TY - JOUR A1 - Heidmann, B. A1 - Andree, Stefan A1 - Levcenko, S. A1 - Unold, T. A1 - Abou-Ras, D. A1 - Schäfer, N. A1 - Bonse, Jörn A1 - Krüger, Jörg A1 - Schmid, M. T1 - Fabrication of regularly arranged chalcopyrite micro solar cells via femtosecond laser-induced forward transfer for concentrator application JF - ACS Applied Energy Materials N2 - A laser-based bottom-up technique for the fabrication of Cu(In,Ga)Se2 (CIGSe) micro solar cells is presented. We use femtosecond laser-induced forward transfer (LIFT) to transport a metallic precursor composed of copper, indium, and gallium onto a molybdenum back contact layer on a glass substrate. A CIGSe absorber forms by subsequent selenization. An array of micro absorbers with defined spacing is fabricated to solar cells and characterized under concentrated light illumination. The solar cell array exhibited a conversion efficiency of 1.4‰ at 1 sun as well as a significant efficiency enhancement of 68% rel. under 20-fold concentration. This work demonstrates the possibility of directly grown micrometer-sized solar cells based on chalcogenide absorber layers, enabling effective material usage. KW - Micro solar cells KW - Light concentration KW - LIFT KW - Chalcopyrite KW - Femtosecond laser PY - 2018 DO - https://doi.org/10.1021/acsaem.7b00028 SN - 2574-0962 VL - 1 IS - 1 SP - 27 EP - 31 PB - ACS CY - Washington, DC AN - OPUS4-43999 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CHAP A1 - Bonse, Jörn A1 - Kirner, Sabrina V. A1 - Krüger, Jörg ED - Sugioka, K. T1 - Laser-Induced Periodic Surface Structures (LIPSS) T2 - Handbook of Laser Micro- and Nano-Engineering N2 - Laser-induced periodic surface structures (LIPSS) are a universal phenomenon and can be generated on almost any material by irradiation with linearly polarized radiation. This chapter reviews the current state in the field of LIPSS, which are formed in a “self-ordered” way and are often accompanying materials processing applications. LIPSS can be produced in a single-stage process and enable surface nanostructuring and, in turn, adaption of optical, mechanical, and chemical surface properties. Typically, they feature a structural size ranging from several micrometers down to less than 100 nm and show a clear correlation with the polarization direction of the light used for their generation. Various types of LIPSS are classified, relevant control parameters are identified, and their material-specific formation mechanisms are analyzed for different types of inorganic solids, i.e., metals, semiconductors, and dielectrics. Finally, technological applications featuring surface functionalization in the fields of optics, fluidics, medicine, and tribology are discussed. KW - Laser-induced periodic surface structures (LIPSS) KW - Femtosecond laser KW - Laser ablation KW - Microstructures KW - Nanostrcutures PY - 2021 SN - 978-3-030-63646-3 (Print) SN - 978-3-030-63647-0 (Online) DO - https://doi.org/10.1007/978-3-030-63647-0_17 SP - 879 EP - 936 PB - Springer-Nature Switzerland AG CY - Cham ET - 1 AN - OPUS4-53728 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CHAP A1 - Bonse, Jörn A1 - Kirner, Sabrina V. A1 - Krüger, Jörg ED - Sugioka, K. T1 - Laser-induced periodic surface structures (LIPSS) T2 - Handbook of laser micro- and nano-engineering N2 - Laser-induced periodic surface structures (LIPSS) are a universal phenomenon and can be generated on almost any material by irradiation with linearly polarized radiation. This chapter reviews the current state in the field of LIPSS, which are formed in a “self-ordered” way and are often accompanying materials processing applications. LIPSS can be produced in a single-stage process and enable surface nanostructuring and, in turn, adaption of optical, mechanical, and chemical surface properties. Typically, they feature a structural size ranging from several micrometers down to less than 100 nm and show a clear correlation with the polarization direction of the light used for their generation. Various types of LIPSS are classified, relevant control parameters are identified, and their material-specific formation mechanisms are analyzed for different types of inorganic solids, i.e., metals, semiconductors, and dielectrics. Finally, technological applications featuring surface functionalization in the fields of optics, fluidics, medicine, and tribology are discussed. KW - Laser-induced periodic surface structures (LIPSS) KW - Laser ablation KW - Femtosecond laser KW - Nanostructures KW - Microstructures PY - 2020 SN - 978-3-319-69537-2 DO - https://doi.org/10.1007/978-3-319-69537-2_17-1 SP - 1 EP - 59 PB - Springer Nature CY - Cham, Switzerland ET - 1 AN - OPUS4-51332 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CHAP A1 - Bonse, Jörn A1 - Kirner, Sabrina V. A1 - Krüger, Jörg ED - Sugioka, K. T1 - Laser-induced periodic surface structures (LIPSS) T2 - Handbook of laser micro- and nano-engineering N2 - Laser-induced periodic surface structures (LIPSS) are a universal phenomenon and can be generated on almost any material by irradiation with linearly polarized radiation. This chapter reviews the current state in the field of LIPSS, which are formed in a “self-ordered” way and are often accompanying materials processing applications. LIPSS can be produced in a single-stage process and enable surface nanostructuring and, in turn, adaption of optical, mechanical, and chemical surface properties. Typically, they feature a structural size ranging from several micrometers down to less than 100 nm and show a clear correlation with the polarization direction of the light used for their generation. Various types of LIPSS are classified, relevant control parameters are identified, and their material-specific formation mechanisms are analyzed for different types of inorganic solids, i.e., metals, semiconductors, and dielectrics. Finally, technological applications featuring surface functionalization in the fields of optics, fluidics, medicine, and tribology are discussed. KW - Femtosecond laser KW - Laser ablation KW - Laser-induced periodic surface structures (LIPSS) KW - Microstructures KW - Nanostructures PY - 2021 SN - 978-3-319-69537-2 DO - https://doi.org/10.1007/978-3-319-69537-2_17-2 SP - 1 EP - 59 PB - Springer Nature CY - Cham, Switzerland ET - 2 AN - OPUS4-51493 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Florian, Camilo A1 - Fischer, Daniel A1 - Freiberg, K. A1 - Duwe, M. A1 - Sahre, Mario A1 - Schneider, S. A1 - Hertwig, Andreas A1 - Krüger, Jörg A1 - Rettenmayr, M. A1 - Beck, Uwe A1 - Undisz, A. A1 - Bonse, Jörn T1 - Single Femtosecond Laser-Pulse-Induced Superficial Amorphization and Re-Crystallization of Silicon JF - Materials N2 - Superficial amorphization and re-crystallization of silicon in <111> and <100> orientation after irradiation by femtosecond laser pulses (790 nm, 30 fs) are studied using optical imaging and transmission electron microscopy. Spectroscopic imaging ellipsometry (SIE) allows fast data acquisition at multiple wavelengths and provides experimental data for calculating nanometric amorphous layer thickness profiles with micrometric lateral resolution based on a thin-film layer model. For a radially Gaussian laser beam and at moderate peak fluences above the melting and below the ablation thresholds, laterally parabolic amorphous layer profiles with maximum thicknesses of several tens of nanometers were quantitatively attained. The accuracy of the calculations is verified experimentally by high-resolution transmission electron microscopy (HRTEM) and energy dispersive X-ray spectroscopy (STEM-EDX). Along with topographic information obtained by atomic force microscopy (AFM), a comprehensive picture of the superficial re-solidification of silicon after local melting by femtosecond laser pulses is drawn. KW - Femtosecond laser KW - Silicon KW - Amorphization KW - Crystallization KW - Spectroscopic imaging ellipsometry PY - 2021 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-523687 UR - https://www.mdpi.com/1996-1944/14/7/1651 DO - https://doi.org/10.3390/ma14071651 SN - 1996-1944 VL - 14 IS - 7 SP - 1651-1 EP - 1651-21 PB - MDPI AG CY - Basel, Switzerland AN - OPUS4-52368 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Legall, Herbert A1 - Schwanke, Christoph A1 - Bonse, Jörn A1 - Krüger, Jörg T1 - The influence of processing parameters on X‑ray emission during ultra‑short pulse laser machining JF - Applied Physics A N2 - During ultra-short laser material processing at high laser pulse repetition rates unwanted X-ray radiation can be generated in a quantity that may constitute a potential risk for health. An adequate X-ray radiation protection requires a thoroughly understanding of the influence of the laser processing parameters on the generation of X-ray radiation. In the present work, the generated X-ray dose during laser machining was investigated in air for varying beam scanning conditions at a pulse duration of 925 fs, a center wavelength of 1030 nm and a laser peak intensity of 2.6 × 10^14 W/cm^2. The X-ray radiation dose and the corresponding spectral X-ray emission were investigated in dependence on the laser’s pulse repetition rate and on the beam scanning speed. The results show a strong dependence of the X-ray emission on these laser processing parameters. KW - Laser-induced X-ray emission KW - Ultrashort laser material interaction KW - Femtosecond laser KW - Radiation protection PY - 2019 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-486441 DO - https://doi.org/10.1007/s00339-019-2827-y SN - 0947-8396 SN - 1432-0630 VL - 125 IS - 8 SP - 570, 1 EP - 8 PB - Springer AN - OPUS4-48644 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Kirner, Sabrina V. A1 - Slachciak, Nadine A1 - Elert, Anna Maria A1 - Griepentrog, Michael A1 - Fischer, Daniel A1 - Hertwig, Andreas A1 - Sahre, Mario A1 - Dörfel, Ilona A1 - Sturm, Heinz A1 - Pentzien, Simone A1 - Koter, Robert A1 - Spaltmann, Dirk A1 - Krüger, Jörg A1 - Bonse, Jörn T1 - Tribological performance of titanium samples oxidized by fs-laser radiation, thermal heating, or electrochemical anodization JF - Applied Physics A N2 - Commercial grade-1 titanium samples (Ti, 99.6%) were treated using three alternative methods, (i) femtosecond laser processing, (ii) thermal heat treatment, and (iii) electrochemical anodization, respectively, resulting in the formation of differently conditioned superficial titanium oxide layers. The laser processing (i) was carried out by a Ti:sapphire laser (pulse duration 30 fs, central wavelength 790 nm, pulse repetition rate 1 kHz) in a regime of generating laser-induced periodic surface structures (LIPSS). The experimental conditions (laser fluence, spatial spot overlap) were optimized in a sample-scanning setup for the processing of several square-millimeters large surface areas covered homogeneously by these nanostructures. The differently oxidized titanium surfaces were characterized by optical microscopy, micro Raman spectroscopy, variable angle spectroscopic ellipsometry, and instrumented indentation testing. The tribological performance was characterized in the regime of mixed friction by reciprocating sliding tests against a sphere of hardened steel in fully formulated engine oil as lubricant. The specific tribological performance of the differently treated surfaces is discussed with respect to possible physical and chemical mechanisms. KW - Femtosecond laser KW - Titanium KW - Oxidation KW - Friction PY - 2018 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-445609 DO - https://doi.org/10.1007/s00339-018-1745-8 SN - 0947-8396 SN - 1432-0630 VL - 124 IS - 4 SP - 326, 1 EP - 10 PB - Springer-Verlag AN - OPUS4-44560 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Legall, Herbert A1 - Schwanke, Christoph A1 - Pentzien, Simone A1 - Dittmar, G. A1 - Bonse, Jörn A1 - Krüger, Jörg T1 - X-ray emission as a potential hazard during ultrashort pulse laser material processing JF - Applied physics A N2 - In laser machining with ultrashort laser pulses unwanted X-ray radiation in the keV range can be generated when a critical laser intensity is exceeded. Even if the emitted X-ray dose per pulse is low, high laser repetition rates can lead to an accumulation of X-ray doses beyond exposure safety limits. For 925 fs pulse duration at a center wavelength of 1030 nm, the X-ray emission was investigated up to an intensity of 2.6 × 10^14 W/cm2. The experiments were performed in air with a thin disk laser at a repetition rate of 400 kHz. X-ray spectra and doses were measured for various planar target materials covering a wide range of the periodic table from aluminum to tungsten. Without radiation shielding, the measured radiation doses at this high repetition rate clearly exceed the regulatory limits. Estimations for an adequate radiation shielding are provided. KW - Laser-induced X-ray emission KW - Ultrashort laser material interaction KW - Femtosecond laser KW - Radiation protection PY - 2018 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-448431 DO - https://doi.org/10.1007/s00339-018-1828-6 SN - 0947-8396 SN - 1432-0630 VL - 124 IS - 6 SP - Article 407, 1 EP - 8 PB - Springer AN - OPUS4-44843 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -