TY - JOUR A1 - Oran, Umut A1 - Swaraj, Sufal A1 - Lippitz, Andreas A1 - Unger, Wolfgang T1 - Surface analysis of Plasma Deposited Polymer Films, 7: "In situ" Characterization of Plasma Deposited Allylamine Films by ToF-SSIMS, XPS and NEXAFS Spectroscopy JF - Plasma processes and polymers N2 - Plasma deposited allylamine films were studied by in situ ToF-SSIMS, XPS and NEXAFS Spectroscopy before exposure to ambient air. The influence of external plasma parameters such as duty cycle, plasma power, and monomer flow rate on (i) unsaturation, (ii) branching and cross-linking, (iii) nitrogen surface concentration and (iv) retention of amino groups was investigated. Harder plasma conditions, which can be obtained when high duty cycles, high plasma power, and low monomer flow rates are employed, increase the unsaturated, branched and cross-linked character of the plasma deposited films, while the surface concentration of N as well as the retention of the monomer's amino group decrease. As proven by NEXAFS findings and cross-checked by ToF-SSIMS results, the allylamine monomer's primary amino groups are partially transformed into other nitrogen functionalities during its plasma polymerization. Amongst them imines and nitriles are the conversion products with the highest probabilities of formation. Another conversion channel is the formation of nitrogen species not participating in the film growth. This is the reason for an increased N loss in plasma deposited allylamine films as observed independently by XPS and ToF-SSIMS when the plasma parameters are changed from mild to hard. KW - Allylamine KW - NEXAFS KW - Plasma polymerization KW - ToF-SSIMS KW - XPS PY - 2006 DO - https://doi.org/10.1002/ppap.200500168 SN - 1612-8850 SN - 1612-8869 VL - 3 IS - 3 SP - 288 EP - 298 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-12272 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -