TY - JOUR A1 - Cappella, Brunero A1 - Geuss, Markus A1 - Sturm, Heinz A1 - Heyde, M. A1 - Rademann, K. A1 - Spangenberg, T. A1 - Niehus, H. T1 - Dynamic plowing nanolithography on polymethylmethacrylate using an atomic force microscope JF - Review of scientific instruments N2 - We present dynamic plowing nanolithography on polymethylmethacrylate films, performed with a scan-linearized atomic force microscope able to scan up to 250 μm with high resolution. Modifications of the surface are obtained by plastically indenting the film surface with a vibrating tip. By changing the oscillation amplitude of the cantilever, i.e., the indentation depth, surfaces can be either imaged or modified. A program devoted to the control of the scanning process is also presented. The software basically converts the gray scale of pixel images into voltages used to control the dither piezo driving cantilever oscillations. The advantages of our experimental setup and the dependence of lithography efficiency on scanning parameters are discussed. Some insights into the process of surface modifications are presented. KW - Nanolithography PY - 2001 UR - http://rsi.aip.org/ DO - https://doi.org/10.1063/1.1326053 SN - 0034-6748 SN - 1089-7623 VL - 72 SP - 136 EP - 141 PB - American Institute of Physics CY - Melville, NY AN - OPUS4-874 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -