TY - JOUR A1 - Bonse, Jörn A1 - Krüger, Jörg T1 - Pulse number dependence of laser-induced periodic surface structures for femtosecond laser irradiation of silicon N2 - The formation of nearly wavelength-sized laser-induced periodic surface structures (LIPSS) on single-crystalline silicon upon irradiation with single (N = 1) and multiple (N ≤ 1000) linearly polarized femtosecond (fs) laser pulses (pulse duration τ = 130 fs, central wavelength λ = 800 nm) in air is studied experimentally. Scanning electron microscopy (SEM) and optical microscopy are used for imaging of the ablated surface morphologies, both revealing LIPSS with periodicities close to the laser wavelength and an orientation always perpendicular to the polarization of the fs-laser beam. It is experimentally demonstrated that these LIPSS can be formed in silicon upon irradiation by single fs-laser pulses—a result that is additionally supported by a recent theoretical model. Two-dimensional Fourier transforms of the SEM images allow the detailed analysis of the distribution of the spatial frequencies of the LIPSS and indicate, at a fixed peak fluence, a monotonous decrease in their mean spatial period between ~770 nm (N = 1) and 560 nm (N = 1000). The characteristic decrease in the LIPSS period is caused by a feedback-mechanism acting upon excitation of surface plasmon polaritons at the rough silicon surface which is developing under the action of multiple pulses into a periodically corrugated surface. KW - Elemental semiconductors KW - Fourier transforms KW - Laser beam effects KW - Optical microscopy KW - Polarisation KW - Polaritons KW - Scanning electron microscopy KW - Silicon KW - Surface morphology KW - Surface plasmons PY - 2010 UR - http://jap.aip.org/resource/1/japiau/v108/i3/p034903_s1 U6 - https://doi.org/10.1063/1.3456501 SN - 0021-8979 SN - 1089-7550 VL - 108 IS - 3 SP - 034903-1 - 034903-5 PB - American Institute of Physics CY - Melville, NY AN - OPUS4-21804 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Rohloff, M. A1 - Das, S.K. A1 - Höhm, S. A1 - Grunwald, R. A1 - Rosenfeld, A. A1 - Krüger, Jörg A1 - Bonse, Jörn T1 - Formation of laser-induced periodic surface structures on fused silica upon multiple cross-polarized double-femtosecond-laser-pulse irradiation sequences N2 - The formation of laser-induced periodic surface structures (LIPSS) upon irradiation of fused silica with multiple irradiation sequences consisting of five Ti:sapphire femtosecond (fs) laser pulse pairs (150 fs, 800 nm) is studied experimentally. A Michelson interferometer is used to generate near-equal-energy double-pulse sequences with a temporal pulse delay from -20 to +20 ps between the cross-polarized individual fs-laser pulses (~0.2 ps resolution). The results of multiple double-pulse irradiation sequences are characterized by means of Scanning Electron and Scanning Force Microscopy. Specifically in the sub-ps delay domain striking differences in the surface morphologies can be observed, indicating the importance of the laser-induced free-electron plasma in the conduction band of the solids for the formation of LIPSS. KW - Atomic force microscopy KW - Conduction bands KW - High-speed optical techniques KW - Laser beam effects KW - Scanning electron microscopy KW - Silicon compounds KW - Surface morphology PY - 2011 U6 - https://doi.org/10.1063/1.3605513 SN - 0021-8979 SN - 1089-7550 VL - 110 IS - 1 SP - 014910-1 - 014910-4 PB - American Institute of Physics CY - Melville, NY AN - OPUS4-24049 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -