<?xml version="1.0" encoding="utf-8"?>
<export-example>
  <doc>
    <id>59326</id>
    <completedYear/>
    <publishedYear>2023</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>1</pageFirst>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>conferenceobject</type>
    <publisherName>IEEE</publisherName>
    <publisherPlace>New York, NY</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Infrared Attenuate Total Reflection Cell with a Functionalized Surface</title>
    <abstract language="eng">ATR cell utilizing chips from silicon wafers is discussed. The cell can be used for wet-chemical analysis on functionalized surfaces. Here, silicon chips are exemplarily "functionalized" by silica layers to provide a hydrophilic or hydrophobic ATR surface in-situ.</abstract>
    <parentTitle language="eng">Proceedings of the 48th International Conference on Infrared, Millimeter, and Terahertz Waves (IRMMW-THz)</parentTitle>
    <identifier type="doi">10.1109/IRMMW-THz57677.2023.10298918</identifier>
    <enrichment key="eventStart">17.09.2023</enrichment>
    <enrichment key="eventEnd">22.09.2023</enrichment>
    <enrichment key="opus.source">publish</enrichment>
    <enrichment key="eventName">48th International Conference on Infrared, Millimeter, and Terahertz Waves (IRMMW-THz)</enrichment>
    <enrichment key="eventPlace">Montreal, Quebec, Canada</enrichment>
    <enrichment key="opus.doi.autoCreate">false</enrichment>
    <enrichment key="opus.urn.autoCreate">true</enrichment>
    <enrichment key="date_peer_review">11.01.2024</enrichment>
    <author>U. Schade</author>
    <author>L. Puskar</author>
    <author>R. Golnak</author>
    <author>A. Veber</author>
    <author>Jörg Beckmann</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>THz radiation</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>ATR</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>FTIR</value>
    </subject>
    <collection role="ddc" number="543">Analytische Chemie</collection>
    <collection role="institutes" number="">8 Zerstörungsfreie Prüfung</collection>
    <collection role="institutes" number="">8.5 Röntgenbildgebung</collection>
    <collection role="themenfelder" number="">Chemie und Prozesstechnik</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
  </doc>
  <doc>
    <id>56943</id>
    <completedYear/>
    <publishedYear>2020</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>1</pageFirst>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>conferenceobject</type>
    <publisherName>IEEE</publisherName>
    <publisherPlace>Buffalo, NY</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Etalon effects in THz film measurements</title>
    <abstract language="eng">Etalon effects in THz transmittance spectra, either taken in time- domain or frequency-domain, often hamper or even hinder the interpretation of film properties. In this paper we discuss the transferability and applicability of spectroscopic methods typically employed in the near and mid infrared spectral range to eliminate the fringes in the transmittance spectra in the THz spectral range.</abstract>
    <parentTitle language="eng">2020 45th international conference on infrared, millimeter, and terahertz waves (IRMMW-THz) - Proceedings</parentTitle>
    <identifier type="issn">2162-2035</identifier>
    <identifier type="issn">2162-2027</identifier>
    <identifier type="isbn">978-1-7281-6620-9</identifier>
    <identifier type="doi">10.1109/IRMMW-THz46771.2020.9370451</identifier>
    <enrichment key="eventName">2020 45th International Conference on Infrared, Millimeter, and Terahertz Waves (IRMMW-THz)</enrichment>
    <enrichment key="eventPlace">Buffalo, NY, USA</enrichment>
    <enrichment key="eventStart">08.11.2020</enrichment>
    <enrichment key="eventEnd">13.11.2020</enrichment>
    <enrichment key="RelatedIdentifier">https://opus4.kobv.de/opus4-bam/frontdoor/index/index/docId/56945</enrichment>
    <enrichment key="opus.source">publish</enrichment>
    <enrichment key="date_peer_review">06.02.2023</enrichment>
    <author>U. Schade</author>
    <author>L. Puskar</author>
    <author>E. Ritter</author>
    <author>Jörg Beckmann</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>THz radiation</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Total transmittance reflection technique</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Etalon effects</value>
    </subject>
    <collection role="ddc" number="543">Analytische Chemie</collection>
    <collection role="institutes" number="">8 Zerstörungsfreie Prüfung</collection>
    <collection role="institutes" number="">8.5 Röntgenbildgebung</collection>
    <collection role="themenfelder" number="">Chemie und Prozesstechnik</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
  </doc>
  <doc>
    <id>56945</id>
    <completedYear/>
    <publishedYear>2020</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>poster</type>
    <publisherName/>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Etalon effects in THz film measurements</title>
    <abstract language="eng">Etalon features in transmittance spectra of films arise due to the coherent superposition of waves caused by reflections multiple times at the inner film boundaries. The fringe maxima occur at i𝜆 = 2nd cos 𝜑 with i - being an integer, 𝜆 - the wavelength, d - the film thickness, 𝜑 - the angle of incidence in respect to the film normal and n - the refractive index of the film. It is obvious that such features can hinder the interpretation of absorption bands when fringe amplitude and period are in the same range as the expected bands.&#13;
&#13;
This poster discusses the suitability of two optical methods for the THz spectral range applied to Fourier Transform Spectroscopy.</abstract>
    <enrichment key="eventName">2020 45th International Conference on Infrared, Millimeter, and Terahertz Waves (IRMMW-THz)</enrichment>
    <enrichment key="eventPlace">Buffalo, NY, USA</enrichment>
    <enrichment key="eventStart">08.11.2020</enrichment>
    <enrichment key="eventEnd">13.11.2020</enrichment>
    <enrichment key="opus.source">publish</enrichment>
    <enrichment key="RelatedIdentifier">https://opus4.kobv.de/opus4-bam/frontdoor/index/index/docId/56943</enrichment>
    <enrichment key="opus.doi.autoCreate">false</enrichment>
    <enrichment key="opus.urn.autoCreate">true</enrichment>
    <author>U. Schade</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>THz radiation</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Total transmittance reflection technique</value>
    </subject>
    <collection role="ddc" number="543">Analytische Chemie</collection>
    <collection role="institutes" number="">8 Zerstörungsfreie Prüfung</collection>
    <collection role="institutes" number="">8.5 Röntgenbildgebung</collection>
    <collection role="themenfelder" number="">Chemie und Prozesstechnik</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
    <collection role="literaturgattung" number="">Präsentation</collection>
  </doc>
</export-example>
