TY - JOUR A1 - Bonse, Jörn A1 - Baudach, Steffen A1 - Kautek, Wolfgang A1 - Krüger, Jörg A1 - Welsch, E. T1 - Femtosecond laser damage of a high reflecting mirror T2 - Thin solid films N2 - Multiple pulse investigations of 130-fs Ti:sapphire laser-induced damage of a high reflecting mirror consisting of alternating ?/4-layers of Ta2O5 and SiO2 and a single 500-nm Ta2O5 film were performed. In both cases, fused silica served as the substrate. For a fixed number of 1000 laser pulses per spot, a decrease in the damage threshold fluence of the mirror by a factor of two was observed by changing the repetition rate from 10 Hz to 1 kHz. A single 500-nm Ta2O5 film shows higher damage resistance compared to the mirror. The mirror and the Ta2O5 film samples were partially coated with a 300-nm-thick aluminium layer. The aluminium coating does not influence the damage threshold of the dielectrics underneath. PB - Elsevier CY - Amsterdam KW - Aluminium KW - Laser ablation KW - Optical coatings KW - Silicon oxide PY - 2002 UR - https://opus4.kobv.de/opus4-bam/frontdoor/index/index/docId/1382 AN - OPUS4-1382 SN - 0040-6090 IS - 408 SP - 297 EP - 301 AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany