TY - JOUR A1 - Gawek, Marcel A1 - Madkour, Sherif A1 - Szymoniak, Paulina A1 - Radnik, Jörg A1 - Schönhals, Andreas T1 - Energy Dependent XPS Measurements on Thin Films of a Poly(vinyl methyl ether)/Polystyrene Blend in Dependence on Film Thickness – Concentration Profile on a Nanometer Resolution to Understand the Behavior of Nanofilms JF - Soft Matter N2 - The composition of the surface layer in dependence from the distance of the polymer/air interface in thin films with thicknesses below 100 nm of miscible polymer blends in a spatial region of a few nanometers is not investigated completely. Here, thin films of the blend poly vinyl methyl ether) (PVME)/polystyrene (PS) with a composition of 25/75 wt% are investigated by Energy Resolved X-ray Photoelectron Spectroscopy (ER-XPS) at a synchrotron storage ring using excitation energies lower than 1 keV. By changing the energy of the photons the information depth is varied in the range from ca. 1 nm to 10 nm. Therefore, the PVME concentration could be estimated in dependence from the distance of the polymer/air interface for film thicknesses below 100 nm. Firstly, as expected for increasing information depth the PVME concentration decreases. Secondly, it was found that the PVME concentration at the surface has a complicated dependence on the film thickness. It increases with decreasing film thickness until 30 nm where a maximum is reached. For smaller film thicknesses the PVME concentration decreases. A simplified layer model is used to calculate the effective PVME concentration in the different spatial regions of the surface layer. KW - Energy dependent XPS KW - Soft X-ray KW - Thin films PY - 2021 DO - https://doi.org/10.1039/d1sm00656h VL - 17 IS - 29 SP - 6985 EP - 6994 PB - The Royal Chemical Society AN - OPUS4-53039 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -