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  <doc>
    <id>63049</id>
    <completedYear/>
    <publishedYear>2023</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>08010</pageFirst>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume>60</volume>
    <type>report</type>
    <publisherName>IOP</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Final report of CCQM-K157 for the measurement of the amount of substance of HfO2 expressed as the thickness of nm films</title>
    <abstract language="eng">The key comparison CCQM-K157 for the thickness measurement of HfO2 films was performed by the Surface Analysis Working Group (SAWG) of the Consultative Committee for Amount of Substance (CCQM). The aim of CCQM-K157 is to establish the measurement traceability and to ensure the equivalency in the measurement capability of national metrology institutes for the thickness measurement of HfO2 films.&#13;
In this key comparison, the thicknesses of six HfO2 films with the nominal thickness range from 0.7 nm to 6 nm were compared by x-ray photoelectron spectroscopy (XPS), x-ray reflectometry (XRR), transmission electron microscopy (TEM), spectroscopic ellipsometry (SE) and medium energy ion scattering spectrometry (MEIS).&#13;
To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database https://www.bipm.org/kcdb/.&#13;
The final report has been peer-reviewed and approved for publication by the CCQM, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).</abstract>
    <parentTitle language="eng">Metrologia</parentTitle>
    <identifier type="doi">10.1088/0026-1394/60/1A/08010</identifier>
    <enrichment key="opus_doi_flag">false</enrichment>
    <enrichment key="opus_import_data">&lt;div class="errorPage"&gt;    &lt;h2&gt;Anwendungsfehler&lt;/h2&gt;        &lt;div class="exceptionMessage"&gt;        Unable to Connect to ssl://api.crossref.org:443. Error #110: Connection timed out    &lt;/div&gt;        &lt;/div&gt;</enrichment>
    <enrichment key="opus.source">publish</enrichment>
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    <enrichment key="opus.urn.autoCreate">true</enrichment>
    <author>K. J. Kim</author>
    <author>H. Yu</author>
    <author>S. M. Lee</author>
    <author>J. H. Kwon</author>
    <author>H. Ruh</author>
    <author>Jörg Radnik</author>
    <author>B. S. Archanjo</author>
    <author>E. Annese</author>
    <author>J. C. Damasceno</author>
    <author>C. A. Achete</author>
    <author>Y. Yao</author>
    <author>L. Ren</author>
    <author>H. Gao</author>
    <author>D. Windover</author>
    <author>H. Matsuzaki</author>
    <author>Y. Azuma</author>
    <author>L. Zhang</author>
    <author>T. Fujimoto</author>
    <author>W. A. Jordaan</author>
    <author>B. Reed</author>
    <author>A. G. Shard</author>
    <author>L. Cibik</author>
    <author>C. Gollwitzer</author>
    <author>M. Krumrey</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>CCQM</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Thin Films</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>HfO2</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>thickness</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>XPS</value>
    </subject>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
  </doc>
  <doc>
    <id>57636</id>
    <completedYear/>
    <publishedYear>2023</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>496</pageFirst>
    <pageLast>500</pageLast>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume>55</volume>
    <type>article</type>
    <publisherName>Wiley</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Elemental composition and thickness determination of thin films by electron probe microanalysis</title>
    <abstract language="eng">Electron probe microanalysis (EPMA) applies to solid samples of homogenous (bulk) chemical composition and can usually not be applied to structures which are inhomogeneous in the micrometer range such as thin film systems down to a few nm. However, in combination with the established thin film software Stratagem, the thickness as well as the elemental composition of thin films on a substrate can be determined. This has been recently successfully demonstrated for Fe-Ni on Si and Si-Ge on Al2O3 thin film systems. For both systems five samples of different elemental composition and a reference were produced and characterised by inductively coupled plasma mass spectrometry (ICP-MS), Rutherford backscattering (RBS), and transmission electron microscopy (TEM) as reference values. Last year, a new and open-source thin film evaluation programme called BadgerFilm has been released. It can also be used to determine thin film composition and thickness from intensity ratios of the unknown sample and standards (k-ratios). In this contribution, we reevaluated the data acquired for the Fe-Ni and Si-Ge systems using the BadgerFilm software package and compared the obtained elemental compositions and thickness values with the results of the Stratagem software and the reference methods. The conclusion is that the BadgerFilm software shows good agreement with the elemental composition and thickness calculated by Stratagem (mostly &lt;2% for both composition and thickness) and with the reference values for two representative thin film systems (&lt;1%–2% for composition and &lt;10%–20% for thickness).</abstract>
    <parentTitle language="eng">Surface and Interface Analysis</parentTitle>
    <identifier type="issn">0142-2421</identifier>
    <identifier type="doi">10.1002/sia.7183</identifier>
    <identifier type="urn">urn:nbn:de:kobv:b43-576368</identifier>
    <enrichment key="opus.source">publish</enrichment>
    <enrichment key="date_peer_review">12.06.2023</enrichment>
    <licence>Creative Commons - CC BY - Namensnennung 4.0 International</licence>
    <author>R. Terborg</author>
    <author>K. J. Kim</author>
    <author>Vasile-Dan Hodoroaba</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Elemental composition</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>EPMA</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Film thickness</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Thin films</value>
    </subject>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei für die Öffentlichkeit verfügbar ("Open Access")</collection>
    <collection role="unnumberedseries" number="">Wissenschaftliche Artikel der BAM</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
    <thesisPublisher>Bundesanstalt für Materialforschung und -prüfung (BAM)</thesisPublisher>
    <file>https://opus4.kobv.de/opus4-bam/files/57636/SurfInterfAnal_2023_Terborg_Kim_Hodoroaba_CompoThinFilmsByEMPA.pdf</file>
  </doc>
</export-example>
