<?xml version="1.0" encoding="utf-8"?>
<export-example>
  <doc>
    <id>52074</id>
    <completedYear/>
    <publishedYear>2021</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>106039</pageFirst>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume>176</volume>
    <type>article</type>
    <publisherName>Elsevier B.V.</publisherName>
    <publisherPlace>Amsterdam</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Calibration capacity of hot-pressed hydrogen standards for glow discharge optical emission and mass spectrometry</title>
    <abstract language="eng">Mixed copper and titanium hydride powder was hot-pressed and characterized by Carrier Gas Hot Extraction, XRay Diffraction, Thermal Gravimetric Analysis coupled with Mass Spectrometry, and Scanning Electron Microscopy.&#13;
The hot-pressed and five conventional samples were applied for calibration of hydrogen in Glow Discharge Optical Emission and Mass Spectrometry. Up to the introduction of 15 ng/s hydrogen the Emission yield model is useful in Glow Discharge Optical Emission Spectrometry. A correlation between saturation and even reversal of the emission yield of the spectral lines H121, H486 and H656 and low sputtering rates was found. Hydrogen effects exist for the spectral lines of Cu(II) 219 and Ti(I) 399. In Glow Discharge Mass Spectrometry, a linear dependency of the 1H ion current on the sputtered mass per time exists over the total range of hydrogen content investigated. Hydrogen effects also exist for the sensitivity of 48Ti and 63Cu. The sputtering rate of two-phase materials depends linearly on the sputtered mass per time of one phase, which allows the sputtering rate of two-phase materials with known composition to be predicted.</abstract>
    <parentTitle language="eng">Spectrochimica Acta Part B: Atomic Spectroscopy</parentTitle>
    <identifier type="doi">10.1016/j.sab.2020.106039</identifier>
    <enrichment key="opus.source">publish</enrichment>
    <enrichment key="date_peer_review">18.03.2021</enrichment>
    <author>V. Hoffmann</author>
    <author>M. Uhlemann</author>
    <author>Silke Richter</author>
    <author>jens Pfeifer</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Hot-pressing</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>GD-OES</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>GD-MS</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Calibration</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Hydrogen</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Titanium hydride</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Sputtering</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Two-phase system</value>
    </subject>
    <collection role="ddc" number="543">Analytische Chemie</collection>
    <collection role="institutes" number="">1 Analytische Chemie; Referenzmaterialien</collection>
    <collection role="institutes" number="">1.1 Anorganische Spurenanalytik</collection>
    <collection role="institutes" number="">1.6 Anorganische Referenzmaterialien und Gasanalytik</collection>
    <collection role="themenfelder" number="">Chemie und Prozesstechnik</collection>
    <collection role="themenfelder" number="">Chemische Charakterisierung und Spurenanalytik</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
  </doc>
  <doc>
    <id>57383</id>
    <completedYear/>
    <publishedYear>2023</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>106681</pageFirst>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume>205</volume>
    <type>article</type>
    <publisherName>Elsevier B.V.</publisherName>
    <publisherPlace>Amsterdam, Netherlands</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Investigation of aluminum current collector degradation in lithium-ion batteries using glow discharge optical emission spectrometry</title>
    <abstract language="eng">In this work, we employed glow discharge optical emission spectrometry (GD-OES) depth profiling as a fast and semi-quantitative method to investigate the aluminum (Al) current collector degradation in commercial lithium cobalt oxide (LCO) pouch cells with no Al2O3 pretreatment. After battery aging, a heterogeneous deposit was found on the surface of the cathode. Gray hotspot areas within an extensive pale white region were formed. Consistent with energy dispersive X-ray (EDX) analysis of micro-cross sections milled via targeted focused ion beam (FIB), an Al-containing layer of approximately 3 µm can be observed using GD-OES. We attribute one main cause of this layer is the degradation of the Al current collector. The nonuniform growth of this layer was investigated by performing GD-OES depth profiling at different in-plane positions. We found that the gray area has a higher mass concentration of Al, probably in metallic form, whereas the white area was probably covered more homogeneously with Al2O3, resulting from the inhomogeneous distribution of the pitting positions on the current collector. Compared to FIB-EDX, GD-OES enables a faster and more convenient depth profile analysis, which allows the more productive characterization of lithium-ion batteries (LIBs), and consequently benefits the development of preferable battery materials.</abstract>
    <parentTitle language="eng">Spectrochimica Acta Part B: Atomic Spectroscopy</parentTitle>
    <identifier type="doi">10.1016/j.sab.2023.106681</identifier>
    <identifier type="issn">0584-8547</identifier>
    <enrichment key="opus.source">publish</enrichment>
    <enrichment key="date_peer_review">11.09.2023</enrichment>
    <author>Zengchao You</author>
    <author>V. Hoffmann</author>
    <author>Dalia Morcillo</author>
    <author>Leonardo Agudo Jácome</author>
    <author>Robert Leonhardt</author>
    <author>Alexander Winckelmann</author>
    <author>Silke Richter</author>
    <author>Sebastian Recknagel</author>
    <author>Carlos Enrique Abad Andrade</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>GD-OES</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>depth profiles</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Li-ion battery</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>battery aging mechanism</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>current collector corrosion</value>
    </subject>
    <collection role="institutes" number="">1 Analytische Chemie; Referenzmaterialien</collection>
    <collection role="institutes" number="">1.6 Anorganische Referenzmaterialien und Gasanalytik</collection>
    <collection role="institutes" number="">3 Gefahrgutumschließungen; Energiespeicher</collection>
    <collection role="institutes" number="">3.1 Sicherheit von Gefahrgutverpackungen und Batterien</collection>
    <collection role="institutes" number="">5 Werkstofftechnik</collection>
    <collection role="institutes" number="">5.1 Mikrostruktur Design und Degradation</collection>
    <collection role="institutes" number="">S Qualitätsinfrastruktur</collection>
    <collection role="institutes" number="">S.1 Qualität im Prüfwesen</collection>
    <collection role="themenfelder" number="">Energie</collection>
    <collection role="themenfelder" number="">Elektrische Energiespeicher und -umwandlung</collection>
    <collection role="themenfelder" number="">Chemie und Prozesstechnik</collection>
    <collection role="themenfelder" number="">Chemische Charakterisierung und Spurenanalytik</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
  </doc>
  <doc>
    <id>64860</id>
    <completedYear/>
    <publishedYear>2025</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>1</pageFirst>
    <pageLast>25</pageLast>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>preprint</type>
    <publisherName/>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">High Quality Crystalline VN Thin Films via MOCVD from a New Vanadium Precursor: Linking Growth Chemistry to Functional Catalytic Surfaces</title>
    <abstract language="eng">Vanadium nitride (VN) has been identified as a promising material for numerous applications including electrochemical nitrogen reduction reaction (eNRR). For such applications, catalyst nanoengineering will help to experimentally test its theoretically predicted eNRR activity, but the majority of investigated VN catalysts are prepared by fabrication methods that do not allow for nanoengineering to the required degree. Herein, we report on a new metalorganic chemical vapor deposition (MOCVD) process for the growth of high quality, facetted and crystalline VN thin films relevant for eNRR applications. N,N’-diisopropylformamidinato [V(dpfamd)3] was identified as a promising precursor as it possesses favorable thermal properties relevant for MOCVD. The application of [V(dpfamd)3] in a MOCVD process with NH3 as co-reactant yielded crystalline VN thin films on Si substrates with high compositional purity. With the potential of using the catalytic activity of VN towards eNRR, the structure-property correlation is of relevance and in this context, the thin films were subjected to complementary analysis including X-ray diffraction (XRD), Rutherford backscattering spectrometry in combination with nuclear reaction analysis (RBS/NRA), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM) and transmission electron microscopy (TEM). Based on the observation of the significant influence NH3 has on the growth characteristics, we conducted first principles density functional theory (DFT) simulations of the precursor reactivity in the absence and presence of NH3 towards VN, supporting experimental findings of energetically more favorable decomposition of [V(dpfamd)3] to VN in the presence of NH3. Process transfer from Si to conductive Ti substrates, relevant for prospective electrochemical testing, revealed comparable VN thin film properties rendering these films promising for further investigation of eNRR applications in follow up studies.</abstract>
    <parentTitle language="eng">ChemRxiv</parentTitle>
    <identifier type="doi">10.26434/chemrxiv-2025-1t4gq</identifier>
    <identifier type="urn">urn:nbn:de:kobv:b43-648600</identifier>
    <enrichment key="opus.source">publish</enrichment>
    <enrichment key="opus.doi.autoCreate">false</enrichment>
    <enrichment key="opus.urn.autoCreate">true</enrichment>
    <licence>Creative Commons - CC BY - Namensnennung 4.0 International</licence>
    <author>J.-P. Glauber</author>
    <author>J. Lorenz</author>
    <author>J. Liu</author>
    <author>M. Seifert</author>
    <author>V. Hoffmann</author>
    <author>Carlos Enrique Abad Andrade</author>
    <author>D. Rogalla</author>
    <author>C. Harms</author>
    <author>M. Wark</author>
    <author>M. Nolan</author>
    <author>A. Devi</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Metal nitrades</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>MOCVD</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Nitrogen reduction reaction</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Precursors</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>DFT</value>
    </subject>
    <collection role="institutes" number="">1 Analytische Chemie; Referenzmaterialien</collection>
    <collection role="institutes" number="">1.6 Anorganische Referenzmaterialien und Gasanalytik</collection>
    <collection role="themenfelder" number="">Chemie und Prozesstechnik</collection>
    <collection role="themenfelder" number="">Chemische Charakterisierung und Spurenanalytik</collection>
    <collection role="fulltextaccess" number="">Datei für die Öffentlichkeit verfügbar ("Open Access")</collection>
    <collection role="literaturgattung" number="">Graue Literatur</collection>
    <collection role="unnumberedseries" number="">Preprints der BAM</collection>
    <thesisPublisher>Bundesanstalt für Materialforschung und -prüfung (BAM)</thesisPublisher>
    <file>https://opus4.kobv.de/opus4-bam/files/64860/vn-thin-films-via-mocvd.pdf</file>
  </doc>
</export-example>
