TY - GEN A1 - Krüger, Jörg A1 - Kautek, Wolfgang T1 - Ultrashort Pulse Laser Interaction with Dielectrics and Polymers N2 - Abstract Femtosecond laser micromachining has excited vivid attention in various industri- al fields and in medicine owing to the advantages of ultrashort laser pulses compared to long-pulse treatment.These are mainly the reduction of the laser fluence needed to induce ablation and the improvement of the contour sharpness of the laser-generated structures. Recently,special attention was paid to femtosecond laser experiments on nonabsorbing in- organic dielectrics.This is due to the fact that optical damage in dielectric optical elements limits the performance of high-power laser systems.Despite the fact that a large variety of organic polymers can be machined with excimer lasers successfully,the involvement of thermal processes can lead to an unsatisfactory quality of the structures.Ultrashort,fs-laser pulses might be an alternative for the treatment of polymers.Therefore,femtosecond laser machining investigations of dielectrics and polymers are reviewed in this paper.Similarities and differences of the ablation behavior of both material classes are discussed.The influ- ence of the bandgap on the ablation threshold in dependence on the pulse duration,the en- hancement of the machining precision with a shortening of the pulse duration,incubation phenomena,and morphological features appearing on the surface after femtosecond laser treatment are mentioned.Possible applications,e.g.,in medicine and biosensors,are de- scribed. KW - Dielectrics KW - Femtosecond laser KW - Micromachining KW - Ablation KW - Polymers PY - 2004 SN - 3-540-40471-6 N1 - Serientitel: Advances in polymer science – Series title: Advances in polymer science IS - 168 SP - 247 EP - 289 PB - Springer CY - Berlin AN - OPUS4-3262 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Hertwig, Andreas A1 - Martin, Sven A1 - Krüger, Jörg A1 - Spielmann, C. A1 - Lenner, M. A1 - Kautek, Wolfgang ED - Dausinger, F. ED - Lichtner, F. ED - Lubatschowski, H. T1 - Primary hazards and reliability of protective materials N2 - Femtosecond laser pulses are close to industrial use. The advantages of ultrashort laser pulses for micromachining applications especially in the case of dielectric and biological samples down to pulse durations of 5 fs have been established. The current international standards of laser safety are primarily concerned with CW and pulsed lasers down to the nanosecond range. Therefore, human tissue and laser-protection equipment was investigated with respect to its resistance and protection performance for femtosecond laser illumination down to 30 fs. This included filter glasses for laser protection eyewear, polymer and textile materials used in curtains and guards. Bulk absorber filters can provide enough protection against laser radiation, give a sufficiently broad absorption spectrum. Materials are damaged more easily by femtosecond laser radiation. The need for sufficient spectral broadness as well as the different damage thresholds have to be included in international laser safety standards. This work should trigger the development of novel eye-protection devices that are lighter and ergonomically more acceptable than present commercial models. KW - Lasersicherheit KW - Kurzpulslaser KW - Femtosekunden KW - Lasertechnik KW - Materialbearbeitung PY - 2004 SN - 3-540-20114-9 DO - https://doi.org/10.1007/b96440 SN - 0303-4216 N1 - Serientitel: Topics in applied physics – Series title: Topics in applied physics IS - 96 SP - 287 EP - 307 PB - Springer CY - Berlin AN - OPUS4-4661 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Bonse, Jörn A1 - Baudach, Steffen A1 - Krüger, Jörg A1 - Kautek, Wolfgang ED - Exarhos, G. T1 - Femtosecond laser damage in dielectric coatings N2 - Multi-shot investigations of Ti:sapphire laser (wavelength (lambda) approximately equals 800 nm) induced damage were performed in three different laboratories (BAM, Berlin; LZH, Hannover; UNM, Albuquerque). The ablation behavior of a high reflecting mirror consisting of alternating (lambda) /4- layers of Ta2O5 and SiO2 was studied. Fused silica served as substrate. The influence of the pulse duration ((tau) equals 13 - 130 fs), the pulse number (30 - (infinity) ) and the repetition rate (10 Hz - 100 MHz) on the damage threshold will be discussed. T2 - 32nd Annual Boulder Damage Symposium CY - Boulder, CO, USA DA - 2000-10-16 PY - 2001 SN - 0-8194-4036-1 DO - https://doi.org/10.1117/12.425056 SN - 1605-7422 N1 - Serientitel: SPIE proceedings series – Series title: SPIE proceedings series IS - 4347 SP - 24 EP - 34 PB - International Society for Optical Engineering (SPIE) CY - Bellingham, Wash. AN - OPUS4-6013 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Kautek, Wolfgang A1 - Pentzien, Simone A1 - Rudolph, Pascale A1 - Krüger, Jörg A1 - Maywald-Pitellos, C. A1 - Bansa, H. A1 - Grösswang, H. A1 - König, W. ED - Fotakis, C. T1 - Near-Ultraviolet Pulsed Laser Interaction with Contaminants and Pigments on Parchment: Spectroscopic Diagnostics for Laser Cleaning Safety T2 - 5th International Conference on Optics within Life Sciences CY - H¯erakleion, Greece DA - 1998-01-01 PY - 2000 SN - 3-540-66648-6 N1 - Serientitel: Optics within life sciences – Series title: Optics within life sciences IS - 5 SP - 100 EP - 107 PB - Springer CY - Berlin AN - OPUS4-6189 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Kautek, Wolfgang A1 - Hertwig, Andreas A1 - Martin, Sven A1 - Krüger, Jörg A1 - Lenzner, Matthias A1 - Spielmann, C. A1 - Lenner, M. A1 - Bunte, J. A1 - Puester, T. A1 - Burmester, T. A1 - Fiedler, A. A1 - Heberer, E. A1 - Brose, M. A1 - Stingl, A. A1 - Kiehl, P. A1 - Hönigsmann, H. A1 - Trautinger, F. A1 - Grabner, G. T1 - Safety in Femtosecond Laser Technology - Recent Results of a European Research Project (406) T2 - International Laser Safety Conference 2003 ; ILSC 2003 CY - Jacksonville, FL, USA DA - 2003-03-10 PY - 2003 SN - 0-912035-38-2 SP - 1(?) EP - 10(?) PB - Laser Institute of America CY - Orlando, Fla. AN - OPUS4-2259 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Kautek, Wolfgang A1 - Pentzien, Simone A1 - Krüger, Jörg A1 - König, E. ED - Kautek, W. ED - König, E. T1 - Laser cleaning of ancient parchments T2 - LACONA I CY - Heraklion, Crete, Greece DA - 1995-10-04 PY - 1997 SN - 3-901025-68-5 VL - 18 SP - 69 EP - 78 PB - Mayer CY - Klosterneuburg AN - OPUS4-11784 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Kautek, Wolfgang A1 - Krüger, Jörg ED - Beyer, E. T1 - Femtosecond pulse laser ablation of metallic, semiconducting, ceramic, and biological materials N2 - Production of holes and grooves of < 30 micrometers diameter with high aspect ratio value is a delicate task either for mechanical tools, or for conventional nanosecond pulse lasers like e.g. pulsed Nd:YAG or excimer lasers. They later tend to cause microcracks extending from an annular melting zone, or substantial disruption, respectively. Experimental results are presented which demonstrate that the development of intense ultrashort pulse laser systems (>> 1012 W cm-2, (tau) < 1 ps) opens up possibilities for materials processing by cold plasma generation and ablation of metals, semiconductors, ceramics, composites, and biological materials. A femtosecond and a nanosecond dye laser with pulse durations of 300 fs (< 200 (mu) J) and 7 ns (< 10 mJ), and center wavelengths at 612 and 600 nm, respectively, both focused on an area of the order of 10-5 cm2, have been applied either to absorbing substrates, like polycrystalline gold, silicon (111), aluminum nitride ceramics, or transparent materials, like synthetic and human dental hydroxyapatite composites, bone material, and human cornea transplants. The fs-laser generates its own absorption in transparent materials by a multiphoton absorption process, and thus forces the absorption of visible radiation. Because the time is too short (< ps) for significant transport of mass and energy, the beam interaction generally results in the formation of a thin plasma layer of approximately solid state density. Only after the end of the subpicosecond laser pulse, it expands rapidly away from the surface without any light absorption and further plasma heating. Therefore, energy transfer (heat and impulse) to the target material, and thermal and mechanical disruption are minimized. In contrast to heat- affected zones (HAZ's) generated by conventional nanosecond pulse lasers of the order of 1 - 10 micrometers , HAZ's of less than 0.02 micrometers were observed. T2 - Conference on Production Line Processes ; Conference on Process Control and Modeling ; Conference on Novel Applications CY - Vienna, Austria DA - 1994-04-05 PY - 1994 SN - 0-8194-1508-1 DO - https://doi.org/10.1117/12.184768 SN - 1605-7422 N1 - Serientitel: SPIE proceedings series – Series title: SPIE proceedings series IS - 2207 SP - 600 EP - 611 PB - SPIE--the International Society for Optical Engineering CY - Bellingham, Wash. AN - OPUS4-11892 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Krüger, Jörg A1 - Kautek, Wolfgang A1 - Lenzner, M. A1 - Sartania, S. A1 - Spielmann, C. A1 - Krausz, F. ED - Dubowski, J. T1 - Structuring of dielectric and metallic materials with ultrashort laser pulses between 20 fs and 3 ps N2 - Laser-micromachining of barium aluminum borosilicate glass, fused silica and stainless steel has been extended down to a pulse duration of 20 fs generated by a Ti:sapphire laser system at a wavelength of 0.8 micrometer. A systematic study shows that, below 100 fs, an enhanced precision and a substantial decrease of the ablation threshold fluence in comparison to pulse laser processing with pulses in the picosecond and nanosecond range could be achieved. The physical mechanism and the technical relevance of this novel microtechnology is discussed. T2 - Conference CY - San José, CA, USA DA - 1997-02-10 KW - Ablation KW - Laser processing KW - Micromachining KW - Structuring KW - Femtosecond pulse laser KW - Glass KW - Silica KW - Steel PY - 1997 SN - 0-8194-2402-1 DO - https://doi.org/10.1117/12.273740 SN - 1605-7422 N1 - Serientitel: SPIE proceedings series – Series title: SPIE proceedings series IS - 2991 SP - 40 EP - 47 PB - SPIE CY - Bellingham, Wash. AN - OPUS4-11893 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Gruber, D. A1 - Husinsky, W. A1 - Grabner, G. A1 - Baumgartner, I. A1 - Scholman, J. A1 - Krüger, Jörg A1 - Kautek, Wolfgang ED - Waidelich, W. T1 - Nano- and Femtosecond-Laser Processing of Human Donor Corneal-Transplants and Lenticules for Corneal Surgery T2 - 12. Internationaler Kongress Laser 95 CY - Munich, Germany DA - 1995-06-01 PY - 1996 SN - 3-540-61316-1 SP - 397 EP - 400 PB - Springer CY - Berlin AN - OPUS4-11895 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Krüger, Jörg A1 - Kautek, Wolfgang A1 - Staub, M. A1 - Scherer, G.G. ED - Waidelich, W. T1 - Femtosecond-pulse laser micromachining of metal layer composites T2 - 12. Internationalen Kongresses Laser 95 CY - Berlin, Germany DA - 1996-01-01 PY - 1996 SN - 3-540-61316-1 SP - 966 EP - 969 PB - Springer CY - Berlin AN - OPUS4-11958 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Niino, Hiroyuki A1 - Krüger, Jörg A1 - Kautek, Wolfgang ED - Dubowski, J. ED - Dyer, P. T1 - Photochemical surface modification of polyurethane films with biomaterial by excimer laser processing T2 - 3rd Three-Day Conference on Laser Applications in Microelectronic and Optoelectronic Manufacturing, LAMOM ; LASE ; Photonics West CY - San José, CA, USA DA - 1998-01-26 KW - Laser irradiation surface effects KW - Surface and interface chemistry of polymers KW - Photochemical reactions of biomolecules KW - Biochemical reaction mechanisms and kinetics PY - 1998 SN - 0-8194-2713-6 SN - 1605-7422 N1 - Serientitel: SPIE proceedings series – Series title: SPIE proceedings series IS - 3274 SP - 128 EP - 132 PB - SPIE CY - Bellingham, Wash. AN - OPUS4-12040 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Lenzner, M. A1 - Sartania, S. A1 - Spielmann, C. A1 - Krausz, F. A1 - Krüger, Jörg A1 - Kautek, Wolfgang T1 - Nanometer precision material ablation and optical breakdown with sub-10 fs pulses T2 - 11th International Conference on Ultrafast Phenomena CY - Garmisch-Partenkirchen, Germany DA - 1998-07-12 PY - 1998 SN - 3-540-65430-5 SN - 0172-6218 N1 - Serientitel: Springer Series in chemical physics – Series title: Springer Series in chemical physics IS - 63 SP - 313 EP - 315 PB - Springer CY - Heidelberg AN - OPUS4-12042 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Lenzner, M. A1 - Sartania, S. A1 - Spielmann, C. A1 - Krausz, F. A1 - Krüger, Jörg A1 - Kautek, Wolfgang T1 - Optical Damage of Dielectrics down to 5 fs T2 - 17th Conference on Lasers and Electro-Optics (CLEO) CY - Baltimore, MD, USA DA - 1997-05-18 PY - 1997 SN - 1-557-52498-X IS - 11 SP - 218 EP - 219 PB - Optical Society of America CY - Washington, DC AN - OPUS4-12043 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Kautek, Wolfgang A1 - Krüger, Jörg ED - Brieger, M. T1 - Femtosecond-pulse laser microstructuring of semiconducting materials T2 - 1st International Symposium on Semiconductor Processing and Characterization with Lasers - Applications in Photovoltaics CY - Stuttgart, Germany DA - 1994-04-18 KW - Femtosecond-Pulse Laser KW - Subpicosecond-Pulse Laser KW - Laser-Ablation KW - Multi-Photon Absorption KW - Microstructuring KW - Dry Etching KW - Semiconductors KW - Silicon PY - 1995 SN - 0-87849-683-1 SN - 0255-5476 N1 - Serientitel: Materials science forum – Series title: Materials science forum IS - 173/174 SP - 17 EP - 22 PB - Trans Tech Publ. CY - Aedermannsdorf AN - OPUS4-11671 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Kautek, Wolfgang A1 - Sorg, N. A1 - Krüger, Jörg ED - Brieger, M. T1 - Optical second-harmonic generation (SHG) on semiconductor electrodes by means of femtosecond and nanosecond-pulse lasers N2 - In situ optical second-harmonic generation (SHG) on centrosymmetric crystalline semiconductor electrodes opens up a new field of in situ investigations of hurried solid state interfaces and metal front contacts relevant to electronic and photovoltaic devices, which are rarely accessible by other methods. Photoelectrochemical nanosecond- and femtosecond-pulse laser investigations of silicon (111) electrodes show that in situ SHG is feasible in such complex interfacial systems. In a p-p polarization configuration, the azimuthal dependence of the SHG from oxide-covered and bare n-Si (111) electrodes, with and without Ni contact deposits, have been studied. Etching and regrowth of silicon oxides as well as burried interfacial electric field distributions were monitored. In situ SHG is shown to be extremely sensitive to trapped interfacial charge, crystal misorientations and surface step arrays. An advantage of femtosecond-pulses is the fact that illumination fluences that are well below the damage threshold, but still with sufficient power density, can be applied. (Author) T2 - 1st International Symposium on Semiconductor Processing and Characterization with Lasers - Applications in Photovoltaics CY - Stuttgart, Germany DA - 1994-04-18 KW - Femtosecond-Pulse Laser KW - Sub-Picosecond-Pulse Laser KW - Semiconductors KW - Silicon KW - Second-Harmonic Generation KW - SHG KW - Nonlinear Electroreflectance KW - Etch Process KW - Oxide KW - Interfacial Electronic States KW - Fermi-Level Pinning KW - MOS Diode PY - 1995 SN - 0-87849-683-1 DO - https://doi.org/10.4028/www.scientific.net/MSF.173-174.285 SN - 0255-5476 N1 - Serientitel: Materials science forum – Series title: Materials science forum IS - 173/174 SP - 285 EP - 290 PB - Trans Tech Publ. CY - Aedermannsdorf AN - OPUS4-11672 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Krüger, Jörg A1 - Lenzner, Matthias A1 - Martin, Sven A1 - Lenner, M. A1 - Spielmann, C. A1 - Fiedler, A. A1 - Kautek, Wolfgang ED - Phipps, C. R. T1 - Femtosecond laser induced damage in absorbing filters used for laser protection N2 - Damage experiments of absorbing filters (Schott BG18 and BG36) were performed with Ti:sapphire laser pulses with durations from 30 fs to 340 fs (800 nm, 1 kHz) in air. The direct focusing technique was employed under single- and multi-pulse irradiation conditions. Ablation threshold fluences were determined from a semi-logarithmic plot of the ablation crater diameter vs. laser fluence. The damage threshold fluence decreases for shorter pulse durations. In the investigated pulse duration range, the measured multi-pulse ablation threshold fluences are practically similar to those of undoped glass material (~1 Jcm-2). That means that the multi-pulse ablation threshold is independent on the doping level of the filters. For more than 100 pulses per spot and all pulse durations applied, the threshold fluence saturates. This leads to technically relevant damage threshold values in the femtosecond laser pulse duration domain. T2 - 4th SPIE's International Conference on High-Power Laser Ablation CY - Taos, NM, USA DA - 2002-04-22 KW - Ablation KW - Damage KW - Eye protection KW - Femtosecond pulse laser KW - Incubation KW - Laser safety KW - Threshold fluence PY - 2002 SN - 0-8194-4524-X DO - https://doi.org/10.1117/12.482109 SN - 1605-7422 N1 - Serientitel: SPIE proceedings series – Series title: SPIE proceedings series VL - 1 IS - 4760 SP - 398 EP - 405 PB - SPIE CY - Bellingham, Wash. AN - OPUS4-1550 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Kautek, Wolfgang A1 - Daminelli-Widany, Grazia A1 - Meja, P. A1 - Cortona, Anna A1 - Krüger, Jörg A1 - Autric, M. ED - Phipps, C. R. T1 - Femtosecond and nanosecond laser removal of anodic oxide layers from aluminium T2 - 4th SPIE's International Conference on High-Power Laser Ablation CY - Taos, NM, USA DA - 2002-04-22 KW - Laser ablation KW - Laser spallation KW - Microphone KW - Acoustical measurement KW - Aluminium oxide PY - 2002 SN - 0-8194-4524-X SN - 1605-7422 N1 - Serientitel: SPIE proceedings series – Series title: SPIE proceedings series IS - 4760 SP - 239 EP - 246 PB - SPIE CY - Bellingham, Wash. AN - OPUS4-1551 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Kautek, Wolfgang A1 - Ligterink, F. J. A1 - Pedersoli Jr., J. L. A1 - Teule, R. A1 - Havermans, J. A1 - Balas, C. A1 - Pentzien, Simone A1 - Rudolph, Pascale ED - Daniels, V. T1 - Laser technology as a solution to unanswered cleaning problems in paper conservation - PARELA - a new European cooperative research project T2 - Baltimore Congress CY - Baltimore, MD, USA DA - 2002-09-02 PY - 2002 SN - 0-9500525-7-4 SP - 1(?) EP - 2(?) CY - London AN - OPUS4-1584 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Kautek, Wolfgang A1 - Nauer, G. A1 - Trettenhahn, G. A1 - Neckel, A. A1 - Mirwald, S. ED - Kruger, F. T1 - Die elektrochemische Oxidation von Blei in sulfathaltigen Elektrolyten - In situ Charakterisierung mittels GIXD (grazing incidence X-ray diffraction) und Infrarotspektroskopie T2 - Jahrestagung der GDCh-Fachgruppe Angewandte Elektrochemie CY - Wien, Österreich DA - 1997-09-24 KW - GIXD PY - 1997 SN - 3-924763-71-2 N1 - Sprachen: Deutsch/Englisch - Languages: German/English N1 - Serientitel: GDCh-Monographien – Series title: GDCh-Monographien IS - 12 SP - 132 EP - 139 PB - GDCh CY - Frankfurt am Main AN - OPUS4-770 LA - mul AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Bonse, Jörn A1 - Baudach, Steffen A1 - Krüger, Jörg A1 - Kautek, Wolfgang ED - Phipps, C. T1 - Femtosecond laser micromachining of technical materials N2 - Micromachining experiments were performed with Ti:sapphire laser pulses (130 fs - 150 fs, 800 nm, approximately 10 Hz) in air. Employing the direct focusing technique, highly absorbing titanium nitride (TiN) and weakly absorbing polyimide (PI) and polymethylmethacrylate (PMMA) served as target materials. The lateral and vertical precision of the laser ablation and morphological features were characterized by scanning force (SFM), scanning electron (SEM) and optical microscopy. For TiN, incubation can be observed, i.e. the single-pulse surface damage threshold (0.26 J/cm2) is by a factor of two greater than the threshold for 100 pulses. Ablation rates below 10 nm per pulse can be achieved. The evolution of sub-wavelength ripples is presented in dependence on pulse number and laser fluence, respectively. The incubation behavior of the polymers can be described by an accumulation model as for TiN. Experiments on PI with varying focal lengths result in the same modification thresholds. Different polarization states of light (linear, circular) lead to a variation of the ablation rate and to various morphological patterns in the ablation craters (wavelength ripples, cones). Swelling of PMMA occurred at fluences below the ablation threshold. T2 - 3rd SPIE's International Conference on High-Power Laser Ablation CY - Santa Fe, NM, USA DA - 24.04.2000 KW - Ablation KW - Femtosecond pulse laser KW - Laser processing KW - Micromachining KW - Polymer KW - Titanium nitride KW - Ripples PY - 2000 SN - 0-8194-3700-X DO - https://doi.org/10.1117/12.407346 SN - 1605-7422 N1 - Serientitel: SPIE proceedings series – Series title: SPIE proceedings series IS - 4065 SP - 161 EP - 172 PB - SPIE CY - Bellingham, Wash. AN - OPUS4-967 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Kautek, Wolfgang A1 - Oltra, R. A1 - Arenholz, E. A1 - Leiderer, P. A1 - Fotakis, C. A1 - Autric, M. A1 - Afonso, C. A1 - Wazen, P. ED - Phipps, C. T1 - Modelling and diagnostic of pulsed laser-solid interactions - Applications to laser cleaning N2 - The present study concerns the cleaning of matenats using pulsed laser irradiarton and it summarises the most recent results obtalned by the collaborative research of different European groups, within the kamework of a European program for tralnlng and mobillrv of researchers. A series of pulsed lasers, which emit at various wavelengths (liom UV to IR) wit11 short duration of pulse (few nano-, pico- or fernto-seconds), is used for the removal of metallic, ceramic and organic pollutants kom contaminated solid surfaces of different natures. The scientific results obtained so far are focused on the laser cleaning of silicon wafers from sub-micrometer particles, tile theoretical modelling of particles removal mechanism during dry laser cleaning, the removal of oxide layers from oxidised metals and alloys, as well as on the development of laser imaging as a diagnostrc tool for the estimation of the efficiency of the proposed cleaning technique. T2 - Osaka High-Power Laser Ablation Conference ; AHPLA '99 Symposium CY - Osaka, Japan DA - 1999-11-01 KW - Laser cleaning KW - Decontamination KW - Surface treatment KW - Particles removal KW - Oxide removal KW - Modelling KW - Laser imaging PY - 2000 UR - http://www.ub.uni-konstanz.de/kops/volltexte/2007/2863/pdf/259_spie_2000.pdf SN - 0-8194-3483-3 SN - 1605-7422 N1 - Serientitel: SPIE proceedings series – Series title: SPIE proceedings series IS - 3885 SP - 499 EP - 508 PB - SPIE CY - Bellingham, Wash. AN - OPUS4-971 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Rudolph, Pascale A1 - Krüger, Jörg A1 - Kautek, Wolfgang T1 - Mikrostrukturierung von Glas zur Erzeugung kristalliner Si-Schichten PY - 2000 IS - 12 SP - 7 EP - 36 PB - VDI-Verl. CY - Düsseldorf AN - OPUS4-985 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Sahre, Mario A1 - Reetz, Susanne A1 - Kautek, Wolfgang A1 - Lindner, B. A1 - Medovic, A. A1 - Sleytr, U. A1 - Neubauer, A. ED - Hasche, K. ED - Mirande, W. ED - Wilkening, G. T1 - Gradient Composite Replicas from Protein Crystal Layer Templates produced by Pulsed Laser Deposition T2 - 4th Seminar on Quantitative Microscopy QM 2000 CY - Semmering, Austria DA - 2000-01-12 KW - Pulsed Laser KW - Protein Crystal Layer Templates PY - 2000 SN - 3-89701-503-X SN - 0179-0609 N1 - Serientitel: PTB-Bericht: PTB-F – Series title: PTB-Bericht: PTB-F IS - 39 SP - 8 EP - 16 PB - Physikalisch-Techn. Bundesanst. CY - Braunschweig AN - OPUS4-881 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Bonse, Jörn A1 - Krüger, Jörg A1 - Kautek, Wolfgang A1 - Wrobel, J. M. T1 - Femtosecond pulse laser machining of InP wafers N2 - Ablation of indium phosphide wafers in air was performed with 130 fs laser pulses at a wavelength of 800 nm at a low repetition rate of 10 Hz. In order to evaluate the role of the incubation effects, the relationship between the number of laser pulses used for the ablation and the threshold fluence was studied. Particular attention was paid to the chemical composition, surface morphology and structural variations of the ablated area. T2 - 5th Laser Applications in Microelectronics and Optoelectronics Manufacturing Conference (LAMOM) CY - San José, CA, USA DA - 240.01.2000 KW - Femtosecond laser ablation KW - Indium phosphide KW - Auger electron spectroscopy PY - 2000 SN - 0-8194-3550-3 SN - 1605-7422 N1 - Serientitel: SPIE proceedings series – Series title: SPIE proceedings series IS - 3933 SP - 280 EP - 287 PB - SPIE CY - Bellingham, Wash. AN - OPUS4-937 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Krüger, Jörg A1 - Bonse, Jörn A1 - Baudach, Steffen A1 - Kautek, Wolfgang A1 - Lenzner, M. A1 - Wrobel, J. M. T1 - Femtosecond-Pulse Laser Machining of Semiconducting Materials N2 - Summary form only given. Machining investigations of crystalline silicon have been performed with laser pulses at a wavelength of 780 nm in the range between 5 fs and 400 fs. Applying 100 pulses per spot, surface damage thresholds were determined by the measurement of the damage diameter. In this pulse duration regime, the threshold fluences were nearly constant. Single-pulse investigations with 5 fs pulses yielded a value of about 0.15 J cm-2 identical to the multi-pulse experiment. This is in contradiction to the behaviour of dielectrics where incubation effects alter the optical properties down to the 5 fs pulse regime. Employing laser pulses with a duration of 130 fs at a wavelength of 800 nm, single-pulse ablation thresholds of 0.23 J cm-2 and 0.16 J cm-2 were determined for Si and InP in air, respectively. The threshold fluence was calculated from the linear relation between the square of the diameters versus the logarithm of the laser fluences. T2 - CLEO/Europe 2000 ; Conference on Lasers and Electro-Optics Europe ; Conférence Européenne sur les Lasers et l'Electro-Optique ; CLEO/Europe-IQEC CY - Nice, France DA - 2000-09-10 PY - 2000 SN - 0-7803-6319-1 DO - https://doi.org/10.1109/CLEOE.2000.910410 PB - IEEE Service Center CY - Piscataway, NJ AN - OPUS4-958 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Krüger, Jörg A1 - Kautek, Wolfgang ED - Dubowski, J. T1 - Femtosecond-pulse laser processing of metallic and semiconducting thin films KW - Femtosekundenpulslaser KW - Pulslaser KW - Dünnschicht, metallisch KW - Dünnschicht, halbleitend KW - Ablation PY - 1995 SN - 0-8194-1750-5 SN - 1605-7422 N1 - Serientitel: SPIE proceedings series – Series title: SPIE proceedings series IS - 2403 SP - 436 EP - 447 PB - SPIE CY - Bellingham, Wash. AN - OPUS4-637 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Kautek, Wolfgang A1 - Sahre, Mario ED - Dunsch, L. ED - Klatt, B. T1 - Neue Einblicke in elektrochemische Doppelschichtprozesse mit der Quarzmikrowaage: Halogenadsorption an Silberelektroden T2 - Jahrestagung der GDCh-Fachgruppe Angewandte Elektrochemie CY - Dresden, Deutschland DA - 1995-09-28 KW - Adsorption KW - Halogen KW - Elektrode KW - Elekrochemie KW - Doppelprozeß KW - Quarzmikrowaage PY - 1995 SN - 3-924763-48-8 VL - 2 SP - 359 CY - Frankfurt am Main AN - OPUS4-604 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Kühnemund, Lutz A1 - Kautek, Wolfgang A1 - Röllig, Mathias ED - Plieth, W. T1 - Pulse Laser Depassivation at 532 nm of Titanium in NaCl Electrolytes T2 - Jahrestagung. Gesellschaft Deutscher Chemiker, Fachgruppe Angewandte Elektrochemie CY - Freiberg, Germany DA - 1999-09-29 KW - Pulsed-Laser-Depassivated Titanium PY - 2000 SN - 3-924763-85-2 N1 - Serientitel: GDCh-Monographien – Series title: GDCh-Monographien IS - 18 SP - 117 EP - 124 PB - Ges. Deutscher Chemiker CY - Frankfurt am Main AN - OPUS4-842 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -