TY - CONF A1 - Unger, Wolfgang T1 - Acquiring and Documenting Reproducible Spectra, Depth Profiles and Images: XPS, AES and SIMS N2 - In this talk sample prep/handling, instrument calibration and data acquisition methods with examples from XPS, Auger and SIMS will be addressed in terms of their contributions to the reproducibility of data delivered by the methods. Active parties in the field are VAMAS TWA 2 “Surface chemical analysis” (http://www.vamas.org/twa2/index.html), ISO/TC 201 “Surface chemical analysis” (https://www.iso.org/committee/54618.html) and the Surface Analysis Working Group (SAWG) at the International Meter Convention (https://www.bipm.org/en/ committees/cc/wg/sawg.html). The tools to improve the reproducibility of spectra, depth profiles and images at these international platforms are inter-laboratory comparisons, validated SOPs, standards and certified reference materials (CRM) as well as uncertainty budgets and establishment of traceability chains. The last point is of specific importance because all the methods, XPS, Auger and SIMS, are not primary methods. To address quantitative XPS, AES and SIMS results of relevant inter-laboratory comparisons organized by SAWG considering measurands as alloy surface composition and thickness of thin films will be introduced. These comparisons delivered results which are viewed to be benchmarking, some of them resulted in ISO/TC 201 standards. For quantitative XPS and AES the principal outline of an uncertainty budget will be discussed together with the audience. Another issue of quantitative XPS which definitely needs consideration are valid methods for a determination of the transmission function of the instruments and even for the emission angle in the respective experiments. Concerning the field of depth profiling it has to be investigated together with the audience whether the ISO (or ASTM) standards we have are sufficient to guarantee comparable results. Having in mind the number of different sputter ion species available today and range of samples of interest (metals, semiconductors, organic films) this might be questionable. And, how do depth profiling by AR-XPS and variable excitation energy XPS compete here? For imaging surface chemical analysis, the characterization of the imaging system is an issue to be investigated. Here the determination of lateral resolution is a relevant topic. Finally, the future needs to develop metrology for new applications e.g., ambient-pressure XPS, bio samples, and core-shell nanoparticles, will be issues raised for a discussion with the audience. T2 - 17th Topical Conference on Quantitative Surface Analysis (QSA 17) CY - Long Beach, CA, USA DA - 21.10.2018 KW - Depth Profiles and Images KW - X-ray Photoelectron Spectroscopy (XPS) KW - Auger Electron Spectroscopy (AES) KW - SIMS KW - Reproducible Spectra PY - 2018 AN - OPUS4-46470 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -