TY - JOUR A1 - Krüger, Jörg A1 - Martin, Sven A1 - Mädebach, Heinrich A1 - Urech, L. A1 - Lippert, T. A1 - Wokaun, A. A1 - Kautek, Wolfgang T1 - Femto- and nanosecond laser treatment of doped polymethylmethacrylate JF - Applied surface science N2 - Femto- and nanosecond laser ablation of polymethylmethacrylate (PMMA) and PMMA doped with a linear absorber was investigated in the infrared spectral region. Ablation thresholds were determined and incubation phenomena were identified. The ‘degree’ of incubation was calculated employing a phenomenological model. The influence of the pulse duration on the machining quality of the polymers was examined. The presence of an absorbing chromophore is not a prerequisite for a controllable fs-laser structuring in contrast to the ns-treatment. Surface swelling always accompanied ablation. KW - Laser ablation KW - Laser beam machining KW - Doping thin films KW - Polymers-radiation effects PY - 2005 DO - https://doi.org/10.1016/j.apsusc.2005.01.078 SN - 0169-4332 SN - 1873-5584 VL - 247 SP - 406 EP - 411 PB - North-Holland CY - Amsterdam AN - OPUS4-7470 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -