TY - JOUR A1 - Kraft, Sebastian A1 - Schille, J. A1 - Bonse, Jörn A1 - Löschner, U. A1 - Krüger, Jörg T1 - X‑ray emission during the ablative processing of biological materials by ultrashort laser pulses JF - Applied Physics A N2 - The ablative laser processing with ultrashort pulsed laser beams may cause secondary emission of hazardous X-rays. While the effect has recently been proven to be considered in working safety regulations when processing technical materials, such as metals, the X-ray emission rates during the ablative processing of biological tissue materials are widely unexplored yet. Therefore, biological materials like water, isotonic saline solution, pig eyes, and human teeth were ablated with ultrashort laser pulses of 1030 nm wavelength, 600 fs pulse duration and 5 kHz pulse repetition rate, aiming to mimic typical surgery situations. Simultaneously, in-situ X-ray dose rate measurements were performed at a short distance from the plasma to display potential X-ray emission. For all four studied biological materials, our measurements prove the secondary emission of laser-induced X-rays. KW - Ultrashort pulsed laser KW - Laser-induced X-ray emission KW - Ophthalmology KW - Dentistry KW - Secondary hazard PY - 2023 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-569960 DO - https://doi.org/10.1007/s00339-023-06440-4 SN - 0947-8396 VL - 129 IS - 3 SP - 1 EP - 8 PB - Springer AN - OPUS4-56996 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Legall, Herbert A1 - Schwanke, Christoph A1 - Bonse, Jörn A1 - Krüger, Jörg T1 - X-ray radiation protection aspects during ultrashort laser processing JF - Journal of Laser Applications N2 - Ultrashort pulse laser processing of materials allows for precise machining with high accuracy. By increasing the repetition rate to several 100 kHz, laser machining becomes quick and cost-effective. Ultrafast laser processing at high repetition rates and peak intensities above 10^13 W/cm^2 can cause a potential hazard by generation of unwanted x-ray radiation. Therefore, radiation protection must be considered. For 925 fs pulse duration at a center wavelength of 1030 nm, the x-ray emission in air at a repetition rate of 400 kHz was investigated up to a peak intensity of 2.6 × 10^14 W/cm^2. Based on the presented measurements, the properties of potential shielding materials will be discussed. By extending our previous works, a scaling of the x-ray radiation emission to higher peak intensities up to 10^15 W/cm^2 is described, and emitted x-ray doses are predicted. KW - Laser ablation KW - Ultrashort pulse laser processing KW - Laser-induced x-ray emission KW - Radiation protection PY - 2020 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-505677 DO - https://doi.org/10.2351/1.5134778 VL - 32 IS - 2 SP - 022004 AN - OPUS4-50567 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Krüger, Jörg A1 - Legall, Herbert A1 - Bonse, Jörn T1 - X-ray hazards and radiation protection aspects in ultrashort laser processing N2 - Ultrashort pulse laser micromachining at repetition rates of several hundreds of kHz allows a cost-effective high precision manufacturing, which makes this method attractive for many industrial applications. Upon exceeding a critical laser intensity, hard X-ray radiation is generated as a side effect. Even if the emitted X-ray dose per laser pulse is low, for currently available high-repetition-rate laser systems the accumulated X-ray dose becomes significant and radiation safety must be considered. Influences of the processing parameters are discussed and radiation protection aspects will be outlined T2 - AKL’22 – International Laser Technology Congress CY - Aachen, Germany DA - 04.05.2022 KW - Ultrashort pulse laser processing KW - X-ray emission KW - Radiation protection PY - 2022 AN - OPUS4-54805 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Stolzenberg, U. A1 - Schmitt Rahner, M. A1 - Pullner, B. A1 - Legall, Herbert A1 - Bonse, Jörn A1 - Kluge, M. A1 - Ortner, A. A1 - Hoppe, B. A1 - Krüger, Jörg T1 - X-ray emission hazards from ultrashort pulsed laser material processing in an industrial setting JF - Materials N2 - Interactions between ultrashort laser pulses with intensities larger than 10^13 W/cm^2 and solids during material processing can lead to the emission of X-rays with photon energies above 5 keV, causing radiation hazards to operators. A framework for inspecting X-ray emission hazards during laser material processing has yet to be developed. One requirement for conducting radiation protection inspections is using a reference scenario, i.e., laser settings and process parameters that will lead to an almost constant and high level of X-ray emissions. To study the feasibility of setting up a reference scenario in practice, ambient dose rates and photon energies were measured using traceable measurement equipment in an industrial setting at SCHOTT AG. Ultrashort pulsed (USP) lasers with a maximum average power of 220 W provided the opportunity to measure X-ray emissions at laser peak intensities of up to 3.3 × 10^15 W/cm^2 at pulse durations of ~1 ps. The results indicate that increasing the laser peak intensity is insufficient to generate high dose rates. The investigations were affected by various constraints which prevented measuring high ambient dose rates. In this work, a list of issues which may be encountered when performing measurements at USP-laser machines in industrial settings is identified. KW - X-ray emission hazards KW - Ultrashort pulsed laser KW - Radiation protection KW - Industrial applications KW - Protection housing PY - 2021 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-538632 DO - https://doi.org/10.3390/ma14237163 SN - 1996-1944 VL - 14 SP - 1 EP - 17 PB - MDPI CY - Basel AN - OPUS4-53863 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Krüger, Jörg A1 - Legall, Herbert A1 - Schwanke, Christoph A1 - Bonse, Jörn T1 - X-ray emission during ultrashort pulse laser processing N2 - The industrial use of ultrashort laser pulses has made considerable progress in recent years. The reasons for this lie in the availability of high average powers at pulse repetition rates in the several 100 kHz range. The advantages of using ultrashort laser pulses in terms of processing precision can thus be fully exploited. However, high laser intensities on the workpiece can also lead to the generation of unwanted X-rays. Even if the emitted X-ray dose per pulse is low, the accumulated X-ray dose can become significant for high-repetition-rate laser systems so that X-ray exposure safety limits must be considered. The X-ray emission during ultrashort pulse laser processing was investigated for a pulse duration of 925 fs at 1030 nm wavelength and 400 kHz repetition rate. Industrially relevant materials such as steel, aluminum and glass were treated. Tungsten served as reference. X-ray spectra were recorded, and X-ray dose measurements were performed for laser treatment in air. For laser intensities > 2 × 10^13 W/cm2, X-ray doses exceeding the regulatory exposure limits for members of the public were found. Suitable X-ray protection strategies are proposed. T2 - SPIE Photonics West CY - San Francisco, USA DA - 02.02.2019 KW - Laser-induced X-ray emission KW - Ultrashort laser material interaction KW - Radiation protection PY - 2019 AN - OPUS4-47361 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Legall, Herbert A1 - Schwanke, Christoph A1 - Bonse, Jörn A1 - Krüger, Jörg T1 - X-ray emission during ultrashort pulse laser processing T2 - Proceedings of SPIE - FRONTIERS IN ULTRAFAST OPTICS: BIOMEDICAL, SCIENTIFIC, AND INDUSTRIAL APPLICATIONS XIX N2 - The industrial use of ultrashort laser pulses has made considerable progress in recent years. The reasons for this lie in the availability of high average powers at pulse repetition rates in the several 100 kHz range. The advantages of using ultrashort laser pulses in terms of processing precision can thus be fully exploited. However, high laser intensities on the workpiece can also lead to the generation of unwanted X-rays. Even if the emitted X-ray dose per pulse is low, the accumulated X-ray dose can become significant for high-repetition-rate laser systems so that X-ray exposure safety limits must be considered. The X-ray emission during ultrashort pulse laser processing was investigated for a pulse duration of 925 fs at 1030 nm wavelength and 400 kHz repetition rate. Industrially relevant materials such as steel,aluminum and glass were treated. Tungsten served as reference. X-ray spectra were recorded, and X-ray dose measurements were performed for laser treatment in air. For laser intensities > 2 × 10^13 W/cm2, X-ray doses exceeding the regulatory exposure limits for members of the public were found. Suitable X-ray protection strategies are proposed. T2 - SPIE Photonics West CY - San Francisco, USA DA - 02.02.2019 KW - Laser-induced X-ray emission KW - Ultrashort laser material interaction KW - Radiation protection PY - 2019 SN - 978-1-5106-2459-7 DO - https://doi.org/10.1117/12.2516165 SN - 0277-786X SN - 1996-756X VL - 10908 SP - 1090802-1 EP - 1090802-7 PB - SPIE - The international society for optics and photonics CY - Bellingham, WA, USA AN - OPUS4-47510 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Legall, Herbert A1 - Schwanke, Christoph A1 - Pentzien, Simone A1 - Dittmar, G. A1 - Bonse, Jörn A1 - Krüger, Jörg T1 - X-ray emission as a potential hazard during ultrashort pulse laser material processing JF - Applied physics A N2 - In laser machining with ultrashort laser pulses unwanted X-ray radiation in the keV range can be generated when a critical laser intensity is exceeded. Even if the emitted X-ray dose per pulse is low, high laser repetition rates can lead to an accumulation of X-ray doses beyond exposure safety limits. For 925 fs pulse duration at a center wavelength of 1030 nm, the X-ray emission was investigated up to an intensity of 2.6 × 10^14 W/cm2. The experiments were performed in air with a thin disk laser at a repetition rate of 400 kHz. X-ray spectra and doses were measured for various planar target materials covering a wide range of the periodic table from aluminum to tungsten. Without radiation shielding, the measured radiation doses at this high repetition rate clearly exceed the regulatory limits. Estimations for an adequate radiation shielding are provided. KW - Laser-induced X-ray emission KW - Ultrashort laser material interaction KW - Femtosecond laser KW - Radiation protection PY - 2018 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-448431 DO - https://doi.org/10.1007/s00339-018-1828-6 SN - 0947-8396 SN - 1432-0630 VL - 124 IS - 6 SP - Article 407, 1 EP - 8 PB - Springer AN - OPUS4-44843 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Böttcher, Katrin A1 - Schmitt Rahner, M. A1 - Stolzenberg, U. A1 - Kraft, Sebastian A1 - Bonse, Jörn A1 - Feist, C. A1 - Albrecht, D. A1 - Pullner, B. A1 - Krüger, Jörg T1 - Worst-case X-ray photon energies in ultrashort pulse laser processing JF - Materials N2 - Ultrashort pulse laser processing can result in the secondary generation of unwanted X-rays if a critical laser irradiance of about 10^13 W/cm^2 is exceeded. Spectral X-ray emissions were investigated during the processing of tungsten and steel using three complementary spectrometers (based on CdTe and silicon drift detectors) simultaneously for the identification of a worst-case spectral scenario. Therefore, maximum X-ray photon energies were determined, and corresponding dose equivalent rates were calculated. An ultrashort pulse laser workstation with a pulse duration of 274 fs, a center wavelength of 1030 nm, pulse repetition rates between 50 kHz and 200 kHz, and a Gaussian laser beam focused to a spot diameter of 33 µm was employed in a single pulse and burst laser operation mode. Different combinations of laser pulse energy and repetition rate were utilized, keeping the average laser power constant close to the maximum power of 20 W. Peak irradiances ranging from 7.3 × 10^13 W/cm^2 up to 3.0 × 10^14 W/cm^2 were used. The X-ray dose equivalent rate increases for lower repetition rates and higher pulse energy if a constant average power is used. Laser processing with burst mode significantly increases the dose rates and the X-ray photon energies. A maximum X-ray photon energy of about 40 keV was observed for burst mode processing of tungsten with a repetition rate of 50 kHz and a peak irradiance of 3 × 10^14 W/cm^2. KW - Ultrashort pulsed laser KW - X-ray emission KW - X-ray spectrum KW - X-ray energies KW - Radiation protection PY - 2022 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-566176 DO - https://doi.org/10.3390/ma15248996 VL - 15 IS - 24 SP - 1 EP - 17 PB - MDPI AN - OPUS4-56617 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Krüger, Jörg A1 - Kraft, S. A1 - Böttcher, Katrin A1 - Bonse, Jörn A1 - Schille, J. A1 - Löschner, U. T1 - Unwanted X-ray emission in ultrashort pulse laser processing: From metallic to biological materials N2 - Ultrashort laser pulses have become established in many industrial processes. Additionally, they are also an integral part of medical applications especially in ophthalmology and to some extent in dentistry. The availability of highly repetitive powerful laser sources and advanced laser beam control systems have favored these developments. However, the laser processing may be accompanied by the generation of unwanted X-rays. Small doses per laser pulse can accumulate to significant dose levels at high laser pulse repetition rates. Moreover, burst mode processing increases the X-ray dose rates compared to single pulse use and results in X-ray photon energies up to 40 keV for tungsten targets. For laser treatment of human teeth, clearly noticeable X-ray skin dose rates can be found. The paper summarizes the current state of the art in the field of undesired generation of X-ray radiation during ultrashort pulse laser processing in air. T2 - Lasers in Manufacturing 2023 (LiM 2023) CY - Munich, Germany DA - 26.06.2023 KW - Ultrashort laser pulses KW - Laser-induced X-ray emission KW - Secondary hazard PY - 2023 AN - OPUS4-57816 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Kraft, S. A1 - Böttcher, Katrin A1 - Bonse, Jörn A1 - Schille, J. A1 - Löschner, U. A1 - Krüger, Jörg T1 - Unwanted X-ray emission in ultrashort pulse laser processing: From metallic to biological materials T2 - Proceedings of the Lasers in Manufacturing Conference 2023 N2 - X-rays can be generated as an unwanted side effect during ultrashort pulse laser material processing of technical work pieces and even biological samples with laser intensities above 10^13 W/cm^2. First studies demonstrate the need to address this effect in industrial as well as in medical applications. This secondary hazard should be considered in work safety and risk assessment. T2 - Lasers in Manufacturing 2023 (LiM 2023) CY - Munich, Germany DA - 26.06.2023 KW - Ultrashort pulse laser processing KW - Laser-induced X-ray emission KW - Secondary hazard PY - 2023 SP - LiM 2023 - 1 EP - LiM 2023 - 6 PB - Wissenschaftliche Gesellschaft Lasertechnik und Photonik e.V. (WLT) AN - OPUS4-58358 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Krüger, Jörg T1 - Unerwünschte Röntgenemission bei der UKP-Lasermaterialbearbeitung N2 - Der Vortrag fasst aktuelle Aspekte zum unerwünschten Auftreten von Röntgenstrahlung bei der Ultrakurzpuls-Lasermaterialbearbeitung zusammen. Es werden Einflussparameter, Grenzwerte, Schutzmaßnahmen, Fragen der Abschirmung und rechtliche Gesichtspunkte diskutiert. T2 - Bayerische Laserschutztage 2022 CY - Online meeting DA - 18.01.2022 KW - Ultrakurze Laserpulse KW - Materialbearbeitung KW - Röntgenstrahlung KW - Strahlenschutz PY - 2022 AN - OPUS4-54259 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Krüger, Jörg A1 - Legall, H. A1 - Bonse, Jörn T1 - Undesired X-ray emission during ultrashort pulse laser material processing N2 - The use of ultrashort laser pulses for material processing in air has many advantages. Due to the progressive development in the laser sector, average powers in the kW range with pulse repetition rates exceeding the MHz-level are available. The machining with high-intensity laser pulses can be accompanied by the generation of a near-surface electron plasma due to absorption and ionization of the material, a subsequent plasma heating by the laser pulse, and finally an interaction of “hot” plasma electrons with the workpiece leading to continuous and characteristic X-ray radiation. The amount of this unwanted X-ray radiation is determined by the laser parameters (pulse duration, intensity, wavelength, polarization), the workpiece (atomic number, surface preparation), and the laser process management (scanning or stationary regime, laser turning). The use of laser intensities above 10^13 W/cm^2 in combination with laser pulse repetition rates in the few 100 kHz-range can lead to X-ray dose rates exceeding the permitted X-ray limits for members of the public. Especially the materials tungsten and steel show significant X-ray emission. Recently, the current state of the art in the field of undesired generation of X-ray radiation during ultrashort pulse laser processing in air was reviewed. In this presentation, important aspects of the measured X-ray doses, X-ray spectra, and practical issues of radiation protection are discussed. T2 - 28th