TY - JOUR A1 - Krüger, Jörg A1 - Kautek, Wolfgang A1 - Lenzner, M. A1 - Krausz, F. T1 - Precision laser ablation of dielectrics in the 10-fs regime JF - Applied physics A N2 - Zusammenfassung Laser pulses in the 10-fs domain provide a quality of micromachining of fused silica and borosilicate glass that is unobtainable with longer pulses in the range of several 100 femtoseconds up to picoseconds. The shortening of the pulses reduces the statistical behavior of the material removal and the ablation process thus attains a more deterministic and reproducible character. The improved reproducibility of ablation is accompanied by significantly smoother morphology. This offers the potential for lateral and vertical machining precision of the order of 100 nm and 10 nm, respectively. KW - Laser ablation PY - 1999 DO - https://doi.org/10.1007/s003390050906 SN - 0947-8396 VL - 68 IS - 3 SP - 369 EP - 371 PB - Springer CY - Berlin AN - OPUS4-825 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -