TY - JOUR A1 - Höhm, S. A1 - Rosenfeld, A. A1 - Krüger, Jörg A1 - Bonse, Jörn T1 - Femtosecond laser-induced periodic surface structures on silica N2 - The formation of laser-induced periodic surface structures (LIPSS) on two different silica polymorphs (single-crystalline synthetic quartz and commercial fused silica glass) upon irradiation in air with multiple linearly polarized single- and double-fs-laser pulse sequences (τ = 150 fs pulse duration, λ = 800nm center wavelength, temporal pulse separation Δt < 40 ps) is studied experimentally and theoretically. Two distinct types of fs-LIPSS [so-called low-spatial-frequency LIPSS (LSFL) and high-spatial-frequency LIPSS (HSFL)] with different spatial periods and orientations were identified. Their appearance was characterized with respect to the experimental parameters peak laser fluence and number of laser pulses per spot. Additionally, the 'dynamics' of the LIPSS formation was addressed in complementary double-fs-pulse experiments with varying delays, revealing a characteristic change of the LSFL periods. The experimental results are interpreted on the basis of a Sipe-Drude model considering the carrier dependence of the optical properties of fs-laser excited silica. This new approach provides an explanation of the LSFL orientation parallel to the laser beam polarisation in silica—as opposed to the behaviour of most other materials. KW - High-speed optical techniques KW - Laser beam effects KW - Refractive index KW - Silicon compounds KW - Surface structure PY - 2012 DO - https://doi.org/10.1063/1.4730902 SN - 0021-8979 SN - 1089-7550 VL - 112 IS - 1 SP - 014901-1 - 014901-9 PB - American Institute of Physics CY - Melville, NY AN - OPUS4-26201 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Bonse, Jörn A1 - Krüger, Jörg T1 - Probing the heat affected zone by chemical modifications in femtosecond pulse laser ablation of titanium nitride films in air N2 - A new approach is presented to quantify the so-called "heat affected zone" (HAZ) during femtosecond laser pulse processing. Ablation of titanium nitride (TiN) thin films (~3 μm thickness) by multiple femtosecond laser pulses (τ=130 fs, λ=800 nm) in air environment was studied by means of two different surface analytical methods both being sensitive to chemical alterations at the surface. Scanning Auger electron microscopy was applied for a visualization of the spatial distribution of specific elements (Ti, O) within the laser-modified areas. The chemical state of the irradiated surface was revealed by complementary x-ray photoelectron spectroscopy. Both methods were used for a depth-profiling chemical analysis (tracking the elements Ti, N, O, and C) using an Ar-ion beam for surface sputtering. In a narrow laser fluence range slightly below the ablation threshold of TiN significant superficial oxidation can be observed leading to the formation of substoichiometric TiO2-x. At fluences above the ablation threshold, an increased titanium concentration is observed within the entire ablation craters. Following upon sputter removal the elemental distribution into the depth of the nonablated material, the results allow an estimation of the heat-affected zone for femtosecond laser ablation in air environment. According to our analyses, the HAZ extends up to a few hundreds of nanometers into the nonablated material. KW - Femtosecond laser ablation KW - Heat affected zone KW - Titanium nitride KW - Scanning Auger electron microscopy KW - X-ray KW - Photoelektron spectroscopy PY - 2010 UR - http://link.aip.org/link/?JAP/107/054902 DO - https://doi.org/10.1063/1.3311552 SN - 0021-8979 SN - 1089-7550 VL - 107 IS - 5 SP - 054902-1 - 054902-5 PB - American Institute of Physics CY - Melville, NY AN - OPUS4-20949 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Rohloff, M. A1 - Das, S.K. A1 - Höhm, S. A1 - Grunwald, R. A1 - Rosenfeld, A. A1 - Krüger, Jörg A1 - Bonse, Jörn T1 - Formation of laser-induced periodic surface structures on fused silica upon multiple cross-polarized double-femtosecond-laser-pulse irradiation sequences N2 - The formation of laser-induced periodic surface structures (LIPSS) upon irradiation of fused silica with multiple irradiation sequences consisting of five Ti:sapphire femtosecond (fs) laser pulse pairs (150 fs, 800 nm) is studied experimentally. A Michelson interferometer is used to generate near-equal-energy double-pulse sequences with a temporal pulse delay from -20 to +20 ps between the cross-polarized individual fs-laser pulses (~0.2 ps resolution). The results of multiple double-pulse irradiation sequences are characterized by means of Scanning Electron and Scanning Force Microscopy. Specifically in the sub-ps delay domain striking differences in the surface morphologies can be observed, indicating the importance of the laser-induced free-electron plasma in the conduction band of the solids for the formation of LIPSS. KW - Atomic force microscopy KW - Conduction bands KW - High-speed optical techniques KW - Laser beam effects KW - Scanning electron microscopy KW - Silicon compounds KW - Surface morphology PY - 2011 DO - https://doi.org/10.1063/1.3605513 SN - 0021-8979 SN - 1089-7550 VL - 110 IS - 1 SP - 014910-1 - 014910-4 PB - American Institute of Physics CY - Melville, NY AN - OPUS4-24049 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Höhm, S. A1 - Rosenfeld, A. A1 - Krüger, Jörg A1 - Bonse, Jörn T1 - Laser-induced periodic surface structures on titanium upon single- and two-color femtosecond double-pulse irradiation N2 - Single- and two-color double-fs-pulse experiments were performed on titanium to study the dynamics of the formation of laser-induced periodic surface structures (LIPSS). A Mach-Zehnder inter-ferometer generated polarization controlled (parallel or cross-polarized) double-pulse sequences in two configurations – either at 800 nm only, or at 400 and 800 nm wavelengths. The inter-pulse delays of the individual 50-fs pulses ranged up to some tens of picoseconds. Multiple of these single- or two-color double-fs-pulse sequences were collinearly focused by a spherical mirror to the sample surface. In both experimental configurations, the peak fluence of each individual pulse was kept below its respective ablation threshold and only the joint action of both pulses lead to the formation of LIPSS. Their resulting characteristics were analyzed by scanning electron microscopy and the periods were quantified by Fourier analyses. The LIPSS periods along with the orientation allow a clear identification of the pulse which dominates the energy coupling to the material. A plasmonic model successfully explains the delay-dependence of the LIPSS on titanium and confirms the importance of the ultrafast energy deposition stage for LIPSS formation. PY - 2015 DO - https://doi.org/10.1364/OE.23.025959 SN - 1094-4087 VL - 23 IS - 20 SP - 25959 EP - 25971 PB - Optical Society of America CY - Washington, DC AN - OPUS4-34354 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Schwibbert, Karin A1 - Menzel, F. A1 - Epperlein, N. A1 - Bonse, Jörn A1 - Krüger, Jörg T1 - Bacterial adhesion on femtosecond laser-modified polyethylene N2 - In this study, femtosecond laser-induced sub-micrometer structures are generated to modify polyethylene (PE) surface topographies. These surfaces were subjected to bacterial colonization studies with Escherichia coli and Staphylococcus aureus as test strains. The results reveal that the nanostructures do not influence S. aureus coverage, while the adhesion of E. coli is reduced. KW - Bacterial adhesion KW - Laser-modified surface KW - Polyethylene KW - Laser-induced nanostructures KW - Biofilm PY - 2019 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-492280 DO - https://doi.org/10.3390/ma12193107 VL - 12 IS - 19 SP - 3107 PB - MDPI CY - Basel, Schweiz AN - OPUS4-49228 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Cubero, A. A1 - Martínez, E. A1 - Angurel, L.A. A1 - de la Fuente, G.F. A1 - Navarro, R. A1 - Legall, Herbert A1 - Krüger, Jörg A1 - Bonse, Jörn T1 - Effects of laser-induced periodic surface structures on the superconducting properties of Niobium N2 - It is well known that the use of ultrashort (fs) pulsed lasers can induce the generation of (quasi-) periodic nanostructures (LIPSS, ripples) on the surface of many materials. Such nanostructures have also been observed in sample’s surfaces irradiated with UV lasers with a pulse duration of 300 ps. In this work, we compare the characteristics of these nanostructures on 1-mm and on 25-μm thick niobium sheets induced by 30 fs n-IR and 300 ps UV pulsed lasers. In addition to conventional continuous or burst mode processing configurations, two-dimensional laser beam and line scanning modes have been investigated in this work. The latter allows the processing of large areas with a more uniform distribution of nanostructures at the surface. The influence of the generated nanostructures on the superconducting properties of niobium has also been explored. For this aim, magnetic hysteresis loops have been measured at different cryogenic temperatures to analyse how these laser treatments affect the flux pinning behaviour and, in consequence, the superconductor’s critical current values. It was observed that laser treatments are able to modify the superconducting properties of niobium samples. T2 - E-MRS Spring Meeting 2019 CY - Nice, France DA - 27.05.2019 KW - Superconductivity KW - Laser-induced periodic surface structures (LIPSS) KW - Niobium PY - 2020 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-502541 DO - https://doi.org/10.1016/j.apsusc.2019.145140 SN - 0169-4332 SN - 1873-5584 VL - 508 IS - 1 SP - 145140-1 EP - 145140-7 PB - Elsevier CY - Amsterdam AN - OPUS4-50254 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Legall, Herbert A1 - Schwanke, Christoph A1 - Bonse, Jörn A1 - Krüger, Jörg T1 - The influence of processing parameters on X‑ray emission during ultra‑short pulse laser machining N2 - During ultra-short laser material processing at high laser pulse repetition rates unwanted X-ray radiation can be generated in a quantity that may constitute a potential risk for health. An adequate X-ray radiation protection requires a thoroughly understanding of the influence of the laser processing parameters on the generation of X-ray radiation. In the present work, the generated X-ray dose during laser machining was investigated in air for varying beam scanning conditions at a pulse duration of 925 fs, a center wavelength of 1030 nm and a laser peak intensity of 2.6 × 10^14 W/cm^2. The X-ray radiation dose and the corresponding spectral X-ray emission were investigated in dependence on the laser’s pulse repetition rate and on the beam scanning speed. The results show a strong dependence of the X-ray emission on these laser processing parameters. KW - Laser-induced X-ray emission KW - Ultrashort laser material interaction KW - Femtosecond laser KW - Radiation protection PY - 2019 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-486441 DO - https://doi.org/10.1007/s00339-019-2827-y SN - 0947-8396 SN - 1432-0630 VL - 125 IS - 8 SP - 570, 1 EP - 8 PB - Springer AN - OPUS4-48644 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Florian, Camilo A1 - Fischer, Daniel A1 - Freiberg, K. A1 - Duwe, M. A1 - Sahre, Mario A1 - Schneider, S. A1 - Hertwig, Andreas A1 - Krüger, Jörg A1 - Rettenmayr, M. A1 - Beck, Uwe A1 - Undisz, A. A1 - Bonse, Jörn T1 - Single Femtosecond Laser-Pulse-Induced Superficial Amorphization and Re-Crystallization of Silicon N2 - Superficial amorphization and re-crystallization of silicon in <111> and <100> orientation after irradiation by femtosecond laser pulses (790 nm, 30 fs) are studied using optical imaging and transmission electron microscopy. Spectroscopic imaging ellipsometry (SIE) allows fast data acquisition at multiple wavelengths and provides experimental data for calculating nanometric amorphous layer thickness profiles with micrometric lateral resolution based on a thin-film layer model. For a radially Gaussian laser beam and at moderate peak fluences above the melting and below the ablation thresholds, laterally parabolic amorphous layer profiles with maximum thicknesses of several tens of nanometers were quantitatively attained. The accuracy of the calculations is verified experimentally by high-resolution transmission electron microscopy (HRTEM) and energy dispersive X-ray spectroscopy (STEM-EDX). Along with topographic information obtained by atomic force microscopy (AFM), a comprehensive picture of the superficial re-solidification of silicon after local melting by femtosecond laser pulses is drawn. KW - Femtosecond laser KW - Silicon KW - Amorphization KW - Crystallization KW - Spectroscopic imaging ellipsometry PY - 2021 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-523687 UR - https://www.mdpi.com/1996-1944/14/7/1651 DO - https://doi.org/10.3390/ma14071651 SN - 1996-1944 VL - 14 IS - 7 SP - 1651-1 EP - 1651-21 PB - MDPI AG CY - Basel, Switzerland AN - OPUS4-52368 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Stolzenberg, U. A1 - Schmitt Rahner, M. A1 - Pullner, B. A1 - Legall, Herbert A1 - Bonse, Jörn A1 - Kluge, M. A1 - Ortner, A. A1 - Hoppe, B. A1 - Krüger, Jörg T1 - X-ray emission hazards from ultrashort pulsed laser material processing in an industrial setting N2 - Interactions between ultrashort laser pulses with intensities larger than 10^13 W/cm^2 and solids during material processing can lead to the emission of X-rays with photon energies above 5 keV, causing radiation hazards to operators. A framework for inspecting X-ray emission hazards during laser material processing has yet to be developed. One requirement for conducting radiation protection inspections is using a reference scenario, i.e., laser settings and process parameters that will lead to an almost constant and high level of X-ray emissions. To study the feasibility of setting up a reference scenario in practice, ambient dose rates and photon energies were measured using traceable measurement equipment in an industrial setting at SCHOTT AG. Ultrashort pulsed (USP) lasers with a maximum average power of 220 W provided the opportunity to measure X-ray emissions at laser peak intensities of up to 3.3 × 10^15 W/cm^2 at pulse durations of ~1 ps. The results indicate that increasing the laser peak intensity is insufficient to generate high dose rates. The investigations were affected by various constraints which prevented measuring high ambient dose rates. In this work, a list of issues which may be encountered when performing measurements at USP-laser machines in industrial settings is identified. KW - X-ray emission hazards KW - Ultrashort pulsed laser KW - Radiation protection KW - Industrial applications KW - Protection housing PY - 2021 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-538632 DO - https://doi.org/10.3390/ma14237163 SN - 1996-1944 VL - 14 SP - 1 EP - 17 PB - MDPI CY - Basel AN - OPUS4-53863 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Schwibbert, Karin A1 - Richter, Anja M. A1 - Krüger, Jörg A1 - Bonse, Jörn T1 - Laser-Textured Surfaces: A Way to Control Biofilm Formation? N2 - Bacterial biofilms pose serious problems in medical and industrial settings. One of the major societal challenges lies in the increasing resistance of bacteria against biocides used in antimicrobial treatments, e.g., via overabundant use in medicine, industry, and agriculture or cleaning and disinfection in private households. Hence, new efficient bacteria-repellent strategies avoiding the use of biocides are strongly desired. One promising route to achieve bacteria-repellent surfaces lies in the contactless and aseptic large-area laser-processing of technical surfaces. Tailored surface textures, enabled by different laser-processing strategies that result in topographic scales ranging from nanometers to micrometers may provide a solution to this challenge. This article presents a current state-of-the-art review of laser-surface subtractive texturing approaches for controlling the biofilm formation for different bacterial strains and in different environments. Based on specific properties of bacteria and laser-processed surfaces, the challenges of anti-microbial surface designs are discussed, and future directions will be outlined. KW - Antibacterial surfaces KW - Biofilms KW - Laser processing KW - Laser-induced periodic surface structures (LIPSS) KW - Microbial adhesions PY - 2023 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-588260 DO - https://doi.org/10.1002/lpor.202300753 SN - 1863-8899 SP - 1 EP - 41 PB - Wiley-VCH GmbH CY - Weinheim AN - OPUS4-58826 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -