TY - JOUR A1 - Grehn, M. A1 - Seuthe, T. A1 - Höfner, M. A1 - Griga, N. A1 - Theiss, C. A1 - Mermillod-Blondin, A. A1 - Eberstein, Markus A1 - Eichler, H. A1 - Bonse, Jörn T1 - Femtosecond-laser induced ablation of silicate glasses and the intrinsic dissociation energy T2 - Optical Materials Express N2 - The relation between ablation threshold fluence upon femtosecond laser pulse irradiation and the average dissociation energy density of silicate based multicomponent glass is studied. A simple model based on multiphoton absorption quantifies the absorbed energy density at the ablation threshold fluence. This energy density is compared to a calculated energy density which is necessary to decompose the glass compound into its atomic constituents. The results confirm that this energy density is a crucial intrinsic material parameter for the description of the femtosecond laser ablation threshold fluence of dielectrics. PB - OSA CY - Washington, DC PY - 2014 UR - https://opus4.kobv.de/opus4-bam/frontdoor/index/index/docId/30475 AN - OPUS4-30475 SN - 2159-3930 VL - 4 IS - 4 SP - 689 EP - 700 AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany