TY - JOUR A1 - Kruse, A. A1 - Hennecke, Manfred A1 - Baalmann, A. A1 - Schlett, V. A1 - Stuke, H. T1 - Bindungsstruktur in plasmapolymerisierten Schichten aus Vinyltrimethylsilan JF - Berichte der Bunsen-Gesellschaft N2 - Plasma polymer films of vinyltrimethylsilane (VTMS) were deposited by radiofrequency (RF. 13.56 MHz) or Microwave (MW, 2.45 GHz) discharges in two reactors of the same volume and geometry. — The polymer films were characterized by electron spectroscopy for chemical analysis (ESCA) and infrared spectroscopy (FTIR). It turned out, that the RF — and the MW — polymers had almost the same Si/C-composition ratio of 1/5 in the entire range of RF-and MW-power (60-150 W). Although the Si/C film-composition remains almost constant, the binding states of Si-and C-atoms in the respective ESCA-spectra are changing. While the CSi part of the C1s-peak increases with the RF-or MW-power, the C-H/C-C part of the peak decreases, indicating a loss of hydrogen in the polymer films. — Obviously the fragmentation of the VTMS-monomer is quite different for the two types of plasma discharges. While films of the RF-plasma clearly show strong contributions of the methyl and vinyl groups, these groups are completely missing for the MW-plasma polymers. — From these results structure models of the plasma polymers have been developed. KW - PECVD KW - Polymers KW - Spectroscopy PY - 1991 DO - https://doi.org/10.1002/bbpc.19910951111 SN - 0005-9021 VL - 95 IS - 11 SP - 1376 EP - 1380 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-23185 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -