TY - JOUR A1 - Holzweber, Markus A1 - Shard, A.G. A1 - Jungnickel, H. A1 - Luch, A. A1 - Unger, Wolfgang T1 - Dual beam organic depth profiling using large argon cluster ion beams N2 - Argon cluster sputtering of an organic multilayer reference material consisting of two organic components, 4,4'-bis[N-(1-naphthyl-1-)-N-phenyl- amino]-biphenyl (NPB) and aluminium tris-(8-hydroxyquinolate) (Alq3), materials commonly used in organic light-emitting diodes industry, was carried out using time-of-flight SIMS in dual beam mode. The sample used in this study consists of a ~400-nm-thick NPB matrix with 3-nm marker layers of Alq3 at depth of ~50, 100, 200 and 300 nm. Argon cluster sputtering provides a constant sputter yield throughout the depth profiles, and the sputter yield volumes and depth resolution are presented for Ar-cluster sizes of 630, 820, 1000, 1250 and 1660 atoms at a kinetic energy of 2.5 keV. The effect of cluster size in this material and over this range is shown to be negligible. KW - SIMS KW - Organic depth profiling KW - Argon cluster KW - ToF-SIMS KW - Ar-GCIB KW - Secondary Ion Mass Spectrometry PY - 2014 U6 - https://doi.org/10.1002/sia.5429 SN - 0142-2421 SN - 1096-9918 VL - 46 SP - 936 EP - 939 PB - Wiley CY - Chichester AN - OPUS4-32573 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -