TY - JOUR A1 - Sachse, René A1 - Hodoroaba, Vasile-Dan A1 - Hertwig, Andreas A1 - Kotil, L. A1 - Kraehnert, R. T1 - Analysis of elemental composition and porosity of mesoporous iridium titanium mixed oxide thin films for energy application by SEM/EDS N2 - Porous materials play an important role in several fields of technology, especially for energy applications like photovoltaics, electrolysis or batteries. The activity of porous films is affected by properties like porosity, film thickness, chemical composition of the material as well as the crystallinity of the framework. The complex morphology of such porous films constitutes a challenge even for modern analytical techniques and requires new approaches employing the combination/complementation of data of different analytical methods. In this contribution we characterize thin mesoporous iridium-titanium mixed oxide film properties by Electron Probe Microanalysis (EPMA) with energy dispersive X-ray spectroscopy (EDS) at an SEM. KW - Electron probe microanalysis (EPMA) KW - Iridium-titanium mixed oxides KW - Spectroscopic ellipsometry KW - Mesoporous thin films KW - NanoSIMS PY - 2019 U6 - https://doi.org/10.1017/S1431927619009589 SN - 1431-9276 (Print) SN - 1435-8115 (Online) VL - 25 IS - S2 (August) SP - 1770 EP - 1771 PB - Cambridge University Press CY - New York, NY, U.S.A. AN - OPUS4-48768 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Hodoroaba, Vasile-Dan A1 - Kim, K. J. T1 - Measurement of Elemental Composition of FeNi and SiGe Thin Films by Electron Probe Microanalysis with Stratagem Software N2 - The present study repeats electron probe microanalysis (EPMA) measurements with the thin film analysis software Stratagem on an Fe-Ni thin films on silicon and reports - for the first-time – results of analysis on Si-Ge thin films deposited on a non-conductive aluminium oxide substrate. If the very good EPMA/Stratagem results for the FeNi system were expected due to previous studies [2], the data obtained for the SiGe films are particularly valuable, because of the challenging insulator substrate of Al2O3. The conductivity of the Si1-xGex surface necessary for charging-free analysis was ensured by applying conductive copper tape onto film surface down to sample stage. Four accelerating voltages, 15, 20, 25 and 30 kV, have been applied, so that the Ge Kα X-ray line at 9.87 keV could be excited. KW - thin film analysis KW - X-ray spectroscopy KW - Fe-Ni KW - Si-Ge KW - Stratagem KW - Electron probe microanalysis (EPMA) PY - 2018 UR - https://www.cambridge.org/core/journals/microscopy-and-microanalysis/article/measurement-of-elemental-composition-of-feni-and-sige-thin-films-by-electron-probe-microanalysis-with-stratagem-software/D4CF5D45B11FCF0DEC8155A89EDACF25 U6 - https://doi.org/10.1017/S1431927618004282 VL - 24 IS - S1 (August) SP - 758 EP - 759 PB - Cambridge University Press CY - New York, NY, U.S.A. AN - OPUS4-45950 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Sachse, René A1 - Hertwig, Andreas A1 - Kraehnert, R. A1 - Hodoroaba, Vasile-Dan T1 - Analysis of mesoporous iridium oxide thin films by the combined methodical approach SEM/EDS/STRATAGem N2 - For the determination of porosity of Ir oxide thin films, electron probe microanalysis (EPMA) can be used as part of a combined SEM/EDS/STRATAGem analysis. The mass deposition (in μg cm-2) of films was calculated with the analysis software STRATAGem via k-values measured with EDS. The average density of coated films was obtained from the mass deposition and the film thickness as measured by the cross-section SEM. The porosity was calculated by dividing the average film density by the bulk (theoretical) density of the film material. Film porosities were counterchecked by spectroscopic ellipsometry (SE) using the Bruggeman effective medium approximation (BEMA). The results obtained by both analytical approaches/methods used, SEM/EDS/STRATAGem and SE were in good agreement. KW - Porous thin films KW - Iridium oxide KW - Electron probe microanalysis (EPMA) KW - Spectroscopic ellipsometry PY - 2018 UR - https://www.cambridge.org/core/journals/microscopy-and-microanalysis/article/analysis-of-mesoporous-iridium-oxide-thin-films-by-the-combined-methodical-approach-semedsstratagem/7607018338B542D8B8C4D944392781EF U6 - https://doi.org/10.1017/S1431927618004300 SN - 1431-9276 SN - 1435-8115 VL - 24 IS - S1 (August) SP - 762 EP - 763 PB - Cambridge University Press CY - New York, NY, U.S.A. AN - OPUS4-45951 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -