TY - CONF A1 - Omar, Hassan A1 - Szymoniak, Paulina A1 - Hertwig, Andreas A1 - Schönhals, Andreas T1 - Invesitgation of Thin Film Interactions with Inorganic Surfaces N2 - Thin polymer films are of vital importance due to their low production costs and wide range of applications in sensors, electronics, and coatings. Their geometry is ideal for the study of confinement effects, specifically one-dimensional confinement, on the thermodynamic properties and segmental dynamics of polymers. For this investigation, films of PC are prepared on both glass and silica substrates to measure the dielectric and calorimetric behavior as a function of film thickness. The methodology consists of broadband dielectric spectroscopy (BDS), ellipsometry, and atomic force microscopy (AFM). Using ellipsometry, the glass transition shows an increase with decreasing film thickness. Compared to a previous investigation of PC where dilatometry was used, an increase in PC was seen, but now only at thicknesses below 20 nm. Therefore, the critical thickness of PC, where the bulk-like layer no longer percolates through the film, is dependent on the method probing the glass transition. The dielectric behavior shows a deviation from bulk behavior with decreasing film thickness, although still showing a Vogel-Fulcher-Tammann (VFT) temperature dependence for all films. The influence of the adsorbed layer on the molecular mobility was also addressed. T2 - Deutschen Physikalische Gesellschaft (DPG) Tagung CY - Regensburg, Germany DA - 04.09.2022 KW - Thin films KW - Adsorbed Layer KW - Broadband dielectric spectroscopy PY - 2022 AN - OPUS4-55706 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Schmidt-Grund, R. A1 - Sturm, C. A1 - Hertwig, Andreas T1 - Ellipsometry and polarimetry - Classical measurement techniques with always new developments, concepts, and applications JF - Advanced optical technologies N2 - Ellipsometry is a matured experimental method, whose roots reach back into the early phase of modern optics itself. It is often attributed to be invented by Paul Drude in the last decade of the 19th century, but similar techniques had already been applied for years before Drude started his work. With this Special Issue about ellipsometry and related techniques, we hope to bring more attention to this method and advance and propagate it to be used by a broader community. We have collected a good mixture of articles: some texts are more in the line of users’ tutorial and best practice guides; others are intended to show recent developments of the method. With this collection, we also hope to show the generally rapidly expanding possibilities of ellipsometry and polarimetry to draw attention of new users and previously unrelated communities to this valuable tool. KW - Ellipsometry KW - Polarimetry KW - Surfaces KW - Thin films KW - Optical analysis PY - 2022 DO - https://doi.org/10.1515/aot-2022-0025 SN - 2192-8584 SN - 2192-8576 VL - 11 IS - 3-4 (Topical issue: Ellipsometry) SP - 57 EP - 58 PB - De Gruyter CY - Berlin AN - OPUS4-55467 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR ED - Schmidt-Grund, R. ED - Sturm, C. ED - Hertwig, Andreas T1 - Topical issue: Ellipsometry T2 - Advanced optical technologies N2 - Ellipsometry is a matured experimental method, whose roots reach back into the early phase of modern optics itself. It is often attributed to be invented by Paul Drude in the last decade of the 19th century, but similar techniques had already been applied for years before Drude started his work. With this Special Issue about ellipsometry and related techniques, we hope to bring more attention to this method and advance and propagate it to be used by a broader community. KW - Spectroscopy KW - Ellipsometry KW - Surfaces KW - Thin films KW - Advanced optics KW - Optical measurement technology PY - 2022 UR - https://www.degruyter.com/journal/key/aot/11/3-4/html#contents SN - 2192-8584 SN - 2192-8576 VL - 11 IS - 3-4 SP - 47 EP - 147 PB - De Gruyter CY - Berlin AN - OPUS4-55468 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Terborg, R. A1 - Kim, K. J. A1 - Hodoroaba, Vasile-Dan T1 - Determination of Thin Film Thickness and Composition using Energy Dispersive EPMA JF - Microscopy and Microanalysis N2 - The thickness of thin films can be measured by various methods, e.g., profilometry, ellipsometry, atomic force microscopy (AFM), or X-ray reflectometry. For the additional determination of thin film composition, techniques like X-ray photoelectron spectroscopy (XPS) or mass spectrometry-based techniques can be used. An alternative non-destructive technique is electron probe microanalysis (EPMA). This method assumes a sample of homogenous (bulk) chemical composition, so that it cannot be usually applied to thin film samples. However, in combination with the thin film software StrataGEM, the thickness as well as the composition of such films on a substrate can be determined. This has been demonstrated for FeNi on Si and SiGe on Al2O3 film systems. For both systems five samples with different elemental composition and a reference were produced and characterised by Korean research institute KRISS using inductively coupled plasma mass spectrometry (ICP-MS), Rutherford backscattering (RBS), and transmission electron microscopy (TEM). These samples were used for an international round robin test. In 2021, a new and open-source thin film evaluation programme called BadgerFilm has been released. It can also be used to determine thin film composition and thickness from intensity ratios of the unknown sample and standards (k-ratios). In this contribution, we re-evaluated the data acquired for the FeNi and SiGe systems using the BadgerFilm software package and compared the resulting composition and thickness with the results of the established StrataGEM software and other reference methods. With the current evaluation, the BadgerFilm software shows good agreement with the composition and thickness calculated by StrataGEM and as the reference values provided by the KRISS. KW - Thin films KW - Elemental composition KW - Film thickness KW - EPMA (Electron Probe Microanalysis) PY - 2022 DO - https://doi.org/10.1017/S143192762200318X VL - 28 IS - Suppl. 1 SP - 672 EP - 673 PB - Cambridge University Press AN - OPUS4-55437 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Radnik, Jörg A1 - Hodoroaba, Vasile-Dan A1 - Terborg, R. A1 - Kim, K.J. T1 - Elemental Composition and Thickness Determination of Thin Films by Electron Probe Microanalysis (EPMA) N2 - microscopy (AFM), or X-ray reflectometry. For the additional determination of thin film composition, techniques like X-ray photoelectron spectroscopy (XPS) or mass spectrometry-based techniques can be used. An alternative non-destructive technique is electron probe microanalysis (EPMA). This method assumes a sample of homogenous (bulk) chemical composition, so that it cannot be usually applied to thin film samples. However, in combination with the thin film software StrataGEM, the thickness as well as the composition of such films on a substrate can be determined. This has been demonstrated for FeNi on Si and SiGe on Al2O3 film systems. For both systems five samples with different elemental composition and a reference were produced and characterised by Korean research institute KRISS using inductively coupled plasma mass spectrometry (ICP-MS), Rutherford backscattering (RBS), and transmission electron microscopy (TEM). These samples were used for an international round robin test. In 2021, a new and open-source thin film evaluation programme called BadgerFilm has been released. It can also be used to determine thin film composition and thickness from intensity ratios of the unknown sample and standards (k-ratios). In this contribution, we re-evaluated the data acquired for the FeNi and SiGe systems using the BadgerFilm software package and compared the resulting composition and thickness with the results of the established StrataGEM software and other reference methods. With the current evaluation, the BadgerFilm software shows good agreement with the composition and thickness calculated by StrataGEM and as the reference values provided by the KRISS. T2 - ECASIA 2022 CY - Limerick, Ireland DA - 29.05.2022 KW - Thin films KW - Electron Probe Microanalysis KW - Interlaboratory Comparisons PY - 2022 AN - OPUS4-54963 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Hudson, A.D. A1 - Jamieson, O. A1 - Crapnell, R.D. A1 - Rurack, Knut A1 - Soares, T.C.C. A1 - Mecozzi, F. A1 - Laude, A. A1 - Gruber, J. A1 - Novakovic, K. A1 - Peeters, M. T1 - Dual detection of nafcillin using a molecularly imprinted polymer-based platform coupled to thermal and fluorescence read-out JF - Materials Advances N2 - Reported here is the production of molecularly imprinted polymer (MIP) films, integrating a fluorescent moiety that serves as both an element for template interaction and signalling, for the thermal and optical detection of the beta-lactam antibiotic nafcillin. Fluorescein methacrylate (FluMa) was synthesized and introduced during the molecular imprinting process as the sole monomer and in a 1 : 1 mixture with methacrylic acid (MAA), allowing to draw first conclusions on the MIP formation potential of such a rather large and rigid monomer. At first, MIP microparticles containing FluMa were prepared by free radical polymerisation. Optical batch rebinding experiments revealed that FluMa can act as a functional monomer for selective detection of nafcillin; however, the addition of MAA as co-monomer significantly improved performance. Subsequently, thin MIP films containing FluMa were deposited onto functionalised glass slides and the influence of porogen, drying time, and monomer composition was studied. These MIP-functionalised glass electrodes were mounted into a customised 3D-printed flow cell, where changes in the liquid were either evaluated with a thermal device or using fluorescence bright field microscopy. Thermal analysis demonstrated that multiple MIP layers enhanced sensor specificity, with detection in the environmentally relevant range. The fluorescence bright field microscope investigations validated these results, showing an increase in the fluorescence intensity upon exposure of the MIP-functionalised glass slides to nafcillin solutions. These are promising results for developing a portable sensor device that can be deployed for antibiotics outside of a dedicated laboratory environment, especially if sensor design and fluorophore architecture are optimised. KW - Molecularly Imprinted Polymers KW - Fluorescence KW - Antibiotics KW - Heat-transfer Measurements KW - Thin films PY - 2021 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-540044 DO - https://doi.org/10.1039/D1MA00192B VL - 2 IS - 15 SP - 5105 EP - 5115 PB - Royal Society of Chemistry CY - Cambridge AN - OPUS4-54004 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Abboud, M. A1 - Motallebzadeh, A. A1 - Duygulu, O. A1 - Maaß, Robert A1 - Özerinc, S. T1 - Microstructure and nanomechanical behavior of sputtered CuNb thin films JF - Intermetallics N2 - We report on the mechanical properties of Cu–Nb alloys produced by combinatorial magnetron sputtering. Depending on the composition, the microstructure is either fully amorphous (~30–65 at.% Cu), a dispersion of Cu crystallites in an amorphous matrix (~70 at.%), or a dominant crystalline phase with separated nanoscale amorphous zones (~80 at.% Cu). Nanomechanical probing of the different microstructures reveals that the hardness of the fully amorphous alloy is much higher than a rule of mixture would predict. We further demonstrate a remarkable tunability of the resistance to plastic flow, ranging from ca. 9 GPa in the amorphous regime to ca. 2 GPa in the fully crystalline regime. We rationalize these findings based on fundamental structural considerations, thereby highlighting the vast structure-property design space that this otherwise immiscible binary alloy provides. KW - Deposition microstructure KW - Metallic glasses KW - Thin films KW - Mechanical properties KW - Nanocrystalline structure PY - 2021 DO - https://doi.org/10.1016/j.intermet.2021.107249 SN - 0966-9795 VL - 136 SP - 1 EP - 7 PB - Elsevier CY - Amsterdam AN - OPUS4-52777 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Gawek, Marcel A1 - Madkour, Sherif A1 - Szymoniak, Paulina A1 - Radnik, Jörg A1 - Schönhals, Andreas T1 - Energy Dependent XPS Measurements on Thin Films of a Poly(vinyl methyl ether)/Polystyrene Blend in Dependence on Film Thickness – Concentration Profile on a Nanometer Resolution to Understand the Behavior of Nanofilms JF - Soft Matter N2 - The composition of the surface layer in dependence from the distance of the polymer/air interface in thin films with thicknesses below 100 nm of miscible polymer blends in a spatial region of a few nanometers is not investigated completely. Here, thin films of the blend poly vinyl methyl ether) (PVME)/polystyrene (PS) with a composition of 25/75 wt% are investigated by Energy Resolved X-ray Photoelectron Spectroscopy (ER-XPS) at a synchrotron storage ring using excitation energies lower than 1 keV. By changing the energy of the photons the information depth is varied in the range from ca. 1 nm to 10 nm. Therefore, the PVME concentration could be estimated in dependence from the distance of the polymer/air interface for film thicknesses below 100 nm. Firstly, as expected for increasing information depth the PVME concentration decreases. Secondly, it was found that the PVME concentration at the surface has a complicated dependence on the film thickness. It increases with decreasing film thickness until 30 nm where a maximum is reached. For smaller film thicknesses the PVME concentration decreases. A simplified layer model is used to calculate the effective PVME concentration in the different spatial regions of the surface layer. KW - Energy dependent XPS KW - Soft X-ray KW - Thin films PY - 2021 DO - https://doi.org/10.1039/d1sm00656h VL - 17 IS - 29 SP - 6985 EP - 6994 PB - The Royal Chemical Society AN - OPUS4-53039 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Hodoroaba, Vasile-Dan A1 - Terborg, R. A1 - Boehm, S. A1 - Kim, K. J. T1 - Analysis of elemental composition of Fe1-xNix and Si1-xGex alloy thin films by electron probe microanalysis and micro-focus X-ray fluorescence JF - Surface and Interface Analysis N2 - The present study reports on results of analysis of the elemental composition of thin films by electron probe microanalysis with energy dispersive (ED-EPMA) X-ray spectrometry in conjunction with the dedicated thin-film analysis software package Stratagem and by X-ray fluorescence in its version with a micro-focus X-ray fluorescence (μ-XRF) source attached to a scanning electron microscope (SEM). Two thin-film systems have been analyzed: Fe1-xNix on silicon wafer and Si1-xGex on Al2O3 substrate, in both cases the layers being grown to a thickness of about 200 nm by ion beam sputter deposition. Samples of five different atomic fractions have been produced and analyzed for each thin-film system. Moreover, reference samples with certified elemental composition and thickness have been also available. This study is part of an interlaboratory comparison organized in the frame of standardization technical committee ISO/TC 201 “Surface chemical analysis.” Two laboratories have been analyzed by ED-EPMA (one laboratory standardless and one laboratory using both standardless and with standards variants) and one laboratory by μ-XRF (standardless and with standards). All the elemental compositions obtained with different methods are in very good agreement for the complete two sets of five samples each. KW - Thin films KW - Elemental composition KW - FeNi KW - SiGe KW - Electron probe microanalysis KW - X-ray Fluorescence PY - 2020 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-509262 DO - https://doi.org/10.1002/sia.6834 SN - 0142-2421 VL - 52 IS - 12 SP - 929 EP - 932 PB - John Wiley & Sons Ltd AN - OPUS4-50926 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Fahmy, Alaa A1 - El Sabbagh, M. A1 - Bedair, M. A1 - Gangan, A. A1 - El-Sabbah, M. A1 - El-Bahy, S. A1 - Friedrich, J. T1 - One-step plasma deposited thin SiOxCy films for corrosion resistance of low carbon steel JF - Journal of Adhesion Science and Technology N2 - Tetraethyl orthosilicate (TEOS) was used as a chemical precursor to deposit ultra-thin SiO x C y plasma polymer films onto mild steel surfaces for preventing the corrosion process. The structure–property relationships of the coatings were evaluated by X-ray Photo Spectroscopy (XPS), X-Ray Diffraction (XRD), Fourier Transform InfraRed spectroscopy (ATR-FTIR) and Energy Dispersive X-ray spectroscopy (EDX) completed with Scanning Electron Microscopy (SEM). The SEM micrographs confirmed a pinhole-free surface morphology of the low-pressure deposited plasma polymer films. The TEOS molecules become fragmented in the plasma by numerous collisions with energy-rich electrons and heavier particles. Recombination of fragments and condensation onto the steel substrate is responsible for the formation of organic SiO containing plasma polymer layers. Such thin layers consist of predominantly SiO x structures. Their properties are determined largely by the gap distance between the two samples used as electrodes in the plasma. The efficiency of the corrosion-protecting coating was compared with uncoated samples. The corrosion protection was determined by exposure of samples to 3.5% NaCl aqueous solutions. For this purpose, polarization and Electrochemical Impedance Spectroscopy (EIS) were used to monitor the corrosion. The optimal gap distance between the electrodes was determined for corrosion protection. The best protective efficiency reached more than 97% of the total protection as measured at room temperature. KW - Thin films KW - Corrosion resistance KW - Mild steel KW - Plasma treatments KW - Tetraethyl orthosilicate PY - 2020 DO - https://doi.org/10.1080/01694243.2020.1856539 VL - 35 IS - 16 SP - 1734 EP - 1751 PB - Taylor & Francis AN - OPUS4-52303 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -