TY - CONF A1 - Unger, Wolfgang A1 - Streeck, Cornelia A1 - Beckhoff, Burkhard T1 - Improved quantitative XRF analysis of industrial thin film samples by calibration using thin film RMs certified by reference-free XRF enabling traceability to the SI N2 - Reference-free XRF is a SI traceable technique for the determination of the mass deposition (mass per unit area) of elements in films on the nano- and micro scale. The method is radiometrically calibrated instrumentation (PTB@BESSY II, Germany) and based on reliable knowledge of all relevant atomic fundamental, experimental and instrumental parameters. No calibration sample or reference materials are necessary. The approach had been validated in the CCQM-P140 pilot study and the K129 key comparison by determination of mole fractions in Cu(In,Ga)Se2 thin films. T2 - Annual Meeting of ISO TC 201 SC 10 XRR/XRF CY - Seoul, Korea DA - 12.10.2016 KW - Reference-free XRF KW - CIGS thin films PY - 2016 AN - OPUS4-38265 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -