TY - JOUR A1 - Bonse, Jörn A1 - Krüger, Jörg T1 - Structuring of thin films by ultrashort laser pulses JF - Applied physics A N2 - Modern life and global communication would not be possible without technologically tailored thin films; they are omnipresent in daily life applications. In most cases, the films are deposited entirely at the carrying substrates in a specific processing step of the device or sample. In some cases, however, removal or modification must be performed locally, i.e., site-controlled and material selective through an additional laser processing step. For that ultrashort laser pulses with durations in the femtosecond and picosecond range can provide unique advantages and capabilities in industrially scalable schemes. This article reviews the current state of the research and corresponding industrial transfer related to the structuring of thin films by ultrashort pulsed lasers. It focuses on the pertinent historic developments, reveals the relevant physical and chemical effects, explores the ultimate limits, and discusses selected industrial and scientific applications. KW - Thin films KW - Laser processing KW - Ultrashort lasers KW - Laser damage KW - Femtosecond laser ablation PY - 2023 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-565732 DO - https://doi.org/10.1007/s00339-022-06229-x SN - 0947-8396 SN - 1432-0630 VL - 129 IS - 1 SP - 1 EP - 38 PB - Springer CY - Berlin AN - OPUS4-56573 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Böttcher, Katrin A1 - Schmitt Rahner, M. A1 - Stolzenberg, U. A1 - Kraft, Sebastian A1 - Bonse, Jörn A1 - Feist, C. A1 - Albrecht, D. A1 - Pullner, B. A1 - Krüger, Jörg T1 - Worst-case X-ray photon energies in ultrashort pulse laser processing JF - Materials N2 - Ultrashort pulse laser processing can result in the secondary generation of unwanted X-rays if a critical laser irradiance of about 10^13 W/cm^2 is exceeded. Spectral X-ray emissions were investigated during the processing of tungsten and steel using three complementary spectrometers (based on CdTe and silicon drift detectors) simultaneously for the identification of a worst-case spectral scenario. Therefore, maximum X-ray photon energies were determined, and corresponding dose equivalent rates were calculated. An ultrashort pulse laser workstation with a pulse duration of 274 fs, a center wavelength of 1030 nm, pulse repetition rates between 50 kHz and 200 kHz, and a Gaussian laser beam focused to a spot diameter of 33 µm was employed in a single pulse and burst laser operation mode. Different combinations of laser pulse energy and repetition rate were utilized, keeping the average laser power constant close to the maximum power of 20 W. Peak irradiances ranging from 7.3 × 10^13 W/cm^2 up to 3.0 × 10^14 W/cm^2 were used. The X-ray dose equivalent rate increases for lower repetition rates and higher pulse energy if a constant average power is used. Laser processing with burst mode significantly increases the dose rates and the X-ray photon energies. A maximum X-ray photon energy of about 40 keV was observed for burst mode processing of tungsten with a repetition rate of 50 kHz and a peak irradiance of 3 × 10^14 W/cm^2. KW - Ultrashort pulsed laser KW - X-ray emission KW - X-ray spectrum KW - X-ray energies KW - Radiation protection PY - 2022 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-566176 DO - https://doi.org/10.3390/ma15248996 VL - 15 IS - 24 SP - 1 EP - 17 PB - MDPI AN - OPUS4-56617 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Stolzenberg, U. A1 - Schmitt Rahner, M. A1 - Pullner, B. A1 - Legall, Herbert A1 - Bonse, Jörn A1 - Kluge, M. A1 - Ortner, A. A1 - Hoppe, B. A1 - Krüger, Jörg T1 - X-ray emission hazards from ultrashort pulsed laser material processing in an industrial setting JF - Materials N2 - Interactions between ultrashort laser pulses with intensities larger than 10^13 W/cm^2 and solids during material processing can lead to the emission of X-rays with photon energies above 5 keV, causing radiation hazards to operators. A framework for inspecting X-ray emission hazards during laser material processing has yet to be developed. One requirement for conducting radiation protection inspections is using a reference scenario, i.e., laser settings and process parameters that will lead to an almost constant and high level of X-ray emissions. To study the feasibility of setting up a reference scenario in practice, ambient dose rates and photon energies were measured using traceable measurement equipment in an industrial setting at SCHOTT AG. Ultrashort pulsed (USP) lasers with a maximum average power of 220 W provided the opportunity to measure X-ray emissions at laser peak intensities of up to 3.3 × 10^15 W/cm^2 at pulse durations of ~1 ps. The results indicate that increasing the laser peak intensity is insufficient to generate high dose rates. The investigations were affected by various constraints which prevented measuring high ambient dose rates. In this work, a list of issues which may be encountered when performing measurements at USP-laser machines in industrial settings is identified. KW - X-ray emission hazards KW - Ultrashort pulsed laser KW - Radiation protection KW - Industrial applications KW - Protection housing PY - 2021 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-538632 DO - https://doi.org/10.3390/ma14237163 SN - 1996-1944 VL - 14 SP - 1 EP - 17 PB - MDPI CY - Basel AN - OPUS4-53863 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Legall, Herbert A1 - Bonse, Jörn A1 - Krüger, Jörg T1 - Review of x-ray exposure and safety issues arising from ultra-short pulse laser material processing JF - Journal of Radiological Protection N2 - Laser processing with ultra-short laser pulses enables machining of materials with high accuracy and throughput. The development of novel laser Technologies with laser pulse repetition rates up to the MHz range opened the way for industrial manufacturing processes. From a radiological point of view this evolution is important, because x-ray radiation can be generated as an unwanted side effect in laser material processing. Even if the emitted x-ray dose per pulse is comparably low, the x-ray dose can become hazardous to health at high laser repetition rates. Therefore, radiation protection must be considered. This article provides an overview on the generation and detection of x-rays in laser material processing, as well as on the handling of this radiation risk in the framework of radiological protection. KW - Ultra-short pulse laser processing KW - Laser-induced x-ray emission KW - Radiation protection PY - 2021 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-522376 DO - https://doi.org/10.1088/1361-6498/abcb16 VL - 41 IS - 1 SP - R28 EP - R42 AN - OPUS4-52237 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Heidmann, B. A1 - Andree, Stefan A1 - Levcenko, S. A1 - Unold, T. A1 - Abou-Ras, D. A1 - Schäfer, N. A1 - Bonse, Jörn A1 - Krüger, Jörg A1 - Schmid, M. T1 - Fabrication of regularly arranged chalcopyrite micro solar cells via femtosecond laser-induced forward transfer for concentrator application JF - ACS Applied Energy Materials N2 - A laser-based bottom-up technique for the fabrication of Cu(In,Ga)Se2 (CIGSe) micro solar cells is presented. We use femtosecond laser-induced forward transfer (LIFT) to transport a metallic precursor composed of copper, indium, and gallium onto a molybdenum back contact layer on a glass substrate. A CIGSe absorber forms by subsequent selenization. An array of micro absorbers with defined spacing is fabricated to solar cells and characterized under concentrated light illumination. The solar cell array exhibited a conversion efficiency of 1.4‰ at 1 sun as well as a significant efficiency enhancement of 68% rel. under 20-fold concentration. This work demonstrates the possibility of directly grown micrometer-sized solar cells based on chalcogenide absorber layers, enabling effective material usage. KW - Micro solar cells KW - Light concentration KW - LIFT KW - Chalcopyrite KW - Femtosecond laser PY - 2018 DO - https://doi.org/10.1021/acsaem.7b00028 SN - 2574-0962 VL - 1 IS - 1 SP - 27 EP - 31 PB - ACS CY - Washington, DC AN - OPUS4-43999 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Bonse, Jörn A1 - Kirner, Sabrina V. A1 - Griepentrog, Michael A1 - Spaltmann, Dirk A1 - Krüger, Jörg T1 - Femtosecond laser texturing of surfaces for tribological applications JF - Materials N2 - Laser texturing is an emerging technology for generating surface functionalities on basis of optical, mechanical, or chemical properties. Taking benefit of laser sources with ultrashort (fs) pulse durations features outstanding precision of machining and negligible rims or burrs surrounding the laser-irradiation zone. Consequently, additional mechanical or chemical post-processing steps are usually not required for fs-laser surface texturing (fs-LST). This work aimed to provide a bridge between research in the field of tribology and laser materials processing. The paper reviews the current state-of-the-art in fs-LST, with a focus on the tribological performance (friction and wear) of specific self-organized surface structures (so-called ripples, grooves, and spikes) on steel and titanium alloys. On the titanium alloy, specific sickle-shaped hybrid micro-nanostructures were also observed and tribologically tested. Care is taken to identify accompanying effects affecting the materials hardness, superficial oxidation, nano- and microscale topographies, and the role of additives contained in lubricants, such as commercial engine oil. KW - Femtosecond laser processing KW - Surface texture KW - Laser-induced periodic surface structures (LIPSS) KW - Friction KW - Wear PY - 2018 UR - http://www.mdpi.com/1996-1944/11/5/801 DO - https://doi.org/10.3390/ma11050801 SN - 1996-1944 VL - 11 IS - 5 SP - 801, 1 EP - 19 PB - MDPI AG CY - Basel, Switzerland AN - OPUS4-44905 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Legall, Herbert A1 - Schwanke, Christoph A1 - Pentzien, Simone A1 - Dittmar, G. A1 - Bonse, Jörn A1 - Krüger, Jörg T1 - X-ray emission as a potential hazard during ultrashort pulse laser material processing JF - Applied physics A N2 - In laser machining with ultrashort laser pulses unwanted X-ray radiation in the keV range can be generated when a critical laser intensity is exceeded. Even if the emitted X-ray dose per pulse is low, high laser repetition rates can lead to an accumulation of X-ray doses beyond exposure safety limits. For 925 fs pulse duration at a center wavelength of 1030 nm, the X-ray emission was investigated up to an intensity of 2.6 × 10^14 W/cm2. The experiments were performed in air with a thin disk laser at a repetition rate of 400 kHz. X-ray spectra and doses were measured for various planar target materials covering a wide range of the periodic table from aluminum to tungsten. Without radiation shielding, the measured radiation doses at this high repetition rate clearly exceed the regulatory limits. Estimations for an adequate radiation shielding are provided. KW - Laser-induced X-ray emission KW - Ultrashort laser material interaction KW - Femtosecond laser KW - Radiation protection PY - 2018 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-448431 DO - https://doi.org/10.1007/s00339-018-1828-6 SN - 0947-8396 SN - 1432-0630 VL - 124 IS - 6 SP - Article 407, 1 EP - 8 PB - Springer AN - OPUS4-44843 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Stratakis, E. A1 - Bonse, Jörn A1 - Heitz, J. A1 - Siegel, J. A1 - Tsibidis, G.D. A1 - Skoulas, E. A1 - Papadopoulos, A. A1 - Mimidis, A. A1 - Joel, A.-C. A1 - Comanns, P. A1 - Krüger, Jörg A1 - Florian, C. A1 - Fuentes-Edfuf, Y. A1 - Solis, J. A1 - Baumgartner, W. T1 - Laser engineering of biomimetic surfaces JF - Materials Science and Engineering: R: Reports N2 - The exciting properties of micro- and nano-patterned surfaces found in natural species hide a virtually endless potential of technological ideas, opening new opportunities for innovation and exploitation in materials science and engineering. Due to the diversity of biomimetic surface functionalities, inspirations from natural surfaces are interesting for a broad range of applications in engineering, including phenomena of adhesion, friction, wear, lubrication, wetting phenomena, self-cleaning, antifouling, antibacterial phenomena, thermoregulation and optics. Lasers are increasingly proving to be promising tools for the precise and controlled structuring of materials at micro- and nano-scales. When ultrashort-pulsed lasers are used, the optimal interplay between laser and material parameters enables structuring down to the nanometer scale. Besides this, a unique aspect of laser processing technology is the possibility for material modifications at multiple (hierarchical) length scales, leading to the complex biomimetic micro- and nano-scale patterns, while adding a new dimension to structure optimization. This article reviews the current state of the art of laser processing methodologies, which are being used for the fabrication of bioinspired artificial surfaces to realize extraordinary wetting, optical, mechanical, and biological-active properties for numerous applications. The innovative aspect of laser functionalized biomimetic surfaces for a wide variety of current and future applications is particularly demonstrated and discussed. The article concludes with illustrating the wealth of arising possibilities and the number of new laser micro/nano fabrication approaches for obtaining complex high-resolution features, which prescribe a future where control of structures and subsequent functionalities are beyond our current imagination. KW - Biomimetic surfaces KW - Laser processing KW - Surface functionalization KW - Bioinspiration KW - Bionic materials PY - 2020 DO - https://doi.org/10.1016/j.mser.2020.100562 SN - 0927-796X VL - 141 SP - 100562-1 EP - 100562-47 PB - Elsevier B.V. AN - OPUS4-50927 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Lone, S. A. A1 - Muck, M. A1 - Fosodeder, P. A1 - Mardare, C.C. A1 - Florian, Camilo A1 - Weth, A. A1 - Krüger, Jörg A1 - Steinwender, C. A1 - Baumgartner, W. A1 - Bonse, Jörn A1 - Heitz, J. A1 - Hassel, A.W. T1 - Impact of Femtosecond Laser Treatment Accompanied with Anodization of Titanium Alloy on Fibroblast Cell Growth JF - Physica Status Solidi A N2 - Herein, Ti6Al4V alloy is surface modified by femtosecond laser ablation. The microstructure image obtained by secondary electron microscopy reveals a combination of micrometer spikes or cones superimposed by nanoripples (laser‐induced periodic surface structures). To make the surface hydrophilic, anodization is performed resulting in further smoothness of microstructure and a final thickness of 35 ± 4 nm is estimated for oxide produced after anodization at 10 V (scan rate = 0.1 V s−1) versus standard hydrogen electrode. The obtained electrochemically active surface area (ECSA) is approximately 8 times larger compared with flat mirror polished Ti6Al4V surface. Combined chemical analysis by Pourbaix diagram and X‐ray photoelectron spectroscopy (XPS) analyses reveal that titanium and aluminum are passivating into TiO2 and Al2O3, but the dissolution of aluminum in the form of solvated ion is inevitable. Finally, cell seeding experiments on anodized and laser‐treated titanium alloy samples show that the growth of murine fibroblast cells is significantly suppressed due to unique surface texture of the laser‐treated and anodized titanium alloy sample. KW - Anodization KW - Femtosecond laser ablation KW - Laser-induced periodic surface structures, LIPSS KW - Ti6Al4V alloys KW - X-ray photoelectron spectroscopy PY - 2020 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-510263 DO - https://doi.org/https://doi.org/10.1002/pssa.201900838 SN - 1862-6300 SN - 1862-6319 VL - 217 IS - 13 SP - 1900838-1 EP - 1900838-9 PB - WILEY-VCH Verlag CY - Weinheim, Germany AN - OPUS4-51026 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Florian, Camilo A1 - Kirner, Sabrina V. A1 - Krüger, Jörg A1 - Bonse, Jörn T1 - Surface functionalization by laser-induced periodic surface structures JF - Journal of Laser Applications N2 - In recent years, the improved understanding of the formation of laser-induced periodic surface structures (LIPSS) has led to an emerging variety of applications that modify the optical, mechanical, and chemical properties of many materials. Such structures strongly depend on the laser beam polarization and are formed usually after irradiation with ultrashort linearly polarized laser pulses. The most accepted explanation for the origin of the structures is based on the interference of the incident laser radiation with electromagnetic surface waves that propagate or scatter at the surface of the irradiated materials. This leads to an intensity modulation that is finally responsible for the selective ablation in the form of parallel structures with periods ranging from hundreds of nanometers up to some micrometers. The versatility when forming such structures is based on the high reproducibility with different wavelengths, pulse durations and repetition rate laser sources, customized micro- and nanometric spatial resolutions, and compatibility with industrially relevant processing speeds when combined with fast scanning devices. In this contribution, we review the latest applications in the rapidly emerging field of surface functionalization through LIPSS, including biomimetic functionalities on fluid transport, control of the wetting properties, specific optical responses in technical materials, improvement of tribological performance on metallic surfaces, and bacterial and cell growth for medical devices, among many others. KW - Laser-induced periodic surface structures (LIPSS) KW - Laser processing KW - Surface functionalization KW - Applications PY - 2020 DO - https://doi.org/10.2351/7.0000103 SN - 1938-1387 VL - 32 IS - 2 SP - 022063 PB - Laser Institute of America AN - OPUS4-50780 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -