TY - CONF A1 - John, Elisabeth A1 - Weise, Matthias A1 - Stockmann, Jörg M. A1 - Radnik, Jörg A1 - Sahre, Mario A1 - Lange, Thorid A1 - Hodoroaba, Dan T1 - Towards a high-entropy alloy thin-film reference material N2 - Analyzing materials composed of multiple elements with spectroscopic techniques such as X-ray Photoelectron Spectroscopy (XPS), Auger-Electron Spectroscopy (AES) or Electron Probe Microanalysis (EPMA), can be challenging due to spectral overlap. Moreover, each analytical method introduces its own set of challenges, e.g., the strong secondary fluorescence effect for neighbor elements in EPMA, thus, making the accurate elemental quantification in such materials difficult. When the material is available as thin film, additional constraints are inherently present. To provide a reference material for these analytical challenges high entropy alloys (HEAs) are excellent candidates. Currently, there is no thin film reference available containing more than 2 elements. Unlike traditional alloys, which typically consist of one or two main elements and smaller amounts of secondary elements, HEAs are characterized by the presence of multiple principal elements in almost equal proportions. This unique composition results in a high degree of disorder at the atomic level, leading to exceptional mechanical, physical, and often unexpected properties. HEAs have garnered significant attention in materials science and engineering due to their potential applications in a wide range of industries, from aerospace and automotive to electronics and renewable energy. For the preparation of a dedicated thin film reference material, we have chosen to prepare HEAs by magnetron sputtering, since it is not associated with elemental segregation that may occur due to the high configurational entropy of HEAs, which promotes atomic rearrangements. Our goal was to prepare films with a homogeneous thickness and defined chemical composition to be analyzed by various methods dedicated to surface analysis. The material, consisting of titanium, chromium, manganese, iron, and nickel was deposited as film on silicon substrates - to our knowledge the first HEA thin film of this type reported in literature. A set of different thickness of the films was chosen, on the one hand to facilitate the analysis with different techniques, and on the other side to evaluate the limitations of the respective methods. The films morphology was characterized as prepared by SEM followed by the analysis of their 2D compositional homogeneity by EDX, XRF, ToF-SIMS and XPS. in-depth chemical composition was evaluated by ToF-SIMS and AES. The outcomes of analyzing the initial batches of films will be presented. T2 - European Conference on Applications Surface and Interface Analysis (ECASIA 2024) CY - Gothenburg, Sweden DA - 10.06.2024 KW - High-entropy alloy KW - Thin film KW - Magnetron sputtering PY - 2024 AN - OPUS4-60455 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -