<?xml version="1.0" encoding="utf-8"?>
<export-example>
  <doc>
    <id>21711</id>
    <completedYear/>
    <publishedYear>2010</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>474</pageFirst>
    <pageLast>481</pageLast>
    <pageNumber/>
    <edition/>
    <issue>6</issue>
    <volume>7</volume>
    <type>article</type>
    <publisherName>Wiley-VCH Verl.</publisherName>
    <publisherPlace>Weinheim</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Non-destructive sub-surface chemical characterization of air-exposed plasma polymers by energy-resolved XPS</title>
    <parentTitle language="eng">Plasma processes and polymers</parentTitle>
    <identifier type="old">24153</identifier>
    <identifier type="doi">10.1002/ppap.200900130</identifier>
    <identifier type="issn">1612-8850</identifier>
    <identifier type="issn">1612-8869</identifier>
    <enrichment key="bibliotheksstandort">Sonderstandort: Publica-Schrank</enrichment>
    <enrichment key="date_peer_review">19.07.2010</enrichment>
    <author>Pierre-Luc Girard-Lauriault</author>
    <author>Iris Retzko</author>
    <author>Sufal Swaraj</author>
    <author>N. Matsubayashi</author>
    <author>Thomas Gross</author>
    <author>Renate Mix</author>
    <author>Wolfgang Unger</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Plasma polymers</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Synchrotron XPS</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Depth profiling</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Derivatisation</value>
    </subject>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Physisches Exemplar in der Bibliothek der BAM vorhanden ("Hardcopy Access")</collection>
  </doc>
  <doc>
    <id>23993</id>
    <completedYear/>
    <publishedYear>2011</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>535</pageFirst>
    <pageLast>550</pageLast>
    <pageNumber/>
    <edition/>
    <issue>4</issue>
    <volume>31</volume>
    <type>article</type>
    <publisherName>Plenum Publ. Corp.</publisherName>
    <publisherPlace>New York, NY, USA</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Ultra-shallow chemical characterization of organic thin films deposited by plasma and vacuum-ultraviolet, using angle- and excitation energy-resolved XPS</title>
    <abstract language="eng">Nitrogen (N)-rich organic thin films were deposited using both low-pressure plasma- and vacuum-ultraviolet-based techniques, from mixtures of ammonia (NH3) and ethylene (C2H4). These films were investigated using angle-resolved and excitation energy resolved X-ray photoelectron spectroscopy (ARXPS and ERXPS, respectively) in order to determine their sub-surface chemical profiles. These two techniques enable one to tune the “XPS 95%” information depth, z 95%, by varying either the angle or the excitation energy. Using a combination of both techniques, z 95% can be varied continuously from 0.7 to 11 nm. The surface-near chemistry is investigated using both high-resolution C 1s spectra and elemental concentrations derived from elemental peak intensities. Results show that while laboratory XPS, and even ARXPS, suggest homogenous surface chemistries, the novel combination of ARXPS and ERXPS points to the existence of a compositional profile in the extreme outer surface layer. Our conclusions are supported by simulations using SESSA software.</abstract>
    <parentTitle language="eng">Plasma chemistry and plasma processing</parentTitle>
    <identifier type="old">26613</identifier>
    <identifier type="doi">10.1007/s11090-011-9306-3</identifier>
    <identifier type="issn">0272-4324</identifier>
    <enrichment key="date_peer_review">07.07.2011</enrichment>
    <author>Pierre-Luc Girard-Lauriault</author>
    <author>J.-C. Ruiz</author>
    <author>Thomas Gross</author>
    <author>M. R. Wertheimer</author>
    <author>Wolfgang Unger</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Plasma polymers</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Vacuum ultraviolet photopolymers</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Synchrotron XPS</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Depth profile</value>
    </subject>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
  </doc>
</export-example>
