TY - JOUR A1 - Topolniak, Ievgeniia A1 - Elert, Anna Maria A1 - Knigge, Xenia A1 - Ciftci, G. C. A1 - Radnik, Jörg A1 - Sturm, Heinz T1 - High precision micropatterning of polydopamine by Multiphoton Lithography JF - Advanced Materials N2 - Mussel-inspired polydopamine (PDA) initiated a multifunctional modification route that leads to the generation of novel advanced materials and their applications. However, existing PDA deposition techniques still exhibit poor spatial control, have a very limited capability of micropatterning and do not allow to locally tune PDA topography. Herein, we demonstrate PDA deposition based on Multiphoton Lithography (MPL) that enables full spatial and temporal control with nearly total freedom of patterning design. Using MPL, we achieve 2D microstructures of complex design with pattern precision of 0.8 μm without the need of a photomask or stamp. Moreover, this approach permits adjusting the morphology and thickness of the fabricated microstructure within one deposition step, resulting in a unique tunability of materials properties. The chemical composition of PDA is confirmed and its ability for protein enzyme immobilization is demonstrated. This work presents a new methodology for high precision and complete control of PDA deposition, enabling PDA incorporation in applications where fine and precise local surface functionalization is required. Possible applications include multicomponent functional elements and devices in microfluidics or lab-on-a-chip systems. KW - Multiphoton lithography KW - Polydopamine KW - Micropatterning PY - 2022 DO - https://doi.org/10.1002/adma.202109509 VL - 34 IS - 18 SP - e2109509 PB - Wiley online library AN - OPUS4-54535 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -