TY - GEN A1 - Krüger, Jörg A1 - Kautek, Wolfgang T1 - Ultrashort Pulse Laser Interaction with Dielectrics and Polymers T2 - Polymers and light N2 - Abstract Femtosecond laser micromachining has excited vivid attention in various industri- al fields and in medicine owing to the advantages of ultrashort laser pulses compared to long-pulse treatment.These are mainly the reduction of the laser fluence needed to induce ablation and the improvement of the contour sharpness of the laser-generated structures. Recently,special attention was paid to femtosecond laser experiments on nonabsorbing in- organic dielectrics.This is due to the fact that optical damage in dielectric optical elements limits the performance of high-power laser systems.Despite the fact that a large variety of organic polymers can be machined with excimer lasers successfully,the involvement of thermal processes can lead to an unsatisfactory quality of the structures.Ultrashort,fs-laser pulses might be an alternative for the treatment of polymers.Therefore,femtosecond laser machining investigations of dielectrics and polymers are reviewed in this paper.Similarities and differences of the ablation behavior of both material classes are discussed.The influ- ence of the bandgap on the ablation threshold in dependence on the pulse duration,the en- hancement of the machining precision with a shortening of the pulse duration,incubation phenomena,and morphological features appearing on the surface after femtosecond laser treatment are mentioned.Possible applications,e.g.,in medicine and biosensors,are de- scribed. KW - Dielectrics KW - Femtosecond laser KW - Micromachining KW - Ablation KW - Polymers PY - 2004 SN - 3-540-40471-6 N1 - Serientitel: Advances in polymer science – Series title: Advances in polymer science IS - 168 SP - 247 EP - 289 PB - Springer CY - Berlin AN - OPUS4-3262 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Hertwig, Andreas A1 - Martin, Sven A1 - Krüger, Jörg A1 - Kautek, Wolfgang T1 - Interaction area dependence of the ablation threshold of ion-doped glass JF - Thin solid films N2 - The laser ablation behaviour of ion-doped glass filter materials under irradiation with femtosecond laser pulses was investigated with respect to spot size and repetition rate. The damage threshold fluence of Schott BG18 depends on the size of the irradiated area. The effect is discussed in terms of a defect-site model. KW - Femtosecond KW - Laser KW - Materials processing KW - Ablation KW - Threshold KW - Glass PY - 2004 DO - https://doi.org/10.1016/j.tsf.2003.11.131 SN - 0040-6090 VL - 453-454 SP - 527 EP - 530 PB - Elsevier CY - Amsterdam AN - OPUS4-11046 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -