TY - JOUR A1 - Cappella, Brunero A1 - Geuss, Markus A1 - Sturm, Heinz A1 - Heyde, M. A1 - Rademann, K. A1 - Spangenberg, T. A1 - Niehus, H. T1 - Dynamic plowing nanolithography on polymethylmethacrylate using an atomic force microscope N2 - We present dynamic plowing nanolithography on polymethylmethacrylate films, performed with a scan-linearized atomic force microscope able to scan up to 250 μm with high resolution. Modifications of the surface are obtained by plastically indenting the film surface with a vibrating tip. By changing the oscillation amplitude of the cantilever, i.e., the indentation depth, surfaces can be either imaged or modified. A program devoted to the control of the scanning process is also presented. The software basically converts the gray scale of pixel images into voltages used to control the dither piezo driving cantilever oscillations. The advantages of our experimental setup and the dependence of lithography efficiency on scanning parameters are discussed. Some insights into the process of surface modifications are presented. KW - Nanolithography PY - 2001 UR - http://rsi.aip.org/ U6 - https://doi.org/10.1063/1.1326053 SN - 0034-6748 SN - 1089-7623 VL - 72 SP - 136 EP - 141 PB - American Institute of Physics CY - Melville, NY AN - OPUS4-874 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Sturm, Heinz A1 - Cappella, Brunero A1 - Heyde, M. A1 - Ritter, C. A1 - Rademann, K. T1 - Dislocation of antimony clusters on graphite by means of dynamic plowing nanolithography N2 - Antimony clusters of different shapes and dimensions have been obtained by evaporating antimony on graphite. The dependence of the shape and dimensions of the particles on the evaporation parameters (effective layer thickness, temperature, pressure) is discussed. A characterisation of the different structures is presented. In particular, the decoration of graphite steps is discussed. Clusters have been dislocated by means of dynamic plowing nanolithography, both in vector and in image pattern mode. The dependence of the energy needed to dislocate a cluster on its dimensions and position is discussed. KW - Antimony clusters KW - Nanolithography PY - 2001 U6 - https://doi.org/10.1016/S0039-6028(00)01113-4 SN - 0039-6028 VL - 476 IS - 1-2 SP - 54 EP - 62 PB - Elsevier CY - Amsterdam AN - OPUS4-875 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Munz, Martin A1 - Cappella, Brunero A1 - Sturm, Heinz A1 - Geuss, Markus A1 - Schulz, Eckhard T1 - Materials contrasts and nanolithography techniques in scanning force microscopy (SFM) and their application to polymers and polymer composites N2 - Beyond measuring the topography of surfaces, scanning force microscopy (SFM) has proved to be valuable both for mapping of various materials properties and for modifying surfaces via lithography techniques. Thus, SFM has gained relevance as a surface analysis technique as well as a tool for nanoscale engineering purposes. Different kinds of tip-sample interactions are exploitable, e.g. mechanical, thermal and electrical ones. Owing to its versatility, SFM has found plenty of applications in polymer science. Among others, the examples reported on in this review article encompass issues related to commodity polymers, various polymer-based composites, polymer blends, or ferroelectric polymers. For instance, stiffness imaging is elucidated as a technique for detecting interphases occurring in composites with inorganic fillers. The described applications are mainly related to mechanical and electrical tip-sample interactions. The respective fundamentals are outlined as well as some aspects of the measurement of materials contrasts. The presented techniques of nano-scale modification are a dynamical sort of plowing lithography and electrical poling, both performed by means of SFM-probes. KW - Local electrical-properties KW - Probing micromechanical properties KW - Spreading resistance microscopy KW - Modulated friction techniques KW - Nanometer-scale modification KW - Ferroelectric domain-walls KW - Interfacial shear-strength KW - Self-assembled monolayers KW - Maxwell-stress microscopy KW - Solid-liquid interfaces KW - Contact mechanics KW - Electrical properties KW - Interface/interphase KW - Nanolithography KW - Polymer-matrix composites (PMC) scanning/atomic force KW - Microscopy (SFM/AFM) thermal diffusivity PY - 2003 SN - 3-540-00530-7 U6 - https://doi.org/10.1007/b11055 SN - 0065-3195 SN - 1436-5030 N1 - Serientitel: Advances in polymer science – Series title: Advances in polymer science IS - 164 SP - 87 EP - 210 PB - Springer CY - Berlin AN - OPUS4-2892 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Cappella, Brunero T1 - Dynamic Plowing Lithography T2 - Seminar am MPI für Polymerforschung CY - Mainz, Germany DA - 2003-05-12 PY - 2003 AN - OPUS4-2919 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Cappella, Brunero A1 - Sturm, Heinz T1 - Comparison between dynamic plowing lithography and nanoindentation methods N2 - Two different methods of nanolithography, namely dynamic plowing lithography (DPL) and indentation by means of force-displacement curves (FDI), have been compared by performing them on two different polymers, poly (methylmethacrylate) and polystyrene. No fundamental differences can be found out in the efficiency of the two methods, i.e., in the depth of the lithographed structure as a function of the scanning parameters. The main drawback of FDI is that it is much more time consuming than DPL. On the other hand, when the sample is lithographed with DPL, the border walls that surround the lithographed structure are very much bigger than the border walls created through FDI. The physicochemical properties of the border walls created through DPL have been investigated. Several experimental data reveal that such border walls are very much softer and looser than unmodified polymers and suggest that during DPL the fast oscillating tip is able to break polymer chains. This does not happen with FDI, where border walls are simply made up of the material carved out by the tip. A method to eliminate these undesirable border walls is suggested. PY - 2002 U6 - https://doi.org/10.1063/1.1421632 SN - 0021-8979 SN - 1089-7550 VL - 91 IS - 1 SP - 506 EP - 512 PB - American Institute of Physics CY - Melville, NY AN - OPUS4-1632 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Cappella, Brunero A1 - Sturm, Heinz T1 - Dynamic Plowing Lithography of Single Holes on Polymethylmethacrylate Using an Atomic Force Microscope N2 - Dynamic Plowing Lithography is employed to carve holes in a PMMA surface by indenting the sample during Tapping Mode imaging. The dependence of the dimensions of the holes on the tip shape, on the modulation voltage amplitude, and on the number of contacts between the tip and sample is studied. The results give some insights in the physico-chemical mechanisms accompanying such rapid modifications. Two-dimensional arrays of holes have also been carved, in order to study the result of the superposition of single holes. PY - 2001 SN - 0044-376x VL - 10 Suppl. 1 SP - 8 EP - 15 PB - Hirzel CY - Stuttgart, Germany AN - OPUS4-1633 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Cappella, Brunero A1 - Sturm, Heinz A1 - Weidner, Steffen T1 - Breaking polymer chains by dynamic plowing lithography N2 - The adhesion of poly(methyl methacrylate) (PMMA) and polystyrene (PS) films, whose surface has been previously structured by dynamic plowing lithography (DPL), has been measured by means of force–displacement curves. The different adhesion of modified and unmodified PS leads to the assumption that polymer chains are broken during DPL. After measuring the energy dissipated by the tip during DPL, in order to check that the transferred energy is sufficient to break covalent bonds, the polymer chain scission caused by the lithographic process has been definitely confirmed by size exclusion chromatography measurements of the lithographed films. KW - AFM KW - Nanolithography KW - Chain scission PY - 2002 U6 - https://doi.org/10.1016/S0032-3861(02)00285-9 SN - 0032-3861 SN - 1873-2291 VL - 43 IS - 16 SP - 4461 EP - 4466 PB - Springer CY - Berlin AN - OPUS4-1608 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Cappella, Brunero A1 - Sturm, Heinz A1 - Schulz, Eckhard T1 - Stiffness and adhesion characterization of nanolithographed poly(methyl methacrylate) by means of force-displacement curves N2 - Poly(methyl methacrylate) (PMMA) surfaces have been modified by dynamic plowing lithography. The resulting modified structures, presenting regions of different densities and stiffnesses, have been studied by force–displacement curves. The elasto-plastic response, the stiffness, and the adhesion of the modified samples have been characterized. Force–displacement curves are able to distinguish between unmodified PMMA and two different structures resulting from the lithography, i.e. compressed PMMA and low density PMMA. In particular, the low density regions are made up of cluster-like globular particles, whose elasto-plastic response and adhesion are measured and whose contribution to the total elasto-plastic response and to the adhesion has been studied in detail. KW - AFM KW - Lithography KW - Force-displacement curves KW - Stiffness KW - Adhesion KW - Elasto-plastic response PY - 2002 U6 - https://doi.org/10.1163/156856102760136472 SN - 0169-4243 SN - 1568-5616 VL - 16 IS - 7 SP - 921 EP - 933 PB - VNU Science Press CY - Utrecht AN - OPUS4-1609 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Cappella, Brunero A1 - Sturm, Heinz T1 - Lithography of Polymer Surfaces using SPM T2 - Frühjahrstagung DPG CY - Regensburg, Germany DA - 2002-03-13 PY - 2002 AN - OPUS4-6529 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Cappella, Brunero A1 - Sturm, Heinz T1 - Stiffness and Adhesion Characterisation of Nanolithographed PMMA T2 - Frühjahrstagung DPG CY - Regensburg, Germany DA - 2002-03-13 PY - 2002 AN - OPUS4-6530 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -