TY - JOUR A1 - Unger, Wolfgang A1 - Senoner, Mathias A1 - Wirth, Thomas A1 - Bütefisch, S. A1 - Busch, I. T1 - Lateral resolution delivered by imaging surface-analytical instruments as SIMS, AES and XPS: Application of the BAM-L200 Certified Reference Material and related ISO Standards N2 - The certified reference material BAM-L200, a nanoscale stripe pattern for length calibration and specification of lateral resolution, is described. BAM-L200 is prepared from a cross-sectioned epitaxially grown layer stack of AlxGa1-xAs and InxGa1 xAs on a GaAs substrate. The surface of BAM-L200 provides a flat pattern with stripe widths ranging down to 1 nm. Calibration distances, grating periods and stripe widths have been certified by TEM with traceability to the length unit. The combination of gratings, isolated narrow stripes and sharp edges of wide stripes offers a plenty of options for the determination of lateral resolution, sharpness and calibration of length scale at selected settings of imaging surface analytical instruments. The feasibility of the reference material for an analysis of the lateral resolution is demonstrated in detail by evaluation of ToF-SIMS, AES and EDX images. Other applications developed in the community are summarized, too. BAM-L200 fully supports the implementation of the revised International Standard ISO 18516 (in preparation) which is based on knowledge outlined in the Technical Report ISO/TR 19319:2013. KW - Standardization KW - AES KW - XPS KW - SIMS KW - Lateral resolution KW - Certified reference material PY - 2017 SN - 1341-1756 VL - 24 IS - 2 SP - 123 EP - 128 AN - OPUS4-43138 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CHAP A1 - Unger, Wolfgang A1 - Gross, Thomas ED - John C. Rivière, ED - Sverre Myhra, T1 - Catalyst characterization KW - Catalyst KW - Surface KW - Analysis KW - XPS KW - ESCA KW - SIMS PY - 2009 SN - 978-0-8493-7558-3 VL - 2nd Edition IS - Chapter 16 SP - 501 EP - 528 PB - CRC Press CY - Boca Raton, FL, USA AN - OPUS4-19602 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Unger, Wolfgang T1 - Advanced surface chemical analysis of plasma modified polymers and plasma-polymers N2 - A comprehensive characterization of plasma modified polymer surfaces or plasma-polymerized thin films needs access to parameters as - concentration of saturated/unsaturated carbon species (e.g. aromaticity) or other double bonds as C=N or C=O, - branching, and - losses of crystallinty or other degrees of structural order. Furthermore the complex ageing phenomena of plasma modified polymers/plasma-polymers and the measurement of an in-depth distribution of chemical species are challenges for the analyst. The talk will display selected examples where such challenges have been met by using advanced methods of surface chemical analyses as Photoelectron Spectroscopy with variable excitation energy (“SyncXPS”), X-ray Absorption Spectroscopy (NEXAFS) at C, N and O K-edges and Time-of-Flight Secondary Mass Spectroscopy (ToF-SIMS) combined with Principal Component analysis (PCA). T2 - IAP workshop – IAP 2016 "Organic surface modifications by plasmas and plasma-polymers" CY - Nancy, France DA - 08.06.2016 KW - XPS KW - NEXAFS KW - SIMS KW - Plasmapolymer PY - 2016 AN - OPUS4-36725 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Unger, Wolfgang A1 - Senoner, Mathias A1 - Wirth, Thomas A1 - Bütefisch, S. A1 - Busch, I. A1 - Rossi, A. A1 - Passiu, C. A1 - Spencer, N.D. T1 - Testing lateral resolution and field of view in imaging and small area analysis: reference materials and standardization N2 - The certified reference material BAM-L200, a nanoscale stripe pattern for length calibration and specification of lateral resolution, is described. BAM-L200 is prepared from a cross-sectioned epitaxially grown layer stack of AlxGa1-xAs and InxGa1 xAs on a GaAs substrate. The surface of BAM-L200 provides a flat pattern with stripe widths ranging down to 1 nm. Calibration distances, grating periods and stripe widths have been certified by TEM with traceability to the length unit. The combination of gratings, isolated narrow stripes and sharp edges of wide stripes offers a plenty of options for the determination of lateral resolution, sharpness and calibration of length scale at selected settings of imaging surface analytical instruments. The feasibility of the reference material for an analysis of the lateral resolution is demonstrated in detail by evaluation of ToF-SIMS, AES and EDX images. Other applications developed in the community are summarized, too. BAM-L200 fully supports the implementation of the revised International Standard ISO 18516 (in preparation) which is based on knowledge outlined in the Technical Report ISO/TR 19319:2013. T2 - 7th International Symposium on Practical Surface Analysis(PSA-16) CY - Daejeon, Korea DA - 17.10.2016 KW - BAM L200 KW - SIMS KW - AES KW - XPS PY - 2016 AN - OPUS4-38266 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Unger, Wolfgang A1 - Wirth, Thomas A1 - Senoner, Mathias T1 - Lateral resolution delivered by imaging surface-analytical instruments as SIMS, AES and XPS: Application of the BAM-L200 Certified Reference Material and related ISO Standards N2 - The certified reference material BAM-L200, a nanoscale stripe pattern for length calibration and specification of lateral resolution, is described. BAM-L200 is prepared from a cross-sectioned epitaxially grown layer stack of AlxGa1-xAs and InxGa1-xAs on a GaAs substrate. The surface of BAM-L200 provides a flat pattern with stripe widths ranging down to 1 nm. Calibration distances, grating periods and stripe widths have been certified by TEM with traceability to the length unit. The combination of gratings, isolated narrow stripes and sharp edges of wide stripes offers a plenty of options for the determination of lateral resolution, sharpness and calibration of length scale at selected settings of imaging surface analytical instruments. The feasibility of the reference material for an analysis of the lateral resolution is demonstrated in detail by evaluation of ToF-SIMS, AES and EDX images. Other applications developed in the community are summarized, too. BAM-L200 fully supports the implementation of the revised International Standard ISO 18516 (in preparation) which is based on knowledge outlined in the Technical Report ISO/TR 19319:2013. Fundamental approaches to determination of lateral resolution and sharpness in beam-based methods T2 - SIMS Europe 2016 CY - Münster, Germany DA - 18.09.2016 KW - ISO standards KW - XPS KW - AES KW - SIMS KW - Lateral resolution PY - 2016 AN - OPUS4-37507 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Unger, Wolfgang T1 - Measuring organic layers N2 - Many innovative products - from touchscreens to solar panels to pharmaceuticals – utilise multiple organic layers to create complex functionality. New techniques have been developed to remove and measure layers individually enabling improved product development and assisting with quality assurance. However, manufacturers cannot be certain of the depth of layer being removed and new reference materials for these techniques are needed to increase uptake, and remove a major barrier to innovation. KW - Organic layers KW - XPS KW - SIMS PY - 2016 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-388656 UR - http://www.euramet.org/metrology-for-societys-challenges/metrology-for-industry/impact-case-studies-emrp-industry-theme/ SP - 1 EP - 2 CY - Teddington AN - OPUS4-38865 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Unger, Wolfgang T1 - Acquiring and Documenting Reproducible Spectra, Depth Profiles and Images: XPS, AES and SIMS N2 - In this talk sample prep/handling, instrument calibration and data acquisition methods with examples from XPS, Auger and SIMS will be addressed in terms of their contributions to the reproducibility of data delivered by the methods. Active parties in the field are VAMAS TWA 2 “Surface chemical analysis” (http://www.vamas.org/twa2/index.html), ISO/TC 201 “Surface chemical analysis” (https://www.iso.org/committee/54618.html) and the Surface Analysis Working Group (SAWG) at the International Meter Convention (https://www.bipm.org/en/ committees/cc/wg/sawg.html). The tools to improve the reproducibility of spectra, depth profiles and images at these international platforms are inter-laboratory comparisons, validated SOPs, standards and certified reference materials (CRM) as well as uncertainty budgets and establishment of traceability chains. The last point is of specific importance because all the methods, XPS, Auger and SIMS, are not primary methods. To address quantitative XPS, AES and SIMS results of relevant inter-laboratory comparisons organized by SAWG considering measurands as alloy surface composition and thickness of thin films will be introduced. These comparisons delivered results which are viewed to be benchmarking, some of them resulted in ISO/TC 201 standards. For quantitative XPS and AES the principal outline of an uncertainty budget will be discussed together with the audience. Another issue of quantitative XPS which definitely needs consideration are valid methods for a determination of the transmission function of the instruments and even for the emission angle in the respective experiments. Concerning the field of depth profiling it has to be investigated together with the audience whether the ISO (or ASTM) standards we have are sufficient to guarantee comparable results. Having in mind the number of different sputter ion species available today and range of samples of interest (metals, semiconductors, organic films) this might be questionable. And, how do depth profiling by AR-XPS and variable excitation energy XPS compete here? For imaging surface chemical analysis, the characterization of the imaging system is an issue to be investigated. Here the determination of lateral resolution is a relevant topic. Finally, the future needs to develop metrology for new applications e.g., ambient-pressure XPS, bio samples, and core-shell nanoparticles, will be issues raised for a discussion with the audience. T2 - 17th Topical Conference on Quantitative Surface Analysis (QSA 17) CY - Long Beach, CA, USA DA - 21.10.2018 KW - Depth Profiles and Images KW - X-ray Photoelectron Spectroscopy (XPS) KW - Auger Electron Spectroscopy (AES) KW - SIMS KW - Reproducible Spectra PY - 2018 AN - OPUS4-46470 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Senoner, Mathias A1 - Wirth, Thomas A1 - Unger, Wolfgang A1 - Escher, M. A1 - Weber, N. A1 - Funnenmann, D. A1 - Krömker, B. T1 - Testing of Lateral Resolution in the Nanometre Range Using the BAM-L002 - Certified Reference Material: Application to ToF-SIMS IV and NanoESCA Instruments T2 - International Symposium on Practical Surface Analysis CY - Jeju, Republic of Corea DA - 2004-10-04 KW - ESCA KW - Nanometrologie KW - Nanotechnologie KW - Oberflächenanalytik KW - SIMS KW - XPS KW - Zertifiziertes Referenzmaterial PY - 2005 SN - 1341-1756 SN - 1347-8400 VL - 12 IS - 2 SP - 78 EP - 82 CY - Tsukuba AN - OPUS4-11146 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - RPRT A1 - Senoner, Mathias A1 - Unger, Wolfgang A1 - Powell, C. T1 - Surface chemical analysis - General procedures - Determination of lateral resolution KW - AES KW - Contrast transfer function KW - Imaging KW - ISO TC 201 KW - Lateral resolution KW - Performance of imaging instruments KW - Quality management systems KW - Simulation KW - SIMS KW - XPS PY - 2009 SP - 1 EP - 65 AN - OPUS4-19158 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Senoner, Mathias A1 - Unger, Wolfgang T1 - Lateral resolution of secondary ion mass spectrometry - results of an inter-laboratory comparison N2 - Recently, BAM organised an inter-laboratory comparison focussed on lateral resolution and accuracy of sub-micron length measurements by secondary ion mass spectrometry (SIMS). Results were submitted by 16 laboratories from 10 countries. The task was to analyse a cross-sectioned semiconductor multilayer stack. The resulting strip pattern in the surface of the sample shows narrow strips, step transitions and gratings of different periods. Imaging analysis of this pattern enables the determination of relevant parameters related to the lateral resolution: (i) The width (FWHM) of the primary ion beam, (ii) the distance between 16% and 84% intensity points in a profile across the image of a step transition and (iii) the modulation of intensity in the images of gratings with different periods. The parameter's data reported by the participants vary in a wide range. A strong variation in the data of primary ion beam width was observed for results measured with the same type of instrument. The distance between two narrow strips was measured with high accuracy. Twelve of sixteen of the submitted values are within the limits of uncertainty of the reference value 964 ± 35 nm. This result shows that the calibration of the length scale of the SIMS instruments is already rather precise in most of the participating laboratories. KW - ESF KW - LSF KW - MTF KW - SIMS KW - Accuracy KW - Deconvolution KW - Edge method KW - Edge spread function KW - Inter-laboratory comparison KW - Ion microscopy KW - Lateral resolution KW - Length scale calibration KW - Line spread function KW - Modulation transfer function KW - Nanometrology KW - Nanotechnology KW - Primary ion beam width KW - Square-wave grating KW - Strip pattern PY - 2007 SN - 0142-2421 SN - 1096-9918 VL - 39 IS - 1 SP - 16 EP - 25 PB - Wiley CY - Chichester AN - OPUS4-14427 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -