TY - JOUR A1 - Cappella, Brunero A1 - Sturm, Heinz A1 - Weidner, Steffen T1 - Breaking polymer chains by dynamic plowing lithography T2 - Polymer N2 - The adhesion of poly(methyl methacrylate) (PMMA) and polystyrene (PS) films, whose surface has been previously structured by dynamic plowing lithography (DPL), has been measured by means of forceĀ–displacement curves. The different adhesion of modified and unmodified PS leads to the assumption that polymer chains are broken during DPL. After measuring the energy dissipated by the tip during DPL, in order to check that the transferred energy is sufficient to break covalent bonds, the polymer chain scission caused by the lithographic process has been definitely confirmed by size exclusion chromatography measurements of the lithographed films. PB - Springer CY - Berlin KW - AFM KW - Nanolithography KW - Chain scission PY - 2002 UR - https://opus4.kobv.de/opus4-bam/frontdoor/index/index/docId/1608 AN - OPUS4-1608 SN - 0032-3861 SN - 1873-2291 VL - 43 IS - 16 SP - 4461 EP - 4466 AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany