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  <doc>
    <id>26147</id>
    <completedYear/>
    <publishedYear>2012</publishedYear>
    <thesisYearAccepted/>
    <language>deu</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>lecture</type>
    <publisherName/>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="deu">Charakterisierung von Oberflächen und dünnen Schichten mit Ellipsometrie</title>
    <parentTitle language="deu">BLiX-Seminar, TU Berlin</parentTitle>
    <identifier type="old">28892</identifier>
    <enrichment key="eventName">BLiX-Seminar, TU Berlin</enrichment>
    <enrichment key="eventPlace">Berlin, Germany</enrichment>
    <enrichment key="eventStart">2012-07-10</enrichment>
    <enrichment key="eventEnd">2012-07-10</enrichment>
    <enrichment key="InvitedTalks">0</enrichment>
    <author>Andreas Hertwig</author>
    <collection role="fulltextaccess" number="">Weder Datei noch physisches Exemplar vorhanden ("No Access")</collection>
    <collection role="literaturgattung" number="">Präsentation</collection>
  </doc>
  <doc>
    <id>25407</id>
    <completedYear/>
    <publishedYear>2005</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>1</pageFirst>
    <pageLast>22</pageLast>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>other</type>
    <publisherName>Bundesanstalt für Materialforschung und -prüfung</publisherName>
    <publisherPlace>Berlin</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Certified reference material BAM-L101 TiO2/SiO2 multilayer on BK7 glass</title>
    <parentTitle language="eng">Certification reports</parentTitle>
    <identifier type="old">28121</identifier>
    <identifier type="url">http://www.rm-certificates.bam.de/de/rm-certificates_media/rm_cert_layer_and_surface/bam_l101repe.pdf</identifier>
    <enrichment key="bibliotheksstandort">Sonderstandort: Publica-Schrank</enrichment>
    <author>Uwe Beck</author>
    <author>Andreas Hertwig</author>
    <author>Marion Männ</author>
    <collection role="literaturgattung" number="">Eigenverlag BAM</collection>
    <collection role="fulltextaccess" number="">Physisches Exemplar in der Bibliothek der BAM vorhanden ("Hardcopy Access")</collection>
  </doc>
  <doc>
    <id>27304</id>
    <completedYear/>
    <publishedYear>2012</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>1</pageFirst>
    <pageLast>4</pageLast>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>conferenceobject</type>
    <publisherName/>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Optical layer systems for product authentication: interference, scattering, light diffusion and ellipsometric encoding as public, hidden and forensic security features</title>
    <abstract language="eng">Embedding of information on surfaces is state of the art for identification testing in which public, hidden and forensic features are used. In many instances, the legal authentication of a product, a material or a document is required. Among the surface-based encoded labels, bar codes and data matrices are most frequently applied. They are publicly visible. The material itself is irrelevant, only a sufficient optical contrast is required.&#13;
However, a strong material dependence of the label can be achieved by means of Fabry-Perot layer stacks. Stack designs are described with regard to all three security levels: public features (e.g. color and tilt effect) perceptible by the human eye, hidden features (e.g. optical response in a given spectral range) detectable by commonly available instruments and forensic features (ellipsometric quantities Ψ and Δ as a function of wavelength λ and angle of incidence AOI) only detectable by sophisticated instruments.&#13;
Regarding material-correlated authentication, ellipsometric quantities Ψ and Δ are used as encoded forensic features for the first time. Hence, Fabry-Perot layer stacks as information carriers in combination with imaging ellipsometry as optical read-out system provide all-in-one anti-counterfeiting capabilities.</abstract>
    <parentTitle language="eng">PSE 2012 - 13th International conference on plasma surface engineering</parentTitle>
    <identifier type="old">30112</identifier>
    <identifier type="url">http://www.pse-conferences.net/tl_files/pse2012/abstractupload/PSE2012-PO1001-ext.pdf</identifier>
    <enrichment key="eventName">PSE 2012 - 13th International conference on plasma surface engineering</enrichment>
    <enrichment key="eventPlace">Garmisch-Partenkirchen, Germany</enrichment>
    <enrichment key="eventStart">10.09.2012</enrichment>
    <enrichment key="eventEnd">14.09.2012</enrichment>
    <author>D. Hönig</author>
    <author>S. Schneider</author>
    <author>R. Domnick</author>
    <author>M. Belzner</author>
    <author>Uwe Beck</author>
    <author>Andreas Hertwig</author>
    <author>Ralph Stephanowitz</author>
    <author>Matthias Weise</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Fabry-Perot layers</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Ellipsometry</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Anti-counterfeiting</value>
    </subject>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
    <collection role="literaturgattung" number="">Graue Literatur</collection>
  </doc>
  <doc>
    <id>28629</id>
    <completedYear/>
    <publishedYear>2013</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>9</pageFirst>
    <pageLast>14</pageLast>
    <pageNumber/>
    <edition/>
    <issue>1</issue>
    <volume>112</volume>
    <type>article</type>
    <publisherName>Springer</publisherName>
    <publisherPlace>Berlin</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Femtosecond laser pulse irradiation effects on thin hydrogenated amorphous carbon layers</title>
    <abstract language="eng">The irradiation of ~0.9-µm-thick hydrogenated amorphous carbon (a-C:H) layers deposited on silicon substrates with single femtosecond (fs) laser pulses (35 fs pulse duration, 790 nm centre wavelength) in air is studied experimentally. Irradiation spots have been generated with different peak fluences and subsequently investigated by optical topometry, micro Raman spectroscopy and microscale mechanical indentation in order to evaluate their microscopic, topographical, structural and mechanical properties (e.g. elastic modulus). By this multi-method approach, a clear separation of different effects (delamination and graphitisation) becomes possible. The joint application of mechanical and spectroscopic techniques provides unique insights into the effects of the fs-laser radiation on the carbon layer.</abstract>
    <parentTitle language="eng">Applied physics A</parentTitle>
    <identifier type="old">31496</identifier>
    <identifier type="doi">10.1007/s00339-012-7170-5</identifier>
    <identifier type="issn">0947-8396</identifier>
    <enrichment key="date_peer_review">10.06.2013</enrichment>
    <author>Jörn Bonse</author>
    <author>Andreas Hertwig</author>
    <author>Robert Koter</author>
    <author>Matthias Weise</author>
    <author>Uwe Beck</author>
    <author>Philipp Reinstädt</author>
    <author>Michael Griepentrog</author>
    <author>Jörg Krüger</author>
    <author>M. Picquart</author>
    <author>E. Haro-Poniatowski</author>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
  </doc>
  <doc>
    <id>28802</id>
    <completedYear/>
    <publishedYear>2013</publishedYear>
    <thesisYearAccepted/>
    <language>deu</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>poster</type>
    <publisherName/>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="deu">Enhanced SPR-ellipsometric gas sensors with doped dielectric layers</title>
    <parentTitle language="deu">ICSE 6 Konferenz</parentTitle>
    <identifier type="old">31687</identifier>
    <enrichment key="eventName">ICSE 6 Konferenz</enrichment>
    <enrichment key="eventPlace">Kyoto, Japan</enrichment>
    <enrichment key="eventStart">2013-05-26</enrichment>
    <enrichment key="eventEnd">2013-05-31</enrichment>
    <author>Andreas Hertwig</author>
    <collection role="fulltextaccess" number="">Weder Datei noch physisches Exemplar vorhanden ("No Access")</collection>
    <collection role="literaturgattung" number="">Präsentation</collection>
  </doc>
  <doc>
    <id>28803</id>
    <completedYear/>
    <publishedYear>2013</publishedYear>
    <thesisYearAccepted/>
    <language>deu</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>lecture</type>
    <publisherName/>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="deu">Enhanced SPR-ellipsometric gas sensors with doped dielectric layers</title>
    <parentTitle language="deu">ICSE 6 Konferenz</parentTitle>
    <identifier type="old">31688</identifier>
    <enrichment key="eventName">ICSE 6 Konferenz</enrichment>
    <enrichment key="eventPlace">Kyoto, Japan</enrichment>
    <enrichment key="eventStart">2013-05-26</enrichment>
    <enrichment key="eventEnd">2013-05-31</enrichment>
    <enrichment key="InvitedTalks">0</enrichment>
    <author>Andreas Hertwig</author>
    <collection role="fulltextaccess" number="">Weder Datei noch physisches Exemplar vorhanden ("No Access")</collection>
    <collection role="literaturgattung" number="">Präsentation</collection>
  </doc>
  <doc>
    <id>28804</id>
    <completedYear/>
    <publishedYear>2013</publishedYear>
    <thesisYearAccepted/>
    <language>deu</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>lecture</type>
    <publisherName/>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="deu">Gasdetektion mit komplexen SPR-Sensoren und ellipsometrischem Messprinzip</title>
    <parentTitle language="deu">Bunsentagung 2013</parentTitle>
    <identifier type="old">31689</identifier>
    <enrichment key="eventName">Bunsentagung 2013</enrichment>
    <enrichment key="eventPlace">Karlsruhe, Germany</enrichment>
    <enrichment key="eventStart">2013-05-09</enrichment>
    <enrichment key="eventEnd">2013-05-11</enrichment>
    <enrichment key="InvitedTalks">0</enrichment>
    <author>Andreas Hertwig</author>
    <collection role="fulltextaccess" number="">Weder Datei noch physisches Exemplar vorhanden ("No Access")</collection>
    <collection role="literaturgattung" number="">Präsentation</collection>
  </doc>
  <doc>
    <id>60661</id>
    <completedYear/>
    <publishedYear>2024</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>researchdata</type>
    <publisherName>Zenodo</publisherName>
    <publisherPlace>Geneva</publisherPlace>
    <creatingCorporation>Bundesanstalt für Materialforschung und  prüfung (BAM)</creatingCorporation>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Optical constants of a single AlN layer on Si</title>
    <abstract language="eng">Spectroscopic ellipsometry was used to determine the thickness and dielectric function of a Aluminium Nitride (AlN) layer on a Si wafer. The layer was determined to be 170 nm thick. The layer was provided by AIXTRON and manufactured by means of MOVPE.&#13;
&#13;
The data was created using a M2000DI spectroscopic ellipsometer from Woollam Co. Inc. Analysis was done using the CompleteEASE software. The model used is a multi-peak oscillator model for the AlN layer.&#13;
&#13;
The data resembles common database values for the material AlN.</abstract>
    <identifier type="url">https://zenodo.org/records/12743500</identifier>
    <identifier type="doi">10.5281/zenodo.12743499</identifier>
    <enrichment key="ScientificResourceTypeGeneral">Datensatz</enrichment>
    <enrichment key="ScientificDateCreatedEnd">06.06.2023</enrichment>
    <enrichment key="ScientificGeolocation">Berlin, Germany</enrichment>
    <enrichment key="ScientificNote">Data Table of n and k over the wavelength from 192 nm to 1697 nm.</enrichment>
    <enrichment key="opus.source">publish</enrichment>
    <enrichment key="opus.doi.autoCreate">false</enrichment>
    <enrichment key="opus.urn.autoCreate">true</enrichment>
    <licence>Creative Commons - CC BY - Namensnennung 4.0 International</licence>
    <author>Andreas Hertwig</author>
    <author>Elena Ermilova</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Aluminium nitride</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Thin solid layers</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Spectroscopic ellipsometry</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Compund semiconductors</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>MOVPE</value>
    </subject>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="fulltextaccess" number="">Datei für die Öffentlichkeit verfügbar ("Open Access")</collection>
    <collection role="literaturgattung" number="">Graue Literatur</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
    <collection role="unnumberedseries" number="">Forschungsdatensätze der BAM</collection>
  </doc>
  <doc>
    <id>55467</id>
    <completedYear/>
    <publishedYear>2022</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>57</pageFirst>
    <pageLast>58</pageLast>
    <pageNumber/>
    <edition/>
    <issue>3-4 (Topical issue: Ellipsometry)</issue>
    <volume>11</volume>
    <type>article</type>
    <publisherName>De Gruyter</publisherName>
    <publisherPlace>Berlin</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Ellipsometry and polarimetry - Classical measurement techniques with always new developments, concepts, and applications</title>
    <abstract language="eng">Ellipsometry is a matured experimental method, whose roots reach back into the early phase of modern optics itself. It is often attributed to be invented by Paul Drude in the last decade of the 19th century, but similar techniques had already been applied for years before Drude started his work. With this Special Issue about ellipsometry and related techniques, we hope to bring more attention to this method and advance and propagate it to be used by a broader community. We have collected a good mixture of articles: some texts are more in the line of users’ tutorial and best practice guides; others are intended to show recent developments of the method. With this collection, we also hope to show the generally rapidly expanding possibilities of ellipsometry and polarimetry to draw attention of new users and previously unrelated communities to this valuable tool.</abstract>
    <parentTitle language="eng">Advanced optical technologies</parentTitle>
    <identifier type="issn">2192-8584</identifier>
    <identifier type="doi">10.1515/aot-2022-0025</identifier>
    <identifier type="issn">2192-8576</identifier>
    <enrichment key="opus.source">publish</enrichment>
    <enrichment key="RelatedIdentifier">https://opus4.kobv.de/opus4-bam/frontdoor/index/index/docId/55468</enrichment>
    <enrichment key="date_peer_review">12.08.2022</enrichment>
    <author>R. Schmidt-Grund</author>
    <author>C. Sturm</author>
    <author>Andreas Hertwig</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Ellipsometry</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Polarimetry</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Surfaces</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Thin films</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Optical analysis</value>
    </subject>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
  </doc>
  <doc>
    <id>60247</id>
    <completedYear/>
    <publishedYear>2024</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>lecture</type>
    <publisherName/>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Determining Material Properties with Spectroscopic Ellipsometry</title>
    <abstract language="eng">In this lecture, an introduction will be given on Spectroscopic Ellipsometry, what quantities can be obtained with it, and how we use it in ELENA and other projects to determine functional parameters of thin layers at the nanoscale.</abstract>
    <enrichment key="eventName">Summer school ELENAM : metrology at the nanoscale</enrichment>
    <enrichment key="eventPlace">Fréjus, France</enrichment>
    <enrichment key="eventStart">02.06.2024</enrichment>
    <enrichment key="eventEnd">07.06.2024</enrichment>
    <enrichment key="InvitedTalks">1</enrichment>
    <enrichment key="opus.source">publish</enrichment>
    <enrichment key="opus.doi.autoCreate">false</enrichment>
    <enrichment key="opus.urn.autoCreate">true</enrichment>
    <author>Andreas Hertwig</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Thin Layers</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Ellipsometry</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Nanotechnology</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Electrical Paramters</value>
    </subject>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
    <collection role="literaturgattung" number="">Präsentation</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
  </doc>
  <doc>
    <id>60266</id>
    <completedYear/>
    <publishedYear>2024</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>lecture</type>
    <publisherName/>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">On the use of spectroscopic imaging ellipsometry for quantification and characterisation of defects in thin films for power electronics</title>
    <abstract language="eng">Compound semiconductors (CS) are promising materials for the development of high-power electrical applications. They have low losses, can withstand high temperatures and can operate at very high voltages and currents. This makes them a key technology for the electrification of many high energy applications, especially electromobility and HVDC power lines.&#13;
&#13;
The challenge with CS technology is that most of the process technology has to be developed anew to the high standards required by electronic applications. Today, compound semiconductors can be produced in thin layers on top of substrates fabricated from classical crystal growth processes that are already well established. A promising method for this is metal organic vapour phase epitaxy (MOVPE). With this method, many different compounds with semiconducting properties can be synthesized. Additionally, this process technology is a direct thin layer deposition method. Therefore, complex multilayer systems can be generated directly by the deposition process and without the need of doping after growing.&#13;
&#13;
There are a number of critical defects that can originate from the deposition process of these thin film devices. Within this project, we intend to develop new correlative imaging and analysis techniques to determine defect types, to quantify defect size and number density, as well as to characterise defects for process optimisation.&#13;
&#13;
We report here on the use of spectroscopic ellipsometry and imaging ellipsometry to investigate defects in several different compound semiconductor materials used in high-power electronic devices. The materials we investigated are Î²-Ga2O3, SiC, GaN, AlN, and AlGaN materials as well as oxidised SiC surfaces. All of these materials have their typical defects and require optimised measurement and analysis schemes for reliable detection and analysis. Spectroscopic ellipsometry is a highly sensitive method for determining the thicknesses and dielectric function of thin layers, yielding potentially a high number of microscopic properties. The combined method between ellipsometry and optical microscopy is called imaging ellipsometry and is especially powerful for the large amount of data it produces. We have analysed defects in SiC- and AlN-based thin film semiconductors as well as characterised the properties of different types of SiO2 layers created on top of SiC monocrystals. We developed ellipsometric models for the data analysis of the different semiconductor materials.&#13;
&#13;
If the defects have geometric features, it is useful to combine the ellipsometric analysis with topometry method like interference microscopy and scanning probe microscopy. We have successfully characterised function-critical defects in MOVPE SiC layers and correlated the findings with topography from WLIM measurements. We have developed an imaging ellipsometric measurement methodology that allows to estimate the relative defect area on a surface by a statistical raw data analysis.&#13;
&#13;
&#13;
&#13;
&#13;
&#13;
&#13;
Compound semiconductors (CS) are promising materials for the development of high-power electrical applications. They have low losses, can withstand high temperatures and can operate at very high voltages and currents. This makes them a key technology for the electrification of many high energy applications, especially electromobility and HVDC power lines.&#13;
&#13;
The challenge is that most of the process technology has to be developed specifically and tailored to the high standards required by electronic applications. Today, many different CS materials can be produced in thin layers on top of substrates fabricated from classical crystal growth processes that are already well established. A promising method for this is metal organic vapour phase epitaxy (MOVPE). This technology is a direct thin layer deposition method capable of producing complex multilayer systems directly from one deposition process without the need of doping after growing.&#13;
&#13;
There are a number of critical defects that can originate from the deposition process when targeting electronic thin film devices. Within this project, we intend to develop new correlative imaging and analysis techniques to determine defect types, to quantify defect size and density, as well as to characterise defects for further process optimisation.&#13;
&#13;
We report here on the use of spectroscopic and multispectral imaging ellipsometry to investigate defects in several different compound semiconductor materials used in high-power electronic devices. The materials we investigated are β-Ga2O3, SiC, GaN, AlN, and AlGaN as well as oxidised SiC. All of these materials have their typical defects and require optimised measurement and analysis schemes for reliable detection and analysis. Spectroscopic ellipsometry is a highly sensitive method for determining the thicknesses and dielectric function of thin layers, yielding potentially a high number of microscopic properties. The combined method between ellipsometry and optical microscopy is known as imaging ellipsometry and is especially powerful for the large amount of data it produces. We have analysed defects in SiC- and AlN-based thin film semiconductors as well as characterised the properties of different types of SiO2 layers created on top of SiC monocrystals. We developed ellipsometric models for the data analysis of the different semiconductor materials.&#13;
&#13;
If the defects have geometric features, it is useful to combine the ellipsometric analysis with topometry methods like interference microscopy and scanning probe microscopy. We have successfully characterised function-critical defects in MOVPE SiC layers and correlated the findings with topography from WLIM measurements. We have developed an imaging ellipsometric measurement methodology that allows to estimate the relative defect area on a surface by a statistical raw data analysis.</abstract>
    <enrichment key="eventName">EMRS Spring Meeting 2024 - ALTECH 2024</enrichment>
    <enrichment key="eventPlace">Strasbourg, France</enrichment>
    <enrichment key="eventStart">27.05.2024</enrichment>
    <enrichment key="eventEnd">31.05.2024</enrichment>
    <enrichment key="InvitedTalks">0</enrichment>
    <enrichment key="opus.source">publish</enrichment>
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    <enrichment key="opus.urn.autoCreate">true</enrichment>
    <author>Andreas Hertwig</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Ellipsometry</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Power Electronics</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Layer Materials</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Defect Analysis</value>
    </subject>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
    <collection role="literaturgattung" number="">Präsentation</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
  </doc>
  <doc>
    <id>61812</id>
    <completedYear/>
    <publishedYear>2024</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>1</pageFirst>
    <pageLast>9</pageLast>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>report</type>
    <publisherName/>
    <publisherPlace/>
    <creatingCorporation>LNE Laboratoire Nationale de métrologie et d'essays</creatingCorporation>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Publishable Summary for 20IND12 Elena Electrical nanoscale metrology in industry</title>
    <abstract language="eng">Consumer electronics, innovative quantum technologies, and Internet of Things applications all rely on semiconductors, where reliable characterisation of electrical properties at the nanoscale is essential for European innovation and competitiveness. The measurement of these properties allows the evaluation of critical parameters used to define the performance of electronic materials and components. Currently, Conductive Atomic Force Microscopes and Scanning Microwave Microscopes enable nanoscale electrical characterisation, but they are costly, complicated and, in many cases where they are used, unreliable as measurements are not traceable. The aim of the project was to make such measurements traceable for the first time, with stated uncertainties, and affordable by developing and testing cost effective instrumentation and the first “out of lab” reference standards from DC to GHz and by elaborating robust calibration methods and good practice guides using simplified uncertainty budgets. All the objectives were achieved. The project has successfully improved the user-friendly uncertainty quantification for the electrical measurements at the nanoscale in the industrial environment. The design of calibration standards has been improved and new standards for DC resistance / current as well as HF impedance have been introduced and quantified. Good practice guides for the calibration and uncertainty quantification have been written and will be available to the users’ community. New ways of determining the properties of standard samples like ellipsometry have been evaluated. The interaction with stakeholders and industry collaborators was very important for the consortium and several case studies were carried out with industry-relevant samples. All data, procedures, and example uncertainty data from the project are included into the standardisation process and two IEC standards projects have been started during this project. These standards will be used as one important dissemination ways for the results of the project.</abstract>
    <enrichment key="opus.source">publish</enrichment>
    <enrichment key="opus.doi.autoCreate">false</enrichment>
    <enrichment key="opus.urn.autoCreate">true</enrichment>
    <author>François Piquemal</author>
    <author>Johannes Hoffmann</author>
    <author>Brice Gautier</author>
    <author>Andreas Hertwig</author>
    <author>Norbert Frabricius</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Electrical Properties</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Nanometrology</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Scanning Probe Microscopy</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Optical Surface Analysis</value>
    </subject>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
    <collection role="literaturgattung" number="">Graue Literatur</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
  </doc>
  <doc>
    <id>63718</id>
    <completedYear/>
    <publishedYear>2025</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>1</pageFirst>
    <pageLast>12</pageLast>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>article</type>
    <publisherName>Royal Society of Chemistry (RSC)</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Molecular Mobility of Thin Films and the Adsorbed Layer of Poly(2-vinylpyridine)</title>
    <abstract language="eng">The molecular dynamics of thin films and the adsorbed layer of poly(2-vinylpyridine) (P2VP) were investigated using broadband dielectric spectroscopy (BDS) and spectroscopic ellipsometry. Thin films of P2VP were prepared on silicon substrates and characterized to understand the influence of film thickness on the thermal glass transition temperature (Tg) and molecular mobility. The ellipsometric study revealed a decrease in Tg with decreasing film thickness, attributed to the enhanced mobility at the polymer/air interface. The adsorbed layer, prepared via the solvent leaching approach, exhibited a higher Tg compared to the bulk, indicating reduced molecular mobility due to strong polymer substrate interactions. The dielectric measurements were carried out in two different electrode configurations, crossed electrode capacitors (CEC) and nanostructured electrodes (NSE), where the latter allows for a free surface layer at the polymer/air interface. The relaxation rates of the α-relaxation measured in the CEC geometry collapse into one chart independent from the film thickness. For the thin films measured in the NSE arrangement the relaxation rates slow down with decreasing film thickness which was discussed as related to a stronger interaction of the P2VP segments with the native SiO2 at the surface of the silicon substrate compared to aluminum. It is worth to note that the effect of the enhanced mobility at the polymer/air interface is not observed in the dielectric measurements. BDS measurements in NSE geometry identified an additional relaxation process (α*-relaxation) in thin films, which was more pronounced in the adsorbed layer. This process is hypothesized to be related to molecular fluctuations within the adsorbed layer including the adsorption/desorption dynamics of segments or to a Slow Arrhenius Process (SAP) related to the equilibration dynamics deep in the glassy state.</abstract>
    <parentTitle language="eng">Soft Matter</parentTitle>
    <identifier type="doi">10.1039/d5sm00539f</identifier>
    <identifier type="urn">urn:nbn:de:kobv:b43-637181</identifier>
    <identifier type="issn">1744-6848</identifier>
    <enrichment key="opus.source">publish</enrichment>
    <enrichment key="date_peer_review">28.07.2025</enrichment>
    <licence>Creative Commons - CC BY - Namensnennung 4.0 International</licence>
    <author>Marcel Gawek</author>
    <author>Paulina Szymoniak</author>
    <author>Deniz Hülagü</author>
    <author>Andreas Hertwig</author>
    <author>Andreas Schönhals</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Thin polymer films</value>
    </subject>
    <collection role="ddc" number="62">Ingenieurwissenschaften</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei für die Öffentlichkeit verfügbar ("Open Access")</collection>
    <collection role="unnumberedseries" number="">Wissenschaftliche Artikel der BAM</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
    <thesisPublisher>Bundesanstalt für Materialforschung und -prüfung (BAM)</thesisPublisher>
    <file>https://opus4.kobv.de/opus4-bam/files/63718/D5SM00539F.pdf</file>
  </doc>
  <doc>
    <id>53743</id>
    <completedYear/>
    <publishedYear>2021</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>3000</pageFirst>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue>11</issue>
    <volume>11</volume>
    <type>article</type>
    <publisherName>MDPI</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Spatial Period of Laser-Induced Surface Nanoripples on PET Determines Escherichia coli Repellence</title>
    <abstract language="eng">Bacterial adhesion and biofilm formation on surfaces are associated with persistent microbial contamination, biofouling, and the emergence of resistance, thus, calling for new strategies to impede bacterial surface colonization. Using ns-UV laser treatment (wavelength 248 nm and a pulse duration of 20 ns), laser-induced periodic surface structures (LIPSS) featuring different submicrometric periods ranging from ~210 to ~610 nm were processed on commercial poly(ethylene terephthalate) (PET) foils. Bacterial adhesion tests revealed that these nanorippled surfaces exhibit a repellence for E. coli that decisively depends on the spatial periods of the LIPSS with the strongest reduction (~91%) in cell adhesion observed for LIPSS periods of 214 nm. Although chemical and structural analyses indicated a moderate laser-induced surface oxidation, a significant influence on the bacterial adhesion was ruled out. Scanning electron microscopy and additional biofilm studies&#13;
using a pili-deficient E. coli TG1 strain revealed the role of extracellular appendages in the bacterial repellence observed here.</abstract>
    <parentTitle language="eng">Nanomaterials</parentTitle>
    <identifier type="doi">10.3390/nano11113000</identifier>
    <identifier type="urn">urn:nbn:de:kobv:b43-537431</identifier>
    <enrichment key="opus.source">publish</enrichment>
    <enrichment key="date_peer_review">06.12.2021</enrichment>
    <licence>Creative Commons - CC BY - Namensnennung 4.0 International</licence>
    <author>Anja Richter</author>
    <author>G. Buchberger</author>
    <author>D. Stifter</author>
    <author>J. Duchoslav</author>
    <author>Andreas Hertwig</author>
    <author>Jörn Bonse</author>
    <author>J. Heitz</author>
    <author>Karin Schwibbert</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Laser-induced periodic surface structures (LIPSS)</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Laser processing</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Polyethylene terephthalate</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Biofilm formation</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Cell appendages</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Biomimetic</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>F pili</value>
    </subject>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="ddc" number="628">Sanitär- und Kommunaltechnik; Umwelttechnik</collection>
    <collection role="institutes" number="">4 Material und Umwelt</collection>
    <collection role="institutes" number="">4.1 Biologische Materialschädigung und Referenzorganismen</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.2 Material- und Oberflächentechnologien</collection>
    <collection role="themenfelder" number="">Umwelt</collection>
    <collection role="themenfelder" number="">Umwelt-Material-Interaktionen</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
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    <collection role="unnumberedseries" number="">Wissenschaftliche Artikel der BAM</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
    <thesisPublisher>Bundesanstalt für Materialforschung und -prüfung (BAM)</thesisPublisher>
    <file>https://opus4.kobv.de/opus4-bam/files/53743/2021-Richter-Spatial Period of Laser-Induced Surface Nanoripples on PET.pdf</file>
  </doc>
  <doc>
    <id>59766</id>
    <completedYear/>
    <publishedYear>2024</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>researchdata</type>
    <publisherName>Refractiveindex.info</publisherName>
    <publisherPlace/>
    <creatingCorporation>Bundesanstalt für Materialforschung und -prüfung (BAM)</creatingCorporation>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Optical constants of In2O3-SnO2 (Indium tin oxide, ITO)</title>
    <abstract language="eng">Optical constants of In2O3-SnO2 (Indium tin oxide, ITO)&#13;
Minenkov et al. 2024: on glass; n,k 0.191–1.69 µm&#13;
&#13;
Optical constants of In2O3-SnO2 (Indium tin oxide, ITO)&#13;
Minenkov et al. 2024: on Si wafer, top; n,k 0.191–1.69 µm&#13;
&#13;
Optical constants of In2O3-SnO2 (Indium tin oxide, ITO)&#13;
Minenkov et al. 2024: on Si wafer, bottom; n,k 0.191–1.69 µm</abstract>
    <identifier type="url">https://refractiveindex.info/?shelf=other&amp;book=In2O3-SnO2&amp;page=Minenkov-glass</identifier>
    <identifier type="url">https://refractiveindex.info/?shelf=other&amp;book=In2O3-SnO2&amp;page=Minenkov-wafer-top</identifier>
    <identifier type="url">https://refractiveindex.info/?shelf=other&amp;book=In2O3-SnO2&amp;page=Minenkov-wafer-bottom</identifier>
    <enrichment key="ScientificResourceTypeGeneral">Datensatz</enrichment>
    <enrichment key="ScientificGeolocation">Berlin, Germany; Linz, Austria</enrichment>
    <enrichment key="ScientificNote">Refractive index of ITO thin layers on different substrates, determined by means of spectroscopic multiangle ellipsometry in the wavelength range between 192 nm and 1692 nm.</enrichment>
    <enrichment key="RelatedIdentifier">https://doi.org/10.1021/acsami.3c17923</enrichment>
    <enrichment key="opus.source">publish</enrichment>
    <licence>Creative Commons - CC0 1.0 - Universell - Public Domain Dedication</licence>
    <author>Manuela Schiek</author>
    <author>Alexey Minenkov</author>
    <author>Sophia Hollweger</author>
    <author>Jiri Duchoslav</author>
    <author>Otgonbayar Erdene-Ochir</author>
    <author>Matthias Weise</author>
    <author>Elena Ermilova</author>
    <author>Andreas Hertwig</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Indium Tin Oxide</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Optical constants</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Magnetron Sputtering</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Electrochemical Degradation</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Spectroscopic Ellipsometry</value>
    </subject>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="fulltextaccess" number="">Datei für die Öffentlichkeit verfügbar ("Open Access")</collection>
    <collection role="literaturgattung" number="">Graue Literatur</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
    <collection role="unnumberedseries" number="">Forschungsdatensätze der BAM</collection>
  </doc>
  <doc>
    <id>63631</id>
    <completedYear/>
    <publishedYear>2025</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>lecture</type>
    <publisherName/>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Characterization of electrical properties in microstructured ITO layers using spectroscopic ellipsometry</title>
    <abstract language="eng">Thin indium tin oxide (ITO) layers are essential in optoelectronics due to their good electrical conductivity, optical transparency in the visible and near infrared regions, substrate adherence and chemical stability. They are widely used in photovoltaic cells,  displays, and organic LEDs, and as low emissivity coatings in smart windows and energy-efficient buildings. For nanophotonic devices, understanding the interplay of ITO’s optical and electrical properties is crucial. Electrical resistivity can be tuned by modifying deposition conditions and layer thickness. However, measuring these properties, especially on microstructured surfaces, remains challenging due to the issues like homogeneity and instability during etching. &#13;
&#13;
Spectroscopic ellipsometry (SE), a non-destructive and phase-sensitive optical technique, offers precise measurement of thin film thickness and dielectric properties. In this study, we investigated the layer thickness, optical constants, and sheet resistance of unstructured and microstructured ITO thin layers using SE. Unstructured layers were deposited via DC-magnetron sputtering on silicon (Si) substrates in argon (Ar) atmospheres with varying oxygen (O2) flows. &#13;
&#13;
This multi-technique approach enhances the understanding of ITO layer structuring and provides robust methodologies for correlating optical and electrical properties, advancing metrology for nanotechnology applications and material science. It also opens the pathway to new reference samples and calibration methods for electrical properties involving device-like structured samples.</abstract>
    <enrichment key="eventName">ICSE10 - 10th International Conference on Spectroscopic Ellipsometry</enrichment>
    <enrichment key="eventPlace">Boulder, CO, USA</enrichment>
    <enrichment key="eventStart">08.06.2025</enrichment>
    <enrichment key="eventEnd">13.06.2025</enrichment>
    <enrichment key="InvitedTalks">0</enrichment>
    <enrichment key="opus.source">publish</enrichment>
    <enrichment key="opus.doi.autoCreate">false</enrichment>
    <enrichment key="opus.urn.autoCreate">true</enrichment>
    <author>Deniz Hülagü</author>
    <author>Elena Ermilova</author>
    <author>Matthias Weise</author>
    <author>Sophie de Préville</author>
    <author>Johannes Hoffmann</author>
    <author>José Morán-Meza</author>
    <author>Francois Piquemal</author>
    <author>Andreas Hertwig</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Ellipsometry</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Indium tin oxide (ITO)</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Scanning microwave microscopy (SMM)</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Sheet resistance calibration standards</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>ITO wet etching</value>
    </subject>
    <collection role="ddc" number="543">Analytische Chemie</collection>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="themenfelder" number="">Chemie und Prozesstechnik</collection>
    <collection role="themenfelder" number="">Chemische Charakterisierung und Spurenanalytik</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
    <collection role="literaturgattung" number="">Präsentation</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
  </doc>
  <doc>
    <id>62624</id>
    <completedYear/>
    <publishedYear>2025</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>1</pageFirst>
    <pageLast>18</pageLast>
    <pageNumber/>
    <edition/>
    <issue>14</issue>
    <volume>222</volume>
    <type>article</type>
    <publisherName>Wiley</publisherName>
    <publisherPlace>Hoboken, New Jersey, USA</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Multimethod Electrical Characterization of Thin Indium Tin Oxide Films: Structuring and Calibration Sample Development for Scanning Probe Microscopy</title>
    <abstract language="eng">Indium tin oxide (ITO), a transparent conductive oxide, is widely used in optoelectronic applications due to its electrical conductivity, optical transparency, and chemical stability. This study employs spectroscopic ellipsometry (SE) to analyze ITO layers, enabling nondestructive determination of film thickness, dielectric functions, and bulk conductivity. Electrical properties derived from SE are compared with those obtained using the four‐point probe method (4PM) to improve metrological tools for nanotechnology applications and optimize deposition process monitoring for better control of film properties. This work also investigates the chemical stability of ITO layers under etching conditions and explores the development of new sheet resistance standards for scanning microwave microscopy (SMM). The results show that ITO resistivity, calculated from fitted SE data, increases with oxygen flow rate up to 5 cm3(STP) min−1. Good agreement is observed between sheet resistance values obtained by SE and 4PM up to 3 cm3(STP) min−1. Additionally, the sheet resistance values of a distinct set of microstructured ITO samples with different ITO layer thicknesses are determined by SMM, which are highly consistent with those obtained by the 4PM.</abstract>
    <parentTitle language="eng">physica status solidi (a)</parentTitle>
    <identifier type="issn">1862-6300</identifier>
    <identifier type="doi">10.1002/pssa.202400871</identifier>
    <identifier type="urn">urn:nbn:de:kobv:b43-626242</identifier>
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This study employs spectroscopic ellipsometry (SE) to analyze ITO layers, enabling nondestructive determination of film thickness, dielectric functions, and bulk conductivity. Electrical properties derived from SE are compared with those obtained using the four\u2010point probe method (4PM) to improve metrological tools for nanotechnology applications and optimize deposition process monitoring for better control of film properties. This work also investigates the chemical stability of ITO layers under etching conditions and explores the development of new sheet resistance standards for scanning microwave microscopy (SMM). The results show that ITO resistivity, calculated from fitted SE data, increases with oxygen flow rate up to 5\u2009cm&lt;jats:sup&gt;3&lt;\/jats:sup&gt;&lt;jats:sub&gt;(STP)&lt;\/jats:sub&gt;\u2009min&lt;jats:sup&gt;\u22121&lt;\/jats:sup&gt;. Good agreement is observed between sheet resistance values obtained by SE and 4PM up to 3\u2009cm&lt;jats:sup&gt;3&lt;\/jats:sup&gt;&lt;jats:sub&gt;(STP)&lt;\/jats:sub&gt;\u2009min&lt;jats:sup&gt;\u22121&lt;\/jats:sup&gt;. Additionally, the sheet resistance values of a distinct set of microstructured ITO samples with different ITO layer thicknesses are determined by SMM, which are highly consistent with those obtained by the 4PM.&lt;\/jats:p&gt;","DOI":"10.1002\/pssa.202400871","type":"journal-article","created":{"date-parts":[[2025,2,20]],"date-time":"2025-02-20T03:16:01Z","timestamp":1740021361000},"update-policy":"https:\/\/doi.org\/10.1002\/crossmark_policy","source":"Crossref","is-referenced-by-count":0,"title":["Multimethod Electrical Characterization of Thin Indium Tin Oxide Films: Structuring and Calibration Sample Development for Scanning Probe Microscopy"],"prefix":"10.1002","author":[{"ORCID":"https:\/\/orcid.org\/0000-0002-7567-7425","authenticated-orcid":false,"given":"Deniz","family":"H\u00fclag\u00fc","sequence":"first","affiliation":[{"name":"Division 6.1 Surface and Thin Film Analysis Federal Institute for Materials Research and Testing (BAM)  Unter den Eichen 44\u201046 12203 Berlin Germany"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-7663-3686","authenticated-orcid":false,"given":"Elena","family":"Ermilova","sequence":"additional","affiliation":[{"name":"Division 6.1 Surface and Thin Film Analysis Federal Institute for Materials Research and Testing (BAM)  Unter den Eichen 44\u201046 12203 Berlin Germany"}]},{"given":"Matthias","family":"Weise","sequence":"additional","affiliation":[{"name":"Division 6.1 Surface and Thin Film Analysis Federal Institute for Materials Research and Testing (BAM)  Unter den Eichen 44\u201046 12203 Berlin Germany"}]},{"ORCID":"https:\/\/orcid.org\/0000-0001-8122-7765","authenticated-orcid":false,"given":"Sophie","family":"de Pr\u00e9ville","sequence":"additional","affiliation":[{"name":"Federal Institute of Metrology METAS  Lindenweg 50 3003 Bern\u2010Wabern Switzerland"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-2757-4958","authenticated-orcid":false,"given":"Johannes","family":"Hoffmann","sequence":"additional","affiliation":[{"name":"Federal Institute of Metrology METAS  Lindenweg 50 3003 Bern\u2010Wabern Switzerland"}]},{"ORCID":"https:\/\/orcid.org\/0000-0001-6352-6040","authenticated-orcid":false,"given":"Jos\u00e9","family":"Mor\u00e1n\u2010Meza","sequence":"additional","affiliation":[{"name":"Fundamental electrical metrology department Laboratoire national de m\u00e9trologie et d'essais (LNE)  29 avenue Roger Hennequin 78197 Trappes Cedex France"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-7950-0475","authenticated-orcid":false,"given":"Fran\u00e7ois","family":"Piquemal","sequence":"additional","affiliation":[{"name":"Fundamental electrical metrology department Laboratoire national de m\u00e9trologie et d'essais (LNE)  29 avenue Roger Hennequin 78197 Trappes Cedex France"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-1380-0109","authenticated-orcid":false,"given":"Andreas","family":"Hertwig","sequence":"additional","affiliation":[{"name":"Division 6.1 Surface and Thin Film Analysis Federal Institute for Materials Research and Testing (BAM)  Unter den Eichen 44\u201046 12203 Berlin Germany"}]}],"member":"311","published-online":{"date-parts":[[2025,2,19]]},"reference":[{"key":"e_1_2_9_2_1","doi-asserted-by":"publisher","DOI":"10.1016\/j.tsf.2012.11.135"},{"key":"e_1_2_9_3_1","doi-asserted-by":"publisher","DOI":"10.1016\/j.tsf.2016.04.047"},{"key":"e_1_2_9_4_1","doi-asserted-by":"publisher","DOI":"10.1016\/j.tsf.2007.10.082"},{"key":"e_1_2_9_5_1","doi-asserted-by":"publisher","DOI":"10.1002\/pssa.201600467"},{"key":"e_1_2_9_6_1","doi-asserted-by":"publisher","DOI":"10.1038\/am.2016.89"},{"key":"e_1_2_9_7_1","doi-asserted-by":"publisher","DOI":"10.1016\/j.jallcom.2012.08.003"},{"key":"e_1_2_9_8_1","doi-asserted-by":"crossref","unstructured":"C.Secouard C.Ducros P.Roca i Cabarrocas S.No\u00ebl F.Sanchette in4M 2006 \u2010 Second Int. 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    <licence>Creative Commons - CC BY - Namensnennung 4.0 International</licence>
    <author>Deniz Hülagü</author>
    <author>Elena Ermilova</author>
    <author>Matthias Weise</author>
    <author>Sophie de Préville</author>
    <author>Johannes Hoffmann</author>
    <author>José Morán‐Meza</author>
    <author>François Piquemal</author>
    <author>Andreas Hertwig</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Ellipsometry</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Indium tin oxide (ITO)</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Scanning microwave microscopy (SMM)</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Sheet resistance calibration standards</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>ITO wet etching</value>
    </subject>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
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    <collection role="unnumberedseries" number="">Wissenschaftliche Artikel der BAM</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
    <collection role="themenfelder" number="">Materialdesign</collection>
    <thesisPublisher>Bundesanstalt für Materialforschung und -prüfung (BAM)</thesisPublisher>
    <file>https://opus4.kobv.de/opus4-bam/files/62624/Huelague et al._2025_PSSA.pdf</file>
  </doc>
  <doc>
    <id>27680</id>
    <completedYear/>
    <publishedYear>2012</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>828</pageFirst>
    <pageLast>839</pageLast>
    <pageNumber/>
    <edition/>
    <issue>5-6</issue>
    <volume>97</volume>
    <type>article</type>
    <publisherName>Mineralogical Society of America</publisherName>
    <publisherPlace>Washington, DC</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation/>
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    <title language="eng">The morphology of the reaction front of the dissolution-precipitation reaction rutile + wollastonite = titanite in time series experiments at 600 °C/400 MPa</title>
    <abstract language="eng">Fluid-assisted mass transport reactions by dissolution-precipitation, where a precursor mineral reacts with a fluid, play an important role in metamorphism and metasomatism. We investigated titanite growth on rutile in time series experiments between one and 107 days at constant P-T conditions of 600 °C and 400 MPa in the system TiO2-CaO-SiO2-Na2O-HCl-H2O. A two-capsule assemblage allows for transport of Ca and Si from dissolving wollastonite to dissolving rutile, the Ti-source, in a NaCl-bearing aqueous fluid, according to the general reaction CaSiO3 + TiO2 = CaTiSiO5. Complete overgrowth of rutile by titanite occurred after just one day of experiment. Fine-grained lozenge-shaped titanite crystals of short-time runs (up to 14 days) reorganize to larger predominantly prismatic crystals after &gt;14 days. &#13;
&#13;
After investigation by scanning electron microscopy, the titanite overgrowth was removed from the rutile by hydrofluoric acid, to provide a three-dimensional view of the dissolution-reaction front on the rutile surface. The morphology of the rutile surface is dominated by humps or ridges beneath the central region of a titanite crystal and valleys at the grain boundaries between adjacent titanite crystals. The dissolution pattern on the rutile surface mimics the titanite overgrowth and changes with changing grain size and shape of the titanite with longer run times. The preferred dissolution of rutile in the valleys is clearly linked to the position of the titanite grain boundaries, which served as pathways for fluid-assisted element transport. Rutile-titanite and titanite-titanite boundaries show a significant porosity in transmission electron microscopy images of foils prepared by focused ion beam milling. The large-scale dissolution pattern on the rutile surface is independent of the crystallographic orientation of the rutile and entirely dominated by the arrangement of titanite crystals in the overgrowth. Dissolution features on a scale smaller than ~1 µm are dominated by stepwise dissolution and etch-pits following the crystallographic orientation of the rutile. Similar observations were made in experiments with an additional Al-source, although these experiments result in a different overgrowth pattern; i.e., an exposed rutile surface is always present and solitary titanite crystals are accompanied by partial overgrowths. Quantitative characterization of the surface morphology by white-light interference microscopy demonstrates that, with increasing grain size of titanite, dissolution of rutile is strongly enhanced at the titanite grain boundaries. &#13;
&#13;
Natural examples of titanite overgrowths on rutile show the same relations between element pathways, arrangement of titanite crystals and 3D dissolution pattern on rutile as in the experimental systems. We conclude that the transport of Ti away from the rutile and of Ca + Si into the reaction rim occurred in a grain boundary fluid, the composition of which must have been strongly different from the composition of the bulk fluid in the experiment, as well as in the natural system. The reaction progress depends on the availability of a fluid, and relicts of rutile in titanite indicate restricted availability of fluid in the natural system (e.g., a fluid pulse that was consumed by the reactions). The reaction examined here can serve as a proxy for other reactions of the conversion of oxide minerals (e.g., spinel or corundum) into silicates.</abstract>
    <parentTitle language="eng">The American mineralogist</parentTitle>
    <identifier type="old">30511</identifier>
    <identifier type="doi">10.2138/am.2012.3742</identifier>
    <identifier type="issn">0003-004X</identifier>
    <identifier type="issn">1945-3027</identifier>
    <enrichment key="date_peer_review">14.02.2013</enrichment>
    <author>F. Lucassen</author>
    <author>G. Franz</author>
    <author>R. Wirth</author>
    <author>Matthias Weise</author>
    <author>Andreas Hertwig</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Experimental mineralogy</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Rutile</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Titanite</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Dissolution-precipitation</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Reaction morphology</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Geochemistry &amp; Geophysics</value>
    </subject>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
  </doc>
  <doc>
    <id>63630</id>
    <completedYear/>
    <publishedYear>2025</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>1</pageFirst>
    <pageLast>11</pageLast>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume>13531</volume>
    <type>conferenceobject</type>
    <publisherName>SPIE</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Polydopamine – a bio-inspired polymer for X-ray mirror coatings and other technical applications</title>
    <abstract language="eng">Although the organic molecule dopamine (3,4-dihydroxyphenethylamine) is commonly known as one of the “hormones of happiness”, thin polymer films of polydopamine (PDA) also have interesting technical properties. PDA is a very strong glue that sticks on almost everything, even under water. In nature, PDA is found in the byssal thread cuticles of mussels. When produced by dip-coating, the self-organizing PDA layers grow in a reproducible thickness of single or multiple molecule monolayers of a few nanometres thickness only. Here we present an optimized preparation regime as derived from polymerization analysis through absorption spectroscopy. One application is the use of thin PDA overcoatings to increase the soft X-ray reflectivity of astronomical X-ray mirrors. Furthermore, we give an outlook to other technical applications for this interesting material, presenting this bio-inspired organic polymer as an innovative technical solution for the future, with applications such as PDA-based super-capacitors and its promising role in enhancing separator materials for batteries.</abstract>
    <parentTitle language="eng">SPIE Digital Library</parentTitle>
    <identifier type="doi">10.1117/12.3056298</identifier>
    <enrichment key="eventName">SPIE Optics + Optoelectronics 2025</enrichment>
    <enrichment key="eventPlace">Prague, Czech Republic</enrichment>
    <enrichment key="eventStart">07.04.2025</enrichment>
    <enrichment key="eventEnd">10.04.2025</enrichment>
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    <author>Diana Khropost</author>
    <author>Franziska Riethmüller</author>
    <author>Thorsten Döhring</author>
    <author>Dennis Flachs</author>
    <author>Deniz Hülagü</author>
    <author>Andreas Hertwig</author>
    <author>Vincenzo Cotroneo</author>
    <author>eugenio gibertini</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>X-ray mirrors</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Reflectivity</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Polydopamine</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Ellipsometry</value>
    </subject>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
    <collection role="themenfelder" number="">Materialdesign</collection>
  </doc>
  <doc>
    <id>63636</id>
    <completedYear/>
    <publishedYear>2025</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
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    <type>lecture</type>
    <publisherName/>
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    <contributingCorporation/>
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    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Polydopamine -a bionic material and its potential applications for batteries</title>
    <abstract language="eng">Polydopamine (PDA) recently came into focus as an innovative material for applications in various technical fields. It is a very strong glue that sticks on almost everything, even under water: In nature, PDA is found in the byssal thread cuticles of mussels. In 2007, Lee et al. first showed that dipping substrates into a solution of dopamine results in the formation of thin PDA films on numerous materials. The simple preparation and the high durability of these coatings have stimulated growing research interest and a wide variety of applications in energy, biomedical and environmental science, and other fields.&#13;
We have investigated thin layers of PDA with different methods including ellipsometry, tactile measurements of the layer thickness and in situ absorption measurements during the polymerization process. During polymerization the dopamine solution shows a progressive colour change from transparent to brown that has been monitored by spectrometric measurements. The increasing absorption of the cuvette with dopamine solution can be seen in figure 1. The absorption levels off after approximately 2,5 h of polymerization time, thus indicating termination of the primary formation of the PDA film. This data shows that for homogeneous layer growth it is advantageous to interrupt the process after two hours. To generate a higher layer thickness, the samples need to be cleaned and immersed in a fresh dopamine solution subsequently. In addition, ellipsometry measurements on polydopamine layers could determine the corresponding coating thickness as well as its complex refractive index over a broad wavelength range.</abstract>
    <enrichment key="eventName">Materials Week 2025</enrichment>
    <enrichment key="eventPlace">Frankfurt am Main, Germany</enrichment>
    <enrichment key="eventStart">02.04.2025</enrichment>
    <enrichment key="eventEnd">04.04.2025</enrichment>
    <enrichment key="InvitedTalks">0</enrichment>
    <enrichment key="opus.source">publish</enrichment>
    <enrichment key="opus.doi.autoCreate">false</enrichment>
    <enrichment key="opus.urn.autoCreate">true</enrichment>
    <author>Diana Khropost</author>
    <author>Franziska Riethmüller</author>
    <author>Eva Stanik</author>
    <author>Thorsten Döhring</author>
    <author>Andreas Hertwig</author>
    <author>Deniz Hülagü</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Polydopamine</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Ellipsometry</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Leyer thickness</value>
    </subject>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
    <collection role="literaturgattung" number="">Präsentation</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
    <collection role="themenfelder" number="">Materialdesign</collection>
  </doc>
  <doc>
    <id>58150</id>
    <completedYear/>
    <publishedYear>2023</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>1</pageFirst>
    <pageLast>15</pageLast>
    <pageNumber/>
    <edition/>
    <issue>1</issue>
    <volume>13</volume>
    <type>article</type>
    <publisherName>Springer Nature</publisherName>
    <publisherPlace>London</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Influence of nanoparticle encapsulation and encoding on the surface chemistry of polymer carrier beads</title>
    <abstract language="eng">Surface-functionalized polymer beads encoded with molecular luminophores and nanocrystalline emitters such as semiconductor nanocrystals, often referred to as quantum dots (QDs), or magnetic nanoparticles are broadly used in the life sciences as reporters and carrier beads. Many of these applications require a profound knowledge of the chemical nature and total number of their surface functional groups (FGs), that control bead charge, colloidal stability, hydrophobicity, and the interaction with the environment and biological systems. For bioanalytical applications, also the number of groups accessible for the subsequent functionalization with, e.g., biomolecules or targeting ligands is relevant. In this study, we explore the influence of QD encoding on the amount of carboxylic acid (COOH) surface FGs of 2 μm polystyrene microparticles (PSMPs). This is done for frequently employed oleic acid and oleylamine stabilized, luminescent core/shell CdSe QDs and two commonly used encoding procedures. This included QD addition during bead formation by a thermally induced polymerization reaction and a post synthetic swelling procedure. The accessible number of COOH groups on the surface of QD-encoded and pristine beads was quantified by two colorimetric assays, utilizing differently sized reporters and electrostatic and covalent interactions. The results were compared to the total number of FGs obtained by a conductometric titration and Fourier transform infrared spectroscopy (FTIR). In addition, a comparison of the impact of QD and dye encoding on the bead surface chemistry was performed. Our results demonstrate the influence of QD encoding and the QD-encoding strategy on the number of surface FG that is ascribed to an interaction of the QDs with the carboxylic acid groups on the bead surface. These findings are of considerable relevance for applications of nanoparticle-encoded beads and safe-by-design concepts for nanomaterials.</abstract>
    <parentTitle language="eng">Scientific reports</parentTitle>
    <identifier type="doi">10.1038/s41598-023-38518-7</identifier>
    <identifier type="issn">2045-2322</identifier>
    <identifier type="urn">urn:nbn:de:kobv:b43-581502</identifier>
    <enrichment key="opus.source">publish</enrichment>
    <enrichment key="date_peer_review">06.09.2023</enrichment>
    <licence>Creative Commons - CC BY - Namensnennung 4.0 International</licence>
    <author>Lena Scholtz</author>
    <author>Isabella Tavernaro</author>
    <author>J. G. Eckert</author>
    <author>Marc Lutowski</author>
    <author>Daniel Geißler</author>
    <author>Andreas Hertwig</author>
    <author>Gundula Hidde</author>
    <author>N. C. Bigall</author>
    <author>Ute Resch-Genger</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Optical spectroscopy</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Particle</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Optical assay</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>IR spectroscopy</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Fluorescence</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Quantum yield</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Quality assurance</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Nano</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Synthesis</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Surface chemistry</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Quantification</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Method</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Conductometry</value>
    </subject>
    <collection role="ddc" number="543">Analytische Chemie</collection>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="institutes" number="">1 Analytische Chemie; Referenzmaterialien</collection>
    <collection role="institutes" number="">1.2 Biophotonik</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="themenfelder" number="">Umwelt</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="themenfelder" number="">Chemie und Prozesstechnik</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei für die Öffentlichkeit verfügbar ("Open Access")</collection>
    <collection role="unnumberedseries" number="">Wissenschaftliche Artikel der BAM</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
    <collection role="themenfelder" number="">Sensorik</collection>
    <thesisPublisher>Bundesanstalt für Materialforschung und -prüfung (BAM)</thesisPublisher>
    <file>https://opus4.kobv.de/opus4-bam/files/58150/Influence of np encapsulation and encoding on the surf chem of polymer carrier beads.pdf</file>
  </doc>
  <doc>
    <id>39940</id>
    <completedYear/>
    <publishedYear>2016</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>poster</type>
    <publisherName/>
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    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Measurement of porous TiO2 layers with spectroscopic ellipsometry - a multi-method study</title>
    <abstract language="eng">By means of an effective medium (EMA) based approach, it is possible to use spectroscopic ellipsometry to determine the mixing ratios between air and material in porous dielectrics and calculate a quantitative value of the porosity for these materials. As this method is model-based, it is very difficult to provide a quantitative measure for the accuracy of porosity values determined by this method. Valuable additional information can often be obtained by combining ellipsometry with other complementary methods. In the present study, the ellipsometry results were validated by Electron Probe Microanalysis (EPMA) with the option of layer analysis (by the socalled “STRATAGem” approach), gravimetry, and electron microscopy. We analysed porous TiO2 thin layers synthesised by means of a template synthesis Approach (evaporation induced self assembly).&#13;
Ellipsometry measurements on porous samples are difficult to analyse due to the complexity of the models necessary. Often it is difficult to decide if the measured data contains enough information to successfully determine the target quantities (mixing ratio, dielectric function of the matrix material). One method to decrease the complexity of the fit and therefore use the measurement data most efficiently is a multi-sample analysis. In the present case, multi-sample analysis was used for determining the porosity factors of the individual layers while using one common set of dielectric function values for the matrix in all cases.&#13;
While the results of the fit analysis in this case can be used to show the feasibility and also the limitations of the multi-method approach, the porosity values themselves show a promising agreement between the Independent methods. It can therefore be concluded that determining porosity values with ellipsometry is in accordance to other methods to the level of accuracy provided by the complementary methodologies.</abstract>
    <enrichment key="eventName">ICSE-7, 7th International Conference on Spectroscopic Ellipsometry</enrichment>
    <enrichment key="eventPlace">Berlin, Germany</enrichment>
    <enrichment key="eventStart">5.6.2016</enrichment>
    <enrichment key="eventEnd">10.6.2016</enrichment>
    <author>Andreas Hertwig</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Spectroscopic ellipsometry</value>
    </subject>
    <subject>
      <language>deu</language>
      <type>uncontrolled</type>
      <value>Electrolysis</value>
    </subject>
    <subject>
      <language>deu</language>
      <type>uncontrolled</type>
      <value>Catalysis</value>
    </subject>
    <subject>
      <language>deu</language>
      <type>uncontrolled</type>
      <value>Thin film metrology</value>
    </subject>
    <subject>
      <language>deu</language>
      <type>uncontrolled</type>
      <value>Porous materials</value>
    </subject>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="ddc" number="621">Angewandte Physik</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
    <collection role="literaturgattung" number="">Präsentation</collection>
  </doc>
  <doc>
    <id>56483</id>
    <completedYear/>
    <publishedYear>2022</publishedYear>
    <thesisYearAccepted/>
    <language>deu</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>lecture</type>
    <publisherName/>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="deu">Normung in der Oberflächen-und Schichttechnik</title>
    <abstract language="deu">Report über Normungsaktivitäten im Bereich der Messtechnk an Oberflächen und dünnen Schichten. Übersicht über Methoden und Vorstellung von laufenden Projekten mit Bezug zur Normung</abstract>
    <enrichment key="eventName">PlasmaGermany Herbstmeeting 2022</enrichment>
    <enrichment key="eventPlace">Bielefeld, Germany</enrichment>
    <enrichment key="eventStart">07.11.2022</enrichment>
    <enrichment key="eventEnd">08.11.2022</enrichment>
    <enrichment key="opus.source">publish</enrichment>
    <enrichment key="opus.doi.autoCreate">false</enrichment>
    <enrichment key="opus.urn.autoCreate">true</enrichment>
    <enrichment key="InvitedTalks">0</enrichment>
    <author>Andreas Hertwig</author>
    <subject>
      <language>deu</language>
      <type>uncontrolled</type>
      <value>Oberflächenmesstechnik</value>
    </subject>
    <subject>
      <language>deu</language>
      <type>uncontrolled</type>
      <value>Spektroskopie</value>
    </subject>
    <subject>
      <language>deu</language>
      <type>uncontrolled</type>
      <value>Ellipsometrie</value>
    </subject>
    <subject>
      <language>deu</language>
      <type>uncontrolled</type>
      <value>XPS</value>
    </subject>
    <subject>
      <language>deu</language>
      <type>uncontrolled</type>
      <value>Dünne Schichten</value>
    </subject>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
    <collection role="literaturgattung" number="">Präsentation</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
  </doc>
  <doc>
    <id>59638</id>
    <completedYear/>
    <publishedYear>2024</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>1253</pageFirst>
    <pageLast>1261</pageLast>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>conferenceobject</type>
    <publisherName>Springer</publisherName>
    <publisherPlace>Orlando-Florida / USA</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Investigation of Mechanical Stress and B10 Exposure on FKM Polymer</title>
    <abstract language="eng">Mechanical stress often accelerates the failure of polymer materials. The aim of this research is to study the interaction between the sealing material FKM and biofuels B10 (heating oil with 10% biodiesel). The mechanical stress test was carried out in a special apparatus. Both mechanical and non-mechanical stress tests were conducted on specimens at 20, 40, and 70 °C for 28 days to document changes in mass, volume, and tensile properties. Both increasing temperature and mechanical stress have a significant effect on the tensile strength of the FKM polymer when exposed to B10. The combination of increasing temperature and mechanical stress induced rupture within 2 h. It was also established that FKM polymer with pre-exposure in B10 survived longer during mechanical stress compared to specimens exposed only to air. With the support of infrared (IR) spectroscopy, we were able to confirm the penetration of B10 into the FKM polymer.</abstract>
    <parentTitle language="eng">The Minerals, Metals &amp; Materials Society (ed.)</parentTitle>
    <identifier type="doi">10.1007/978-3-031-50349-8_108</identifier>
    <identifier type="isbn">978-3-031-50349-8</identifier>
    <enrichment key="eventName">TMS 2024 Annual Meeting &amp; Exhibition Teilnahme mit Präsentation</enrichment>
    <enrichment key="eventPlace">Orlando-Florida / USA</enrichment>
    <enrichment key="eventStart">03.03.2024</enrichment>
    <enrichment key="eventEnd">06.03.2024</enrichment>
    <enrichment key="opus.source">publish</enrichment>
    <enrichment key="date_peer_review">06.01.2025</enrichment>
    <author>Q. An</author>
    <author>Ralph Bäßler</author>
    <author>Andreas Hertwig</author>
    <author>Rainer Rehfeldt</author>
    <author>Gundula Hidde</author>
    <author>Frank Otremba</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Biofuels</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Sealing materials</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Mechanical stress</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Change in tensile properties</value>
    </subject>
    <collection role="ddc" number="624">Ingenieurbau</collection>
    <collection role="institutes" number="">3 Gefahrgutumschließungen; Energiespeicher</collection>
    <collection role="institutes" number="">3.2 Sicherheit von Energiespeichern</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="themenfelder" number="">Infrastruktur</collection>
    <collection role="themenfelder" number="">Fire Science</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
    <collection role="literaturgattung" number="">Graue Literatur</collection>
  </doc>
  <doc>
    <id>51462</id>
    <completedYear/>
    <publishedYear>2020</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>e49826-1</pageFirst>
    <pageLast>e49826-9</pageLast>
    <pageNumber/>
    <edition/>
    <issue>48</issue>
    <volume>137</volume>
    <type>article</type>
    <publisherName>Wiley</publisherName>
    <publisherPlace>New York, NY</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Development of layer-by-layer assembled thin coatings on aluminium alloy AA2024-T3 for high resolution studies of local corrosion processes</title>
    <abstract language="eng">The aim of this study is to develop nanometer-thin epoxy-based films on aluminium alloy AA2024-T3 as a model coating system for high resolution corrosion studies. Spin coating was used for the layer-by-layer (LbL) deposition of poly-(ethylenimine) (PEI) and poly([o-cresyl glycidyl ether]-co-formaldehyde) (CNER) bilayers. The film chemistry and the cross-linking process were characterized by means of Fourier-transform infrared spectroscopy (FTIR).&#13;
Ellipsometric data confirmed the linear increase of film thickness. The potentiodynamic polarization and electrochemical impedance spectroscopy (EIS) results indicate the improvement of the film barrier properties with increasing film thickness. Mapping of the topography and the volta potential was performed by means of scanning Kelvin probe force microscopy (SKPFM).&#13;
The results indicate the presence of a homogeneous film structure, while the intermetallic phases can still be identified below the coating. The SKPFM Analysis confirmed that the model films are suitable for investigation of corrosion processes at the coating/metal interface.</abstract>
    <parentTitle language="eng">Journal of applied polymer science</parentTitle>
    <identifier type="doi">10.1002/app.49826</identifier>
    <identifier type="issn">0021-8995</identifier>
    <identifier type="urn">urn:nbn:de:kobv:b43-514627</identifier>
    <enrichment key="date_peer_review">28.10.2020</enrichment>
    <author>A. Almalla</author>
    <author>Andreas Hertwig</author>
    <author>Daniel Fischer</author>
    <author>Özlem Özcan Sandikcioglu</author>
    <author>Julia Witt</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Spectroscopy</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Coatings</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Electrochemistry</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Microscopy</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Resins</value>
    </subject>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.2 Material- und Oberflächentechnologien</collection>
    <collection role="institutes" number="">6.7 Materialsynthese und Design</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei für die Öffentlichkeit verfügbar ("Open Access")</collection>
    <collection role="unnumberedseries" number="">Wissenschaftliche Artikel der BAM</collection>
    <collection role="institutes" number="">6.0 Abteilungsleitung und andere</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
    <thesisPublisher>Bundesanstalt für Materialforschung und -prüfung (BAM)</thesisPublisher>
    <file>https://opus4.kobv.de/opus4-bam/files/51462/2020.Almalla_et_al.JApplPolymSci.137.e49826.pdf</file>
  </doc>
  <doc>
    <id>65520</id>
    <completedYear/>
    <publishedYear>2026</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>1</pageFirst>
    <pageLast>14</pageLast>
    <pageNumber/>
    <edition/>
    <issue>1</issue>
    <volume>63</volume>
    <type>article</type>
    <publisherName>IOP Publishing</publisherName>
    <publisherPlace>Bristol, UK</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Comparison of thin-film thickness measurements using ellipsometry and reflectometry with uniform samples</title>
    <abstract language="eng">This study evaluates spectroscopic ellipsometry and reflectometry using high-quality SiO2 and Al2O3 thin-films on Si substrates, thereby facilitating a detailed assessment of consistency of measurement results and uncertainty analyses. The results with detailed uncertainty budgets indicate good agreement between the two methods across a broad layer thickness range from 10 nm to 2000 nm, with deviations remaining well within the measurement uncertainties. Ellipsometry results have lower uncertainty than reflectometry results especially with the thinner layers, whereas reflectometry uncertainties are lower with the thickest layers studied. This work underscores the importance of rigorous thickness characterization and reliable uncertainty evaluation as critical factors in advancing both modeling and measurement practices in thin-film metrology.</abstract>
    <parentTitle language="eng">Metrologia</parentTitle>
    <identifier type="issn">0026-1394</identifier>
    <identifier type="doi">10.1088/1681-7575/ae3964</identifier>
    <identifier type="urn">urn:nbn:de:kobv:b43-655209</identifier>
    <enrichment key="opus_doi_flag">true</enrichment>
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    <enrichment key="local_crossrefLicence">https://creativecommons.org/licenses/by/4.0/</enrichment>
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    <licence>Creative Commons - CC BY - Namensnennung 4.0 International</licence>
    <author>Masoud Rastgou</author>
    <author>Deniz Hülagü</author>
    <author>Aleksandr Danilenko</author>
    <author>Farshid Manoocheri</author>
    <author>Andreas Hertwig</author>
    <author>Erkki Ikonen</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Ellipsometry</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Reflectometry</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Thin Film Metrology</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Measurement Accuracy</value>
    </subject>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei für die Öffentlichkeit verfügbar ("Open Access")</collection>
    <collection role="unnumberedseries" number="">Wissenschaftliche Artikel der BAM</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
    <thesisPublisher>Bundesanstalt für Materialforschung und -prüfung (BAM)</thesisPublisher>
    <file>https://opus4.kobv.de/opus4-bam/files/65520/Rastgou_2026_Metrologia_63_015006.pdf</file>
  </doc>
  <doc>
    <id>44560</id>
    <completedYear/>
    <publishedYear>2018</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>326, 1</pageFirst>
    <pageLast>10</pageLast>
    <pageNumber/>
    <edition/>
    <issue>4</issue>
    <volume>124</volume>
    <type>article</type>
    <publisherName>Springer-Verlag</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Tribological performance of titanium samples oxidized by fs-laser radiation, thermal heating, or electrochemical anodization</title>
    <abstract language="eng">Commercial grade-1 titanium samples (Ti, 99.6%) were treated using three alternative methods, (i) femtosecond laser processing, (ii) thermal heat treatment, and (iii) electrochemical anodization, respectively, resulting in the formation of differently conditioned superficial titanium oxide layers. The laser processing (i) was carried out by a Ti:sapphire laser (pulse duration 30 fs, central wavelength 790 nm, pulse repetition rate 1 kHz) in a regime of generating laser-induced periodic surface structures (LIPSS). The experimental conditions (laser fluence, spatial spot overlap) were optimized in a sample-scanning setup for the processing of several square-millimeters large surface areas covered homogeneously by these nanostructures. The differently oxidized titanium surfaces were characterized by optical microscopy, micro Raman spectroscopy, variable angle spectroscopic ellipsometry, and instrumented indentation testing. The tribological performance was characterized in the regime of mixed friction by reciprocating sliding tests against a sphere of hardened steel in fully formulated engine oil as lubricant. The specific tribological performance of the differently treated surfaces is discussed with respect to possible physical and chemical mechanisms.</abstract>
    <parentTitle language="eng">Applied Physics A</parentTitle>
    <identifier type="doi">10.1007/s00339-018-1745-8</identifier>
    <identifier type="issn">0947-8396</identifier>
    <identifier type="issn">1432-0630</identifier>
    <identifier type="urn">urn:nbn:de:kobv:b43-445609</identifier>
    <enrichment key="date_peer_review">12.04.2018</enrichment>
    <licence>Creative Commons - CC BY - Namensnennung 4.0 International</licence>
    <author>Sabrina V. Kirner</author>
    <author>Nadine Slachciak</author>
    <author>Anna Maria Elert</author>
    <author>Michael Griepentrog</author>
    <author>Daniel Fischer</author>
    <author>Andreas Hertwig</author>
    <author>Mario Sahre</author>
    <author>Ilona Dörfel</author>
    <author>Heinz Sturm</author>
    <author>Simone Pentzien</author>
    <author>Robert Koter</author>
    <author>Dirk Spaltmann</author>
    <author>Jörg Krüger</author>
    <author>Jörn Bonse</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Femtosecond laser</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Titanium</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Oxidation</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Friction</value>
    </subject>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="ddc" number="621">Angewandte Physik</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei für die Öffentlichkeit verfügbar ("Open Access")</collection>
    <collection role="unnumberedseries" number="">Wissenschaftliche Artikel der BAM</collection>
    <thesisPublisher>Bundesanstalt für Materialforschung und -prüfung (BAM)</thesisPublisher>
    <file>https://opus4.kobv.de/opus4-bam/files/44560/2018-Kirner-APA124_326.pdf</file>
  </doc>
  <doc>
    <id>65521</id>
    <completedYear/>
    <publishedYear>2026</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>lecture</type>
    <publisherName/>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">How can ellipsometry help us to understand ultrashort pulse laser material processing?</title>
    <abstract language="eng">Laser processing of materials is a key technology in many fields of modern production. Still, more work is needed to understand the mechanisms behind laser material interaction. Recently, ellipsometry has become a valuable tool for investigating materials pre and post laser irradiation. Imaging ellipsometry and time-resolved methods boost this work and open up the path to a much better understanding of light interaction with solid state surfaces. We use spectroscopic single-spot and imaging ellipsometry to investigate treated and untreated surfaces. The goal is to determine changes in the material dielectric function, as well as geometric changes in surface layers (oxidation, modification, ablation, blistering). A good knowledge of bulk dielectric functions is often needed to model processes caused by laser irradiation. Imaging ellipsometry can play an important role in the post-analysis of laser treated sites on surfaces if combined with other methods such as IR-spectroscopy, SEM, topometric methods, Raman-spectroscopy, and XPS. In this work, we present the results of several studies to investigate laser-treated materials by means of ellipsometry. We cover the following topics:&#13;
&#13;
• Ablation of amorphous carbon layers, role of intra-layer interference effects on the result&#13;
• Amorphisation behaviour of c-Si, depending on the crystal orientation,&#13;
• Understanding the role of bulk and surface properties on ablation behaviour of classical and&#13;
multicomponent high-entropy metals,</abstract>
    <enrichment key="eventName">13th Workshop on Spectroscopic Ellipsometry</enrichment>
    <enrichment key="eventPlace">Genova, Italy</enrichment>
    <enrichment key="eventStart">09.02.2026</enrichment>
    <enrichment key="eventEnd">12.02.2026</enrichment>
    <enrichment key="InvitedTalks">0</enrichment>
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    <enrichment key="opus.doi.autoCreate">false</enrichment>
    <enrichment key="opus.urn.autoCreate">true</enrichment>
    <author>Andreas Hertwig</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Ellipsometry</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Laser Ablation</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Femtosecond Technology</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Surface and Thin Layer Technology</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Laser Surface processing</value>
    </subject>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
    <collection role="literaturgattung" number="">Präsentation</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
  </doc>
  <doc>
    <id>59636</id>
    <completedYear/>
    <publishedYear>2024</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>poster</type>
    <publisherName/>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Investigation of mechanical stress and B10 exposure on FKM polymer</title>
    <abstract language="eng">Biofuels, particularly biodiesel, have gained significant attention as an alternative to traditional fossil fuels in recent years. Unlike diesel, which contains hundreds of compounds, biodiesel only contains a few compounds in the C16-C18 carbon chain. However, the use of biodiesel in automobile and transportation applications can result in problems of degradation or even damage in materials. Among the commonly used polymer materials, fluorocarbon (FKM) shows excellent performance and high stability and compatibility towards oil, diesel, ethanol, and other chemicals. FKM is a family of fluorocarbon-based fluoroelastomer materials, which provide excellent high-temperature and chemical stability compared to other elastomers. As a result, FKM is widely used in chemical processes such as petroleum refining, where it is used for sealings, pumps, and other components.</abstract>
    <enrichment key="eventName">TMS 2024 153rd Annual Meeting &amp; Exhibition Supplemental Proceedings</enrichment>
    <enrichment key="eventPlace">Orlando, Florida, USA</enrichment>
    <enrichment key="eventStart">03.03.2024</enrichment>
    <enrichment key="eventEnd">06.03.2024</enrichment>
    <enrichment key="opus.source">publish</enrichment>
    <author>Frank Otremba</author>
    <author>Q. An</author>
    <author>Ralph Bäßler</author>
    <author>Andreas Hertwig</author>
    <author>Rainer Rehfeldt</author>
    <author>Gundula Hidde</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>B10 exposure</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>FKM polymer</value>
    </subject>
    <collection role="ddc" number="624">Ingenieurbau</collection>
    <collection role="institutes" number="">3 Gefahrgutumschließungen; Energiespeicher</collection>
    <collection role="institutes" number="">3.2 Sicherheit von Energiespeichern</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="themenfelder" number="">Infrastruktur</collection>
    <collection role="themenfelder" number="">Fire Science</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
    <collection role="literaturgattung" number="">Präsentation</collection>
  </doc>
  <doc>
    <id>60240</id>
    <completedYear/>
    <publishedYear>2024</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>lecture</type>
    <publisherName/>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Accuracy on all scales: Hybrid metrology for micro- and nanomanufacturing</title>
    <abstract language="eng">In this presentation, we discuss hybrid metrology and correlative imaging. These techniques are used to improve the design and quality monitoring of nanomaterials used in energy technology and for referencing the properties of nanoparticles.</abstract>
    <enrichment key="eventName">EMN for Advanced Manufacturing workshop</enrichment>
    <enrichment key="eventPlace">Berlin, Germany</enrichment>
    <enrichment key="eventStart">22.05.2024</enrichment>
    <enrichment key="eventEnd">23.05.2024</enrichment>
    <enrichment key="InvitedTalks">1</enrichment>
    <enrichment key="opus.source">publish</enrichment>
    <author>Andreas Hertwig</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Nanotechnology</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Nanoanalytics</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Correlative Spectroscopy</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Correlative Imaging</value>
    </subject>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
    <collection role="literaturgattung" number="">Präsentation</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
  </doc>
  <doc>
    <id>21818</id>
    <completedYear/>
    <publishedYear>2010</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>739</pageFirst>
    <pageLast>742</pageLast>
    <pageNumber/>
    <edition/>
    <issue>6-7</issue>
    <volume>42</volume>
    <type>article</type>
    <publisherName>Wiley</publisherName>
    <publisherPlace>Chichester</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Imaging the microstructure of duplex stainless steel samples with TOF-SIMS</title>
    <abstract language="eng">Time-of-flight secondary ion mass spectrometry (TOF-SIMS) mappings provide a visualization of the distribution of chemical elements and phases on polished duplex steel surfaces as element and fragment secondary ion signals. The advantage of TOF-SIMS, compared to optical microscopy, is its potential to analyze the chemical composition with a lateral resolution at a submicrometer scale. TOF-SIMS mappings allow distinguishing between ferritic and austenitic phases because of the phase selective detection method without any requirement of etching or other processing.</abstract>
    <parentTitle language="eng">Surface and interface analysis</parentTitle>
    <identifier type="old">24273</identifier>
    <identifier type="doi">10.1002/sia.3385</identifier>
    <identifier type="url">http://onlinelibrary.wiley.com/doi/10.1002/sia.3385/pdf</identifier>
    <identifier type="issn">0142-2421</identifier>
    <identifier type="issn">1096-9918</identifier>
    <enrichment key="bibliotheksstandort">Sonderstandort: Publica-Schrank</enrichment>
    <enrichment key="date_peer_review">19.08.2010</enrichment>
    <author>Franka Straub</author>
    <author>Thomas Wirth</author>
    <author>Andreas Hertwig</author>
    <author>Vasile-Dan Hodoroaba</author>
    <author>Wolfgang Unger</author>
    <author>Thomas Böllinghaus</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>TOF-SIMS mappings</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Duplex stainless steel</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Surface analysis</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Ferritic phase</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Austenitic phase</value>
    </subject>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Physisches Exemplar in der Bibliothek der BAM vorhanden ("Hardcopy Access")</collection>
  </doc>
  <doc>
    <id>37202</id>
    <completedYear/>
    <publishedYear>2016</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>poster</type>
    <publisherName/>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Measurement of Porous TiO2 Layers with spectroscopic ellipsometry – a multi-method study</title>
    <abstract language="eng">By means of an effective medium (EMA) based approach, it is possible to use spectroscopic ellipsometry to determine the mixing ratios between air and material in porous dielectrics and calculate a quantitative value of the porosity for these materials. As this method is model-based, it is very difficult to provide a quantitative measure for the accuracy of porosity values determined by this method. Valuable additional information can often be obtained by combining ellipsometry with other complementary methods. In the present study, the ellipsometry results were validated by Electron Probe Microanalysis (EPMA) with the option of layer analysis (by the socalled “STRATAGem” approach), gravimetry, and electron microscopy. We analysed porous TiO2 thin layers synthesised by means of a template synthesis approach (evaporation induced self assembly).&#13;
Ellipsometry measurements on porous samples are difficult to analyse due to the complexity of the models necessary. Often it is difficult to decide if the measured data contains enough information to successfully determine the target quantities (mixing ratio, dielectric function of the matrix material). One method to decrease the complexity of the fit and therefore use the measurement data most efficiently is a multi-sample analysis. In the present case, multi-sample analysis was used for determining the porosity factors of the individual layers while using one common set of dielectric function values for the matrix in all cases.&#13;
While the results of the fit analysis in this case can be used to show the feasibility and also the limitations of the multi-method approach, the porosity values themselves show a promising agreement between the independent methods. It can therefore be concluded that determining porosity values with ellipsometry is in accordance to other methods to the level of accuracy provided by the complementary methodologies.</abstract>
    <enrichment key="eventName">International conference on spectroscopic ellipsometry (ICSE-7)</enrichment>
    <enrichment key="eventPlace">Berlin, Germany</enrichment>
    <enrichment key="eventStart">06.06.2016</enrichment>
    <enrichment key="eventEnd">10.06.2016</enrichment>
    <author>Andreas Hertwig</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Spectroscopic Ellipsometry</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Electron Microscopy</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Multi-method Metrology</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Porous Materials</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Thin Films</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Titanium Dioxide</value>
    </subject>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="ddc" number="621">Angewandte Physik</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
    <collection role="literaturgattung" number="">Präsentation</collection>
  </doc>
  <doc>
    <id>51629</id>
    <completedYear/>
    <publishedYear>2020</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>lecture</type>
    <publisherName/>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Towards hydrogen economy: multimethod analysis and operando investigation of mesoporous iridium oxides films for electrocatalysis, EMPIR/EURAMET Project HyMet 16ENG03</title>
    <abstract language="eng">In the face of rising energy demand and the impending climate change the development of a sustainable, fossil-free fuel and chemical production is of global importance. One possible goal is the development of electrochemical conversion processes using catalysts. Porous materials play an important role in such energy applications. The key to the development of improved catalysts is a better understanding of the relations between their performance, stability and physico-chemical properties. However, the complex morphology of such catalysts constitutes a challenge even for modern analytical techniques. Spectroscopic ellipsometry (SE) is a versatile method for studying material properties by using appropriate models (e.g. film thickness, optical and electronic properties). The fact that the material properties cannot be taken directly from the measured spectra, the developed models have to be validated. In a first step, the model for the ellipsometric fit studies of a calcination series of mesoporous iridium oxide films (300 – 600 °C) was investigated and validated with respect to their material properties. Moreover, the electronic structures of the catalysts reveal a direct correlation with electrochemical activities. The development of an environmental cell offers the possibility of investigations under real conditions. This will allow changes in the optical and electronic properties during the electrocatalytic oxygen evolution reaction.</abstract>
    <enrichment key="eventName">HyMet dissemination event</enrichment>
    <enrichment key="eventPlace">Online meeting</enrichment>
    <enrichment key="eventStart">17.11.2020</enrichment>
    <enrichment key="opus.doi.autoCreate">false</enrichment>
    <enrichment key="opus.urn.autoCreate">true</enrichment>
    <enrichment key="InvitedTalks">0</enrichment>
    <author>Andreas Hertwig</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Correlative ex-situ ellipsometric analysis</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Ellipsometric operando investigation</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Hydrogen economy</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Mesoporous iridium oxides films</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Oxygen evolution reaction</value>
    </subject>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="ddc" number="624">Ingenieurbau</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="institutes" number="">6.7 Materialsynthese und Design</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="themenfelder" number="">Chemie und Prozesstechnik</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
    <collection role="literaturgattung" number="">Präsentation</collection>
  </doc>
  <doc>
    <id>58990</id>
    <completedYear/>
    <publishedYear>2023</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>1</pageFirst>
    <pageLast>12</pageLast>
    <pageNumber/>
    <edition/>
    <issue>15</issue>
    <volume>221</volume>
    <type>article</type>
    <publisherName>Wiley-VCH GmbH</publisherName>
    <publisherPlace>Weinheim</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Chemical and topographical changes upon sub-100-nm laser-induced periodic surface structure formation on titanium alloy: the influence of laser pulse repetition rate and number of over-scans</title>
    <abstract language="eng">Titanium and its alloys are known to allow the straightforward laser-based manufacturing of ordered surface nanostructures, so-called high spatial frequency laser-induced periodic surface structures (HSFL). These structures exhibit sub-100 nm spatial periods – far below the optical diffraction limit. The resulting surface functionalities are usually enabled by both, topographic and chemical alterations of the nanostructured surfaces. For exploring these effects, multi-method characterizations were performed here for HSFL processed on Ti–6Al–4V alloy upon irradiation with near-infrared ps-laser pulses (1030 nm, ≈1 ps pulse duration, 1–400 kHz) under different laser scan processing conditions, i.e., by systematically varying the pulse repetition frequency and the number of laser irradiation passes. The sample characterization involved morphological and topographical investigations by scanning electron microscopy (SEM), atomic force microscopy (AFM), tactile stylus profilometry, as well as near-surface chemical analyses hard X-ray photoelectron spectroscopy (HAXPES) and depth-profiling time-of-flight secondary ion mass spectrometry (ToF-SIMS). This provides a quantification of the laser ablation depth, the geometrical HSFL characteristics and enables new insights into the depth extent and the nature of the non-ablative laser-induced near-surface oxidation accompanying these nanostructures. This allows to answer the questions how the processing of HSFL can be industrially scaled up, and whether the latter is limited by heat-accumulation effects.</abstract>
    <parentTitle language="eng">Physica Status Solidi A</parentTitle>
    <identifier type="issn">1862-6319</identifier>
    <identifier type="url">https://onlinelibrary.wiley.com/doi/full/10.1002/pssa.202300719</identifier>
    <identifier type="doi">10.1002/pssa.202300719</identifier>
    <identifier type="urn">urn:nbn:de:kobv:b43-589902</identifier>
    <enrichment key="eventName">2023 E-MRS Spring Meeting, Symposium L "Making light matter: lasers in material sciences and photonics"</enrichment>
    <enrichment key="eventPlace">Strasbourg, France</enrichment>
    <enrichment key="eventStart">29.05.2023</enrichment>
    <enrichment key="eventEnd">02.06.2023</enrichment>
    <enrichment key="opus.source">publish</enrichment>
    <enrichment key="PaperofMonth">1</enrichment>
    <enrichment key="date_peer_review">19.08.2024</enrichment>
    <licence>Creative Commons - CC BY - Namensnennung 4.0 International</licence>
    <author>Kai Müller</author>
    <author>Francesca Mirabella</author>
    <author>Xenia Knigge</author>
    <author>Marek Mezera</author>
    <author>Matthias Weise</author>
    <author>Mario Sahre</author>
    <author>Karsten Wasmuth</author>
    <author>Heike Voss</author>
    <author>Andreas Hertwig</author>
    <author>Jörg Krüger</author>
    <author>Jörg Radnik</author>
    <author>Vasile-Dan Hodoroaba</author>
    <author>Jörn Bonse</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Laser-induced periodic surface structures (LIPSS)</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Ultrashort laser pulses</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Laser processing</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Hard X-ray photoelectron spectroscopy (HAXPES)</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Time-of-flight secondary ion mass spectrometry (ToF-SIMS)</value>
    </subject>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="ddc" number="621">Angewandte Physik</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="institutes" number="">6.2 Material- und Oberflächentechnologien</collection>
    <collection role="themenfelder" number="">Energie</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei für die Öffentlichkeit verfügbar ("Open Access")</collection>
    <collection role="unnumberedseries" number="">Wissenschaftliche Artikel der BAM</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
    <thesisPublisher>Bundesanstalt für Materialforschung und -prüfung (BAM)</thesisPublisher>
    <file>https://opus4.kobv.de/opus4-bam/files/58990/2023-Mueller_PSSA220_2300719.pdf</file>
  </doc>
  <doc>
    <id>51628</id>
    <completedYear/>
    <publishedYear>2020</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>14210</pageFirst>
    <pageLast>14223</pageLast>
    <pageNumber/>
    <edition/>
    <issue>23</issue>
    <volume>10</volume>
    <type>article</type>
    <publisherName>American Chemical Society</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Assessing optical and electrical properties of highly active IrOx catalysts for the electrochemical oxygen evolution reaction via spectroscopic ellipsometry</title>
    <abstract language="eng">Efficient water electrolysis requires highly active electrodes. The activity of corresponding catalytic coatings strongly depends on material properties such as film thickness, crystallinity, electrical conductivity, and chemical surface speciation. Measuring these properties with high accuracy in vacuum-free and nondestructive methods facilitates the elucidation of structure−activity relationships in realistic environments. Here, we report a novel approach to analyze the optical and electrical properties of highly active oxygen evolution reaction (OER) catalysts via spectroscopic ellipsometry (SE). Using a series of differently calcined, mesoporous, templated iridium oxide films as an example, we assess the film thickness, porosity, electrical resistivity, electron concentration, electron mobility, and interband and intraband transition energies by modeling of the optical spectra. Independently performed analyses using scanning electron microscopy, energy-dispersive X-ray spectroscopy, ellipsometric porosimetry, X-ray reflectometry, and absorption spectroscopy indicate a high accuracy of the deduced material properties. A comparison of the derived analytical data from SE, resonant photoemission spectroscopy, X-ray absorption spectroscopy, and X-ray photoelectron spectroscopy with activity measurements of the OER suggests that the intrinsic activity of iridium oxides scales with a shift of the Ir 5d t2g sub-level and an increase of p−d interband transition energies caused by a transition of μ1-OH to μ3-O species.</abstract>
    <parentTitle language="eng">ACS Catalysis</parentTitle>
    <identifier type="doi">10.1021/acscatal.0c03800</identifier>
    <identifier type="urn">urn:nbn:de:kobv:b43-516288</identifier>
    <identifier type="issn">2155-5435</identifier>
    <enrichment key="date_peer_review">04.02.2021</enrichment>
    <enrichment key="PaperofMonth">1</enrichment>
    <licence>Creative Commons - CC BY-NC-ND - Namensnennung - Nicht kommerziell - Keine Bearbeitungen 4.0 International</licence>
    <author>René Sachse</author>
    <author>Mika Pfüger</author>
    <author>Juan-Jesús Velasco-Vélez</author>
    <author>Mario Sahre</author>
    <author>Jörg Radnik</author>
    <author>Michael Bernicke</author>
    <author>Denis Bernsmeier</author>
    <author>Vasile-Dan Hodoroaba</author>
    <author>Michael Krumrey</author>
    <author>Peter Strasser</author>
    <author>Ralph Kraehnert</author>
    <author>Andreas Hertwig</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Spectroscopic ellipsometry</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Electrocatalysis</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Oxygen evolution reaction</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Mesoporous iridium oxide films</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Non-destructive ambient analysis</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Intrinsic OER activity</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Complementary methodology and metrology</value>
    </subject>
    <collection role="ddc" number="543">Analytische Chemie</collection>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="ddc" number="621">Angewandte Physik</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="institutes" number="">6.7 Materialsynthese und Design</collection>
    <collection role="themenfelder" number="">Energie</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="themenfelder" number="">Chemie und Prozesstechnik</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei für die Öffentlichkeit verfügbar ("Open Access")</collection>
    <collection role="unnumberedseries" number="">Wissenschaftliche Artikel der BAM</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
    <thesisPublisher>Bundesanstalt für Materialforschung und -prüfung (BAM)</thesisPublisher>
    <file>https://opus4.kobv.de/opus4-bam/files/51628/acscatal.0c03800_si_001.pdf</file>
    <file>https://opus4.kobv.de/opus4-bam/files/51628/acscatal.0c03800.pdf</file>
  </doc>
  <doc>
    <id>60196</id>
    <completedYear/>
    <publishedYear>2024</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>1</pageFirst>
    <pageLast>11</pageLast>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>article</type>
    <publisherName>Wiley-VCH GmbH</publisherName>
    <publisherPlace>Weinheim</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Picosecond laser processing of hierarchical micro–nanostructures on titanium alloy upon pre- and postanodization: morphological, structural, and chemical effects</title>
    <abstract language="eng">Recent publications indicate that the order of electrochemical anodization (before or after the laser processing step) plays an important role for the response of bone-forming osteoblasts—an effect that can be utilized for improving permanent dental or removable bone implants. For exploring these different surface functionalities, multimethod morphological, structural, and chemical characterizations are performed in combination with electrochemical pre- and postanodization for two different characteristic microspikes covered by nanometric laser-induced periodic surface structures on Ti–6Al–4V upon irradiation with near-infrared ps-laser pulses (1030 nm wavelength, ≈1 ps pulse duration, 67 and 80 kHz pulse repetition frequency) at two distinct sets of laser fluence and beam scanning parameters. This work involves morphological and topographical investigations by scanning electron microscopy and white light interference microscopy, structural material examinations via X-ray diffraction, and micro-Raman spectroscopy, as well as near-surface chemical analyses by X-ray photoelectron spectroscopy and hard X-ray photoelectron spectroscopy. The results allow to qualify the mean laser ablation depth, assess the spike geometry and surface roughness parameters, and provide new detailed insights into the near-surface oxidation that may affect the different cell growth behavior for pre- or postanodized medical implants.</abstract>
    <parentTitle language="eng">Physica Status Solidi A</parentTitle>
    <identifier type="issn">1862-6319</identifier>
    <identifier type="doi">10.1002/pssa.202300920</identifier>
    <identifier type="urn">urn:nbn:de:kobv:b43-601962</identifier>
    <enrichment key="eventName">2023 E-MRS Spring Meeting, Symposium L "Making light matter: lasers in material sciences and photonics"</enrichment>
    <enrichment key="eventPlace">Strasbourg, France</enrichment>
    <enrichment key="eventStart">29.05.2023</enrichment>
    <enrichment key="eventEnd">02.06.2023</enrichment>
    <enrichment key="opus.source">publish</enrichment>
    <enrichment key="date_peer_review">19.06.2024</enrichment>
    <licence>Creative Commons - CC BY - Namensnennung 4.0 International</licence>
    <author>Heike Voss</author>
    <author>Xenia Knigge</author>
    <author>D. Knapic</author>
    <author>Matthias Weise</author>
    <author>Mario Sahre</author>
    <author>Andreas Hertwig</author>
    <author>A. Sacco</author>
    <author>A. M. Rossi</author>
    <author>Jörg Radnik</author>
    <author>Kai Müller</author>
    <author>Karsten Wasmuth</author>
    <author>Jörg Krüger</author>
    <author>A. W. Hassel</author>
    <author>Vasile-Dan Hodoroaba</author>
    <author>Jörn Bonse</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Hierarchical micro-nanostructures</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Laser-induced periodic surface structures (LIPSS)</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Ultrashort laser pulses</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Ti-6Al-4V alloy</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>X-ray photoelectron spectroscopy</value>
    </subject>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="institutes" number="">6.2 Material- und Oberflächentechnologien</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei für die Öffentlichkeit verfügbar ("Open Access")</collection>
    <collection role="unnumberedseries" number="">Wissenschaftliche Artikel der BAM</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
    <thesisPublisher>Bundesanstalt für Materialforschung und -prüfung (BAM)</thesisPublisher>
    <file>https://opus4.kobv.de/opus4-bam/files/60196/Physica Status Solidi a - 2024 - Voss.pdf</file>
  </doc>
  <doc>
    <id>55102</id>
    <completedYear/>
    <publishedYear>2022</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>137</pageFirst>
    <pageLast>147</pageLast>
    <pageNumber/>
    <edition/>
    <issue>3-4 (Topical issue: Ellipsometry)</issue>
    <volume>11</volume>
    <type>article</type>
    <publisherName>De Gruyter</publisherName>
    <publisherPlace>Berlin</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Multilevel effective material approximation for modeling ellipsometric measurements on complex porous thin films</title>
    <abstract language="eng">Catalysts are important components in chemical processes because they lower the activation energy and thus determine the rate, efficiency and selectivity of a chemical reaction. This property plays an important role in many of today’s processes, including the electrochemical splitting of water. Due to the continuous development of catalyst materials, they are becoming more complex, which makes a reliable evaluation of physicochemical properties challenging even for modern analytical measurement techniques and industrial manufacturing.&#13;
We present a fast, vacuum-free and non-destructive analytical approach using multi-sample spectroscopic ellipsometry to determine relevant material parameters such as film thickness, porosity and composition of mesoporous IrOx–TiOy films. Mesoporous IrOx–TiOy films were deposited on Si wafers by sol–gel synthesis, varying the composition of the mixed oxide films between 0 and 100 wt%Ir. The ellipsometric modeling is based on an anisotropic Bruggeman effective medium approximation (a-BEMA) to determine the film thickness and volume fraction of the material and pores. The volume fraction of the material was again modeled using a Bruggeman EMA to determine the chemical composition of the materials. The ellipsometric fitting results were compared with complementary methods, such as scanning electron microscopy (SEM), electron probe microanalysis (EPMA) as well as environmental ellipsometric porosimetry (EEP).</abstract>
    <parentTitle language="eng">Advanced optical technologies</parentTitle>
    <identifier type="doi">10.1515/aot-2022-0007</identifier>
    <identifier type="urn">urn:nbn:de:kobv:b43-551026</identifier>
    <identifier type="issn">2192-8584</identifier>
    <identifier type="issn">2192-8576</identifier>
    <enrichment key="opus.source">publish</enrichment>
    <enrichment key="date_peer_review">04.07.2022</enrichment>
    <enrichment key="RelatedIdentifier">https://opus4.kobv.de/opus4-bam/frontdoor/index/index/docId/55468</enrichment>
    <licence>Creative Commons - CC BY - Namensnennung 4.0 International</licence>
    <author>René Sachse</author>
    <author>Vasile-Dan Hodoroaba</author>
    <author>R. Kraehnert</author>
    <author>Andreas Hertwig</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Electrochemical catalysts</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Mixed metal oxide</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Multi-sample analysis</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Spectroscopic ellipsometry</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Thin mesoporous films</value>
    </subject>
    <collection role="ddc" number="543">Analytische Chemie</collection>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="ddc" number="621">Angewandte Physik</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="themenfelder" number="">Energie</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="themenfelder" number="">Chemie und Prozesstechnik</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei für die Öffentlichkeit verfügbar ("Open Access")</collection>
    <collection role="unnumberedseries" number="">Wissenschaftliche Artikel der BAM</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
    <collection role="themenfelder" number="">Wasserstoff</collection>
    <thesisPublisher>Bundesanstalt für Materialforschung und -prüfung (BAM)</thesisPublisher>
    <file>https://opus4.kobv.de/opus4-bam/files/55102/10.1515_aot-2022-0007.pdf</file>
  </doc>
  <doc>
    <id>47670</id>
    <completedYear/>
    <publishedYear>2019</publishedYear>
    <thesisYearAccepted/>
    <language>deu</language>
    <pageFirst>1</pageFirst>
    <pageLast>10</pageLast>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume>2019</volume>
    <type>conferenceobject</type>
    <publisherName/>
    <publisherPlace/>
    <creatingCorporation>INNOVENT e.V. Prüssingstrasse 27B 07745 Jena</creatingCorporation>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="deu">Auf dem Weg zu Industrie 4.0: Bestimmung von Messunsicherheitsbudgets in der Oberflächentechnik</title>
    <abstract language="deu">Vorgestellt wurde die Bestimmung von Messunsicherheitsbudgets für sehr unterschiedliche physikalische Größen, die in der Oberflächentechnik von hoher Relevanz sind: Stufenhöhe h, Schichtdicke d, Eindringhärte HIT und Haftfestigkeit. Die Unterschiede betreffen die Art der Prüfmethodik (optisch zerstörungsfrei vs. mechanisch invasiv/zerstörend), die laterale Größe des Integrationsgebietes der Messung (lokal: nano bis sub-mikro vs. global: mikro bis makro) und die Art der Bestimmung von Messunsicherheitsbudgets (physikalische Größen: direkt rückführbar; Werkstoffkenngröße: genormt; Systemkenngröße: genormt).&#13;
Im Rahmen von Industrie 4.0 werden ausgehend der geforderten Spezifikation des beschichteten Produkts (Mittelwert mit Vertrauensbereich oder Mindestwert) durchgehende Toleranzbänder zur Oberflächenmodifizierung/Beschichtung des Substrats, einhergehend mit Prozessfenstern, die diese Toleranzbänder garantieren, erforderlich, die zuverlässig erfasst werden müssen. Die Frage der anzuwendenden Mess- und Prüftechnik und die damit notwendige Betrachtung von Messunsicherheitsbudgets ist für die Digitalisierung von Konditionierungs-, Zustands-, Regel- und Steuergrößen unverzichtbar. Mit Blick auf die Einhaltung von Prozessfenstern und die dafür notwendige Prozessführung wird technologisches Kern-Know-how digitalisiert, das es unbedingt zu schützen gilt. Nur lokale Netze können diese Sicherheit garantieren, in globalen Netzen ist die Datensicherheit bestenfalls maximierbar</abstract>
    <parentTitle language="deu">Tagungsband 14. ThGOT Thementage Grenz- und Oberflächentechnik und 6. Kolloquium Dünne Schichten in der Optik</parentTitle>
    <identifier type="isbn">978-3-00-058187-8</identifier>
    <enrichment key="eventName">14. ThGOT Thementage Grenz- und Oberflächentechnik und 6. Kolloquium Dünne Schichten in der Optik</enrichment>
    <enrichment key="eventPlace">Zeulenroda, Germany</enrichment>
    <enrichment key="eventStart">12.03.2019</enrichment>
    <enrichment key="eventEnd">14.03.2019</enrichment>
    <enrichment key="opus.doi.autoCreate">false</enrichment>
    <enrichment key="opus.urn.autoCreate">true</enrichment>
    <author>Uwe Beck</author>
    <author>Michael Griepentrog</author>
    <author>Andreas Hertwig</author>
    <author>Stefan Hielscher</author>
    <author>Matthias Weise</author>
    <subject>
      <language>deu</language>
      <type>uncontrolled</type>
      <value>Oberflächentechnik</value>
    </subject>
    <subject>
      <language>deu</language>
      <type>uncontrolled</type>
      <value>Messunsicherheit</value>
    </subject>
    <subject>
      <language>deu</language>
      <type>uncontrolled</type>
      <value>Messtechnik</value>
    </subject>
    <subject>
      <language>deu</language>
      <type>uncontrolled</type>
      <value>Prüftechnik</value>
    </subject>
    <subject>
      <language>deu</language>
      <type>uncontrolled</type>
      <value>Haftfestigkeit</value>
    </subject>
    <collection role="ddc" number="543">Analytische Chemie</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
    <collection role="literaturgattung" number="">Graue Literatur</collection>
  </doc>
  <doc>
    <id>61855</id>
    <completedYear/>
    <publishedYear>2024</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>researchdata</type>
    <publisherName>Zenodo</publisherName>
    <publisherPlace>Geneva</publisherPlace>
    <creatingCorporation>Bundesanstalt für Materialforschung und -prüfung (BAM)</creatingCorporation>
    <contributingCorporation/>
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    <title language="eng">A multi-method study of femtosecond laser modification and ablation of amorphous hydrogenated carbon coatings</title>
    <abstract language="eng">We report here the optical constants of ECR (MW) and RF generated a-C:H layers before and after laser irradiation. The work is described in the following publication:&#13;
&#13;
https://doi.org/10.1007/s00339-024-07980-z&#13;
&#13;
The data uploaded are the optical constants (n and k) of the a-C:H layers before (base) and after (ROIx) laser irradiation. Please see the article for the nomenclature of the data and for the methods applied ot produce the layers, laser shots, and OK data.</abstract>
    <identifier type="doi">10.5281/zenodo.13928596</identifier>
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    <enrichment key="ScientificDateCreatedStart">2022</enrichment>
    <enrichment key="ScientificDateCreatedEnd">2024</enrichment>
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    <enrichment key="ScientificNote">Text files containing n, k values (optical constants) of a-C:H layers as described in the publication. The data was produced by spectroscopic (imaging) ellipsometry and subsequent modelling.</enrichment>
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    <licence>Creative Commons - CC BY - Namensnennung 4.0 International</licence>
    <author>Andreas Hertwig</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Spectroscopic ellipsometry</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Amorphous hydrogenated carbon layers</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Laser materials processing</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Correlative imaging spectroscopy</value>
    </subject>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="fulltextaccess" number="">Datei für die Öffentlichkeit verfügbar ("Open Access")</collection>
    <collection role="literaturgattung" number="">Graue Literatur</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
    <collection role="unnumberedseries" number="">Forschungsdatensätze der BAM</collection>
  </doc>
  <doc>
    <id>45951</id>
    <completedYear/>
    <publishedYear>2018</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>762</pageFirst>
    <pageLast>763</pageLast>
    <pageNumber/>
    <edition/>
    <issue>S1 (August)</issue>
    <volume>24</volume>
    <type>article</type>
    <publisherName>Cambridge University Press</publisherName>
    <publisherPlace>New York, NY, U.S.A.</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
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    <title language="eng">Analysis of mesoporous iridium oxide thin films by the combined methodical approach SEM/EDS/STRATAGem</title>
    <abstract language="eng">For the determination of porosity of Ir oxide thin films, electron probe microanalysis (EPMA) can be used as part of a combined SEM/EDS/STRATAGem analysis. The mass deposition (in μg cm-2) of films was calculated with the analysis software STRATAGem via k-values measured with EDS. The average density of coated films was obtained from the mass deposition and the film thickness as measured by the cross-section SEM. The porosity was calculated by dividing the average film density by the bulk (theoretical) density of the film material.&#13;
Film porosities were counterchecked by spectroscopic ellipsometry (SE) using the Bruggeman effective medium approximation (BEMA).&#13;
The results obtained by both analytical approaches/methods used, SEM/EDS/STRATAGem and SE were in good agreement.</abstract>
    <parentTitle language="eng">Microscopy and Microanalysis</parentTitle>
    <identifier type="doi">10.1017/S1431927618004300</identifier>
    <identifier type="url">https://www.cambridge.org/core/journals/microscopy-and-microanalysis/article/analysis-of-mesoporous-iridium-oxide-thin-films-by-the-combined-methodical-approach-semedsstratagem/7607018338B542D8B8C4D944392781EF</identifier>
    <identifier type="issn">1431-9276</identifier>
    <identifier type="issn">1435-8115</identifier>
    <author>René Sachse</author>
    <author>Andreas Hertwig</author>
    <author>R. Kraehnert</author>
    <author>Vasile-Dan Hodoroaba</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Porous thin films</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Iridium oxide</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Electron probe microanalysis (EPMA)</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Spectroscopic ellipsometry</value>
    </subject>
    <collection role="ddc" number="543">Analytische Chemie</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
  </doc>
  <doc>
    <id>36911</id>
    <completedYear/>
    <publishedYear>2016</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>7083</pageFirst>
    <pageLast>7090</pageLast>
    <pageNumber/>
    <edition/>
    <issue>14</issue>
    <volume>88</volume>
    <type>article</type>
    <publisherName>ACS Publications</publisherName>
    <publisherPlace>1155 Sixteenth Street N.W., Washington, DC 20036</publisherPlace>
    <creatingCorporation>American Chemical Society</creatingCorporation>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">New approach on quantification of porosity of thin films via electron-excited X‑ray spectra</title>
    <abstract language="eng">One of the crucial characteristics of functionalized thin films is their porosity (i.e., the ratio between the pore volume and the volume of the whole film). Due to the very low amount of material per coated area corresponding to thin films, it is a challenge for analytics to measure the film porosity. In this work, we present an Approach to determine the porosity of thin films by means of electron probe microanalysis (EPMA) either by wavelength-dispersive X-ray spectrometry (WDX) or by energy-dispersive X-ray spectrometry (EDX) with a scanning electron microscope (SEM). The procedure is based on the calculation of the film mass deposition from electron-excited X-ray spectra. The&#13;
mass deposition is converted into film density by division of measured film thickness.&#13;
Finally, the film porosity is calculated from the measured film density and the density of bulk, nonporous film material. The general applicability of the procedure to determine the&#13;
porosity is demonstrated on thin templated mesoporous TiO₂&#13;
films, dip-coated on silicon&#13;
wafer, with controlled porosity in the range of 15 to 50%. The high accuracy of the mass deposition as determined from X-ray spectra was validated with independent methods (ICP-OES and weighing). Furthermore, for the validation of the porosity results, ellipsometry, interference fringes method (IFM), and focused ion beam (FIB) cross sectioning were employed as independent techniques. Hence, the approach proposed&#13;
in the present study is proven to be suited as a new analytical tool for accurate and relatively fast determination of the porosity of thin films.</abstract>
    <parentTitle language="eng">Analytical Chemistry</parentTitle>
    <identifier type="doi">10.1021/acs.analchem.6b00847</identifier>
    <identifier type="url">http://pubs.acs.org/doi/abs/10.1021/acs.analchem.6b00847</identifier>
    <enrichment key="date_peer_review">01.09.2016</enrichment>
    <author>Erik Ortel</author>
    <author>Andreas Hertwig</author>
    <author>D. Berger</author>
    <author>P. Esposito</author>
    <author>A. M. Rossi</author>
    <author>R. Kraehnert</author>
    <author>Vasile-Dan Hodoroaba</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Porosity</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>X-rays</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>EDX</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Thin film</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>TiO2</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Density</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Mass deposition</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>STRATAGem</value>
    </subject>
    <collection role="ddc" number="543">Analytische Chemie</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
  </doc>
  <doc>
    <id>48768</id>
    <completedYear/>
    <publishedYear>2019</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>1770</pageFirst>
    <pageLast>1771</pageLast>
    <pageNumber/>
    <edition/>
    <issue>S2 (August)</issue>
    <volume>25</volume>
    <type>article</type>
    <publisherName>Cambridge University Press</publisherName>
    <publisherPlace>New York, NY, U.S.A.</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Analysis of elemental composition and porosity of mesoporous iridium titanium mixed oxide thin films for energy application by SEM/EDS</title>
    <abstract language="eng">Porous materials play an important role in several fields of technology, especially for energy applications like photovoltaics, electrolysis or batteries. The activity of porous films is affected by properties like porosity, film thickness, chemical composition of the material as well as the crystallinity of the framework. The complex morphology of such porous films constitutes a challenge even for modern analytical techniques and requires new approaches employing the combination/complementation of data of different analytical methods. In this contribution we characterize thin mesoporous iridium-titanium mixed oxide film properties by Electron Probe Microanalysis (EPMA) with energy dispersive X-ray spectroscopy (EDS) at an SEM.</abstract>
    <parentTitle language="eng">Microscopy and Microanalysis</parentTitle>
    <identifier type="doi">10.1017/S1431927619009589</identifier>
    <identifier type="issn">1431-9276 (Print)</identifier>
    <identifier type="issn">1435-8115 (Online)</identifier>
    <enrichment key="opus.doi.autoCreate">false</enrichment>
    <enrichment key="opus.urn.autoCreate">true</enrichment>
    <author>René Sachse</author>
    <author>Vasile-Dan Hodoroaba</author>
    <author>Andreas Hertwig</author>
    <author>L. Kotil</author>
    <author>R. Kraehnert</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Electron probe microanalysis (EPMA)</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Iridium-titanium mixed oxides</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Spectroscopic ellipsometry</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Mesoporous thin films</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>NanoSIMS</value>
    </subject>
    <collection role="ddc" number="543">Analytische Chemie</collection>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
  </doc>
  <doc>
    <id>42517</id>
    <completedYear/>
    <publishedYear>2017</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>487</pageFirst>
    <pageLast>493</pageLast>
    <pageNumber/>
    <edition/>
    <issue>Part B</issue>
    <volume>421</volume>
    <type>article</type>
    <publisherName>Elsevier B.V.</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Ellipsometric porosimetry on pore-controlled TiO2 layers</title>
    <abstract language="eng">The practical performance of surface coatings in applications like catalysis, water splitting or batteries depends critically on the coating materials’ porosity. Determining the porosity in a fast and nondestructive way is still an unsolved problem for industrial thin-films technology. As a contribution to calibrated, non-destructive, optical layer characterisation, we present a multi-method comparison study on porous TiO2 films deposited by sol-gel synthesis on Si wafers. The ellipsometric data were collected on a range of samples with different TiO2 layer thickness and different porosity values. These samples were produced by templated sol-gel synthesis resulting in layers with a well-defined pore size and pore density. The ellipsometry measurement data were analysed by means of a Bruggeman effective medium approximation (BEMA), with the aim to determine the mixture ratio of void and matrix material by a multi-sample analysis strategy. This analysis yielded porosities and layer thicknesses for all samples as well as the dielectric function for the matrix material. Following the idea of multi-method techniques in metrology, the data was referenced to imaging by electron microscopy (SEM) and to a new EPMA (electron probe microanalysis) porosity approach for thin film analysis. This work might lead to a better metrological understanding of optical porosimetry and also to better-qualified characterisation methods for nano-porous layer systems.&#13;
1. IntroductionPorous materials, especially porous thin films play an importantrole in chemical and physical technology in every case where thecontact area between two media has to be maximised. From cataly-sis to photochemistry and photovoltaics, the applications of porouslayer materials are diverse and numerous [1–6].The accurate and non-destructive characterisation of porousfilms for layered systems poses a challenge. This applies especiallyfor the key parameter of porous films, their porosity, i.e. the mix-ing ratio between the Matrix of the film (host material) and thepore volume which is empty or filled with a fluid medium (inclu-sions). This parameter influences most of the physical and chemicalproperties of a porous thin film and is therefore essential for theunderstanding as well as the optimisation of this class of materials.</abstract>
    <parentTitle language="eng">Applied Surface Science</parentTitle>
    <identifier type="doi">10.1016/j.apsusc.2016.11.055</identifier>
    <identifier type="issn">0169-4332</identifier>
    <identifier type="issn">1873-5584</identifier>
    <enrichment key="eventName">International Conference on Spectroscopic Ellipsometry (ICSE-7)</enrichment>
    <enrichment key="eventPlace">Berlin, Germany</enrichment>
    <enrichment key="eventStart">06.06.2016</enrichment>
    <enrichment key="eventEnd">10.06.2016</enrichment>
    <enrichment key="date_peer_review">16.10.2017</enrichment>
    <author>Dana-Maria Rosu</author>
    <author>Erik Ortel</author>
    <author>Vasile-Dan Hodoroaba</author>
    <author>R. Kraehnert</author>
    <author>Andreas Hertwig</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Spectroscopic ellipsometry</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Porous materials</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Porosimetry</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Multi-sample analysis</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Thin film metrology</value>
    </subject>
    <collection role="ddc" number="543">Analytische Chemie</collection>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
  </doc>
  <doc>
    <id>61185</id>
    <completedYear/>
    <publishedYear>2024</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>541</pageFirst>
    <pageLast>542</pageLast>
    <pageNumber/>
    <edition/>
    <issue>Supplement 1</issue>
    <volume>30</volume>
    <type>article</type>
    <publisherName>Oxford University Press (OUP)</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Morphological and Chemical Nanoscale Analysis of Mesoporous Mixed IrOx-TiOy Thin Films as Electrode Materials</title>
    <abstract language="eng">orous films play an important role particularly in energy applications like photovoltaics, electrolysis or batteries. Thin film properties such as thickness, chemical composition, crystallinity of the framework, and porosity define the activity of the porous films. The accurate morpho-chemical characterisation of mesoporous thin films is a challenging analytical task which requires the consideration of new analytical approaches based on the combination of data of different methods able to address the structure and chemical composition at the nanoscale. In this contribution we characterise thin mesoporous iridium-titanium mixed oxide film properties by Electron Probe Microanalysis (EPMA) with Energy-Dispersive X-ray Spectroscopy (EDS) at an SEM applied in a dedicated “thin film analysis” approach (1). Thus, the film mass deposition, film thickness and the film density can be determined. Further, by dividing the measured film density to an assumed (theoretical) metal oxide framework (skeletal) density, the thin film porosity can be extracted, too.&#13;
In order to assess the homogeneity of the thin film properties like the chemical composition, Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) and Auger Electron Spectrometry are applied in the depth profiling mode, so that possible in-depth gradients are detected. Lateral inhomogeneities in the chemical composition and structure of the thin mesoporous films are also identified by applying the same methods in the line-scan or mapping mode, which can be further combined with in-depth sputtering for 3D information. The role of the spatial resolution of the analytical methods considered, which can go down well below 100 nm, will be highlighted.</abstract>
    <parentTitle language="eng">Microscopy and Microanalysis</parentTitle>
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    <author>Denis Bernsmeier</author>
    <author>Ralph Kraehnert</author>
    <author>Andreas Hertwig</author>
    <author>Vasile-Dan Hodoroaba</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Mesoporous thin films</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Imaging</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>TiO2</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Ir oxid</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Auger electron spectroscopy</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>ToF-SIMS</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>SEM/EDX</value>
    </subject>
    <collection role="ddc" number="621">Angewandte Physik</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
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    <id>53960</id>
    <completedYear/>
    <publishedYear>2021</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>1</pageFirst>
    <pageLast>17</pageLast>
    <pageNumber/>
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    <publisherName>Wiley-VCH</publisherName>
    <publisherPlace/>
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    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Ellipsometry-based approach for the characterization of mesoporous thin films for H2 technologies</title>
    <abstract language="eng">Porous thin layer materials are gaining importance in different fields of technology and pose a challenge to the accurate determination of materials properties important for their function. In this work, we demonstrate a hybrid measurement technique using ellipsometry together with other independent methods for validation. Ellipsometry provides information about the porosity of different mesoporous films (PtRuNP/OMC = 45%; IrOx = 46%) as well as about the pore size (pore radius of ca. 5 nm for PtRuNP/OMC). In addition, the electronic structure of a material, such as intraband transitions of a mesoporous IrOx film, can be identified, which can be used to better understand the mechanisms of chemical processes. In addition, we show that ellipsometry can be used as a scalable imaging and visualization method for quality assurance in production. These require accurate and traceable measurements, with reference materials playing an important role that include porosity and other related properties. We show that our novel analytical methods are useful for improving analytical work in this entire field.</abstract>
    <parentTitle language="eng">Advanced Engineering Materials</parentTitle>
    <identifier type="doi">10.1002/adem.202101320</identifier>
    <enrichment key="opus.source">publish</enrichment>
    <enrichment key="date_peer_review">20.04.2022</enrichment>
    <author>René Sachse</author>
    <author>Maëlle Moor</author>
    <author>Ralph Kraehnert</author>
    <author>Vasile-Dan Hodoroaba</author>
    <author>Andreas Hertwig</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Porous materials</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Electrolysis</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Spectroscopic ellipsometry</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Hybrid metrology measurement</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Electron microscopy</value>
    </subject>
    <collection role="ddc" number="543">Analytische Chemie</collection>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="ddc" number="621">Angewandte Physik</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="institutes" number="">6.7 Materialsynthese und Design</collection>
    <collection role="themenfelder" number="">Energie</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="themenfelder" number="">Chemie und Prozesstechnik</collection>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
    <collection role="themenfelder" number="">Wasserstoff</collection>
  </doc>
  <doc>
    <id>63633</id>
    <completedYear/>
    <publishedYear>2025</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
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    <issue/>
    <volume/>
    <type>lecture</type>
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    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Using imaging ellipsometry to understand femtosecond laser materials processing of group IV materials</title>
    <abstract language="eng">Laser materials processing is an important tool for creating and shaping new materials. Laser machining, especially with ultrashort pulses offers the modification of surfaces, thin coatings, and bulk materials with an unprecedented precision and control. The most desired feature of pulsed laser processing in the femtosecond range is that the heat-affected zone in the irradiated material will be extremely small. To better understand the mechanisms involved during laser irradiation, it is important to analyse the outcome of light-matter interaction with spectroscopic methods. Ellipsometry, especially spectroscopic imaging ellipsometry (SIE), has become an important tool for this in recent times, as it gives access to local layer thicknesses, materials dielectric functions, and features like changes in surface roughness.&#13;
This work includes an overview over our recent studies examining near-infrared fs-laser surface processing of different group IV materials. The superficial phase change of silicon from crystalline to amorphous has been investigated in the past as the result of laser processing strongly depends on the crystal orientation. Moreover, SIE is capable of determining the&#13;
properties of buried a-Si interfaces with micrometer lateral and sub-nanoneter vertical precision. Additionally, the growth of native and laser-induced oxides can be revealed.</abstract>
    <enrichment key="eventName">ICSE10 - 10th International Conference on Spectroscopic Ellipsometry</enrichment>
    <enrichment key="eventPlace">Boulder, CO, USA</enrichment>
    <enrichment key="eventStart">08.06.2025</enrichment>
    <enrichment key="eventEnd">13.06.2025</enrichment>
    <enrichment key="InvitedTalks">0</enrichment>
    <enrichment key="opus.source">publish</enrichment>
    <enrichment key="opus.doi.autoCreate">false</enrichment>
    <enrichment key="opus.urn.autoCreate">true</enrichment>
    <author>Deniz Hülagü</author>
    <author>Kenta Hirahara</author>
    <author>Daniel Fischer</author>
    <author>Camilo Florian</author>
    <author>Robert Schusterbauer</author>
    <author>Elena Ermilova</author>
    <author>Jörg Krüger</author>
    <author>Andreas-Neil Unterreiner</author>
    <author>Jörn Bonse</author>
    <author>Andreas Hertwig</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Laser surface ablation</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Amorphous Carbon</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Silicon</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Correlative Imaging Ellipsometry</value>
    </subject>
    <collection role="ddc" number="543">Analytische Chemie</collection>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="institutes" number="">6.2 Material- und Oberflächentechnologien</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="themenfelder" number="">Chemie und Prozesstechnik</collection>
    <collection role="themenfelder" number="">Chemische Charakterisierung und Spurenanalytik</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
    <collection role="literaturgattung" number="">Präsentation</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
    <collection role="themenfelder" number="">Materialdesign</collection>
  </doc>
  <doc>
    <id>27210</id>
    <completedYear/>
    <publishedYear>2012</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>671</pageFirst>
    <pageLast>677</pageLast>
    <pageNumber/>
    <edition/>
    <issue>8</issue>
    <volume>36</volume>
    <type>article</type>
    <publisherName>Heyden</publisherName>
    <publisherPlace>London</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Sub-micrometre coatings as an infrared mirror: a new route to flame retardancy</title>
    <abstract language="eng">Most of the polymeric materials used are easy to ignite and show extensive flame spread along their surfaces. Apart from extensive heat release rates, their short time to ignition (tig), in particular, is a key fire hazard. Preventing ignition eliminates fire hazards completely. Protection layers that shift tig by more than an order of magnitude are powerful flame retardancy approaches presenting an alternative to the usual flame retardancy concepts.&#13;
Coatings are proposed that consist of a three-layer system to ensure adhesion to the substrate, acting as an infrared (IR) mirror and protecting against oxidation. The IR-mirror layer stack is realised by physical vapour deposition in the sub-micrometre (&lt;1 µm) range, reducing heat absorption by up to an order of magnitude. Not only is the ease of ignition diminished (tig is increased by several minutes), the flame spread and fire growth indices are also remarkably reduced to as little as 1/10 of the values of the uncoated polymers open for further optimization. Sub-micrometre thin IR-mirror coatings yielding surface absorptivity &lt;0.1 are proposed as a novel and innovative flame retardancy approach.</abstract>
    <parentTitle language="eng">Fire and materials</parentTitle>
    <identifier type="old">30006</identifier>
    <identifier type="doi">10.1002/fam.1122</identifier>
    <identifier type="issn">0308-0501</identifier>
    <identifier type="issn">1099-1018</identifier>
    <enrichment key="date_peer_review">03.12.2012</enrichment>
    <author>Bernhard Schartel</author>
    <author>Uwe Beck</author>
    <author>Horst Bahr</author>
    <author>Andreas Hertwig</author>
    <author>Uta Knoll</author>
    <author>Matthias Weise</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Coating</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Fire protection</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Physical vapour deposition (PVD)</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>IR mirror</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Ignition</value>
    </subject>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
  </doc>
  <doc>
    <id>61782</id>
    <completedYear/>
    <publishedYear>2024</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>1</pageFirst>
    <pageLast>17</pageLast>
    <pageNumber/>
    <edition/>
    <issue>12</issue>
    <volume>130</volume>
    <type>article</type>
    <publisherName>Springer Science and Business Media LLC</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">A multi-method study of femtosecond laser modification and ablation of amorphous hydrogenated carbon coatings</title>
    <abstract language="eng">e present a study on femtosecond laser treatment of amorphous hydrogen-containing carbon coatings (a-C:H). The coatings were deposited on silicon wafers by a plasma-assisted chemical vapour deposition (PA-CVD), resulting in two different types of material with distinct properties (referred to as “absorbing” and “semi-transparent” coatings in the following). &#13;
The samples were laser-treated with single fs-laser pulses (800 nm center wavelength, 35 fs pulse duration) in the ablative regime. Through a multi-method approach using topometry, Raman spectroscopy, and spectroscopic imaging ellipsometry, we can identify zones and thresholds of diferent fuence dependent efects and have access to the local dielectric function. &#13;
The two coating materials react signifcantly diferent upon laser treatment. We determined the (non-ablative) modifcation threshold fuence for the absorbing coating as 3.6 × 10−2 Jcm−2 and its ablation threshold as 0.22 Jcm−2. The semi-transparent coating does not show such a low-fuence modifcation but exhibits a characteristic interference-based intra-flm ablation mechanism with two distinguishable ablation thresholds at 0.25 and 0.28 Jcm−2,  respectively. The combination of tailored layer materials and correlative imaging spectroscopic methods delivers new insights into the behaviour of materials when treated with ultrashort-pulse laser radiation</abstract>
    <parentTitle language="eng">Applied Physics A</parentTitle>
    <identifier type="doi">10.1007/s00339-024-07980-z</identifier>
    <identifier type="urn">urn:nbn:de:kobv:b43-617829</identifier>
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    <licence>Creative Commons - CC BY - Namensnennung 4.0 International</licence>
    <author>Kenta Hirahara</author>
    <author>Jörn Bonse</author>
    <author>Jörg Krüger</author>
    <author>Matthias Weise</author>
    <author>Elena Ermilova</author>
    <author>Robert Schusterbauer</author>
    <author>Andreas-Neil Unterreiner</author>
    <author>Andreas Hertwig</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Amorphous Hydrogenated Carbon Coatings</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Correlative Imaging Measurement Techniques</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Hybrid Metrology</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Imaging Spectroscopy</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Spectroscopic Ellipsometry</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Ultra-short Pulse Laser Materials Processing</value>
    </subject>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
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    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
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    <collection role="unnumberedseries" number="">Wissenschaftliche Artikel der BAM</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
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    <title language="eng">Correlative analysis of graphene: Advancing ellipsometry as a fast routine method</title>
    <abstract language="eng">Graphene (G) and graphene oxide (GO) are key materials for various applications,  yet their structural and thickness inhomogeneities calls for rapid, reliable characterization. In this work, we performed a correlative analysis, combining spectroscopic (SE) and imaging ellipsometry (IE) with complementary microscopy techniques to investigate monolayer graphene and GO flakes on SiO₂/Si substrates.&#13;
&#13;
SEM, owing to its high resolution and excellent contrast, delivered a comprehensive overview of the monolayer graphene (Figure 1a) and enabled the clear identification of individual GO flakes (c). However, SEM does not provide layer-thickness information. In this case, SE served as a fast and non-destructive method capable of quantitative thickness determination through optical modeling, revealing a graphene layer thickness of 0.7 nm (b), corresponding to a monolayer. The GO flake identified by SEM was subsequently analyzed by AFM, a well-established technique providing nanoscale height profiles with high accuracy (d–f). AFM results further revealed flake thicknesses of a few monolayers. However, AFM is time-consuming, restricted to small scan areas, and does not offer a full overview of the sample. WLIM complemented these results by providing large-area imaging, enabling the visualization of multiple flakes simultaneously. Nevertheless, it is not able to quantify the exact thickness (e). In contrast, IE enabled non-destructive, substrate-independent thickness of GO flakes with single-atomic-layer precision and improved sensitivity, once the ellipsometer settings were optimized for material and thickness contrast and fixed during imaging, bridging the gap between overview imaging and quantitative nanoscale analysis (g–h).&#13;
&#13;
While SE provides non-destructive, quantitative thickness information for homogeneous monolayer graphene, GO flakes require imaging-based methods. Therefore, IE represents an attractive alternative, offering large-area maps of GO flakes together with local layer-thickness information. This correlative approach establishes a foundation for standardized, large-area quality assessment of such 2D materials.</abstract>
    <enrichment key="eventName">13th Workshop on Spectroscopic Ellipsometry WSE 2026</enrichment>
    <enrichment key="eventPlace">Genova, Italy</enrichment>
    <enrichment key="eventStart">09.02.2026</enrichment>
    <enrichment key="eventEnd">12.02.2026</enrichment>
    <enrichment key="opus.source">publish</enrichment>
    <enrichment key="opus.doi.autoCreate">false</enrichment>
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    <author>Deniz Hülagü</author>
    <author>Andreas Hertwig</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Monolayer graphene</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Graphene oxide</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Correlative Analysis</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>SEM</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Spectroscopic ellipsometry</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Imaging ellipsometry</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>AFM</value>
    </subject>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="institutes" number="">6 Materialchemie</collection>
    <collection role="institutes" number="">6.1 Oberflächen- und Dünnschichtanalyse</collection>
    <collection role="themenfelder" number="">Material</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
    <collection role="literaturgattung" number="">Präsentation</collection>
    <collection role="themenfelder" number="">Advanced Materials</collection>
  </doc>
  <doc>
    <id>25453</id>
    <completedYear/>
    <publishedYear>2012</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>615</pageFirst>
    <pageLast>622</pageLast>
    <pageNumber/>
    <edition/>
    <issue>4</issue>
    <volume>13</volume>
    <type>article</type>
    <publisherName>Elsevier B.V.</publisherName>
    <publisherPlace>Amsterdam [u.a.]</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Light management in PCPDTBT:PC70BM solar cells: A comparison of standard and inverted device structures</title>
    <abstract language="eng">We compare standard and inverted bulk heterojunction solar cells composed of PCPDTBT:PC70BM blends. Inverted devices comprising 100 nm thick active layers exhibited short circuit currents of 15 mA/cm², 10% larger than in corresponding standard devices. Modeling of the optical field distribution in the different device stacks proved that this enhancement originates from an increased absorption of incident light in the active layer. Internal quantum efficiencies (IQEs) were obtained from the direct comparison of experimentally derived and modeled currents for different layer thicknesses, yielding IQEs&#13;
of ~70% for a layer thickness of 100 nm. Simulations predict a significant increase of the light harvesting efficiency upon increasing the layer thickness to 270 nm. However, a continuous deterioration of the photovoltaic properties with layer thickness was measured for both device architectures, attributed to incomplete charge extraction. On the other hand, our optical modeling suggests that inverted devices based on PCPDTBT should be able to deliver high power conversion efficiencies (PCEs) of more than 7% provided that recombination losses can be reduced.</abstract>
    <parentTitle language="eng">Organic electronics</parentTitle>
    <identifier type="old">28171</identifier>
    <identifier type="doi">10.1016/j.orgel.2011.12.019</identifier>
    <identifier type="issn">1566-1199</identifier>
    <enrichment key="date_peer_review">09.02.2012</enrichment>
    <author>S. Albrecht</author>
    <author>S. Schäfer</author>
    <author>I. Lange</author>
    <author>S. Yilmaz</author>
    <author>I. Dumsch</author>
    <author>S. Allard</author>
    <author>U. Scherf</author>
    <author>Andreas Hertwig</author>
    <author>D. Neher</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Organic solar cells</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Inverted solar cells</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>PCPDTBT</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Low band-gap</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Optical modeling</value>
    </subject>
    <collection role="literaturgattung" number="">Verlagsliteratur</collection>
    <collection role="fulltextaccess" number="">Datei im Netzwerk der BAM verfügbar ("Closed Access")</collection>
  </doc>
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