International Conference on Advanced Laser Technologies (ALT'21) CY - Online meeting DA - 06.09.2021 KW - Ultrashort laser pulses KW - Material processing KW - X-ray emission KW - Radiation protection PY - 2021 AN - OPUS4-53241 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Bonse, Jörn A1 - Wrobel, Jerzy A1 - Krüger, Jörg A1 - Kautek, Wolfgang T1 - Ultrashort-pulse laser ablation of indium phosphide in air JF - Applied physics A N2 - Ablation of indium phosphide wafers in air was performed with low repetition rate ultrashort laser pulses (130 fs, 10 Hz) of 800 nm wavelength. The relationships between the dimensions of the craters and the ablation parameters were analyzed. The ablation threshold fluence depends on the number of pulses applied to the same spot. The single-pulse ablation threshold value was estimated to be fth(1)=0.16 J/cm2. The dependence of the threshold fluence on the number of laser pulses indicates an incubation effect. Morphological and chemical changes of the ablated regions were characterized by means of scanning electron microscopy and Auger electron spectroscopy. PY - 2001 DO - https://doi.org/10.1007/s003390000596 SN - 0947-8396 VL - 72 IS - 1 SP - 89 EP - 94 PB - Springer CY - Berlin AN - OPUS4-1068 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Krüger, Jörg A1 - Kautek, Wolfgang T1 - Ultrashort Pulse Laser Interaction with Dielectrics and Polymers T2 - Polymers and light N2 - Abstract Femtosecond laser micromachining has excited vivid attention in various industri- al fields and in medicine owing to the advantages of ultrashort laser pulses compared to long-pulse treatment.These are mainly the reduction of the laser fluence needed to induce ablation and the improvement of the contour sharpness of the laser-generated structures. Recently,special attention was paid to femtosecond laser experiments on nonabsorbing in- organic dielectrics.This is due to the fact that optical damage in dielectric optical elements limits the performance of high-power laser systems.Despite the fact that a large variety of organic polymers can be machined with excimer lasers successfully,the involvement of thermal processes can lead to an unsatisfactory quality of the structures.Ultrashort,fs-laser pulses might be an alternative for the treatment of polymers.Therefore,femtosecond laser machining investigations of dielectrics and polymers are reviewed in this paper.Similarities and differences of the ablation behavior of both material classes are discussed.The influ- ence of the bandgap on the ablation threshold in dependence on the pulse duration,the en- hancement of the machining precision with a shortening of the pulse duration,incubation phenomena,and morphological features appearing on the surface after femtosecond laser treatment are mentioned.Possible applications,e.g.,in medicine and biosensors,are de- scribed. KW - Dielectrics KW - Femtosecond laser KW - Micromachining KW - Ablation KW - Polymers PY - 2004 SN - 3-540-40471-6 N1 - Serientitel: Advances in polymer science – Series title: Advances in polymer science IS - 168 SP - 247 EP - 289 PB - Springer CY - Berlin AN - OPUS4-3262 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Kautek, Wolfgang A1 - Daminelli-Widany, Grazia A1 - Krüger, Jörg ED - Meunier, M. T1 - Ultrashort pulse laser interaction with anodic metal oxide layers in electrolyte contact T2 - Physics and chemistry of advanced laser materials processing N2 - The removal and accelerated corrosion monitoring of metal coating systems is of general interest in materials science and engineering technology. The femtosecond and nanosecond laser ablation and delamination at 800 nm and 532 nm, respectively, of anodic oxide layers on aluminium alloys in electrolyte contact were investigated. Laser-induced modifications of the oxide layer resulted in an ionic contact between electrolyte and metal, which produced a current transient and thus allowed the in-situ electrochemical monitoring of the modification. Oxide coatings with different optical properties, almost transparent and opaque, were examined. The transparent anodic oxides showed contrasting ablation mechanisms in the nanosecond and femtosecond pulse duration regime: nanosecond pulses caused spallation, whereas femtosecond treatment led to ablation. Current signals measured in the transparent film were consistent with light absorption below the metal-oxide interface and with film spallation. Irradiation of the opaque coating yielded ionic current transients within the so-called shock-affected-zone of the oxide layer. This investigation provided insight into the role of the penetration depth of light and the heat-affected zone, the extent of the shock-affected zone, and the defect formation in the coating and at the solid-solid interface between metal and oxide. T2 - Symposium D - European Materials Research Society CY - Strasbourg, France DA - 2002-06-18 PY - 2002 UR - http://www.emrs-strasbourg.com/files/pdf/2002_SPRING/02_Prog_Dv2.pdf N1 - Serientitel: Applied surface science – Series title: Applied surface science VL - 208/209.2003,1 IS - 1 SP - 1(?) PB - Elsevier CY - Amsterdam AN - OPUS4-1731 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Baudach, Steffen A1 - Bonse, Jörn A1 - Krüger, Jörg A1 - Kautek, Wolfgang T1 - Ultrashort pulse laser ablation of polycarbonate and polymethylmethacrylate JF - Applied surface science N2 - Ablation experiments with ultrashort laser pulses (pulse duration 150 fs, wavelength 800 nm) on polymers (PC, PMMA) relevant for biomedical technology have been performed in air. The lateral and vertical machining precision was evaluated by optical, atomic force and scanning electron microscopy. The ablation threshold reaches values in the range of 0.5–2.5 J/cm2 and depends significantly on the number of laser pulses applied to the same spot. The hole diameters are influenced by the laser fluence and the number of laser pulses. The relation between the ablation threshold and the number of laser pulses applied to the same spot is described in accordance with an incubation model. KW - Femtosecond laser ablation KW - Polymer KW - Polycarbonate KW - Polymethylmethacrylate PY - 2000 DO - https://doi.org/10.1016/S0169-4332(99)00474-2 SN - 0169-4332 SN - 1873-5584 VL - 154-155 SP - 555 EP - 560 PB - North-Holland CY - Amsterdam AN - OPUS4-803 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Krüger, Jörg T1 - Ultrakurzpulslaseraktivitäten an der Bundesanstalt für Materialforschung und -prüfung N2 - Der Vortrag gibt einen Überblick zu aktuellen Projektaktivitäten im BAM-Fachbereich 6.4 Technologien mit Nanowerkstoffen. Der Einsatz von Femtosekunden-Laserpulsen zur Mikro- und Nanostrukturierung, für Prozessschritte in der Photovoltaik und zur Reinigung und Dekontamination von Oberflächen wird beschrieben. Darüber hinaus werden Laser-Zerstörschwellenmessungen erläutert. T2 - IFSW-Kolloquium CY - Universität Stuttgart, Stuttgart, Germany DA - 15.02.2017 KW - Ultrakurze Laserpulse KW - Femtosekundenlaser KW - Laser-Materialbearbeitung KW - Laserreinigung PY - 2017 AN - OPUS4-39170 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Krüger, Jörg T1 - Ultrakurze Laserpulse für technische und biomedizinische Applikationen T2 - Workshop "Brillante Diodenlaser für neue Anwendungen in der Lasermaterialbearbeitung" T2 - Workshop "Brillante Diodenlaser für neue Anwendungen in der Lasermaterialbearbeitung" CY - Berlin, Germany DA - 2014-03-18 PY - 2014 AN - OPUS4-30579 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Krüger, Jörg T1 - Ultrakurze Laserimpulse in der Mikromaterialbearbeitung T2 - Tag der Technik, Fachhochschule für Technik und Wirtschaft (FHTW) T2 - Tag der Technik, Fachhochschule für Technik und Wirtschaft (FHTW) CY - Berlin, Germany DA - 2006-05-19 PY - 2006 AN - OPUS4-12305 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Krüger, Jörg T1 - Ultrakurze Laserimpulse in der Materialbearbeitung: Anwendungen und Sicherheitsaspekte N2 - Im Überblicksvortrag werden Untersuchungen zur Laser-Mikro- und Nanostrukturierung mit Femtosekunden-Laserimpulsen und ausgewählte Anwendungen, z.B. in der Photovoltaik und Biomedizin, vorgestellt. Aktuelle Fragestellungen zur sicheren Prozessführung, wie die mögliche Erzeugung von Röntgenstrahlung beim Laserbearbeitungsprozess und unerwünschte Partikelemissionen, werden aufgegriffen. T2 - Laserverbund Berlin Brandenburg, 89. Laserstammtisch Berlin Brandenburg - Laser für die Materialbearbeitung CY - Berlin, Germany DA - 17.09.2018 KW - Lasermikrobearbeitung KW - Femtosekundenlaser KW - Photovoltaik KW - Biomedizin KW - Lasersicherheit KW - Röntgenemission PY - 2018 AN - OPUS4-46077 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -