TY - JOUR A1 - Haro-Poniatowski, E. A1 - Acosta-Zepeda, C. A1 - Mecalco, G. A1 - Hernández-Pozos, J.L. A1 - Batina, Nikola A1 - Morales-Reyes, I. A1 - Bonse, Jörn T1 - Diffraction-assisted micropatterning of silicon surfaces by ns-laser irradiation N2 - Single-pulse (532 nm, 8 ns) micropatterning of silicon with nanometric surface modulation is demonstrated by irradiating through a diffracting pinhole. The irradiation results obtained at fluences above the melting threshold are characterized by scanning electron and scanning force microscopy and reveal a good agreement with Fresnel diffraction theory. The physical mechanism is identified and discussed on basis of both thermocapillary and chemicapillary induced material transport during the molten state of the surface. PY - 2014 UR - http://scitation.aip.org/content/aip/journal/jap/115/22/10.1063/1.4882660 U6 - https://doi.org/10.1063/1.4882660 SN - 0021-8979 SN - 1089-7550 VL - 115 IS - 22 SP - Article 224309, 1 EP - 6 PB - American Institute of Physics CY - Melville, NY AN - OPUS4-30862 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -