TY - JOUR A1 - Gornushkin, Igor B. A1 - Shabanov, Sergej V. A1 - Sennikov, P. G. T1 - Equilibrium Chemistry in BCl3–H2–Ar Plasma T2 - Plasma Chemistry and Plasma Processing N2 - The approach, which was developed earlier for modeling chemical reactions in laser induced plasmas, is applied to radio-frequency discharge plasmas. The model is based on the assumption that all ionization processes and chemical reactions are at local thermodynamic equilibrium. A chemical composition of an argon-hydrogen plasma with an Addition of boron trichloride is studied as a function of plasma temperature and mole ratio H2∕BCl3. It is established that more than twenty simple and composite molecules and ions can be formed in the course of chemical reactions. The results are compared with those obtained earlier by means of another equilibrium model that uses ab-initio quantum chemical computations of thermochemical and kinetic data and a 0D thermochemical quilibrium solver. PB - Springer KW - Modeling chemical reactions KW - Plasma physics KW - Plasma enhanced chemical vapor deposition PY - 2019 UR - https://opus4.kobv.de/opus4-bam/frontdoor/index/index/docId/47817 AN - OPUS4-47817 VL - 39 IS - 4 SP - 1087 EP - 1102 AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany