TY - JOUR A1 - Dietrich, Paul A1 - Treu, Dieter A1 - Kalbe, Henryk A1 - Krumrey, M. A1 - Gross, Thomas A1 - Marti, K. A1 - Unger, Wolfgang T1 - Experimental determination of the effective attenuation length of palladium 3d 5/2 photoelectrons in a magnetron sputtered Pd nanolayer T2 - Surface and Interface Analysis N2 - An electron effective attenuation length (EAL) of 1.68nm for Al Kα excited Pd 3d 5/2 photoelectrons with a kinetic energy of 1.152 keV has been determined experimentally using a sputtered Pd film deposited on an ultra flat fused quartz substrate. The film thickness was reduced by Ar ion sputtering several times in order to obtain different Pd film thicknesses which are used to determine experimental EAL values. These results are compared to data generated by using a Simulation of Electron Spectra for Surface Analysis (SESSA) simulation using an inelastic mean free path (IMFP) calculated with the Tanuma–Powell–Penn (TPP)-2M formula and with ‘elastic scattering on and off’. Contributions to the uncertainty budget related to the experimental approach are discussed in detail. Proposals on how to further improve the approach are suggested. PB - John Wiley & Sons, Ltd KW - Pd 3d KW - Electron effective attenuation length KW - XPS PY - 2017 UR - https://opus4.kobv.de/opus4-bam/frontdoor/index/index/docId/39682 AN - OPUS4-39682 UR - http://onlinelibrary.wiley.com/doi/10.1002/sia.6141/abstract?campaign=woletoc SN - 0142-2421 SN - 1096-9918 VL - 49 IS - 5 SP - 464 EP - 468 AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany