TY - JOUR A1 - Cappella, Brunero A1 - Sturm, Heinz A1 - Weidner, Steffen T1 - Breaking polymer chains by dynamic plowing lithography JF - Polymer N2 - The adhesion of poly(methyl methacrylate) (PMMA) and polystyrene (PS) films, whose surface has been previously structured by dynamic plowing lithography (DPL), has been measured by means of forceĀ–displacement curves. The different adhesion of modified and unmodified PS leads to the assumption that polymer chains are broken during DPL. After measuring the energy dissipated by the tip during DPL, in order to check that the transferred energy is sufficient to break covalent bonds, the polymer chain scission caused by the lithographic process has been definitely confirmed by size exclusion chromatography measurements of the lithographed films. KW - AFM KW - Nanolithography KW - Chain scission PY - 2002 DO - https://doi.org/10.1016/S0032-3861(02)00285-9 SN - 0032-3861 SN - 1873-2291 VL - 43 IS - 16 SP - 4461 EP - 4466 PB - Springer CY - Berlin AN - OPUS4-1608 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Cappella, Brunero A1 - Geuss, Markus A1 - Sturm, Heinz A1 - Heyde, M. A1 - Rademann, K. A1 - Spangenberg, T. A1 - Niehus, H. T1 - Dynamic plowing nanolithography on polymethylmethacrylate using an atomic force microscope JF - Review of scientific instruments N2 - We present dynamic plowing nanolithography on polymethylmethacrylate films, performed with a scan-linearized atomic force microscope able to scan up to 250 Ī¼m with high resolution. Modifications of the surface are obtained by plastically indenting the film surface with a vibrating tip. By changing the oscillation amplitude of the cantilever, i.e., the indentation depth, surfaces can be either imaged or modified. A program devoted to the control of the scanning process is also presented. The software basically converts the gray scale of pixel images into voltages used to control the dither piezo driving cantilever oscillations. The advantages of our experimental setup and the dependence of lithography efficiency on scanning parameters are discussed. Some insights into the process of surface modifications are presented. KW - Nanolithography PY - 2001 UR - http://rsi.aip.org/ DO - https://doi.org/10.1063/1.1326053 SN - 0034-6748 SN - 1089-7623 VL - 72 SP - 136 EP - 141 PB - American Institute of Physics CY - Melville, NY AN - OPUS4-874 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Sturm, Heinz A1 - Cappella, Brunero A1 - Heyde, M. A1 - Ritter, C. A1 - Rademann, K. T1 - Dislocation of antimony clusters on graphite by means of dynamic plowing nanolithography JF - Surface science N2 - Antimony clusters of different shapes and dimensions have been obtained by evaporating antimony on graphite. The dependence of the shape and dimensions of the particles on the evaporation parameters (effective layer thickness, temperature, pressure) is discussed. A characterisation of the different structures is presented. In particular, the decoration of graphite steps is discussed. Clusters have been dislocated by means of dynamic plowing nanolithography, both in vector and in image pattern mode. The dependence of the energy needed to dislocate a cluster on its dimensions and position is discussed. KW - Antimony clusters KW - Nanolithography PY - 2001 DO - https://doi.org/10.1016/S0039-6028(00)01113-4 SN - 0039-6028 VL - 476 IS - 1-2 SP - 54 EP - 62 PB - Elsevier CY - Amsterdam AN - OPUS4-875 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -