TY - JOUR A1 - Maser, K. A1 - Mohr, U. A1 - Leihkauf, R. A1 - Ecker, Klaus A1 - Beck, Uwe A1 - Grambole, D. A1 - Grötzschel, R. A1 - Herrmann, F. A1 - Krauser, J. A1 - Weidinger, A. T1 - Hydrogen migration in wet-thermally grown silicon dioxide layers due to high dose 15N ion beam irradiation N2 - Three effects have been observed in wet-thermally grown structures under bombardement with energetic 15N ions: (1) Out-diffusion of H from the SiO2/Si system through the surface, (2) Accumulation of H at the SiO2/Si interface, (3) Changes in the optical fingerprint spectra of Ψ and Δ in dependence on λ (wavelength) obtained by ellipsometric measurements. PY - 1999 U6 - https://doi.org/10.1016/S0167-9317(99)00356-1 SN - 0167-9317 SN - 1873-5568 VL - 48 IS - 1-4 SP - 139 EP - 142 PB - Elsevier CY - Amsterdam AN - OPUS4-25572 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -