TY - CONF A1 - Unger, Wolfgang T1 - Characterization of carbon materials and plasma deposited organic films by NEXAFS spectroscopy (and complementary methods of surface analysis) T2 - CRG Evaluation of the BM Beamline HE-SGM, BESSY, Lecture Hall T2 - CRG Evaluation of the BM Beamline HE-SGM, BESSY, Lecture Hall CY - Berlin, Germany DA - 2007-03-20 PY - 2007 AN - OPUS4-14648 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Unger, Wolfgang T1 - CCQM surface analysis working group (SAWG): introduction for WG meeting 2006 & summary 2006 and next steps T2 - CCQM Surface Analysis Working Group Meeting 2006 T2 - CCQM Surface Analysis Working Group Meeting 2006 CY - Sèvres, France DA - 2006-04-05 PY - 2006 AN - OPUS4-12289 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Unger, Wolfgang A1 - Oran, Umut A1 - Swaraj, Sufal A1 - Lippitz, Andreas T1 - Ageing studies of plasma deposited organic films by surface chemical analysis (ESCA, ToF-SIMS, XAS) T2 - International Conference on Processing & Manufacturing of Advanced Materials T2 - International Conference on Processing & Manufacturing of Advanced Materials CY - Vancouver, Canada DA - 2006-07-04 PY - 2006 AN - OPUS4-12251 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Unger, Wolfgang T1 - Advanced surface chemical analysis of plasma modified polymers and plasma-polymers N2 - A comprehensive characterization of plasma modified polymer surfaces or plasma-polymerized thin films needs access to parameters as - concentration of saturated/unsaturated carbon species (e.g. aromaticity) or other double bonds as C=N or C=O, - branching, and - losses of crystallinty or other degrees of structural order. Furthermore the complex ageing phenomena of plasma modified polymers/plasma-polymers and the measurement of an in-depth distribution of chemical species are challenges for the analyst. The talk will display selected examples where such challenges have been met by using advanced methods of surface chemical analyses as Photoelectron Spectroscopy with variable excitation energy (“SyncXPS”), X-ray Absorption Spectroscopy (NEXAFS) at C, N and O K-edges and Time-of-Flight Secondary Mass Spectroscopy (ToF-SIMS) combined with Principal Component analysis (PCA). T2 - IAP workshop – IAP 2016 "Organic surface modifications by plasmas and plasma-polymers" CY - Nancy, France DA - 08.06.2016 KW - XPS KW - NEXAFS KW - SIMS KW - Plasmapolymer PY - 2016 AN - OPUS4-36725 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Unger, Wolfgang T1 - Acquiring and Documenting Reproducible Spectra, Depth Profiles and Images: XPS, AES and SIMS N2 - In this talk sample prep/handling, instrument calibration and data acquisition methods with examples from XPS, Auger and SIMS will be addressed in terms of their contributions to the reproducibility of data delivered by the methods. Active parties in the field are VAMAS TWA 2 “Surface chemical analysis” (http://www.vamas.org/twa2/index.html), ISO/TC 201 “Surface chemical analysis” (https://www.iso.org/committee/54618.html) and the Surface Analysis Working Group (SAWG) at the International Meter Convention (https://www.bipm.org/en/ committees/cc/wg/sawg.html). The tools to improve the reproducibility of spectra, depth profiles and images at these international platforms are inter-laboratory comparisons, validated SOPs, standards and certified reference materials (CRM) as well as uncertainty budgets and establishment of traceability chains. The last point is of specific importance because all the methods, XPS, Auger and SIMS, are not primary methods. To address quantitative XPS, AES and SIMS results of relevant inter-laboratory comparisons organized by SAWG considering measurands as alloy surface composition and thickness of thin films will be introduced. These comparisons delivered results which are viewed to be benchmarking, some of them resulted in ISO/TC 201 standards. For quantitative XPS and AES the principal outline of an uncertainty budget will be discussed together with the audience. Another issue of quantitative XPS which definitely needs consideration are valid methods for a determination of the transmission function of the instruments and even for the emission angle in the respective experiments. Concerning the field of depth profiling it has to be investigated together with the audience whether the ISO (or ASTM) standards we have are sufficient to guarantee comparable results. Having in mind the number of different sputter ion species available today and range of samples of interest (metals, semiconductors, organic films) this might be questionable. And, how do depth profiling by AR-XPS and variable excitation energy XPS compete here? For imaging surface chemical analysis, the characterization of the imaging system is an issue to be investigated. Here the determination of lateral resolution is a relevant topic. Finally, the future needs to develop metrology for new applications e.g., ambient-pressure XPS, bio samples, and core-shell nanoparticles, will be issues raised for a discussion with the audience. T2 - 17th Topical Conference on Quantitative Surface Analysis (QSA 17) CY - Long Beach, CA, USA DA - 21.10.2018 KW - Depth Profiles and Images KW - X-ray Photoelectron Spectroscopy (XPS) KW - Auger Electron Spectroscopy (AES) KW - SIMS KW - Reproducible Spectra PY - 2018 AN - OPUS4-46470 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Unger, Wolfgang T1 - 2-D materials standardization N2 - The implementation of new 2-D materials based technologies in production processes requires the development of quality management tools. These have to be underpinned by appropriate measurements. Consequently there is a need for the development of the metrology for measurement methods, the development of certified reference materials (CRM) and finally standardization. This chain represents the ideal way to practically useful standards. The presentation will give an overview on the main players in the field and summarize the recent status of activities. At the highest level the metrology of chemical characterization of 2D materials is in the scope of the International Meter Convention, specifically the Consultative Committee for Amount of Substance: Metrology in Chemistry and Biology (CCQM). Pre-standardization is an activity field of the Versailles Project on Advanced Materials and Standards (VAMAS). Standardization is mainly addressed by addressed ISO Technical Committees. A summary on available CRMs relevant to the characterization of nano materials has been prepared by BAM. Examples from the work of BAM’s Division 6.1 “Surface Analysis and Interfacial Chemistry” showcasing the characterization of chemically modified graphene surfaces are given and specific needs for the development of metrology are addressed. In the discussion the audience is invited to define specific needs which will be streamlined to the respective bodies! T2 - Science-Industry-Workshop 2D Materials CY - EMPA Akademie, Dübendorf, Switzerland DA - 21.3.16 KW - Standardization KW - Graphene PY - 2016 AN - OPUS4-35866 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Unger, Wolfgang T1 - 1. Metrological Directions in Surface and Micro/Nano Analysis in BAM 2. OH group density at polymer surfaces T2 - CCQM Surface Analysis Working Group Meeting for 2004 T2 - CCQM Surface Analysis Working Group Meeting for 2004 CY - Sèvres, France DA - 2004-04-20 PY - 2004 AN - OPUS4-4608 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Unger, Wolfgang A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas T1 - (Pulsed) R. F. Plasma-polymerized Films Prepared From Small Organic Monomers: Chemical Characterization by XAS, XPS and ToF-SIMS T2 - Seminar: Dept. of Engineering Physics, Ecole Polytechnique T2 - Seminar: Dept. of Engineering Physics, Ecole Polytechnique CY - Montreal, Canada DA - 2005-08-15 PY - 2005 AN - OPUS4-10821 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -