TY - JOUR A1 - Unger, Wolfgang A1 - Gross, Thomas A1 - Lippitz, Andreas A1 - Güttler, B. T1 - Uncertainty in measurement of overlayer thickness of thermally oxidized silicon using x-ray photoelectron spectroscopy N2 - Overlayers of SiO2 (nominally 4, 6 and 8 nm thick) on silicon, prepared by thermal oxidation, were investigated using x-ray photoelectron spectroscopy (XPS). The thickness of these overlayers was obtained from a measurement of the photoelectron intensities originating from the substrate and the oxide overlayer by applying an appropriate quantitative model. The uncertainty budget of that thickness measurement method is given. The relative combined standard uncertainty of the method was found to be 15%. The effective attenuation lengths or the corresponding electron inelastic mean free paths are of considerable importance for both the estimated values of overlayer thickness and combined standard uncertainties. The XPS results were compared with ellipsometry data. KW - XPS KW - ESCA KW - Uncertainty KW - Overlayer KW - SiO2 PY - 2000 DO - https://doi.org/10.1002/1096-9918(200012)29:12<891::AID-SIA943>3.0.CO;2-A SN - 0142-2421 SN - 1096-9918 IS - 29 SP - 891 EP - 894 PB - Wiley CY - Chichester AN - OPUS4-1075 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Unger, Wolfgang A1 - Kalbe, Henryk A1 - Rades, Steffi T1 - Determining shell thicknesses in stabilised CdSe@ZnS core-shell nanoparticles by quantitative XPS analysis using an infinitesimal columns model N2 - A novel Infinitesimal Columns (IC) simulation model is introduced in this study for the quantitativeanalysis of core-shell nanoparticles (CSNP) by means of XPS, which combines the advantages of exist-ing approaches. The IC model is applied to stabilised Lumidot™CdSe/ZnS 610 CSNP for an extensiveinvestigation of their internal structure, i.e. calculation of the two shell thicknesses (ZnS and stabiliser)and exploration of deviations from the idealised CSNP composition. The observed discrepancies betweendifferent model calculations can be attributed to the presence of excess stabiliser as well as synthesisresidues, demonstrating the necessity of sophisticated purification methods. An excellent agreement isfound in the comparison of the IC model with established models from the existing literature, the Shardmodel and the software SESSA. KW - XPS KW - Quantum dot KW - Core shell nano particle PY - 2016 DO - https://doi.org/10.1016/j.elspec.2016.08.002 SN - 0368-2048 VL - 212 SP - 34 EP - 43 PB - Elsevier B.V. AN - OPUS4-38273 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Unger, Wolfgang A1 - Khani, M. A1 - Mehdipour, E. A1 - Faghani, A. A1 - Guday, G. A1 - Donskyi, Ievgen A1 - Haag, R. A1 - Adeli, M. T1 - Preparation of graphene oxide by cyanuric chloride as an effective and non-corrosive oxidizing agent N2 - In this work, we report a new method for the synthesis of graphene oxide (GO) using cyanuric chloride as a non-corrosive oxidizing agent. The mild conditions, simple purification, and scalability of this method are significant advantages over common approaches in which harsh oxidizing agents are used. Moreover, a major drawback with the Hummers' method, the production of toxic gases, is not an issue with this process. This method is a safe and large-scale alternative for the production of GO under mild conditions. KW - Graphene oxide KW - Synthesis KW - XPS KW - AFM KW - IR KW - TGA PY - 2016 DO - https://doi.org/10.1039/c6ra23702a SN - 2046-2069 VL - 6 IS - 116 SP - 115055 EP - 115057 PB - The Royal Society of Chemistry AN - OPUS4-39111 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Unger, Wolfgang A1 - Schwarz, F. A1 - Heinrich, Thomas A1 - Kaufmann, J. O. A1 - Lippitz, Andreas A1 - Puttreddy, R. A1 - Rissanen, K. A1 - Schalley, C. A. T1 - Photocontrolled on-surface pseudorotaxane formation with well-ordered macrocycle multilayers N2 - The photoinduced pseudorotaxane formation between a photoresponsive axle and a tetralactam macrocycle was investigated in solution and on glass surfaces with immobilized multilayers of macrocycles. In the course of this reaction, a novel photoswitchable binding station with azobenzene as the photoswitchable unit and diketopiperazine as the binding station was synthesized and studied by NMR and UV/Vis spectroscopy. Glass surfaces have been functionalized with pyridine-terminated SAMs and subsequently withmultilayers of macrocycles through layer-by-layer self assembly. A preferred orientation of the macrocycles could be confirmed by NEXAFS spectroscopy. The photocontrolled Deposition of the axle into the surface-bound macrocycle-multilayers was monitored by UV/Vis spectroscopy and led to an increase of the molecular order, as indicated by more substantial linear dichroism effects in angle-resolved NEXAFS spectra. KW - Well-ordered macrocycle multilayers KW - XPS KW - NEXAFS PY - 2016 DO - https://doi.org/10.1002/chem.201603156 SN - 0947-6539 SN - 1521-3765 VL - 22 IS - 40 SP - 14383 EP - 14389 PB - Wiley-VCH Verlag GmbH & Co. KGaA CY - Weinheim AN - OPUS4-38270 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Unger, Wolfgang A1 - Senoner, Mathias A1 - Wirth, Thomas A1 - Bütefisch, S. A1 - Busch, I. T1 - Lateral resolution delivered by imaging surface-analytical instruments as SIMS, AES and XPS: Application of the BAM-L200 Certified Reference Material and related ISO Standards N2 - The certified reference material BAM-L200, a nanoscale stripe pattern for length calibration and specification of lateral resolution, is described. BAM-L200 is prepared from a cross-sectioned epitaxially grown layer stack of AlxGa1-xAs and InxGa1 xAs on a GaAs substrate. The surface of BAM-L200 provides a flat pattern with stripe widths ranging down to 1 nm. Calibration distances, grating periods and stripe widths have been certified by TEM with traceability to the length unit. The combination of gratings, isolated narrow stripes and sharp edges of wide stripes offers a plenty of options for the determination of lateral resolution, sharpness and calibration of length scale at selected settings of imaging surface analytical instruments. The feasibility of the reference material for an analysis of the lateral resolution is demonstrated in detail by evaluation of ToF-SIMS, AES and EDX images. Other applications developed in the community are summarized, too. BAM-L200 fully supports the implementation of the revised International Standard ISO 18516 (in preparation) which is based on knowledge outlined in the Technical Report ISO/TR 19319:2013. KW - Standardization KW - AES KW - XPS KW - SIMS KW - Lateral resolution KW - Certified reference material PY - 2017 SN - 1341-1756 VL - 24 IS - 2 SP - 123 EP - 128 AN - OPUS4-43138 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Unger, Wolfgang A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas T1 - Radio frequency (r.f.) plasma-deposited polymer films: influence of external plasma parameters as viewed by comprehensive in-situ surface chemical analysis by XAS, XPS and ToF-SIMS N2 - The formation of plasma-deposited materials made from organic molecules is a technologically attractive way to obtain films with unique properties, e.g. adhesion, wettability, conductivity or selected chemical functionalization. A detailed chemical characterization of these films is a great challenge for the analyst because of the co-existence of a large number of chemical species in plasma-deposited films. We investigated these types of organic films using photoelectron spectroscopy for chemical analysis (ESCA, XPS), near edge X-ray absorption fine structure (NEXAFS) spectroscopy at synchrotron radiation source BESSY II and time-of-flight secondary ion mass spectroscopy (ToF-SIMS). A dedicated plasma preparation chamber was designed and added to the main analysis chamber of the respective spectrometers. This approach offers the possibility of studying plasma-deposited films without exposure to air before analysis (often called in-situ analysis) and the influence of post-plasma reactions, i.e. the ageing process. The present investigations are aimed at finding correlations between basic chemical properties of the deposited films and the plasma deposition parameters, e.g. duty cycle in pulsed plasmas and the power of discharge. KW - Plasma deposition KW - NEXAFS KW - XPS KW - ToF-SIMS KW - Plasma parameter PY - 2006 DO - https://doi.org/10.1002/sia.2158 SN - 0142-2421 SN - 1096-9918 VL - 38 IS - 4 SP - 522 EP - 525 PB - Wiley CY - Chichester AN - OPUS4-12271 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Ungureanu, F. A1 - Manea, A.S. A1 - Frunza, L. A1 - Frunza, S. A1 - Ganea, C.P. A1 - Cotorobai, F. A1 - Diamandescu, L. A1 - Schönhals, Andreas T1 - Pentylcyanobiphenyl as test molecule for the acid sites of powdered titanium(IV) oxides: sensitivity of core levels to the local structure N2 - Pentylcyanobiphenyl was used successfully as a test molecule to show the acid sites upon some commercial nanoscaled titanium dioxide materials. The surface interactions were investigated in detail using methods sensitive to the surface or to the bulk material, e.g., X-ray photoelectron spectroscopy (XPS), infrared spectroscopy, and thermal analysis. Different oxidation states of surface Ti ions were revealed. Several species were found: the majority were bonded through the nitrogen lone pair of the cyano group, but bonding to the surface OH groups by benzene π electrons might also appear. The N 1s lines of adsorbed 5CB were able to distinguish between Lewis acid and relatively weak Brønsted acid sites. KW - Infrared spectra KW - Pentylcyanobiphenyl KW - Size dependence KW - Titanium dioxide KW - XPS PY - 2012 DO - https://doi.org/10.1080/15421406.2012.697416 SN - 1542-1406 SN - 0026-8941 VL - 562 IS - 1 SP - 200 EP - 217 PB - Taylor & Francis CY - Philadelphia, PA, USA AN - OPUS4-26397 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Vlajića, M. A1 - Unger, Wolfgang A1 - Bruns, J. A1 - Rueck-Braun, K. T1 - Photoswitching of fulgimides in different environments on silicon surfaces N2 - Reversible light-modulation of fulgimide based monolayers on Si(1 1 1) and Si(1 0 0) was investigated using ATR-FTIR spectroscopy. Fulgimide monolayers were prepared from neat COOH-terminated SAMs on Si(1 1 1) obtained from methyl undec-10-enoate, (1:1)-diluted COOH-terminated monolayers on Si(1 1 1), and GPTMS monolayers on Si(1 0 0). The epoxy-terminated monolayer on oxidized Si(1 0 0) was characterized with ellipsometry, XPS, as well as contact angle measurements, and ATR-FTIR spectroscopy revealed a strong influence of toluene water content on reproducible high-quality monolayer formation. The results of this study show that environmental polarity has a strong influence on fulgimide imide IR band locations and read-out options for the two photostationary states PSS(365 nm), containing E/Z- and C-isomers, and PSS(545 nm), with solely the E/Zisomers. Neat COOH-terminated monolayers on flat Si(1 1 1) have the Advantage of high functional Group concentration, orientation and stability, and an upright arrangement of fulgimide head groups. KW - Surface functionalization KW - Photoswitchable monolayers KW - ATR-FTIR spectroscopy KW - XPS PY - 2019 DO - https://doi.org/10.1016/j.apsusc.2018.09.159 SN - 0169-4332 SN - 1873-5584 VL - 465 SP - 686 EP - 692 PB - Elsevier B.V. AN - OPUS4-46276 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Weigel, W. A1 - Unger, Wolfgang A1 - Graf, Nora A1 - Gross, Thomas A1 - Wirth, Thomas T1 - Surface Chemical Analysis of DNA Microarrays - Application of XPS and ToF-SIMS for Surface Chemical Imaging on the µm Scale KW - Microarrays KW - Oberflächenanalytik KW - XPS KW - ToF-SIMS KW - Chemical imaging PY - 2008 SN - 1611-597X VL - 12 IS - 10 SP - 14 EP - 16 PB - GIT-Verlag CY - Darmstadt AN - OPUS4-18307 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Weigert, Florian A1 - Müller, A. A1 - Häusler, I. A1 - Geißler, Daniel A1 - Skroblin, D. A1 - Unger, Wolfgang A1 - Radnik, Jörg A1 - Resch-Genger, Ute T1 - Combining HR‑TEM and XPS to elucidate the core–shell structure of ultrabright CdSe/CdS semiconductor quantum dots N2 - Controlling thickness and tightness of surface passivation shells is crucial for many applications of core–shell nanoparticles (NP). Usually, to determine shell thickness, core and core/shell particle are measured individually requiring the availability of both nanoobjects. This is often not fulfilled for functional nanomaterials such as many photoluminescent semiconductor quantum dots (QD) used for bioimaging, solid state lighting, and display technologies as the core does not show the applicationrelevant functionality like a high photoluminescence (PL) quantum yield, calling for a whole nanoobject approach. By combining high-resolution transmission electron microscopy (HR-TEM) and X-ray photoelectron spectroscopy (XPS), a novel whole nanoobject approach is developed representatively for an ultrabright oleic acid-stabilized, thick shell CdSe/CdS QD with a PL quantum yield close to unity. The size of this spectroscopically assessed QD, is in the range of the information depth of usual laboratory XPS. Information on particle size and monodispersity were validated with dynamic light scattering (DLS) and small angle X-ray scattering (SAXS) and compared to data derived from optical measurements. In addition to demonstrating the potential of this novel whole nanoobject approach for determining architectures of small nanoparticles, the presented results also highlight challenges faced by different sizing and structural analysis methods and method-inherent uncertainties. KW - Photoluminescence KW - Single particle KW - Microscopy KW - Particle architecture KW - Thickness KW - SAXS KW - Shell KW - XPS KW - TEM KW - Semiconductor KW - Quantum dot KW - Photophysics KW - Quantum yield PY - 2020 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-517911 DO - https://doi.org/10.1038/s41598-020-77530-z VL - 10 IS - 1 SP - 20712 PB - Springer Nature AN - OPUS4-51791 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -