TY - CONF A1 - Hodoroaba, Vasile-Dan T1 - Complementary methodical approach for the analysis of a perovskite solar cell layered system N2 - Loss in efficiency of perovskite solar cells may be caused by structural and/or chemical alterations of the complex layered system. As these changes might take place either in the bulk and/or on the surface of the stratified material, analytical tools addressing both key issues are selected and combined. SEM/EDX combined with XPS were chosen as appropriate methodical approach to characterise perovskite laboratory cells in depth and complementary on top, before and after light exposure. The layered perovskite system investigated here is based on glass covered with fluorine doped tin oxide (FTO), followed by three porous thin films of TiO2, ZrO2 and a thick monolithic carbon. The TiO2 film is subdivided into a dense layer covered by a porous one constituted of nanoparticles with a truncated bipyramidal shape. This layered system serves as the matrix for the perovskite. After infiltration of perovskite solution and annealing, EDX spectral maps on cross-sections of the specimen have been measured. The distribution of relevant elements – Si, Sn, Ti, Zr and C – correlates conclusively with layers visible in the acquired SEM images. Lead and iodine are distributed throughout the porous layers C, ZrO2 and TiO2. In a SEM micrograph taken of the cross-section of a sample after illumination, the glass substrate and all layers FTO, TiO2, ZrO2 as well as C are clearly identified. By EDX it was found that several weeks of ambient daylight did not change significantly the qualitative elemental composition of lead and iodine throughout the solar cell system. It was confirmed with EDX that nanoparticles identified in high-resolution SEM micrographs contain mainly Pb and I, indicating these to be the perovskite crystals. However, a time-dependent compositional and chemical altering was observed with XPS for the near-surface region of the outermost ~10 nm after two months of illumination. T2 - Microscopy & Microanalysis 2017 Meeting CY - St. Louis, MO, USA DA - 06.08.2017 KW - Thin films KW - EDX KW - XPS KW - SEM KW - Nanoparticles KW - Perovskite KW - TiO2 PY - 2017 AN - OPUS4-41664 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Rosu, Dana-Maria T1 - The accuracy and reproducibility in thickness determination of thin films using SE N2 - Maintaining a consistent product quality is critical for the thin film industry. Therefore, the development of highly accurate protocols able to detect variations and nonidealities in manufactured thin film devices is essential and helps improve production quality and decrease manufacturing costs. The present work will discuss the accuracy and reproducibility in the determination of the thickness of thin films relevant for optoelectronic industry using spectroscopic ellipsometry, starting with the importance of set-up calibration, the need for very well defined calibration standards suitable for real devices and not least, the importance of accurate data analysis. As ellipsometry is an indirect method and theoretical modelling is needed to obtain the desired information regarding the investigated samples (e.g. thickness, roughness, optical constants), the model uncertainty has to be discussed and taken into account. If for ideal samples consisting of single layers with well-known optical constants the determination of thickness and roughness is straight forward and pretty accurate, for real samples, more complex theoretical models are needed and extracting accurate information regarding the samples can be very challenging. With careful calibration and a multidisciplinary approach, a combined measurement methodology can be developed enabling reliability, comparability, and accuracy. For production-relevant operation, maintaining the ease of use and scalability of ellipsometry as a technique can also be retained. T2 - EOSAM (European Optical Society Annual Meeting) CY - Berlin, Germany DA - 26.09.2016 KW - Spectroscopic ellipsometry KW - Thin films KW - Film thickness determination KW - Uncertainty PY - 2016 AN - OPUS4-38109 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Derrien, Thibault J.-Y. T1 - Multi-wavelength, multi-material prediction tools for the LIPSS community N2 - This talk presents multi-wavelength, multi-material prediction tools serving as useful models for researchers working in the field of laser-induced periodic surface structures (LIPSS). These models explain the role of surface plasmon polaritons (SPPs) in the formation of LIPSS. They particularly consider the cases of (i) “lossy” materials (where the imaginary part of the dielectric permittivity should not be neglected) and (ii) the excitation of SPPs in a thin film configuration (where two film interfaces become plasmonically active and couple to each other). T2 - 6th International LIPSS Workshop CY - Heraklion (Crete), Greece DA - 24.11.2016 KW - Surface plasmon polaritons KW - Laser-induced periodic surface structures (LIPSS) KW - Lossy materials KW - Thin films PY - 2016 AN - OPUS4-38512 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Stockmann, Jörg M. A1 - Hertwig, Andreas A1 - Beck, Uwe T1 - Visualization of low-contrast surface modifications: Thin films, printed pattern, laser-induced changes, imperfections, impurities, and degradation N2 - Visualization of surface modifications may be very challenging for coating/substrate systems of either almost identical optical constants, e.g. transparent films on substrates of the same material, or minor film thickness, substance quantity and affected area, e.g. ultra-thin or island films. Methods for visualization are optical microscopy (OM), imaging ellipsometry (IE), and referenced spectroscopic ellipsometry (RSE). Imaging ellipsometry operates at oblique incidence near Brewster angle of the bare, clean or unmodified substrate. In this configuration, reflected intensities are rather weak. However, the contrast to add-on and sub-off features may be superior. Referenced spectroscopic ellipsometry operates in a two-sample configuration but with much higher intensities. In many cases, both ellipsometric techniques reveal and visualize thin films, printed-pattern, laser-induced changes, and impurities better than optical microscopy. In particular for stratified homogeneous modifications, ellipsometric techniques give access to modelling and hence thickness determination. Modifications under investigation are polymer foil residue on silicon, laser-induced changes of ta-C:H coatings on 100Cr6 steel, imperfections of ta-C:H on thermal silicon oxide, degradation of glass, thin film tin oxide pattern on silicon, printed and dried pattern of liquids such as deionized water, cleaning agents, and dissolved silicone. © 2016 Elsevier B.V. All rights reserved. T2 - International Conference on Spectroscopic Ellipsometry (ICSE-7) CY - Berlin, Germany DA - 06.06.2016 KW - Optical microscopy (OM) KW - Imaging ellipsometry (IE) KW - Referenced spectroscopic ellipsometry (RSE) KW - Thin films KW - Impurities KW - Degradation PY - 2016 DO - https://doi.org/10.1016/j.apsusc.2016.10.145 SN - 0196-4332 VL - 2017 IS - 421 SP - 807 EP - 812 PB - Elsevier B.V. AN - OPUS4-42136 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Stockmann, Jörg M. T1 - Visualization of low-contrast surface modifications: thin films, printed pattern, laser-induced changes, imperfections, impurities, and degradation N2 - Industrial quality control (QC) nowadays requires the visualization of surface modifications from the macro-scopic to the microscopic or even nanoscopic scale. This is a prerequisite to the evaluation of functionality and reliability, the detection of defects and their separation of artefacts. The diversity of applications ranges from low-E glazings and solar panels, micro- and optoelectronics, micro- and smart devices to sensor-on-chip and lab-on-chip systems [1]. Optical microcopy (light, confocal laser scanning, white light interference) as established QC-tool is operated at normal incidence, i.e. p- and s-polarization are undistinguishable. Either light-intensity in terms of grey scale and colour or intensity-correlated effects of phase shifts are used. In case of ellipsometry, operated at oblique incidence, p- and s-polarization matter, and amplitude ratios and phase shifts upon reflection are measured. Hence, information content must be much higher. The visualization of surface modifications may be very challenging for coating/substrate systems of either al-most identical optical constants, e.g. transparent films on substrates of the same material, or minor film thick-ness, substance quantity and affected area, e.g. ultra-thin or island films. Ellipsometry gives access to the con-trast of intensity (I), amplitude ratio (Ψ), and phase shift (Δ) with nanometer-scaled vertical and micrometer-scaled lateral sensitivity, one is able to identify tiny changes within an unmodified surface. As both mapping ellipsometry (ME) and imaging ellipsometry (IE) are operated in the optical far-field, surface inspection is also possible on the macroscopic scale. Near the Brewster-angle of the bare, undamaged, clean, and fresh substrate, the contrast to add-on and sub-off features is superior. Fig. 1 shows three examples of ellipsometric imaging, i.e. a thin SnO:Ni film on SiO2/Si (Fig. 1a), a dried stain of an anti-body solution on cyclo-olefin-polymer (COP) shown in Fig. 1b, and a polyimide film residue on SiO2/Si (Fig. 1c). For all of these examples, ellipsometry provides much better contrast between substrate and surface modification than optical microscopy, sometimes primarily caused by the oblique incidence (Figs. 1a and 1c), in other cases related to the phase sensitivity of ellipsometry (Fig. 1b). Other examples are laser surface modifications and the corrosion of glass. In these cases, optical microscopy and IE yield to similar results, how-ever only ellipsometry gives access to modelling. Further investigated coating/substrate systems are 100Cr6 steel, native oxide on silicon, borosilicate glass, and the polymer polycarbonate with deposited films of graphene and ta-C:H, printed and dried pattern of liquids such as water, cleaning agents, and dissolved silicone. Besides imaging ellipsometry, referenced spectral ellipsometry (RSE) has been applied, combining the advantages of both optical microscopy (fast measurement) and ellipsometry (high sensitivity to tiny modifications). T2 - International Conference on Spectroscopic Ellipsometry (ICSE-7) CY - Berlin, Germany DA - 06.06.2016 KW - Ellipsometry KW - Thin films KW - Impurities KW - Degradation PY - 2016 AN - OPUS4-37068 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Rades, Steffi T1 - Analysis of functionalization of TiO2 nanoparticles and various substrates by means of SEM-EDX, AES and ToF-SIMS N2 - The physico-chemical characteristics of TiO2 coatings can greatly influence their final performance. In SETNanoMetro, different deposition procedures are being set for applying films of TiO2 NPs with defined and homogenous thickness on supports of interest for the applications studied in the project. The selected substrates are the following: (i) Silica glasses for photocatalytic measurements, (ii) Ti-alloys for orthopedic and/or dental prostheses, and for cell cultures, and (iii) Conductive glasses (e.g. Fluorine doped Tin Oxide, FTO) for dye-sensitized solar cells. From the different film deposition procedures studied within the project Self-assembly of TiO2 NPs in multiple layers was selected. For this, surface modification of the substrate and of TiO2 nanoparticles (NPs) with e.g. silane coupling agents is a prerequisite. First attempts to prepare the self-assembled coating on the functionalized glass substrates seem to indicate that the functionalized NPs adhere to the substrates, even if the final coatings were not homogenous and presented agglomerates. ToF-SIMS results support this outcome. In order to use the layer-by-layer deposition technique for the formation of TiO2 films by controlled self-assembly of the TiO2 NPs, the proper complementary moieties for the functionalization of the NPs were chosen. A first set of NPs has been produced by reaction with (3-aminopropyl)phosphonic acid (APPA) in order to functionalize the surface with free amino-groups. Then, the complementary NP set can be obtained from an aliquot of the first one, through the conversion of free surface amino-groups to aldehydes by reaction with glutaraldehyde. A proper approach for the functionalization of two types of TiO2, commercial P25 (Evonik) and SETNanoMetro-sample labelled UT001, with APPA was developed. A second set of NPs consisting of three types of TiO2 NPs, P25 and SETNanoMetro NPs (TiO2 NPs with high specific surface area > 150 m2/g and TiO2 NPs with low size < 20 nm) was functionalized with (3-aminopropyl)triethoxysilane (APTS). As for the previous set of NPs, the complementary NP set was obtained through the conversion of free surface amino-groups to aldehydes by reaction with glutaraldehyde. EDX, AES and ToF-SIMS spectra were collected and analyzed to demonstrate the presence of the surface functionalization of the different types of TiO2 NPs. T2 - Nanoscience meets Metrology - Synthesis, Characterization, Testing and Applications of Validated Nanoparticles - International Summer School CY - Turin, Italy DA - 04.09.2016 KW - Time-of-flight secondary-ion mass spectrometry KW - X-ray spectroscopy KW - Auger electron spectroscopy KW - Electron microscopy KW - Nanoparticles KW - Thin films PY - 2016 UR - http://www.setnanometro.eu/events/ AN - OPUS4-38064 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Hodoroaba, Vasile-Dan T1 - Nanoparticles and films characterization: Electron microscopy and related techniques N2 - Scanning Electron Microscopy (SEM) represents the mostly widespread method available in analytical laboratories dedicated to the characterization of physical properties such as morphology of various solid materials from ‘micro-’ down to the nanometre scale. The use of secondary electrons excited by a sharply, nm-focussed primary electron beam enables at any modern SEM to image objects with high in-depth and lateral sensitivity, i.e. with high spatial resolution. Hence, e. g. nanoparticles (NPs) are able to be easily characterized with respect to their individual size and shape, but also to the morphology of their surface. By preparing the nano-objects on thin membranes as electron transparent samples it is possible to perform electron microscopy in the transmission mode (TEM and TSEM). The corresponding transmission (i.e. mass-thickness) contrast reveals in-depth information, but is also well suited for dimensional measurements in the 2D projection image. Both the surface sensitive mode and the transmission one are meanwhile available at any modern SEM. If an X-ray spectrometer is attached to an electron microscope, it is possible to analyse the characteristic X-rays induced by electron bombardment. Most electron microscopes have attached an energy dispersive X-ray spectrometer (EDX) so that EDX elemental maps can be carried out. Recent technological developments of high throughput EDS detectors and their advantages regarding high-resolution X-ray analysis down to the nm range are reviewed. High-resolution micrographs (SEM, TSEM, TEM) and corresponding X-ray elemental maps on various representative nanoparticles, but also layered samples prepared in cross-section, will be presented and discussed. The importance of selecting the best suited analysis conditions will be highlighted. Also other, often challenging, topics such as sample preparation and image data processing will be critically addressed by practical examples. Further analytical techniques able to be employed at an electron microscope, like cathodoluminescence (CL) or micro-X-ray fluorescence (µXRF) will be briefly surveyed. T2 - Nanoscience Meets Metrology - Synthesis, Characterization, Testing and Applications of Validated Nanoparticles - International Summer School CY - Turin, Italy DA - 04.09.2016 KW - Nanoparticles KW - Electron microscopy KW - High-resolution KW - Thin films KW - X-ray spectroscopy PY - 2016 UR - http://www.setnanometro.eu/events/ AN - OPUS4-37325 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Schade, U. A1 - Ritter, E. A1 - Bawagan, A.D.O. A1 - Beckmann, Jörg A1 - Aziz, E. F. T1 - Far-infrared absorption measurements on thin polymer films N2 - Interference fringes in the far-infrared spectra of thin films are the result of the coherent adding up of waves and can influence the spectral interpretation by concealing smaller features. A number of methods have been developed in order to eliminate such oscillating features from the transmittance spectrum. The paper critically evaluates the total transmission-reflection technique and applies the method to quantify the spectra of different polymer films. T2 - IRMMW-THz 2014 - 39th International conference on infrared, millimeter, and terahertz waves CY - Tucson, Arizona, USA DA - 14.09.2014 KW - Far-infrared spectra KW - Thin films KW - Total transmission reflection technique KW - Infrared spectroscopy KW - Light absorption KW - Light reflection KW - Polymer films KW - Far-infrared absorption measurements KW - Thin polymer films KW - Interference fringes KW - Spectral interpretation KW - Transmittance spectrum KW - Oscillating features KW - Total transmission-reflection technique KW - Interference KW - Absorption KW - Finite impulse response filters KW - Optical films KW - Optical reflection PY - 2014 UR - http://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=6956145&isnumber=6955975 SN - 978-1-4799-3877-3 DO - https://doi.org/10.1109/IRMMW-THz.2014.6956145 IS - IEEE Catalog No.: CFP14IMM-ART SP - 1 EP - 2 AN - OPUS4-32700 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Schott, M. A1 - Szczerba, Wojciech A1 - Kurth, D.G. T1 - Detailed study of layer-by-layer self-assembled and dip-coated electrochromic thin films based on metallo-supramolecular polymers N2 - Electrochromic thin films of metallo-supramolecular polyelectrolytes based on Fe(OAc)2 and 1,4-bis(2,2':6',2''-terpyridin-4'-yl)benzene are readily prepared by layer-by-layer (LbL) deposition or dip-coating on transparent conducting electrode surfaces. By applying a potential, we can switch the color of the films from blue to colorless. Because of the strong absorption and the fast switching speed, the color change can be observed with the eye. The devices show reversible switching and cycle stability. KW - Layer-by-layer self assembly KW - Dip coating KW - Thin films KW - Metallo-supramolecular polyelectrolytes KW - Electrochromism PY - 2014 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-317347 DO - https://doi.org/10.1021/la501590a SN - 0743-7463 SN - 1520-5827 VL - 30 IS - 35 SP - 10721 EP - 10727 PB - American Chemical Society CY - Washington, DC AN - OPUS4-31734 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Fahmy, A. A1 - Friedrich, Jörg Florian T1 - Degradation behavior of thin polystyrene films on exposure to Ar plasma and its emitted radiation N2 - Spin-coated films of amorphous polystyrene (PS) were exposed to argon plasma for a few seconds to several minutes. The PS film was either in direct contact with the plasma or was shielded from the direct plasma contact by filters with different cutoff wavelengths in the vacuum UV region or by a Faraday cage (FC) made from metal mesh to prevent the impinging of charged species. Only energy-rich neutrals and plasma radiation may be operative in presence of the FC. lithium fluoride (LiF) filter protects the sample from direct contact with the plasma. Wavelengths of plasma radiation shorter than c. 105 nm (≈ 11.8 eV) were cut off. Glass filters made of fused SiO2 have a cutoff at λ ≈175?nm completely the vacuum UV radiation of plasma (ca. 175 nm ≈ 7.0 eV). These energies are sufficient to produce C–C, C–H bond scissions in case of direct Ar plasma exposure and Ar plasma exposure with use of the LiF filter. Only quartz glass shielding did not produce significant effects on the polymer surface in comparison to the reference PS, either in surface energy or O/C ratio or in IR spectra. Oxygen plasma has worked most aggressive and had etched the PS film, thus establishing a steady state between introduction of new oxygen functionalities and polymer etching. Ar plasma exposure produces also oxidation and etching of the polymer films as the oxygen plasma. Using of a FC during Ar plasma exposure or the LiF filter a slightly weaker oxidation was observed. KW - Polystyrene KW - Plasma treatment KW - Plasma emitted radiation KW - Degradation KW - Thin films PY - 2013 DO - https://doi.org/10.1080/01694243.2012.705528 SN - 0169-4243 SN - 1568-5616 VL - 27 IS - 3 SP - 324 EP - 338 PB - VNU Science Press CY - Utrecht AN - OPUS4-26315 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Hertwig, Andreas A1 - De Castro, F.A. T1 - Newsletter - Metrology for the manufacturing of thin films KW - Metrology KW - Thin films KW - Optoelectronics KW - Photovoltaics KW - Coatings technology KW - Traceability PY - 2012 UR - http://projects.npl.co.uk/optoelectronic_films/documents/EMRP%20ThinFilms_Newsletter%20Feb%202012.pdf IS - February SP - 1 EP - 4 AN - OPUS4-25505 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Hodoroaba, Vasile-Dan A1 - Kim, K.J. A1 - Unger, Wolfgang T1 - Energy dispersive electron probe microanalysis (ED-EPMA) of elemental composition and thickness of Fe-Ni alloy films N2 - The elemental composition of thin Fe-Ni alloy films deposited on silicon substrates were determined by electron probe microanalysis with an energy dispersive spectrometer using the STRATAGem software. The work was part of ample inter-laboratory comparisons organized in the frame of CCQM/SAWG (Consultative Committee for Amount of Substance/Surface Analysis Working Group). Therefore, the evaluation of the measurement uncertainties is treated in detail. By having the mass coverage and estimating a layer density, the layer thickness could be derived. KW - Thin films KW - Fe-Ni KW - Energy dispersive electron probe microanalysis (ED-EPMA) KW - STRATAGem KW - k-values KW - Mass coverage KW - Elemental composition KW - Thickness KW - CCQM PY - 2012 DO - https://doi.org/10.1002/sia.4975 SN - 0142-2421 SN - 1096-9918 VL - 44 IS - 11-12 SP - 1459 EP - 1461 PB - Wiley CY - Chichester AN - OPUS4-27139 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Abou-Ras, D. A1 - Caballero, R. A1 - Fischer, C.-H. A1 - Kaufmann, C.A. A1 - Lauermann, I. A1 - Mainz, R. A1 - Mönig, H. A1 - Schöpke, A. A1 - Stephan, C. A1 - Streeck, C. A1 - Schorr, S. A1 - Eicke, A. A1 - Döbeli, M. A1 - Gade, B. A1 - Hinrichs, J. A1 - Nunney, T. A1 - Dijkstra, H. A1 - Hoffmann, V. A1 - Klemm, D. A1 - Efimova, V. A1 - Bergmaier, A. A1 - Dollinger, G. A1 - Wirth, Thomas A1 - Unger, Wolfgang A1 - Rockett, A.A. A1 - Perez-Rodriguez, A. A1 - Alvarez-Garcia, J. A1 - Izquierdo-Roca, V. A1 - Schmid, T. A1 - Choi, P.-P. A1 - Müller, M. A1 - Bertram, F. A1 - Christen, J. A1 - Khatri, H. A1 - Collins, R.W. A1 - Marsillac, S. A1 - Kötschau, I. T1 - Comprehensive comparison of various techniques for the analysis of elemental distributions in thin films N2 - The present work shows results on elemental distribution analyses in Cu(In,Ga)Se2 thin films for solar cells performed by use of wavelength-dispersive and energy-dispersive X-ray spectrometry (EDX) in a scanning electron microscope, EDX in a transmission electron microscope, X-ray photoelectron, angle-dependent soft X-ray emission, secondary ion-mass (SIMS), time-of-flight SIMS, sputtered neutral mass, glow-discharge optical emission and glow-discharge mass, Auger electron, and Rutherford backscattering spectrometry, by use of scanning Auger electron microscopy, Raman depth profiling, and Raman mapping, as well as by use of elastic recoil detection analysis, grazing-incidence X-ray and electron backscatter diffraction, and grazing-incidence X-ray fluorescence analysis. The Cu(In,Ga)Se2 thin films used for the present comparison were produced during the same identical deposition run and exhibit thicknesses of about 2 µm. The analysis techniques were compared with respect to their spatial and depth resolutions, measuring speeds, availabilities, and detection limits. KW - Elemental distributions KW - Comparison KW - Depth profiling KW - Chemical mapping KW - Thin films KW - Solar cells KW - Chalcopyrite-type KW - Cu(In,Ga)Se2 PY - 2011 DO - https://doi.org/10.1017/S1431927611000523 SN - 1431-9276 SN - 1435-8115 VL - 17 IS - 5 SP - 728 EP - 751 PB - Cambridge University Press CY - New York, NY AN - OPUS4-24506 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Rybachuk, Maksym A1 - Hertwig, Andreas A1 - Weise, Matthias A1 - Sahre, Mario A1 - Männ, Marion A1 - Beck, Uwe A1 - Bell, J. M. T1 - Near infrared optical materials from polymeric amorphous carbon synthesized by collisional plasma process N2 - The synthesis of polymerlike amorphous carbon (a-C:H) thin-films by microwave excited collisional hydrocarbon plasma process is reported. Stable and highly aromatic a-C:H were obtained containing significant inclusions of poly(p-phenylene vinylene) (PPV). PPV confers universal optoelectronic properties to the synthesized material. That is a-C:H with tailor-made refractive index are capable of becoming absorption-free in visible (red)-near infrared wavelength range. Production of large aromatic hydrocarbon including phenyl clusters and/or particles is attributed to enhanced coagulation of elemental plasma species under collisional plasma conditions. Detailed structural and morphological changes that occur in a-C:H during the plasma synthesis are also described. KW - Kohlenstoffschichten KW - Plasmachemie KW - PA-CVD KW - Amorphous state KW - Carbon KW - Coagulation KW - Hydrogen KW - Optical materials KW - Plasma collision processes KW - Plasma deposition KW - Refractive index KW - Thin films PY - 2010 DO - https://doi.org/10.1063/1.3431292 SN - 0003-6951 SN - 1077-3118 VL - 96 IS - 21 SP - 211909-1 - 211909-3 PB - American Institute of Physics CY - Melville, NY AN - OPUS4-21365 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Silbernagl, Dorothee A1 - Cappella, Brunero T1 - Mechanical properties of thin polymer films on stiff substrates N2 - Force–displacement curves have been acquired with a commercial atomic force microscope on thin films of poly(n-butyl methacrylate) on glass substrates in order to examine the so-called 'mechanical double layer' topic, i.e. the influence of the substrate on the mechanical properties of the film in dependence of the film thickness. The hyperbolic fit, a novel semi-empirical equation introduced in previous articles, has been further corroborated. The interpretation of this equation has been deepened, yielding a quantitative and demonstrative characterization of the mechanical properties of double layers. Provided that the Young's moduli of bulk polymer and substrate are measured from the deformation curves, this mathematical model permits to fit the deformation–force curves on the double layers and to determine the thickness of the polymer films in wide range (0–200 nm). KW - Atomic force microscopy KW - Indentation KW - Rheology KW - Polymers KW - Thin films PY - 2010 DO - https://doi.org/10.1002/sca.20196 SN - 0161-0457 SN - 1932-8745 VL - 32 IS - 5 SP - 282 EP - 293 PB - Wiley CY - Hoboken, NJ AN - OPUS4-22681 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Labahn, Diana A1 - Mix, Renate A1 - Schönhals, Andreas T1 - Dielectric relaxation of ultrathin films of supported polysulfone N2 - The dynamic glass transition (α relaxation, structural relaxation) of ultrathin polysulfone films prepared between aluminum electrodes is investigated by dielectric relaxation spectroscopy. As a main result, it is found that the glass transition temperature Tg does not depend on the thickness of the polymeric layer down to a thickness of 10 nm. For thicknesses lower than 10 nm, an increase of Tg is observed. A more detailed analysis of the temperature dependence of the relaxation rates reveals that the Vogel temperature increases and the fragility decreases systematically with decreasing film thickness d. Further, the dielectric strength Δε decreases with decreasing d. This is discussed by the formation of a surface layer of adsorbed polysulfone segments having a reduced molecular mobility with regard to the time scale characteristic of the glassy dynamics of bulk polysulfone. Plotted versus inverse film thickness Δε decreases linearly with 1/d and becomes zero for an extrapolated length scale of 10 nm. From that it is concluded that the thickness of the adsorbed boundary layer is about 5 nm. Contact-angle measurements were carried out to confirm the strong interaction between aluminum and polysulfone. It is also shown that preparation details like annealing conditions strongly influence the glass transition of supported ultrathin films. KW - Adsorbed layers KW - Aluminium KW - Annealing KW - Contact angle KW - Dielectric relaxation KW - Electrodes KW - Glass transition KW - Polymer films KW - Thin films PY - 2009 DO - https://doi.org/10.1103/PhysRevE.79.011801 SN - 1539-3755 SN - 1063-651X VL - 79 IS - 1 SP - 011801-1 - 011801-9 PB - American Institute of Physics CY - Melville, NY AN - OPUS4-19050 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas A1 - Schulze, Rolf-Dieter A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang T1 - Surface Analysis of Plasma-Deposited Polymer Films, 4 - In situ Characterization of Plasma-Deposited Ethylene Films by XPS and NEXAFS N2 - XPS and NEXAFS spectroscopy were used for the chemical characterization of pulsed plasma-deposited ethylene films before and after exposure to ambient air. The influence of external plasma parameters on the spectroscopic results was investigated. Information on the chemical character of the plasma-polymerized films, such as the regularity of the primary structure, the amount of long-living radicals, and branching or cross-linking or both was derived from this data. Irregularity and radical concentration for post-plasma reactions of the plasma-deposited films increased with the duty cycle or power. A decreased level of monomer fragmentation and, consequently, an increase in regularity is partially concluded from the experimental data when the monomer pressure is increased. The concentration of surface radicals available for post-plasma reactions also increased with monomer pressure. The correlation found between the degree of the post-plasma oxygen incorporation and the variation of the various external parameters agreed with earlier ToF-SSIMS findings. KW - ESCA/XPS KW - NEXAFS KW - Plasma polymerization KW - Polyethylene (PE) KW - Thin films PY - 2005 DO - https://doi.org/10.1002/ppap.200400070 SN - 1612-8850 SN - 1612-8869 VL - 2 IS - 4 SP - 310 EP - 318 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-11940 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Hübert, Thomas A1 - Shimamura, Aki A1 - Klyszcz, Andreas T1 - Electrical Properties of Carbon Black and Ruthenium Dioxide Embedded Silica Films N2 - The electrical properties of sol–gel-derived films can be tailored by embedding conductive particles of ruthenium dioxide or carbon black in an insulating amorphous SiO2 silica matrix. The preparation process included an acid hydrolysis of tetraethoxysilane and methyltrimethoxysilane. Then alcohol solutions of ruthenium chloride or carbon black were added. Films of filler concentration up to 60 vol.% were prepared by dip coating and then dried and heat-treated at various temperatures up to 600_°C. The D.C. resistance of the films can be varied within the range of 109 to 10–2 OHgr sdot cm. A non-linear dependence on filler composition in the films was observed for both systems, which is explained by a modified percolation theory. A percolation threshold of 5.5 vol.% for SiO2-RuO2 or 50 vol.% for SiO2-C films, whereby the resistance drastically decreases, was determined. Moreover the temperature dependency of resistance and the current-voltage characteristics of the films can also be explained by this geometric model. KW - Sol-gel KW - Thin films KW - Carbon black KW - Ruthenium dioxide KW - Percolation phenomena PY - 2004 DO - https://doi.org/10.1007/s10971-004-5777-5 SN - 0928-0707 SN - 1573-4846 VL - 32 SP - 131 EP - 135 PB - Kluwer Academic Publ. CY - Dordrecht AN - OPUS4-6909 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - RPRT A1 - Seah, M.P. A1 - Spencer, S.J. A1 - Bensebaa, F. A1 - Vickridge, I. A1 - Danzebrink, H. A1 - Krumrey, M. A1 - Gross, Thomas A1 - Österle, Werner A1 - Wendler, E. A1 - Rheinländer, B. A1 - Azuma, Y. A1 - Kojima, I. A1 - Suzuki, N. A1 - Suzuki, M. A1 - Tanuma, S. A1 - Moon, D.W. A1 - Lee, H.J. A1 - Cho, H.M. A1 - Chen, H.Y. A1 - Wee, A. T. S. A1 - Osipowicz, T. A1 - Pan, J.S. A1 - Jordaan, W.A. A1 - Hauert, R. A1 - Klotz, U. A1 - van der Marel, C. A1 - Verheijen, M. A1 - Tamminga, Y. A1 - Jeynes, C. A1 - Bailey, P. A1 - Biswas, S. A1 - Falke, U. A1 - Nguyen, N.V. A1 - Chandler-Horowitz, D. A1 - Ehrstein, J.R. A1 - Muller, D. A1 - Dura, J.A. T1 - Ultra-thin SiO2 on Si, Part V: Results of a CCQM Pilot Study of Thickness Measurements KW - SiO2 KW - Thin films KW - Thickness KW - XPS KW - Ellipsometry KW - TEM PY - 2003 SN - 1473-2734 SP - 57 pages AN - OPUS4-4118 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Procop, Mathias A1 - Radtke, Martin A1 - Krumrey, M. A1 - Hasche, K. A1 - Schädlich, S. A1 - Frank, W. T1 - Electron probe microanalysis (EPMA) measurement of thin-film thickness in the nanometre range N2 - The thickness of thin films of platinum and nickel on fused silica and silicon substrates has been determined by EPMA using the commercial software STRATAGEM for calculation of film thickness. Film thickness ranged in the order 10 nm. An attempt was made to estimate the confidence range of the method by comparison with results from other methods of analysis. The data show that in addition to the uncertainty of the spectral intensity measurement and the complicated fitting routine, systematic deviation caused by the underlying model should be added. The scattering in the results from other methods does not enable specification of a range of uncertainty, but deviations from the real thickness are estimated to be less than 20%. KW - Electron probe microanalysis KW - EPMA KW - Thin films KW - Thickness measurement KW - X-rays PY - 2002 DO - https://doi.org/10.1007/s00216-002-1514-5 SN - 1618-2642 SN - 1618-2650 VL - 374 SP - 631 EP - 634 PB - Springer CY - Berlin AN - OPUS4-7090 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -