TY - JOUR A1 - Gross, Thomas A1 - Retzko, Iris A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang T1 - Time-of-flight-SIMS and XPS characterization of metal doped polymers N2 - Organic thin films with defined chemical structures and physical properties are required for various applications. Plasma polymerization is of technological interest, since the deposition of plasma polymers is possible on any material of any shape in the desired thickness. We report on the TOF-SIMS (TOF: time-of-flight) and XPS investigations of pulse plasma ‘poly(acetylene)’ and alkali metal doped pulse plasma ‘poly(acetylene)’ films. The combination of TOF-SIMS and XPS supplies detailed information on the surface chemistry of these films. Application of both methods provides the possibility for cross-checking certain results. Moreover the different sensitivities of the methods can be utilized. According to the TOF-SIMS and XPS data it can be concluded that the interaction of alkali metals with plasma ‘poly(acetylene)’ results in electrovalent bonds of the type Me?+–C?- between carbon and metal. Furthermore carbon–oxygen–metal interactions were observed. These interactions are of the type C=O?-cdots, three dots, centeredMe?+ and/or C–O?-–Me?+. KW - SIMS KW - TOF-SIMS KW - XPS KW - Plasma KW - Polymer KW - Poly(acetylene) PY - 2003 U6 - https://doi.org/10.1016/S0169-4332(02)00769-9 SN - 0169-4332 SN - 1873-5584 VL - 203-204 SP - 575 EP - 579 PB - North-Holland CY - Amsterdam AN - OPUS4-2271 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Unger, Wolfgang A1 - Gross, Thomas A1 - Lippitz, Andreas A1 - Güttler, B. T1 - Uncertainty in measurement of overlayer thickness of thermally oxidized silicon using x-ray photoelectron spectroscopy N2 - Overlayers of SiO2 (nominally 4, 6 and 8 nm thick) on silicon, prepared by thermal oxidation, were investigated using x-ray photoelectron spectroscopy (XPS). The thickness of these overlayers was obtained from a measurement of the photoelectron intensities originating from the substrate and the oxide overlayer by applying an appropriate quantitative model. The uncertainty budget of that thickness measurement method is given. The relative combined standard uncertainty of the method was found to be 15%. The effective attenuation lengths or the corresponding electron inelastic mean free paths are of considerable importance for both the estimated values of overlayer thickness and combined standard uncertainties. The XPS results were compared with ellipsometry data. KW - XPS KW - ESCA KW - Uncertainty KW - Overlayer KW - SiO2 PY - 2000 U6 - https://doi.org/10.1002/1096-9918(200012)29:12<891::AID-SIA943>3.0.CO;2-A SN - 0142-2421 SN - 1096-9918 IS - 29 SP - 891 EP - 894 PB - Wiley CY - Chichester AN - OPUS4-1075 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Gross, Thomas A1 - Unger, Wolfgang A1 - Patscheider, J. T1 - Quantitative surface chemical analysis of stainless steel 1.4301 using Surface Science Instruments XPS spectrometers: report on an interlaboratory comparison N2 - Results of an interlaboratory comparison of XPS data obtained with stainless steel are presented. Only one photoelectron spectrometer model was used. The stainless-steel sample surfaces were analysed in different states by XPS: as received, after sputtering to I(C 1s)/I(Fe 2p3/2) 0.025 and after removing a chromium-enriched oxide layer following a certain protocol. The Fe, Cr and Ni elemental concentrations were evaluated from the respective XPS data submitted by the participants of the interlaboratory test experiment. Total means, repeat standard deviations (sr) and reproducibility standard deviations (sR) are presented. The best reproducibility standard deviations were obtained for the XPS analysis after removal of a chromium-enriched oxide layer and quantification of the XPS intensities without taking the contamination elements of carbon and oxygen into account. The absolute reproducibility standard deviation of the elemental concentrations in that case is as small as 1.1-1.5 at.%. This gives 2%, 6% and 16% for the relative reproducibility standard deviation of the concentrations of iron, chromium and nickel, respectively. The total means of the iron, chromium and nickel concentrations finally obtained agree within 2sR with bulk values determined by wavelength-dispersive x-ray fluorescence spectroscopy. Comparison to an earlier interlaboratory test experiment shows that using only one model of photoelectron spectrometer reduces the reproducibility standard deviations efficiently. Copyright © 2002 John Wiley & Sons, Ltd. KW - XPS KW - ESCA KW - Quantitative surface chemical analysis KW - Stainless steel KW - Interlaboratory comparison PY - 2002 U6 - https://doi.org/10.1002/sia.1229 SN - 0142-2421 SN - 1096-9918 VL - 33 IS - 5 SP - 426 EP - 432 PB - Wiley CY - Chichester AN - OPUS4-1409 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Seah, M.P. A1 - Spencer, S.J. A1 - Bensebaa, F. A1 - Vickridge, I. A1 - Danzebrink, H. A1 - Krumrey, M. A1 - Gross, Thomas A1 - Österle, Werner A1 - Wendler, E. A1 - Rheinländer, B. A1 - Azuma, Y. A1 - Kojima, I. A1 - Suzuki, N. A1 - Suzuki, M. A1 - Tanuma, S. A1 - Moon, D.W. A1 - Lee, H.J. A1 - Cho, H.M. A1 - Chen, H.Y. A1 - Wee, A. T. S. A1 - Osipowicz, T. A1 - Pan, J.S. A1 - Jordaan, W.A. A1 - Hauert, R. A1 - Klotz, U. A1 - van der Marel, C. A1 - Verheijen, M. A1 - Tamminga, Y. A1 - Jeynes, C. A1 - Bailey, P. A1 - Biswas, S. A1 - Falke, U. A1 - Nguyen, N.V. A1 - Chandler-Horowitz, D. A1 - Ehrstein, J.R. A1 - Muller, D. A1 - Dura, J.A. T1 - Critical review of the current status of thickness measurements for ultrathin SiO2 on Si - Part V: Results of a CCQM pilot study N2 - Results are reported from a pilot study under the Consultative Committee for Amount of Substance (CCQM) to compare measurements of and resolve any relevant measurement issues in, the amount of thermal SiO2 oxide on (100) and (111) orientation Si wafer substrates in the thickness range 1.5 - 8 nm. As a result of the invitation to participate in this activity, 45 sets of measurements have been made in different laboratories using 10 analytical methods: medium-energy ion scattering spectrometry (MEIS), nuclear reaction analysis (NRA), RBS, elastic backscattering spectrometry (EBS), XPS, SIMS, ellipsometry, grazing-incidence x-ray reflectrometry (GIXRR), neutron reflectometry and transmission electron microscopy (TEM). The measurements are made on separate sets of 10 carefully prepared samples, all of which have been characterised by a combination of ellipsometry and XPS using carefully established reference conditions and reference parameters. The results have been assessed against the National Physical Laboratory (NPL) data and all show excellent linearity. The remaining data sets correlate with the NPL data with average root-mean-square scatters of 0.15 nm, half being better than 0.1 nm and a few at or better than 0.05 nm. Each set of data allows a relative scaling constant and a zero thickness offset to be determined. Each method has an inherent zero thickness offset between 0 nm and 1 nm and it is these offsets, measured here for the first time, that have caused many problems in the past. There are three basic classes of offset: water and carbonadeous contamination equivalent to ~1 nm as seen by ellipsometry; adsorbed oxygen mainly from water at an equivalent thickness of 0.5 nm as seen by MEIS, NRA, RBS and possibly GIXRR; and no offset as seen by XPS using the Si 2p peaks. Each technique has a different uncertainty for the scaling constant and consistent results have been achieved. X-Ray photoelectron spectroscopy has large uncertainties for the scaling constant but a high precision and, critically, if used correctly, has zero offset. Thus, a combination of XPS and the other methods allows the XPS scaling constant to be determined with low uncertainty, traceable via the other methods. XPS laboratories returning results early were invited to test a new reference procedure. All showed very significant improvements. The reference attenuation lengths thus need scaling by 0.986 ± 0.009 (at an expansion factor of 2) deduced from the data for the other methods. Several other methods have small offsets and, to the extent that these can be shown to be constant or measurable, then these methods will also show low uncertainty. Recommendations are provided for parameters for XPS, MEIS, RBS and NRA to improve their accuracy. KW - Calibration KW - Ellipsometry KW - GIXRR KW - Interlaboratory study KW - MEIS KW - Neutron reflectometry KW - NRA KW - RBS KW - Silicon dioxide KW - SIMS KW - XPS PY - 2004 U6 - https://doi.org/10.1002/sia.1909 SN - 0142-2421 SN - 1096-9918 VL - 36 IS - 9 SP - 1269 EP - 1303 PB - Wiley CY - Chichester AN - OPUS4-5549 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Unger, Wolfgang A1 - Gross, Thomas A1 - Böse, Olaf A1 - Lippitz, Andreas A1 - Fritz, Thomas A1 - Gelius, U. T1 - VAMAS TWA2 Project A2: evaluation of static charge stabilization and determination methods in XPS on non-conducting samples. Report on an inter-laboratory comparison N2 - First results of an inter-laboratory comparison (27 participants in Europe, Japan and USA) of XPS data obtained with non-conducting samples are presented. Binding energies of Al 2s for alumina, N 1s and imide C 1s for Kapton and Sr 3p3/2 for a strontium titanate film on glass were obtained after static charge referencing with the help of 15 nm gold particles deposited at the surface of the test samples. For the alumina sample C 1s static charge referenced data are also presented. Repeat standard deviations (sr), between standard deviations (sb), reproducibility standard deviations (sR) and total means are evaluated from the experimental data. It can be stated that although the repeat standard deviation is as small as 0.05 eV in the best case, the standard deviation characterizing the reproducibility of the method is obviously not better than 0.15 eV in the best case at the present time. The knowledge of these standard deviations is important for metrology, validations of analytical procedures relying on qualitative photoelectron spectroscopy and XPS databanking. KW - XPS KW - ESCA KW - Binding energy KW - Inter-laboratory comparison PY - 2000 U6 - https://doi.org/10.1002/1096-9918(200008)29:8<535::AID-SIA900>3.0.CO;2-5 SN - 0142-2421 SN - 1096-9918 VL - 29 SP - 535 EP - 543 PB - Wiley CY - Chichester AN - OPUS4-6939 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Funk, C. A1 - Dietrich, Paul A1 - Gross, Thomas A1 - Min, Hyegeun A1 - Unger, Wolfgang A1 - Weigel, W. T1 - Epoxy-functionalized surfaces for microarray applications: surface chemical analysis and fluorescence labeling of surface species N2 - Methods for characterization of epoxy-functionalized substrates used for microarray applications, prepared by silanization with 3-glycidoxypropyltrimethoxysilane, have been developed. Contact angle measurements, X-ray photoelectron spectroscopy, time of flight secondary ion mass spectrometry and fluorescence based methods have been applied to investigate these epoxy-functionalized microarray substrates. The surface density of epoxy-functionalized glass slides was investigated by fluorescence labeling of surface species utilizing Rhodamine 110 as fluorescence probe. KW - Epoxy silane KW - Microarrays KW - Fluorescence KW - XPS KW - ToF-SIMS KW - Surface analysis PY - 2012 U6 - https://doi.org/10.1002/sia.3856 SN - 0142-2421 SN - 1096-9918 VL - 44 IS - 8 SP - 890 EP - 894 PB - Wiley CY - Chichester AN - OPUS4-26342 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Girard-Lauriault, P.-L. A1 - Dietrich, Paul A1 - Gross, Thomas A1 - Wirth, Thomas A1 - Unger, Wolfgang T1 - Chemical characterization of the long-term ageing of nitrogen-rich plasma polymer films under various ambient conditions N2 - Nitrogen rich plasma polymer films (L-PPE:N) were prepared by low-pressure RF plasma using a 1:1 mixture of ethylene and ammonia and aged for 345 d in four different ambient conditions: (i) at room temperature (RT) in air; (ii) at RT in nitrogen; (iii) at -20?°C in air and; (iv) at –20 °C in nitrogen. The films were analyzed by X-ray photoelectron spectroscopy (XPS) and by time-of-flight secondary ion mass spectrometry (ToF-SIMS) at various intervals over the duration of the experiment. The ageing of primary amines, NH2, was followed by chemical derivatization with 4-trifluoromethyl benzaldehyde. Storage at –20 °C, mostly independently of ambient atmosphere, slowed down ageing to almost undetectable levels as evaluated by the analytical methods used for this study. KW - Ageing KW - Plasma polymers KW - Primary amines KW - ToF-SIMS KW - XPS PY - 2013 U6 - https://doi.org/10.1002/ppap.201200118 SN - 1612-8850 SN - 1612-8869 VL - 10 IS - 4 SP - 388 EP - 395 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-28006 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Dietrich, Paul A1 - Horlacher, T. A1 - Girard-Lauriault, Pierre-Luc A1 - Gross, Thomas A1 - Lippitz, Andreas A1 - Min, Hyegeun A1 - Wirth, Thomas A1 - Castelli, R. A1 - Seeberger, P. A1 - Unger, Wolfgang T1 - Multimethod chemical characterization of carbohydrate-functionalized surfaces N2 - A combined XPS, NEXAFS, and ToF-SIMS chemical surface characterization of carbohydrate-functionalized gold and glass surfaces is presented. Spot shape and chemical composition across a spot surface are provided by surface-sensitive methods as ToF-SIMS and XPS, used in their imaging modes. Moreover, the feasibility of this multimethod approach to control relevant production steps of a carbohydrate microarray prototype is demonstrated. KW - Carbohydrates KW - Microarrays KW - Self-assembled monolayers KW - XPS KW - NEXAFS KW - ToF-SIMS PY - 2011 U6 - https://doi.org/10.1080/07328303.2011.615181 SN - 0732-8303 VL - 30 IS - 4-6 SP - 361 EP - 372 PB - Taylor & Francis CY - London [u.a.] AN - OPUS4-24874 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Girard-Lauriault, Pierre-Luc A1 - Dietrich, Paul A1 - Gross, Thomas A1 - Unger, Wolfgang T1 - Is quantitative chemical derivatization XPS of plasma deposited organic coatings a valid analytical procedure? N2 - Functionalized organic layers prepared by plasma processes have complex surface chemistries. The problem of elucidating such chemistries is an extensively studied subject. One of the preponderant methods used to acquire information on specific functional groups is chemical derivatization XPS. In this communication, we focus on rather popular chemical derivatization XPS approaches, for instance, the quantification of amines with 4-trifluoromethyl benzaldehyde and of hydroxyl groups with trifluoroacetic anhydride. Although these procedures have been used for a long period by various laboratories, the use of varying protocols is obvious. Comparison of results is therefore difficult. We discuss steps toward a valid experimental procedure, in particular, the calculation of concentrations, the preparation of test samples, the pitfalls, and the shortcomings. KW - Organic coatings KW - Amine KW - Alcohol KW - Chemical derivatization KW - XPS PY - 2012 U6 - https://doi.org/10.1002/sia.4947 SN - 0142-2421 SN - 1096-9918 VL - 44 IS - 8 SP - 1135 EP - 1140 PB - Wiley CY - Chichester AN - OPUS4-26234 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Weigel, W. A1 - Unger, Wolfgang A1 - Graf, Nora A1 - Gross, Thomas A1 - Wirth, Thomas T1 - Surface Chemical Analysis of DNA Microarrays - Application of XPS and ToF-SIMS for Surface Chemical Imaging on the µm Scale KW - Microarrays KW - Oberflächenanalytik KW - XPS KW - ToF-SIMS KW - Chemical imaging PY - 2008 SN - 1611-597X VL - 12 IS - 10 SP - 14 EP - 16 PB - GIT-Verlag CY - Darmstadt AN - OPUS4-18307 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Baytekin, H.T. A1 - Wirth, Thomas A1 - Gross, Thomas A1 - Treu, Dieter A1 - Sahre, Mario A1 - Theisen, J. A1 - Schmidt, M. A1 - Unger, Wolfgang T1 - Determination of wettability of surface-modified hot-embossed polycarbonate wafers used in microfluidic device fabrication via XPS and ToF-SIMS N2 - The wettability of the surfaces inside the microchannels of a microfluidic device is an important property considering a liquid flows through them. Contact angle measurements usually applied to test the wettability of surfaces cannot be used for an analysis of microchannel walls within microfluidic devices. A workaround is the use of surface analytical methods, which are able to reach points of interest in microchannels and may provide information on the surface chemistry established there. In calibrating these methods by using flat polymer wafers, where the contact angle can be measured as usual, data measured in real microchannels can be evaluated in terms of wetting properties. Reference wafers of bisphenol-A polycarbonate, a polymeric material that is often used in fluidic microdevice fabrication, were treated under different oxygen plasma conditions. The modified surfaces were characterized by using XPS, time of flight (ToF)-SIMS and atomic force microscope (AFM). Surface chemistry and surface topography have been correlated with contact angle measurements. In addition, effects of ageing or rinsing after plasma treatment have also been investigated. KW - Oxygen plasma KW - Polycarbonate KW - XPS KW - ToF-SIMS KW - Principal component analysis PY - 2008 U6 - https://doi.org/10.1002/sia.2724 SN - 0142-2421 SN - 1096-9918 VL - 40 IS - 3-4 SP - 358 EP - 363 PB - Wiley CY - Chichester AN - OPUS4-17340 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - RPRT A1 - Seah, M.P. A1 - Spencer, S.J. A1 - Bensebaa, F. A1 - Vickridge, I. A1 - Danzebrink, H. A1 - Krumrey, M. A1 - Gross, Thomas A1 - Österle, Werner A1 - Wendler, E. A1 - Rheinländer, B. A1 - Azuma, Y. A1 - Kojima, I. A1 - Suzuki, N. A1 - Suzuki, M. A1 - Tanuma, S. A1 - Moon, D.W. A1 - Lee, H.J. A1 - Cho, H.M. A1 - Chen, H.Y. A1 - Wee, A. T. S. A1 - Osipowicz, T. A1 - Pan, J.S. A1 - Jordaan, W.A. A1 - Hauert, R. A1 - Klotz, U. A1 - van der Marel, C. A1 - Verheijen, M. A1 - Tamminga, Y. A1 - Jeynes, C. A1 - Bailey, P. A1 - Biswas, S. A1 - Falke, U. A1 - Nguyen, N.V. A1 - Chandler-Horowitz, D. A1 - Ehrstein, J.R. A1 - Muller, D. A1 - Dura, J.A. T1 - Ultra-thin SiO2 on Si, Part V: Results of a CCQM Pilot Study of Thickness Measurements KW - SiO2 KW - Thin films KW - Thickness KW - XPS KW - Ellipsometry KW - TEM PY - 2003 SN - 1473-2734 SP - 57 pages AN - OPUS4-4118 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Graf, Nora A1 - Gross, Thomas A1 - Wirth, Thomas A1 - Weigel, W. A1 - Unger, Wolfgang T1 - Application of XPS and ToF-SIMS for surface chemical analysis of DNA microarrays and their substrates N2 - The chemical composition of the functional surfaces of substrates used for microarrays is one of the important parameters that determine the quality of a microarray experiment. In addition to the commonly used contact angle measurements to determine the wettability of functionalized supports, X-ray photoelectron spectroscopy (XPS) and time-of-flight secondary ion mass spectrometry (ToF-SIMS) are more specific methods to elucidate details about the chemical surface constitution. XPS yields information about the atomic composition of the surface, whereas from ToF-SIMS, information on the molecular species on the surface can be concluded. Applied on printed DNA microarrays, both techniques provide impressive chemical images down to the micrometer scale and can be utilized for label-free spot detection and characterization. Detailed information about the chemical constitution of single spots of microarrays can be obtained by high-resolution XPS imaging. KW - Microarrays KW - Surface analysis KW - XPS KW - ToF-SIMS KW - Chemical imaging PY - 2009 U6 - https://doi.org/10.1007/s00216-009-2599-x SN - 1618-2642 SN - 1618-2650 VL - 393 IS - 8 SP - 1907 EP - 1912 PB - Springer CY - Berlin AN - OPUS4-19245 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Dietrich, Paul A1 - Horlacher, T. A1 - Girard-Lauriault, Pierre-Luc A1 - Gross, Thomas A1 - Lippitz, Andreas A1 - Min, Hyegeun A1 - Wirth, Thomas A1 - Castelli, R. A1 - Seeberger, P.H. A1 - Unger, Wolfgang T1 - Adlayers of dimannoside thiols on gold: surface chemical analysis N2 - Carbohydrate films on gold based on dimannoside thiols (DMT) were prepared, and a complementary surface chemical analysis was performed in detail by X-ray photoelectron spectroscopy (XPS), time-of-flight secondary ion mass spectrometry (ToF-SIMS), near-edge X-ray absorption fine structure (NEXAFS), FT-IR, and contact angle measurements in order to verify formation of ω-carbohydrate-functionalized alkylthiol films. XPS (C 1s, O 1s, and S 2p) reveals information on carbohydrate specific alkoxy (C–O) and acetal moieties (O–C–O) as well as thiolate species attached to gold. Angle-resolved synchrotron XPS was used for chemical speciation at ultimate surface sensitivity. Angle-resolved XPS analysis suggests the presence of an excess top layer composed of unbound sulfur components combined with alkyl moieties. Further support for DMT attachment on Au is given by ToF-SIMS and FT-IR analysis. Carbon and oxygen K-edge NEXAFS spectra were interpreted by applying the building block model supported by comparison to data of 1-undecanethiol, poly(vinyl alcohol), and polyoxymethylene. No linear dichroism effect was observed in the angle-resolved C K-edge NEXAFS. KW - Carbohydrates KW - Self-assembled monolayer KW - XPS KW - NEXAFS KW - ToF-SIMS KW - Surface chemical analysis PY - 2011 U6 - https://doi.org/10.1021/la104038q SN - 0743-7463 SN - 1520-5827 VL - 27 IS - 8 SP - 4808 EP - 4815 PB - American Chemical Society CY - Washington, DC AN - OPUS4-23554 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Dietrich, Paul A1 - Graf, Nora A1 - Gross, Thomas A1 - Lippitz, Andreas A1 - Schüpbach, B. A1 - Bashir, A. A1 - Wöll, Ch. A1 - Terfort, A. A1 - Unger, Wolfgang T1 - Self-assembled monolayers of aromatic omega-aminothiols on gold: surface chemistry and reactivity N2 - Amino-terminated self-assembled monolayers on gold substrates were studied by X-ray photoelectron spectroscopy (XPS), near-edge X-ray absorption fine structure (NEXAFS) measurements, and atomic force microscopy (AFM). Two different ω-amino-4,4'-terphenyl substituted alkanethiols of the general structure H2N-(C6H4)3-(CH2)n-SH (ATPn) were used: 2-(4''-amino-1,1':4',1''-terphenyl-4-yl)ethane-1-thiol (n = 2, ATP2) and 3-(4''-amino-1,1':4',1''-terphenyl-4-yl)propane-1-thiol (n = 3, ATP3). Moreover, the addressability of amino groups within the films was investigated by chemical derivatization of ATPn SAMs with 3,5-bis(trifluoromethyl)phenyl isothiocyanate (ITC) forming fluorinated thiourea ATPn-F films. Evaluation of high-resolution C 1s and N 1s XPS data revealed successful derivatization of at least 50% of surface amino species. Furthermore, it could be demonstrated by angle-resolved NEXAFS spectroscopy that chemical derivatization with ITC has no noticeable influence on the preferential upright orientation of the molecules in the SAMs. KW - Gold KW - Self-assembled monolayer KW - Thiols KW - Amino surfaces KW - XPS KW - NEXAFS PY - 2010 U6 - https://doi.org/10.1021/la903293b SN - 0743-7463 SN - 1520-5827 VL - 26 IS - 6 SP - 3949 EP - 3954 PB - American Chemical Society CY - Washington, DC AN - OPUS4-20990 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Kim, K.J. A1 - Kim, J.W. A1 - Moon, D.W. A1 - Wirth, Thomas A1 - Hodoroaba, Vasile-Dan A1 - Gross, Thomas A1 - Unger, Wolfgang A1 - Jordaan, W. A1 - Staden, M.v. A1 - Prins, S. A1 - Wang, H. A1 - Song, X. A1 - Zhang, L. A1 - Fujimoto, T. A1 - Kojima, I. T1 - Final report on key comparison K67 and parallel pilot study P108: measurement of composition of a thin Fe-Ni alloy film N2 - The Key Comparison K67 and the parallel Pilot Study P108 on quantitative analysis of thin alloy films have been completed in the Surface Analysis Working Group (SAWG) of the Consultative Committee for Amount of Substance (CCQM). The aim of these inter-laboratory comparisons is to determine the degree of equivalence in the measurement capability of national metrology institutes (NMIs) and designated institutes (DIs) for the determination of the composition of thin alloy films. The measurand is expressed in atomic percent. A Fe-Ni alloy film with a certified composition was available for the participants of the inter-laboratory comparison. It has been used as a reference specimen to determine the relative sensitivity factors (RSF) of Fe and Ni for the different analytical methods used by the participants to determine the composition of the test sample. As was shown in the preceding Pilot Study P98, the degrees of equivalence in the measurement capabilities of the participants can be improved in that way. The composition of the reference specimen was certified by inductively coupled plasma mass spectrometry (ICP-MS) using the isotope dilution method. The in-depth and lateral homogeneity, determined in terms of elemental composition, of the certified reference sample and the unknown test sample were confirmed by secondary ion mass spectrometry (SIMS) using C60 primary ions by the leading laboratory. Five laboratories participated in the key comparison. Four of them used x-ray photoelectron spectroscopy (XPS) and one Auger electron spectroscopy (AES). One laboratory participated in the parallel P108 pilot study using electron probe micro analysis with an energy-dispersive spectrometer (ED EPMA) and XPS. KW - XPS KW - AES KW - EDX KW - Fe-Ni alloy film KW - Key comparison KW - CCQM PY - 2010 U6 - https://doi.org/10.1088/0026-1394/47/1A/08011 SN - 0026-1394 SN - 1681-7575 VL - 47 IS - 1A SP - 08011-1 - 08011-15 PB - Inst. of Physics Publ. CY - Bristol AN - OPUS4-21045 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Min, Hyegeun A1 - Girard-Lauriault, Pierre-Luc A1 - Gross, Thomas A1 - Lippitz, Andreas A1 - Dietrich, Paul A1 - Unger, Wolfgang T1 - Ambient-ageing processes in amine self-assembled monolayers on microarray slides as studied by ToF-SIMS with principal component analysis, XPS, and NEXAFS spectroscopy N2 - We investigated the ageing of amine-terminated self-assembled monolayers (amine-SAMs) on different silica substrates due to exposure to different ambient gases, pressures, and/or temperatures using time-of-flight secondary ion mass spectrometry (ToF-SIMS) with principal component analysis and complementary methods of surface analysis as X-ray photoelectron spectroscopy (XPS) and near edge X-ray absorption fine structure (NEXAFS). The goal of this study is to examine the durability of primary amine groups of amine-SAMs stored in a user laboratory prior to being used as supports for biomolecule immobilization and other applications. We prepared amine-SAMs on the native oxides of silicon wafers and glass slides using 3- aminopropyl triethoxysilane, by using optimized conditions such as anhydrous organic solvent and reaction time scale of hours to avoid multilayer growth. Selected commercial amine-SAM slides have been investigated, too. When the amine-SAMs are exposed to air, oxygen incorporation occurs, followed by formation of amide groups. The formation of oxygen species due to ageing was proved by ToFSIMS, XPS, and NEXAFS findings such as CNO- secondary ion emission at m/z 42, observation of the N 1s HNC=O component peak at 400.2–400.3 eV in XPS, and, last but not least, by formation of a π*(HNC=O) resonance at 401 eV in the N K-edge X-ray absorption spectrum. It is concluded that the used multi-method approach comprising complementary ToF-SIMS, XPS, and NEXAFS analyses is well suited for a thorough study of chemical aspects of ageing phenomena of amine-SAM surfaces. KW - Amine-SAM KW - Ageing process KW - ToF-SIMS KW - NEXAFS KW - XPS PY - 2012 U6 - https://doi.org/10.1007/s00216-012-5862-5 SN - 1618-2642 SN - 1618-2650 VL - 403 IS - 2 SP - 613 EP - 623 PB - Springer CY - Berlin AN - OPUS4-25829 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CHAP A1 - Unger, Wolfgang A1 - Gross, Thomas ED - John C. Rivière, ED - Sverre Myhra, T1 - Catalyst characterization KW - Catalyst KW - Surface KW - Analysis KW - XPS KW - ESCA KW - SIMS PY - 2009 SN - 978-0-8493-7558-3 VL - 2nd Edition IS - Chapter 16 SP - 501 EP - 528 PB - CRC Press CY - Boca Raton, FL, USA AN - OPUS4-19602 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Dietrich, Paul A1 - Graf, Nora A1 - Gross, Thomas A1 - Lippitz, Andreas A1 - Krakert, S. A1 - Schüpbach, B. A1 - Terfort, A. A1 - Unger, Wolfgang T1 - Amine species on self-assembled monolayers of omega-aminothiolates on gold as identified by XPS and NEXAFS spectroscopy N2 - Functionalised surfaces are of interest in many fields, e.g. in biomedicine, materials science and molecular electronics. In this study a series of self-assembled aliphatic and aromatic monolayers on gold substrates with terminal amino groups was investigated. Four different thiol molecules were used: aliphatic 11-aminoundecane-1-thiol (AUDT), aromatic 4-aminobenzenethiol (ABT) and aromatic ω-amino thiols with an alkyl spacer as 4-aminophenylbutane-1-thiol (APBT) and 3-(4''-amino-1,1':4',1''-terphenyl-4-yl)propane-1-thiol (ATPT). Evaluation of N 1s XPS data revealed that on the aromatic self-assembled monolayers (SAMs) amino groups exist preferentially as primary amines, whereas on the aliphatic SAM protonated and/or hydrogen-bonded amines are the major species. This result is crosschecked by N K edge near edge X-ray absorption fine structure (NEXAFS) spectroscopy and can be rationalised by the different basicity of aliphatic and aromatic amines. KW - Self-assembled monolayer KW - Amines KW - XPS KW - NEXAFS KW - Surface analysis PY - 2010 U6 - https://doi.org/10.1002/sia.3224 SN - 0142-2421 SN - 1096-9918 VL - 42 SP - 1184 EP - 1187 PB - Wiley CY - Chichester AN - OPUS4-21498 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Dietrich, Paul A1 - Horlacher, T. A1 - Gross, Thomas A1 - Wirth, Thomas A1 - Castelli, R. A1 - Shard, A.G. A1 - Alexander, M. A1 - Seeberger, P.H. A1 - Unger, Wolfgang T1 - Surface analytical characterization of carbohydrate microarrays N2 - Microarrays are a versatile platform for diagnostics and high-throughput analysis. Carbohydrate microarrays are valuable tools to investigate interactions with other molecules since many glycans are involved in fundamental biological processes. A combined X-ray photoelectron spectroscopy (XPS) and time-of-flight secondary ion mass spectrometry (ToF-SIMS) surface analysis was used to investigate the basic steps in the production of carbohydrate microarrays. The preparation included coupling of a thiol-terminated mannoside to maleimide-functionalized glass surfaces derived from γ-aminopropyl silane (GAPS) slides. XPS results clearly demonstrate successful chemical modification in each fabrication step, and ToF-SIMS imaging revealed immobilized carbohydrates in the spotted regions of the final microarray. KW - Carbohydrates KW - Microarrays KW - XPS KW - ToF-SIMS KW - Nona-mannoside KW - Maleimide surfaces KW - Surface analysis PY - 2010 U6 - https://doi.org/10.1002/sia.3255 SN - 0142-2421 SN - 1096-9918 VL - 42 SP - 1188 EP - 1192 PB - Wiley CY - Chichester AN - OPUS4-21500 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Gross, Thomas A1 - Treu, Dieter A1 - Ünveren, E. A1 - Kemnitz, G. A1 - Unger, Wolfgang T1 - Characterization of Cr(III) compounds of O, OH, F and Cl by XPS N2 - Cr2O3, CrCl3, α-CrF3, CrF3·3H20 and Cr(OH)3 were investigated by x-ray photoelectron (XPS) and x-ray excited Auger electron spectroscopy (XAES) using a latest generation XPS spectrometer. Non-conductive powders are analyzed with ultimate energy resolution. Multiplet splitting features and/or satellite emission were observed in the Cr 2p and Cr 3s spectra. Cr(III) compounds are of interest in many applications as for example in corrosion and catalysis. Chromia and chromium-III-fluoride activated by reaction with fluoroalkanes are very promising industrial catalysts. It is the aim of this selection of spectral reference data to enable deeper insight in the formation of catalytically active fluorinated chromia phases by using XPS analysis. KW - Chromium(III) compound KW - Cr2O3 KW - CrCl3 KW - Cr(OH)3 KW - CrF3 KW - CrF3.3H2O KW - XPS KW - XAES KW - Multiplet splitting KW - Satellite KW - Powder chromium(III) compounds PY - 2008 U6 - https://doi.org/10.1116/11.20080801 SN - 1055-5269 SN - 1520-8575 VL - 15 SP - 77 EP - 123 PB - AIP CY - Woodbury, NY AN - OPUS4-23387 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Baytekin, H. Tarik A1 - Wirth, Thomas A1 - Gross, Thomas A1 - Sahre, Mario A1 - Unger, Wolfgang A1 - Theisen, J. A1 - Schmidt, M. T1 - Surface analytical characterization of micro-fluidic devices hot embossed in polymer wafers: Surface chemistry and wettability N2 - Recently, time-of-flight secondary ion mass spectrometry (ToF-SIMS) and X-ray photoelectron spectroscopy (XPS) instrumentation has been used to address areas of interest within micro-fluidic devices providing full access to the surface chemistry established at the bottom of micro-channels therein. After careful calibration, information on surface chemistry as obtained by ToF-SIMS or XPS can be interpreted in terms of wettability expressed as contact angles which are then characteristic for the inner walls of micro-channels. Standard contact angle measurement is not applicable in micro-channels. The approach has been demonstrated to be successful with two different micro-fluidic devices hot embossed into high-end quality poly(methyl methacrylate) (PMMA) or Polycarbonate wafers. A pre-selected surface chemistry at micro-channel walls can be established by plasma technologies but ageing and rinsing effects have to be under control. A combination of ToF-SIMS, XPS and contact angle measurement techniques has been demonstrated to provide the required information. Finally, it is shown by ToF-SIMS and XPS analysis that in the production of micro-fluidic parts during practical processing using hot embossing technologies, material originating from cover foils will reside on the polymer wafer's surface. Moreover, residues of releasing agents as silicone oil used during processing can be detected by ToF-SIMS. Both cover foil residues and silicones are issues of trouble shooting in micro-fluidics because they will change contact angles efficiently. KW - Micro-fluidic device KW - PMMA KW - Polycarbonate KW - Plasma treatment KW - Wettability KW - ToF-SIMS KW - XPS PY - 2010 U6 - https://doi.org/10.1002/sia.3149 SN - 0142-2421 SN - 1096-9918 VL - 42 IS - 8 SP - 1417 EP - 1431 PB - Wiley CY - Chichester AN - OPUS4-21712 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Dietrich, Paul A1 - Treu, Dieter A1 - Kalbe, Henryk A1 - Krumrey, M. A1 - Gross, Thomas A1 - Marti, K. A1 - Unger, Wolfgang T1 - Experimental determination of the effective attenuation length of palladium 3d 5/2 photoelectrons in a magnetron sputtered Pd nanolayer N2 - An electron effective attenuation length (EAL) of 1.68nm for Al Kα excited Pd 3d 5/2 photoelectrons with a kinetic energy of 1.152 keV has been determined experimentally using a sputtered Pd film deposited on an ultra flat fused quartz substrate. The film thickness was reduced by Ar ion sputtering several times in order to obtain different Pd film thicknesses which are used to determine experimental EAL values. These results are compared to data generated by using a Simulation of Electron Spectra for Surface Analysis (SESSA) simulation using an inelastic mean free path (IMFP) calculated with the Tanuma–Powell–Penn (TPP)-2M formula and with ‘elastic scattering on and off’. Contributions to the uncertainty budget related to the experimental approach are discussed in detail. Proposals on how to further improve the approach are suggested. KW - Pd 3d KW - Electron effective attenuation length KW - XPS PY - 2017 UR - http://onlinelibrary.wiley.com/doi/10.1002/sia.6141/abstract?campaign=woletoc U6 - https://doi.org/10.1002/sia.6141 SN - 0142-2421 SN - 1096-9918 VL - 49 IS - 5 SP - 464 EP - 468 PB - John Wiley & Sons, Ltd AN - OPUS4-39682 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -