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  <doc>
    <id>51655</id>
    <completedYear/>
    <publishedYear>2020</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>063208</pageFirst>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue>6</issue>
    <volume>38</volume>
    <type>article</type>
    <publisherName/>
    <publisherPlace/>
    <creatingCorporation>American Vacuum Society</creatingCorporation>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Versailles Project on Advanced Materials and Standards interlaboratory study on intensity calibration for x-ray photoelectron spectroscopy instruments using low-density polyethylene</title>
    <abstract language="eng">We report the results of a Versailles Project on Advanced Materials and Standards interlaboratory study on the intensity scale calibration of x-ray photoelectron spectrometers using low-density polyethylene (LDPE) as an alternative material to gold, silver, and copper. An improved set of LDPE reference spectra, corrected for different instrument geometries using a quartz-monochromated Al Kα x-ray source, was developed using data provided by participants in this study. Using &#13;
these new reference spectra, a transmission function was calculated for each dataset that participants provided. When compared to a similar calibration procedure using the NPL reference spectra for gold, the LDPE intensity calibration method achieves an absolute offset of ∼3.0% and a systematic deviation of ±6.5% on average across all participants. For spectra recorded at high pass energies (≥90 eV), values of absolute offset and systematic deviation are ∼5.8% and ±5.7%, respectively, whereas for spectra collected at lower pass energies (&lt;90 eV), values of absolute offset and systematic deviation are ∼4.9% and ±8.8%, respectively; low pass energy spectra perform worse than the global average, in terms of systematic deviations, due to diminished count rates and signal-to-noise ratio. Differences in absolute offset are attributed to the surface roughness of the LDPE induced by sample preparation. We further assess the usability of LDPE as a secondary reference material and comment on its performance in the presence of issues such as variable dark noise, x-ray warm up times, inaccuracy at low count rates, and underlying spectrometer problems. In response to participant feedback and the results of the study, we provide an updated LDPE intensity calibration protocol to address the issues highlighted in the interlaboratory study. We also comment on the lack of implementation of a consistent and traceable intensity calibration method across the community of x-ray photoelectron spectroscopy (XPS) users and, therefore, propose a route to achieving this with the assistance of instrument manufacturers, metrology laboratories, and experts leading to an international standard for XPS intensity scale calibration.</abstract>
    <parentTitle language="eng">Journal of Vacuum Science &amp; Technology A</parentTitle>
    <identifier type="doi">10.1116/6.0000577</identifier>
    <enrichment key="date_peer_review">14.12.2020</enrichment>
    <author>B. P. Reed</author>
    <author>D.J.H. Cant</author>
    <author>J. Spencer</author>
    <author>A. J. Carmona-Carmona</author>
    <author>A. Bushell</author>
    <author>A. Herrara-Gómez</author>
    <author>A. Kurokawa</author>
    <author>A. Thissen</author>
    <author>A.G. Thomas</author>
    <author>A.J. Britton</author>
    <author>A. Bernasik</author>
    <author>A. Fuchs</author>
    <author>A. P. Baddorf</author>
    <author>B. Bock</author>
    <author>B. Thellacker</author>
    <author>B. Cheng</author>
    <author>D.G. Castner</author>
    <author>D.J. Morgan</author>
    <author>D. Valley</author>
    <author>E.A. Willneff</author>
    <author>E.F. Smith</author>
    <author>E. Nolot</author>
    <author>F. Xie</author>
    <author>G. Zorn</author>
    <author>G.C. Smith</author>
    <author>H. Yasukufu</author>
    <author>J. L. Fenton</author>
    <author>J. Chen</author>
    <author>J..D.P. Counsell</author>
    <author>Jörg Radnik</author>
    <author>K.J. Gaskell</author>
    <author>K. Artyushkova</author>
    <author>L. Yang</author>
    <author>L. Zhang</author>
    <author>M. Eguchi</author>
    <author>M. Walker</author>
    <author>M. Hajdyla</author>
    <author>M.M. Marzec</author>
    <author>M.R. Linford</author>
    <author>N. Kubota</author>
    <author>O. Cartazar-Martínez</author>
    <author>P. Dietrich</author>
    <author>R. Satoh</author>
    <author>S.L.M. Schroeder</author>
    <author>T.G. Avval</author>
    <author>T. Nagatomi</author>
    <author>V. Fernandez</author>
    <author>W. Lake</author>
    <author>Y. Azuma</author>
    <author>Y. Yoshikawa</author>
    <author>A.G. Shard</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>X-ray photoelectron spectroscopy</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Transmission function</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Intensity scale calibration</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Reference spectra</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Low-density polyethylene (LDPE)</value>
    </subject>
    <collection role="ddc" number="543">Analytische Chemie</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="themenfelder" number="">Chemie und Prozesstechnik</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
  </doc>
  <doc>
    <id>52380</id>
    <completedYear/>
    <publishedYear>2021</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>027001</pageFirst>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue>2</issue>
    <volume>39</volume>
    <type>article</type>
    <publisherName>American Vacuum Society</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">ERRATUM: “Versailles project on advanced materials and standards interlaboratory study on intensity calibration for x-ray photoelectron spectroscopy instruments using low-density polyethylene” [J. Vac. Sci. Technol. A 38, 063208 (2020)]</title>
    <abstract language="eng">The lead authors failed to name two collaborators as co-authors. The authors listed should include:&#13;
Miss Claudia L. Compean-Gonzalez (ORCID:&#13;
0000-0002-2367-8450) and Dr. Giacomo Ceccone (ORCID:&#13;
0000-0003-4637-0771).&#13;
These co-authors participated in VAMAS project A27, provided data that were analyzed and presented in this publication (and supporting information), and reviewed the manuscript before submission.</abstract>
    <parentTitle language="eng">Journal of Vacuum Science &amp; Technology A</parentTitle>
    <identifier type="doi">10.1116/6.0000907</identifier>
    <enrichment key="opus.source">publish</enrichment>
    <enrichment key="date_peer_review">07.04.2021</enrichment>
    <enrichment key="opus.doi.autoCreate">false</enrichment>
    <enrichment key="opus.urn.autoCreate">true</enrichment>
    <author>B. P. Reed</author>
    <author>D.J.H. Cant</author>
    <author>S.J. Spencer</author>
    <author>A. J. Carmona-Carmona</author>
    <author>A. Bushell</author>
    <author>A. Herrara-Gómez</author>
    <author>A. Kurokawa</author>
    <author>A. Thissen</author>
    <author>A.G. Thomas</author>
    <author>A.J. Britton</author>
    <author>A. Bernasik</author>
    <author>A. Fuchs</author>
    <author>A.P. Baddorf</author>
    <author>B. Bock</author>
    <author>B. Thellacker</author>
    <author>B. Cheng</author>
    <author>D.G. Castner</author>
    <author>D.J. Morgan</author>
    <author>D. Valley</author>
    <author>E.A. Willneff</author>
    <author>E.P. Smith</author>
    <author>E. Nolot</author>
    <author>F. Xie</author>
    <author>G. Zorn</author>
    <author>G.C. Smith</author>
    <author>H. Yasukufu</author>
    <author>J.L. Fenton</author>
    <author>J. Chen</author>
    <author>J.D.P. Counsell</author>
    <author>Jörg Radnik</author>
    <author>K.J. Gaskell</author>
    <author>K. Artyushkova</author>
    <author>L. Yang</author>
    <author>L. Zhang</author>
    <author>M. Eguchi</author>
    <author>M. Walker</author>
    <author>M. Hajdyla</author>
    <author>M.M. Marzec</author>
    <author>M.R. Linford</author>
    <author>N. Kubota</author>
    <author>O. Cortazar-Martinez</author>
    <author>P. Dietrich</author>
    <author>R. Satoh</author>
    <author>S.L.M. Schroeder</author>
    <author>T.G. Avval</author>
    <author>T. Nagatomi</author>
    <author>V. Fernandez</author>
    <author>W. Lake</author>
    <author>Y. Azuma</author>
    <author>Y. Yoshikawa</author>
    <author>C.L. Compean-Gonzalez</author>
    <author>G. Ceccone</author>
    <author>A.G. Shard</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>X-ray photoelectron spectroscopy</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Transmission function</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Low-density polyethylene</value>
    </subject>
    <collection role="ddc" number="543">Analytische Chemie</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="themenfelder" number="">Chemie und Prozesstechnik</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
  </doc>
  <doc>
    <id>54175</id>
    <completedYear/>
    <publishedYear>2021</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>08016</pageFirst>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue>1a</issue>
    <volume>58</volume>
    <type>article</type>
    <publisherName>IOP Publishing Lt.</publisherName>
    <publisherPlace>Bristol</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Thickness measurement of nm HfO2 films</title>
    <abstract language="eng">A pilot study for the thickness measurement of HfO2 films was performed by the Surface Analysis Working Group (SAWG) of the Consultative Committee for Amount of Substance (CCQM). The aim of this pilot study was to ensure the equivalency in the measurement capability of national metrology institutes for the thickness measurement of HfO2 films. In this pilot study, the thicknesses of six HfO2 films with nominal thickness from 1 nm to 4 nm were measured by X-ray Photoelectron Spectroscopy (XPS), X-ray Reflectometry(XRR), X-ray Fluorescence Analysis (XRF), Transmission Electron Spectroscopy (TEM), Spectroscopic Ellipsometry (SE) and Rutherford Backscattering Spectrometry (RBS). The reference thicknesses were determined by mutual calibration of a zero-offset method (Medium Energy Ion Scattering Spectroscopy (MEIS) of KRISS) and a method traceable to the length unit (the average thicknesses of three XRR data except the thinnest film). These reference thicknesses are traceable to the length unit because they are based on the traceability of XRR. For the thickness measurement by XPS, the effective attenuation length of Hf 4f electrons was determined. In the cases of XRR and TEM, the offset values were determined from a linear fitting between the reference thicknesses and the individual data by XRR and TEM. The amount of substance of HfO2, expressed as thickness of HfO2 films (in both linear and areal density units), was found to be a good subject for a CCQM key comparison.&#13;
&#13;
To reach the main text of this paper, click on Final Report.&#13;
&#13;
The final report has been peer-reviewed and approved for publication by the CCQM.</abstract>
    <parentTitle language="eng">Metrologia</parentTitle>
    <identifier type="issn">0026-1394</identifier>
    <identifier type="doi">10.1088/0026-1394/58/1A/08016</identifier>
    <enrichment key="opus.source">publish</enrichment>
    <enrichment key="date_peer_review">03.01.2022</enrichment>
    <enrichment key="opus.doi.autoCreate">false</enrichment>
    <enrichment key="opus.urn.autoCreate">true</enrichment>
    <author>K.J. Kim</author>
    <author>C.S. Kim</author>
    <author>S. W. Ruh</author>
    <author>Wolfgang Unger</author>
    <author>Jörg Radnik</author>
    <author>J. Mata-Salazar</author>
    <author>J.M. Juarez-Garcia</author>
    <author>O. Cortazar-Martinez</author>
    <author>A. Herrera-Gomez</author>
    <author>P.E. Hansen</author>
    <author>J.S. Madesen</author>
    <author>C.A. Senna</author>
    <author>B.S. Archanjo</author>
    <author>J.C. Damasceno</author>
    <author>C.A. Achete</author>
    <author>H. Wang</author>
    <author>M. Wang</author>
    <author>D. Windover</author>
    <author>E. Steel</author>
    <author>A. Kurokawa</author>
    <author>T. Fujimoto</author>
    <author>Y. Azuma</author>
    <author>S. Terauchi</author>
    <author>L. Zhang</author>
    <author>W.A. Jordaan</author>
    <author>S.J. Spencer</author>
    <author>A.G. Shard</author>
    <author>L. Koenders</author>
    <author>M. Krumrey</author>
    <author>I. Busch</author>
    <author>C. Jeynes</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Thickness measurements</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>nm films</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>X-ray Photoelectron Spectroscopy</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Mutual calibration</value>
    </subject>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="themenfelder" number="">Chemie und Prozesstechnik</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
  </doc>
  <doc>
    <id>63049</id>
    <completedYear/>
    <publishedYear>2023</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>08010</pageFirst>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume>60</volume>
    <type>report</type>
    <publisherName>IOP</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Final report of CCQM-K157 for the measurement of the amount of substance of HfO2 expressed as the thickness of nm films</title>
    <abstract language="eng">The key comparison CCQM-K157 for the thickness measurement of HfO2 films was performed by the Surface Analysis Working Group (SAWG) of the Consultative Committee for Amount of Substance (CCQM). The aim of CCQM-K157 is to establish the measurement traceability and to ensure the equivalency in the measurement capability of national metrology institutes for the thickness measurement of HfO2 films.&#13;
In this key comparison, the thicknesses of six HfO2 films with the nominal thickness range from 0.7 nm to 6 nm were compared by x-ray photoelectron spectroscopy (XPS), x-ray reflectometry (XRR), transmission electron microscopy (TEM), spectroscopic ellipsometry (SE) and medium energy ion scattering spectrometry (MEIS).&#13;
To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database https://www.bipm.org/kcdb/.&#13;
The final report has been peer-reviewed and approved for publication by the CCQM, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).</abstract>
    <parentTitle language="eng">Metrologia</parentTitle>
    <identifier type="doi">10.1088/0026-1394/60/1A/08010</identifier>
    <enrichment key="opus_doi_flag">false</enrichment>
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    <enrichment key="opus.source">publish</enrichment>
    <enrichment key="opus.doi.autoCreate">false</enrichment>
    <enrichment key="opus.urn.autoCreate">true</enrichment>
    <author>K. J. Kim</author>
    <author>H. Yu</author>
    <author>S. M. Lee</author>
    <author>J. H. Kwon</author>
    <author>H. Ruh</author>
    <author>Jörg Radnik</author>
    <author>B. S. Archanjo</author>
    <author>E. Annese</author>
    <author>J. C. Damasceno</author>
    <author>C. A. Achete</author>
    <author>Y. Yao</author>
    <author>L. Ren</author>
    <author>H. Gao</author>
    <author>D. Windover</author>
    <author>H. Matsuzaki</author>
    <author>Y. Azuma</author>
    <author>L. Zhang</author>
    <author>T. Fujimoto</author>
    <author>W. A. Jordaan</author>
    <author>B. Reed</author>
    <author>A. G. Shard</author>
    <author>L. Cibik</author>
    <author>C. Gollwitzer</author>
    <author>M. Krumrey</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>CCQM</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Thin Films</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>HfO2</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>thickness</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>XPS</value>
    </subject>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
  </doc>
  <doc>
    <id>54830</id>
    <completedYear/>
    <publishedYear>2022</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>4331</pageFirst>
    <pageLast>4345</pageLast>
    <pageNumber/>
    <edition/>
    <issue>15</issue>
    <volume>414</volume>
    <type>article</type>
    <publisherName>SpringerNature</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Composition, thickness, and homogeneity of the coating of core–shell nanoparticles—possibilities, limits, and challenges of X-ray photoelectron spectroscopy</title>
    <abstract language="eng">Core–shell nanoparticles have attracted much attention in recent years due to their unique properties and their increasing importance in many technological and consumer products. However, the chemistry of nanoparticles is still rarely investigated in comparison to their size and morphology. In this review, the possibilities, limits, and challenges of X-ray photoelectron spectroscopy (XPS) for obtaining more insights into the composition, thickness, and homogeneity of nanoparticle coatings are discussed with four examples: CdSe/CdS quantum dots with a thick coating and a small core; NaYF4-based upconverting nanoparticles with a large Yb-doped core and a thin Er-doped coating; and two types of polymer nanoparticles with a poly(tetrafluoroethylene) core with either a poly(methyl methacrylate) or polystyrene coating. Different approaches for calculating the thickness of the coating are presented, like a simple numerical modelling or a more complex simulation of the photoelectron peaks. Additionally, modelling of the XPS background for the investigation of coating is discussed. Furthermore, the new possibilities to measure with varying excitation energies or with hard-energy X-ray sources (hard-energy X-ray photoelectron spectroscopy) are described. A discussion about the sources of uncertainty for the determination of the thickness of the coating completes this review.</abstract>
    <parentTitle language="eng">Analytical and Bioanalytical Chemistry</parentTitle>
    <identifier type="doi">10.1007/s00216-022-04057-9</identifier>
    <identifier type="urn">urn:nbn:de:kobv:b43-548305</identifier>
    <enrichment key="opus.source">publish</enrichment>
    <enrichment key="date_peer_review">16.05.2022</enrichment>
    <licence>Creative Commons - CC BY - Namensnennung 4.0 International</licence>
    <author>Jörg Radnik</author>
    <author>Xenia Knigge</author>
    <author>Elina Andresen</author>
    <author>Ute Resch-Genger</author>
    <author>D.J.H. Cant</author>
    <author>A.G. Shard</author>
    <author>C.A. Clifford</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>X-ray spectroscopy</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Nanoparticles</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Spectroscopy / Instrumentation</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Spectroscopy / Theory</value>
    </subject>
    <collection role="ddc" number="543">Analytische Chemie</collection>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="institutes" number="">1 Analytische Chemie; Referenzmaterialien</collection>
    <collection role="institutes" number="">1.2 Biophotonik</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="themenfelder" number="">Chemie und Prozesstechnik</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei für die Öffentlichkeit verfügbar ("Open Access")</collection>
    <collection role="unnumberedseries" number="">Wissenschaftliche Artikel der BAM</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
    <thesisPublisher>Bundesanstalt für Materialforschung und -prüfung (BAM)</thesisPublisher>
    <file>https://opus4.kobv.de/opus4-bam/files/54830/Radnik2022_Article_CompositionThicknessAndHomogen.pdf</file>
  </doc>
  <doc>
    <id>54335</id>
    <completedYear/>
    <publishedYear>2022</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>014001-1</pageFirst>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue>1</issue>
    <volume>29</volume>
    <type>article</type>
    <publisherName>AVS</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Ionic liquid [PMIM]+[NTf2]− (Solarpur®) characterized by XPS</title>
    <abstract language="eng">X-ray photoelectron spectroscopy (XPS) was performed on the meniscus of a droplet of ionic liquid 1-propyl-3-methyl-imidazolium bis(trifluoromethylsulfonyl) imide [PMIM]+[NTf2]− (Solarpur®) in ultrahigh vacuum. High-resolution spectra of F 1s, O 1s, N 1s, C 1s, and S 2p are presented along with a survey spectrum and the valence band structure. The spectra presented here were generated using monochromatic Al Kα radiation (1486.6 eV).</abstract>
    <parentTitle language="eng">Surface Science Spectra</parentTitle>
    <identifier type="doi">10.1116/6.0001518</identifier>
    <enrichment key="opus.source">publish</enrichment>
    <enrichment key="date_peer_review">14.02.2022</enrichment>
    <enrichment key="opus.doi.autoCreate">false</enrichment>
    <enrichment key="opus.urn.autoCreate">true</enrichment>
    <author>B.P. Reed</author>
    <author>Jörg Radnik</author>
    <author>A.G. Shard</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Ionic liquid</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>1-propyl-3-methyl-imidazolium bis(trifluoromethylsulfonyl)imide</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>X-ray Photoelectron Spectroscopy</value>
    </subject>
    <collection role="ddc" number="543">Analytische Chemie</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="themenfelder" number="">Chemie und Prozesstechnik</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
    <collection role="unnumberedseries" number="">Wissenschaftliche Artikel der BAM</collection>
  </doc>
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