TY - JOUR A1 - Senoner, Mathias A1 - Unger, Wolfgang T1 - Summary of ISO/TC 201 technical report: ISO/TR 19319:2013 - Surface chemical analysis - Fundamental approaches to determination of lateral resolution and sharpness in beam-based methods JF - Surface and interface analysis N2 - This Technical Report revises ISO/TR 19319:2003 - Surface chemical Analysis-Auger electron spectroscopy and X-ray photoelectron spectroscopy-Determination of lateral resolution, analysis area and sample area viewed by the analyser. The revised Technical Report gives a short introduction to basic models of image formation and introduces functions which characterize the performance of imaging instruments with respect to lateral resolution and sharpness. The determination of lateral resolution by imaging of square-wave gratings and the determination of sharpness by imaging of narrow stripes and straight edges are described in detail. Finally, physical factors affecting lateral resolution, analysis area and sample area viewed by the analyser are discussed. KW - CTF KW - ESF KW - Lateral resolution KW - LSF KW - MTF KW - Narrow stripe KW - Noise KW - PSF KW - Resolution criterion KW - Sharpness KW - Square-wave grating KW - Straight edge PY - 2013 DO - https://doi.org/10.1002/sia.5294 SN - 0142-2421 SN - 1096-9918 VL - 45 IS - 9 SP - 1313 EP - 1316 PB - Wiley CY - Chichester AN - OPUS4-29012 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Senoner, Mathias A1 - Unger, Wolfgang T1 - Lateral resolution of secondary ion mass spectrometry - results of an inter-laboratory comparison JF - Surface and interface analysis N2 - Recently, BAM organised an inter-laboratory comparison focussed on lateral resolution and accuracy of sub-micron length measurements by secondary ion mass spectrometry (SIMS). Results were submitted by 16 laboratories from 10 countries. The task was to analyse a cross-sectioned semiconductor multilayer stack. The resulting strip pattern in the surface of the sample shows narrow strips, step transitions and gratings of different periods. Imaging analysis of this pattern enables the determination of relevant parameters related to the lateral resolution: (i) The width (FWHM) of the primary ion beam, (ii) the distance between 16% and 84% intensity points in a profile across the image of a step transition and (iii) the modulation of intensity in the images of gratings with different periods. The parameter's data reported by the participants vary in a wide range. A strong variation in the data of primary ion beam width was observed for results measured with the same type of instrument. The distance between two narrow strips was measured with high accuracy. Twelve of sixteen of the submitted values are within the limits of uncertainty of the reference value 964 ± 35 nm. This result shows that the calibration of the length scale of the SIMS instruments is already rather precise in most of the participating laboratories. KW - ESF KW - LSF KW - MTF KW - SIMS KW - Accuracy KW - Deconvolution KW - Edge method KW - Edge spread function KW - Inter-laboratory comparison KW - Ion microscopy KW - Lateral resolution KW - Length scale calibration KW - Line spread function KW - Modulation transfer function KW - Nanometrology KW - Nanotechnology KW - Primary ion beam width KW - Square-wave grating KW - Strip pattern PY - 2007 SN - 0142-2421 SN - 1096-9918 VL - 39 IS - 1 SP - 16 EP - 25 PB - Wiley CY - Chichester AN - OPUS4-14427 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -