TY - JOUR A1 - Krüger, Hannes A1 - Hertwig, Andreas A1 - Beck, Uwe A1 - Kemnitz, E. T1 - Low temperature sol-gel metal oxide and fluoride layer stacks for optical applications JF - Thin solid films N2 - MgF2 and TiO2 single layers and layer stacks were produced by a spin-coating sol-gel process. The final temperature treatment was carried out at 100 °C. The layers were deposited onto silicon and fused silica substrates and were analysed by means of atomic force microscopy, X-ray photoelectron spectroscopy, transmission electron microscopy, ellipsometry, and UV-vis transmission spectroscopy. MgF2 and TiO2 single layers have morphological and optical properties comparable with physical vapour deposited layers. By using spectroscopic mapping ellipsometry, a good inter- and intra-sample homogeneity was confirmed. Multiple deposition steps result in a linear increase of layer thickness. Various films were deposited with thicknesses between 25 nm and 350 nm. It was shown that the low temperature sol-gel process results in films of optical quality. Anti-reflective and high reflective layer stacks consisting of MgF2 and TiO2 were designed and can be produced now by a sol-gel process, whereas the MgF2 layers in the layer stacks contains also traces of MgF2-2xOx. KW - Magnesium fluoride KW - Titanium oxide KW - Sol-gel KW - Spin-coating KW - Optical properties KW - Optical layer stacks KW - MgF2 KW - TiO2 PY - 2010 DO - https://doi.org/10.1016/j.tsf.2010.06.025 SN - 0040-6090 VL - 518 IS - 21 SP - 6080 EP - 6086 PB - Elsevier CY - Amsterdam AN - OPUS4-21516 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -