TY - GEN A1 - Reuther, F. A1 - Krüger, Ralph-Peter A1 - Schulz, Günter A1 - Baehr, G. A1 - Westerwelle, U. A1 - Gruetzner, G. ED - Houlihan, F. M. T1 - Tailored novolak resins for advanced photoresists by a two-step procedure - new insight into the molecular structure by coupling GPC and MALDI-TOF-MS T2 - Advances in resist technology and processing XVII T2 - 17th Annual SPIE Conference on Advances in Resist Technology and Processing CY - Santa Clara, CA, USA DA - 2000-02-28 KW - Novolak KW - Structure KW - Synthesis KW - Gel permeation KW - Chromatography KW - MALDI-TOF-MS PY - 2000 SN - 0-8194-3617-8 SN - 1605-7422 N1 - Serientitel: SPIE proceedings series – Series title: SPIE proceedings series IS - 3999 SP - 464 EP - 471 PB - SPIE CY - Bellingham AN - OPUS4-2171 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -