TY - JOUR A1 - Dietrich, Paul A1 - Hennig, Andreas A1 - Holzweber, Markus A1 - Thiele, T. A1 - Borcherding, H. A1 - Lippitz, Andreas A1 - Schedler, U. A1 - Resch-Genger, Ute A1 - Unger, Wolfgang T1 - Surface analytical study of poly(acrylic acid)-grafted microparticles (beads): characterization, chemical derivatization, and quantification of surface carboxyl groups JF - The journal of physical chemistry / C N2 - We report a surface analytical study of poly(methyl methacrylate) (PMMA) microparticles (beads) with a grafted shell of poly(acrylic acid) (PAA) with thicknesses up to 4 nm using scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), time-of-flight secondary ion mass spectrometry (ToF-SIMS), and near-edge X-ray adsorption fine structure (NEXAFS) spectroscopy. These polymer microparticles were analyzed before and after reaction of the surface carboxyl (CO2H) groups with 2,2,2-trifluoroethylamine (TFEA) to gain a better understanding of methods with use of covalently bound probe molecules for surface group analysis. The results obtained with chemical derivatization XPS using TFEA are discussed in terms of surface quantification of reactive CO2H groups on these PAA-coated microparticles. A labeling yield of about 50% was found for TFEA-derivatized particles with amounts of surface-grafted CO2H groups of 99 µmol/g or more, which is consistent with predicted reaction yields for homogeneously dispersed PAA hydrogels. KW - Polymer microparticles KW - Poly(acrylic acid)-grafted microparticles KW - Beads KW - XPS KW - SEM KW - NEXAFS KW - Surface analysis KW - Fluorine labeling PY - 2014 DO - https://doi.org/10.1021/jp505519g SN - 1932-7447 SN - 1089-5639 VL - 118 IS - 35 SP - 20393 EP - 20404 PB - Soc. CY - Washington, DC AN - OPUS4-31326 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Holzweber, Markus A1 - Heinrich, T. A1 - Kunz, V. A1 - Richter, S. A1 - Traulsen, C.H.-H. A1 - Schalley, C.A. A1 - Unger, Wolfgang T1 - Principal component analysis (PCA)-assisted time-of-flight secondary-ion mass spectrometry (ToF-SIMS): a versatile method for the investigation of self-assembled monolayers and multilayers as precursors for the bottom-up approach of nanoscaled devices JF - Analytical chemistry N2 - The production of high-quality self-assembled monolayers (SAMs) followed by layer-by-layer (LbL) self-assembly of macrocycles is essential for nanotechnology applications based on functional surface films. To help interpret the large amount of data generated by a standard ToF-SIMS measurement, principal component analysis (PCA) was used. For two examples, the advantages of a combination of ToF-SIMS and PCA for quality control and for the optimization of layer-by-layer self-assembly are shown. The first example investigates how different cleaning methods influence the quality of SAM template formation. The second example focuses on the LbL self-assembly of macrocycles and the corresponding stepwise surface modification. KW - ToF-SIMS KW - Principal component analysis KW - Self assembled monolayer KW - Layer by layer PY - 2014 DO - https://doi.org/10.1021/ac500059a SN - 0003-2700 SN - 1520-6882 VL - 86 IS - 12 SP - 5740 EP - 5748 PB - American Chemical Society CY - Washington, DC AN - OPUS4-30963 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Holzweber, Markus A1 - Shard, A.G. A1 - Jungnickel, H. A1 - Luch, A. A1 - Unger, Wolfgang T1 - Dual beam organic depth profiling using large argon cluster ion beams JF - Surface and interface analysis N2 - Argon cluster sputtering of an organic multilayer reference material consisting of two organic components, 4,4'-bis[N-(1-naphthyl-1-)-N-phenyl- amino]-biphenyl (NPB) and aluminium tris-(8-hydroxyquinolate) (Alq3), materials commonly used in organic light-emitting diodes industry, was carried out using time-of-flight SIMS in dual beam mode. The sample used in this study consists of a ~400-nm-thick NPB matrix with 3-nm marker layers of Alq3 at depth of ~50, 100, 200 and 300 nm. Argon cluster sputtering provides a constant sputter yield throughout the depth profiles, and the sputter yield volumes and depth resolution are presented for Ar-cluster sizes of 630, 820, 1000, 1250 and 1660 atoms at a kinetic energy of 2.5 keV. The effect of cluster size in this material and over this range is shown to be negligible. KW - SIMS KW - Organic depth profiling KW - Argon cluster KW - ToF-SIMS KW - Ar-GCIB KW - Secondary Ion Mass Spectrometry PY - 2014 DO - https://doi.org/10.1002/sia.5429 SN - 0142-2421 SN - 1096-9918 VL - 46 SP - 936 EP - 939 PB - Wiley CY - Chichester AN - OPUS4-32573 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -