TY - CONF A1 - Bonse, Jörn A1 - Florian, Camilo A1 - Fischer, Daniel A1 - Freiberg, K. A1 - Duwe, M. A1 - Sahre, Mario A1 - Schneider, S. A1 - Hertwig, Andreas A1 - Krüger, Jörg A1 - Rettenmayr, M. A1 - Beck, Uwe A1 - Undisz, A. T1 - Single Femtosecond Laser Pulse induced Amorphization, Re-crystallization and Native Oxide Removal at Silicon Wafer Surfaces N2 - Single femtosecond laser pulse induced amorphization, re-crystallization and native oxide layer removal at silicon wafer surfaces of different crystal orientation is studied via spectroscopic imaging ellipsometry, atomic force microscopy, and high-resolution transmission electron microscopy. T2 - 2023 Conference on Lasers and Electro-Optics/Europe – European Quantum Electronics Conferences CY - Munich, Germany DA - 26.06.2023 KW - Femtosecond laser KW - Laser-induced amorphization KW - Spectroscopic imaging ellipsometry KW - Transmission electron microscopy KW - Native oxide layer PY - 2023 AN - OPUS4-57829 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -