TY - JOUR A1 - Ramm, M. A1 - Ata, M. A1 - Gross, Thomas A1 - Unger, Wolfgang T1 - Plasma-Polymerized C60 Films JF - Materials physics and mechanics N2 - We studied the polymerization of C60 under different Ar plasma conditions. Films were either deposited in the pressure range between 1.3 and 40 Pa applying input power of 50 W or evaporated C60 films were exposed to Ar plasma of 30 and 50 W. The films were investigated by Raman spectroscopy, X-ray photoelectron spectroscopy (XPS) and carbon K near-edge X-ray-absorption fine structure spectroscopy (NEXAFS). The films were non-uniform and consisted of unpolymerized C60, dimers, linear chains and polymeric planes. In comparison with evaporated C60 the XPS C 1s peak is broader and asymmetric for the C60 polymer and its shake-up satellites diminished. Furthermore, the features of the valence band as well as the features of the p * antibonding orbitals of the C60 polymer are broader and reduced in intensity. PY - 2001 UR - http://www.ipme.ru/e-journals/MPM/no_1401/ramm/ramm.html SN - 1605-2730 SN - 1605-8119 VL - 4 IS - 1 SP - 8 EP - 12 PB - Advanced Study Center CY - St. Petersburg AN - OPUS4-6941 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -