<?xml version="1.0" encoding="utf-8"?>
<export-example>
  <doc>
    <id>61046</id>
    <completedYear/>
    <publishedYear>2024</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>2334</pageFirst>
    <pageLast>2348</pageLast>
    <pageNumber/>
    <edition/>
    <issue>10</issue>
    <volume>14</volume>
    <type>article</type>
    <publisherName>Optica Publishing Group</publisherName>
    <publisherPlace>Washington DC, USA</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Impact of Ho3+, Er3+, and Tm3+ on laser cooling of Yb:YLF</title>
    <abstract language="eng">Ytterbium-doped LiYF4 (Yb:YLF) is a promising material for all-solid-state optical cryocoolers, but the impact of foreign rare-earth impurities on the laser-cooling performance is not completely understood. In particular, Tm3+ has been reported to reduce the background absorption. This study quantitatively assesses the impact of Ho3+, Tm3+, and Er3+ impurities on laser-cooling of Yb:YLF by anti-Stokes fluorescence. We grew five Yb(5%):YLF crystals intentionally doped with tens of ppm levels of these impurities. Laser-induced thermal modulation spectroscopy tests confirmed that these rare-earth impurities reduce the external quantum efficiency of Yb:YLF without affecting the background absorption coefficient. Although Er3+ is a well-known quencher for Yb3+, Er3+ co-doping only slightly decreases the laser-cooling efficiency at low pump intensities but becomes detrimental at high pump intensities (&gt;5 kW cm−2). However, this detrimental effect diminishes at lower temperatures, as evidenced by cooling an Er3+ co-doped crystal to the same minimum temperature of 144K as a solely Yb3+-doped crystal. Contrary to previous reports, Tm3+ proved to be the most detrimental among the three impurities.</abstract>
    <parentTitle language="eng">Optical Materials Express</parentTitle>
    <identifier type="doi">10.1364/OME.538215</identifier>
    <enrichment key="opus.source">publish</enrichment>
    <enrichment key="date_peer_review">21.10.2024</enrichment>
    <author>S. Püschel</author>
    <author>Z. Liestmann</author>
    <author>S. Kalusniak</author>
    <author>C. Kränkel</author>
    <author>Andreas Schulz</author>
    <author>Heike Traub</author>
    <author>H. Tanaka</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>ICP</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Laser cooling</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Impurity</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>LiYF4</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Crystal</value>
    </subject>
    <collection role="ddc" number="543">Analytische Chemie</collection>
    <collection role="institutes" number="">1 Analytische Chemie; Referenzmaterialien</collection>
    <collection role="institutes" number="">1.1 Anorganische Spurenanalytik</collection>
    <collection role="themenfelder" number="">Chemie und Prozesstechnik</collection>
    <collection role="themenfelder" number="">Chemische Charakterisierung und Spurenanalytik</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
  </doc>
</export-example>
