TY - JOUR A1 - Gornushkin, Igor B. A1 - Sennikov, P. A1 - Kornev, R. A1 - Ermakov, A. A1 - Shkrunin, V. T1 - Laser Induced Dielectric Breakdown for Chemical Vapor Deposition by Hydrogen Reduction of Volatile Boron Halides BCl3 and  BF3 JF - Plasma Chemistry and Plasma Processing N2 - A possibility of deposition from laser-induced plasma is investigated in search for an economic and simple method for obtaining isotopic compounds from enriched gaseous precursors although no isotopic compounds are used in this the proof-of-principle work. A breakdown in mixtures of BCl3 and BCl3 with hydrogen, argon, and methane are studied both theoretically and experimentally. Equilibrium chemistry calculations show the deposition of boron, boron carbide, and carbon is thermodynamically favorable in BCl3 systems and only carbon in BF3 systems. Dynamic calculation of expanding plasma is performed using fluid dynamics coupled with equilibrium chemistry. Condensed phases of boron, boron carbide, and graphite are predicted with maximum concentrations in peripheral zones of the plasma. In experiment, plasma is induced in mixtures BCl3, H2 + BCl3, H2 + Ar + BCl3, H2 + BCl3 + CH4, BF3, H2 + BF3, H2 + Ar + BF3, and H2 + Ar + BF3. The gases are analyzed before, during, and after laser irradiation by optical and mass spectrometry methods. The results show the composition of reaction products close to that predicted theoretically. The conversion of precursor gases BCl3 and BF3 into gaseous and condensed products is 100% for BCl3 and 80% for BF3. Solid deposits of up to 30 mg are obtained from all reaction mixtures. Due to technical reasons only FTIR characterization of the BCl3 + H2 + CH4 deposit is done. It points to presence of condensed boron and boron carbide predicted by the model. Overall, the calculations and preliminary experimental results imply the chemical vapor deposition with laser induced plasma is promising for conversion of gaseous enriched precursors into elemental isotopes and their isotopic compounds. KW - Boron halides KW - Chemical vapor deposition KW - Laser induced dielectric breakdown, Hydrogen reduction PY - 2020 DO - https://doi.org/10.1007/s11090-020-10096-w VL - 40 IS - 5 SP - 1145 EP - 1162 PB - Springer AN - OPUS4-50968 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Gornushkin, Igor B. A1 - Sennikov, P. A1 - Kornev, R. A1 - Ermakov, A. A1 - Shkrunin, V. T1 - Laser Induced Plasma for Chemical Vapor Deposition: Theory and Experiment N2 - A possibility of deposition from laser-induced plasma (LIP) is investigated in search for an economic and simple method to obtain isotopic compounds from enriched gaseous precursors. A breakdown in mixtures of BCl3 and BCl3 with hydrogen, argon, and methane are studied both theoretically and experimentally. Calculations of expanding plasma of different composition are performed with the use of the fluid dynamic code coupled to the equilibrium chemistry solver. Condensed phases of boron, boron carbide, and graphite are predicted showing maximum concentrations in peripheral zones of the plasma. In experiment LIP is induced in mixtures BCl3, Н2+BCl3, H2+Ar+BCl3, H2+BCl3+CH4, BF3, Н2+BF3, H2+Ar+BF3, and H2+Ar+BF3. The gases are analyzed before, during, and after laser irradiation by optical and mass spectroscopic methods. The composition of reaction products is found to be close to that predicted theoretically. The conversion of precursor gases BCl3 and BF3 into gaseous and condensed products is 100% for BCl3 and 80% for BF3. Solid deposits of up to 30 mg are obtained from all the reaction mixtures. FTIR analysis of BCl3+H2+CH4 deposits points to a presence of condensed boron and boron carbide that are also predicted by the model. Both calculations and preliminary experimental results suggest the chemical vapor deposition by LIP is promising for conversion of gaseous enriched precursors into elemental isotopes and their isotopic compounds. T2 - International Online Meeting on Laser Induced Breakdown Spectroscopy (IIOMLIBS) CY - Online meeting DA - 06.07.2020 KW - Chemical vapor deposition KW - Laser induced plasma PY - 2020 AN - OPUS4-50994 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Sennikov, P. A1 - Gornushkin, Igor B. A1 - Kornev, R. A1 - Nazarov, V. A1 - Polyakov, V. A1 - Shkrunin, V. T1 - Hydrogen Reduction of MoF6 and Molybdenum Carbide Formation in RF Inductively Coupled Low‑Pressure Discharge: Experiment and Equilibrium Thermodynamics Consideration JF - Plasma Chemistry and Plasma Processing N2 - The physical plasma parameters, temperature and electron number density, are studied in the RF-IC (RF inductively coupled) discharge at a reduced pressure of 3 Torr in mixtures of MoF6 with Ar, H2 and CH4. The emission spectra of mixtures are investigated. It is shown that in the presence of argon, the concentration of free electrons in plasma and dissociation rate of MoF6 increase. A main role of molecular hydrogen is the generation of atomic hydrogen that binds atomic fuorine and leads to the formation of gaseous and solid products. Exhaust gas mixtures exiting the reactor are analyzed by mass spectrometry. It is shown that for all cases, the conversion of MoF6 into reaction products is close to 100%. A thermodynamic analysis of the equilibrium composition of MoF6 systems with Ar, H2 and CH4 was carried out and the obtained results are in good agreement with experimentally observed composition of the solid and gas phases. Analysis of solid deposits from mixture MoF6/H2/Ar revealed the presence of molybdenum powder and large amount of amorphous MoFx. The deposit obtained from mixtures with methane, MoF6/H2/Ar/CH4, contained crystalline molybdenum carbide, Mo3C2. KW - Molybdenum carbide KW - RF ICP discharge KW - Reduction of MoF6 KW - Thermodynamic KW - Molybdenum PY - 2020 DO - https://doi.org/10.1007/s11090-020-10138-3 SN - 0272-4324 VL - 41 IS - 2 SP - 673 EP - 690 PB - Springer AN - OPUS4-51569 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Gornushkin, Igor B. A1 - Sennikov, P. A1 - Kornev, R. A1 - Ermakov, A. A1 - Shkrunin, V. A1 - Polyakov, V. T1 - Laser induced dielectric breakdown for synthesis of chlorofluorosilanes JF - Journal of Fluorine Chemistry N2 - Tetrafluorosilane (SF4) and tetrachlorosilane (SiCl4) plasmas have been widely used as a source of either F or Cl for etching silicon or as a source of silicon for deposition of Si-based materials. Using different combinations of F and Cl in molecules of chlorofluorosilane SiFxCly adds additional flexibility in realization of these processes. Direct synthesis of SiFxCl4-x (x=1, 2, 3) from SiF4 and SiCl4 is thermodynamically forbidden under standard conditions. This restriction is removed in low-temperature plasmas studied in this work: a laser induced dielectric breakdown (LIDB) plasma and steady-state inductively-coupled plasma (ICP). The plasmas differ in many respects including energy content, temperature, and electron density that lead to different ionization/excitation states of plasma species, which are observed from plasma optical emission spectra. IR spectroscopy and mass-spectrometry confirm the formation of three chlorofluorosilanes, SiF3Cl, SiF2Cl2, and SiFCl3 that constitute ~60% in products of LIDB plasma and split 50/50 between SiF3Cl, SiFCl3 and SiF2Cl2. Experimental observations are verified by equilibrium static calculations via the minimization of Gibbs free energy and by dynamic calculations via the chemical-hydrodynamic plasma model of a spherically expanding plasma plume. The both types of calculations qualitatively agree with the results of spectroscopic analysis and reproduce dominant presence of SiF2Cl2 as the temperature of the gas approaches the room temperature. KW - Chemical-hydrodynamic modeling KW - Chlorofluorosilanes KW - Laser induced dielectric breakdown KW - Inductively coupled plasma KW - Equilibrium chemical modeling PY - 2020 DO - https://doi.org/10.1016/j.jfluchem.2020.109692 VL - 241 SP - 109692 PB - Elsevier B.V. AN - OPUS4-51646 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -