<?xml version="1.0" encoding="utf-8"?>
<export-example>
  <doc>
    <id>32695</id>
    <completedYear/>
    <publishedYear>2014</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>601</pageFirst>
    <pageLast>604</pageLast>
    <pageNumber/>
    <edition/>
    <issue>3</issue>
    <volume>571</volume>
    <type>article</type>
    <publisherName>Elsevier</publisherName>
    <publisherPlace>Amsterdam</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Optical characterization of patterned thin films</title>
    <abstract language="eng">The present study investigates the use of imaging and mapping ellipsometry to determine the properties of non-ideal and patterned thin film samples. Samples which are candidates for future references and standards were prepared for this purpose. The samples investigated were lithographically patterned SiO2 and photoresist layers. The thickness and the optical constants of the two materials were determined using spectroscopic ellipsometry in the visible spectral range. On a larger lateral scale of several mm lateral resolution, the homogeneity was investigated using a goniospectral rotating compensator ellipsometer. A nulling imaging ellipsometer was used to determine the properties of the sample on a smaller scale of 25–150 µm.</abstract>
    <parentTitle language="eng">Thin solid films</parentTitle>
    <identifier type="old">35771</identifier>
    <identifier type="doi">10.1016/j.tsf.2013.11.052</identifier>
    <identifier type="issn">0040-6090</identifier>
    <enrichment key="date_peer_review">05.03.2015</enrichment>
    <author>Dana Maria Rosu</author>
    <author>P. Petrik</author>
    <author>G. Rattmann</author>
    <author>M. Schellenberger</author>
    <author>Uwe Beck</author>
    <author>Andreas Hertwig</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Spectroscopic imaging and mapping ellipsometry</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Inhomogeneous and patterned thin films</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>SiO2</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Photoresist</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Ellipsometrie</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Patterned films</value>
    </subject>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
  </doc>
</export-example>
