The TiO2 films are prepared by atomic layer deposition (ALD) method using titanium
isopropoxide precursors at 250 °C and analyzed using resonant photoemission spectroscopy (resPES). We report on the Ti2p and O1s core levels, on the valence band (VB) spectra and
x-ray absorption spectroscopy (XAS) data, and on the resonant photoelectron spectroscopy (resPES) profiles at the O1s and the Ti3p absorption edges. We determine the elemental
abundance, the position of the VB maxima, the partial density of states (PDOS) in the VB and in the conduction band (CB) and collect these data in a band scheme. In addition, we analyze the band-gap states as well as the intrinsic states due to polarons and charge-transfer
excitations. These states are found to cause multiple Auger decay processes upon resonant
excitation. We identify several of these processes and determine their relative contribution to the Auger signal quantitatively. As our resPES data allow a quantitative analysis of these defect states, we determine the relative abundance of the PDOS in the VB and in CB and also the charge neutrality level.
The anatase and rutile polymorphs of TiO2 are analyzed in the same way as the TiO2 ALD layer. The electronic properties of the TiO2ALD layer are compared with the anatase and rutile polymorphs of TiO2. In our comparative study, we find that ALD has its own
characteristic electronic structure that is distinct from that of anatase and rutile. However, many details of the electronic structure are comparable and we benefit from our spectroscopic
data and our careful analysis to find these differences. These can be attributed to a stronger hybridization of the O2p and Ti3d4s states for the ALD films when compared to the anatase and rutile polymorphs.
We study the electronic structure of ultrathin Al₂O₃, HfO₂, and TiO₂ ALD films by resonant photoelectron spectroscopy. We identify intrinsic defects which are responsible for the active sites in interface reactions, for the incorporation of intrinsic charges, and for the formation of local dipole momenta. All of these features determine the surface potentials and the reactivity of the surface of the atomic layer deposition coated systems. We give examples of charges and dipoles in Al₂O₃, on a study of the surface potentials in HfO₂, and relate the intrinsic defects in TiO₂ to their electrochemical relevance.
Atomic Layer-Deposited Aluminum Oxide Hinders Iodide Migration and Stabilizes Perovskite Solar Cells
(2020)
Iodide migration causes degradation of the perovskite solar cells. Here,we observe the direct migration of iodide into the hole-transport
layer in a device. We demonstrate that ultrathin room temperature
atomic layer-deposited Al2O3 on the perovskite surface very effectively hinders the migration. The perovskite-Al2O3 interface enables charge transfer across the Al2O3 layer in the solar cells, without causing any drastic changes in the properties of the perovskite absorber. Furthermore, it helps to preserve the initial properties of the perovskite film during exposure to light and air under real operating conditions, and thus, improves the stability of the solar cells. The ultrathin Al2O3 layer deposited at room temperature significantly increases the lifetime of the perovskite solar cells, and we hope this may be a step toward the mass production of stable devices.
Band Bending at Hole Transporting Layer-Perovskite Interfaces in n-i-p and in p-i-n Architecture
(2022)
Interfaces between hybrid perovskite absorber and its adjacent charge-transporting layers are of high importance for solar cells performance. Understanding their chemical and electronic properties is a key step in designing efficient and stable perovskite solar cells. In this work, the tapered cross-section photoemission spectroscopy (TCS-PES) method is used to study the methylammonium lead iodide (CH3NH3PbI3) (MAPI)-based solar cells in two configurations, that is, in an inverted p–i–n and in a classical n–i–p architecture. It is revealed in the results that the MAPI film deposited once on the n-type TiO2 and once on the p-type NiOx substrates is neither an intrinsic semiconductor nor adapts to the dopant nature of the substrate underneath, but it is heavily n-type doped on both substrates. In addition to that, the TCS-PES results identify that the band bending between the MAPI film and the hole transporting layer (HTL) layer depends on the perovskite solar cells architecture. In particular, a band bending on the HTL side in the n–i–p and at the MAPI in the p–i–n architecture is found. The flat band of NiOx at the NiOx/MAPI interface can be explained by the Fermi level pinning of the NiOx at the interface.
In this work we have utilized near-ambient pressure and ultra-high vacuum X-ray photoelectron spectroscopy as well as atomic layer deposition to investigate perovskite solar cells (PSCs). We have demonstrated that ultrathin room temperature atomic layer-deposited aluminium oxide on the perovskite surface very effectively suppresses iodine migration[1] and improves the long term stability and efficiency of PSCs [2,3]. Furthermore, exposure to light proves more detrimental to the perovskite film than exposure to water vapor.[2] Absorbed photons create Frenkel defects in the perovskite crystal and their number strongly depends on the used illumination. The higher the photon flux, the higher the concentration of Frenkel defects, and thus the stronger the degradation of power conversion efficiency and the stronger the hysteresis in the J-V characteristics. [1] C. Das, M. Kot et al., Cell Reports Physical Science 2020, 1, 100112. [2] M. Kot et al., ChemSusChem 2020, 13, 5722. [3] M. Kot et al., ChemSusChem 2018, 11, 3640.
Interface engineering is a common strategy for passivating surface defects to attain open circuit voltages (Voc) in perovskite solar cells (PSCs). In this work, we introduce the concept of polishing a perovskite thin-film surface using a nanosecond (ns) pulsed ultraviolet laser to reduce surface defects, such as dangling bonds, undesirable phases, and suboptimal stoichiometry. A careful control of laser energy and scanning speed improves the photophysical properties of the surface without compromising the thickness. Using laser polishing, a Voc of 1.21 V is achieved for planar PSCs with a triple cation composition, showing an improved perovskite/hole transport interface by mitigating surface recombination losses. We measure an efficiency boost from 18.0% to 19.3% with improved stability of up to 1000 h. The results open the door to a new class of surface modification using lasers for interface passivation in well-controllable, automated, scalable, and solvent-free surface treatments.
Interfaces in perovskite solar cells play a crucial role in their overall performance, and therefore, detailed fundamental studies are needed for a better understanding. In the case of the classical n–i–p architecture, TiO2 is one of the most used electron-selective layers and can induce chemical reactions that influence the performance of the overall device stack. The interfacial properties at the TiO2/perovskite interface are often neglected, owing to the difficulty in accessing this interface. Here, we use X-rays of variable energies to study the interface of (compact and mesoporous) TiO2/perovskite in such a n–i–p architecture. The X-ray photoelectron spectroscopy and X-ray absorption spectroscopy methods show that the defect states present in the TiO2 layer are passivated by a chemical interaction of the perovskite precursor solution during the formation of the perovskite layer and form an organic layer at the interface. Such passivation of intrinsic defects in TiO2 removes charge recombination centers and shifts the bands upward. Therefore, interface defect passivation by oxidation of Ti3+ states, the organic cation layer, and an upward band bending at the TiO2/perovskite interface explain the origin of an improved electron extraction and hole-blocking nature of TiO2 in the n–i–p perovskite solar cells.
A study of the chemical and electronic properties of various layers across perovskite solar cell (PSC) stacks is challenging. Depth-profiling photoemission spectroscopy can be used to study the surface, interface, and bulk properties of different layers in PSCs, which influence the overall performance of these devices. Herein, sputter depth profiling (SDP) and tapered cross-sectional (TCS) photoelectron spectroscopies (PESs) are used to study highly efficient mixed halide PSCs. It is found that the most used SDP-PES technique degrades the organic and deforms the inorganic materials during sputtering of the PSCs while the TCS-PES method is less destructive and can determine the chemical and electronic properties of all layers precisely. The SDP-PES dissociates the chemical bonding in the spiro-MeOTAD and perovskite layer and reduces the TiO2, which causes the chemical analysis to be unreliable. The TCS-PES revealed a band bending only at the spiro-MeOTAD/perovskite interface of about 0.7 eV. Both the TCS and SDP-PES show that the perovskite layer is inhomogeneous and has a higher amount of bromine at the perovskite/TiO2 interface.
Room temperature atomic layer deposited Al₂O₃ improves perovskite solar cells efficiency over time
(2018)
Electrical characterisation of perovskite solar cells consisting of room-temperature atomic-layer-deposited aluminium oxide (RT-ALD-Al₂O₃) film on top of a methyl ammonium lead triiodide (CH₃NH₃PbI₃) absorber showed excellent stability of the power conversion efficiency (PCE) over along time. Under the same environmental conditions (for 355 d), the average PCE of solar cells without the ALD layer decreased from 13.6 to 9.6 %, whereas that of solar cells containing 9 ALD cycles of depositing RT-ALD-Al₂O₃on top of CH₃NH₃PbI₃ increased from 9.4 to 10.8 %. Spectromicroscopic investigations of the ALD/perovskite interface revealed that the maximum PCE with the ALD layer is obtained when the so-called perovskite cleaning process induced by ALD precursors is complete. The PCE enhancement over time is probably related to a self-healing process induced by the RT-ALD-Al₂O₃ film. This work may provide a new direction for further improving the long-term stability and performance of perovskite solar cells.
Valence band (VB) spectra of titanium dioxide (TiO2) and oxynitride (TiOxNy) films prepared by different atomic layer deposition (ALD) processes are compared and related to electrical characterization [current–voltage (JV) and capacitance–voltage (CV)] results. By increasing the nitrogen amount in the TiO2 film, band-gap narrowing is observed. The band-gap decrease is related to the contribution of the nitrogen density of states, which induces defects within the band-gap and thus reduces its optical band-gap. In-gap states are found in the VB spectra at 1 eV below the Fermi energy in all investigated ALD samples, i.e., in TiO2 as well as in TiOxNy films. An exponential correlation between leakage current density and in-gap state intensity is derived
by the combination of JV measurements and VB spectra, whereas the in-gap states seem to have no influence on hysteresis and fixed oxide charges found in the CV data. It is argued that the in-gap states in TiO2 and TiOxNy have an excitonic or polaronic origin. Both, band-gap narrowing and in-gap state intensity can be tuned by the ALD process selection and the variation of its parameters.
A systematic structural elucidation of the near-surface active species of the two remarkably active nickel phosphides Ni12P5 and Ni2P on the basis of extensive analytical, microscopic, and spectroscopic investigations is reported. The latter can serve as complementary efficient electrocatalysts in the hydrogen (HER) versus oxygen evolution reaction (OER) in alkaline media. In
the OER Ni12P5 shows enhanced performance over Ni2P due to the higher concentration of nickel in this phase, which enables the formation of an amorphous NiOOH/Ni(OH)2 shell on a modified multiphase with a disordered phosphide/phosphite core. The situation is completely reversed in the HER, where Ni2P displayed a significant improvement in electrocatalytic activity over Ni12P5 owing to
a larger concentration of phosphide/phosphate species in the shell. Moreover, the efficiently combined use of the two nickel phosphide phases deposited on nickel foam in overall electrocatalytic water splitting is demonstrated by a strikingly low cell voltage and high stability with pronounced current density, and these catalysts could be an apt choice for applications in commercial alkaline water electrolysis.
Ultra-small rock salt cobalt monoxide (CoO) nanoparticles were synthesized and subjected to partial oxidation (‘corrosion’) with ceric ammonium nitrate (CAN) to form mixed-valence CoOx(1 < x< 2) water oxidation catalysts. Spectroscopic, microscopic and analytical methods evidenced a structural reformation of cubic CoO to active CoOx with a spinel structure. The superior water oxidation activity of CoOx has been established in electrochemical water oxidation under alkaline conditions.
Electrochemical water oxidation with CoOx was recorded at a considerably low overpotential of merely 325 mV at a current density of 10 mA cm-2 in comparison to 370 mV for CoO. Transformation of both octahedral CoII and CoIII sites into amorphous Co(OH)2–CoOOH is the key to high electrochemical activity while the presence of a higher amount of octahedral CoIII sites in CoOx is imperative for an efficient oxygen evolution process.
A comparative study of thin titanium oxynitride (TiOxNy) films prepared by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium (TDMAT) and N2 plasma as well as titanium(IV)isopropoxide and NH3 plasma is reported. The comparison is based on the combination of Ti2p core level and valence band spectroscopy and current-voltage measurements. The TDMAT/N2 process delivers generally higher fractions of TiN and TiON within the Ti2p spectra of the films and stronger photoemissions within the bandgap as resolved in detail by high energy resolution synchrotron-based spectroscopy. In particular, it is shown that higher TiN contributions and in-gap emission intensities correlate strongly with increased leakage currents within the films and might be modified by the process parameters and precursor selection.
Platinum, being the most efficient and stable catalyst, is used in photoelectrochemical (PEC) devices. However, a minimal amount of Pt with maximum catalytic activity is required to be used to minimize the cost of production. In this work, we use an environmentally friendly, ost-effective, and less Pt-consuming method to prepare PEC devices for the hydrogen evolution reaction (HER). The Pt monolayer catalyst is selectively deposited on a Au-nanoisland-supported boron-doped p-type Si (100) photocathode. The PEC device based on the Si photocathode with an ultralow loading of the Pt catalyst exhibits a comparable performance for the HER to that of devices with a thick Pt layer. In addition, we demonstrate that by using a thin TiO2 layer deposited by atomic layer deposition photo-oxidation of the Si photocathode can be blocked resulting in a stable PEC performance.
An ultrathin Al₂O₃ film deposited on methylammonium lead triiodide (CH₃NH₃PbI₃) perovskite has the capability to suppress the carrier recombination process and improve the perovskite solar cells efficiency
and stability. However, annealing at temperatures higher than 85°C degrades the CH₃NH₃PbI₃ perovskite film. The X-ray photoelectron spectroscopy study performed in this work indicates that it is possible to grow Al₂O₃ by atomic layer deposition on the perovskite at room temperature, however, besides pure Al₂O₃ some OH groups are found and the creation of lead and iodine oxides at the Al₂O₃/CH₃NH₃PbI₃ interface takes place.
It has been recently demonstrated that the photoactivity toward oxygen evolution of a number of n-type metal oxides can be substantially improved by a reductive electrochemical pretreatment. Such an enhancement has been primarily linked to the formation of low valent metal species that increase electrode conductivity. In this work, we report new insights into the electrochemical doping using highly ordered (110)-oriented hematite nanorods directly grown on FTO. The reductive pretreatment consists in applying negative potentials for a controlled period of time. Such a pretreatment was optimized in both potentiostatic and potentiodynamic regimes. We show that the optimized pretreatment enhances electrode conductivity due to an increase in charge carrier density. However, it additionally triggers changes in the morphologic, catalytic and electronic properties that facilitate the separation and collection of the photogenerated charge carriers causing an up to 8-fold enhancement in the photocurrent for water oxidation. The reductive pretreatment can be considered as a highly controllable electrochemical n-type doping with the amount of generated Fe2+/polaron species and the change in film morphology as the main factors determining the final efficiency for water photooxidation of the resulting electrodes.
Alkaline electrochemical water oxidation with multi-shelled cobalt manganese oxide hollow spheres
(2017)
Multi-shelled hollow spheres of cobalt manganese oxides (CMOs) deposited on Ni foam exhibited superior alkaline electrochemical water oxidation activity and surpassed those of bulk CMO and commercial noble metal-based catalysts. A higher amount of cobalt in the spinel structure resulted in the transformation of the tetragonal to the cubic phase with a decrease in the overpotential of oxygen evolution.
Titanium oxynitride films are prepared by plasma enhanced atomic layer deposition method using two different precursors and nitrogen sources. Synchrotron radiation-based X-ray photoelectron spectroscopy and X-ray absorption spectroscopy are used to characterize the nitrogen species incorporated
within these films depending on the deposition parameters.
It is found that nitrogen atoms in these films are differently bonded. In particular, it can be distinguished between Ti-ON and Ti-N bonding configurations and molecular nitrogen species caused by precursor fragments.
Organic-inorganic lead halide perovskites have emerged as very attractive absorber materials for the fabrication of low cost and high efficiency solar cells, but a delicate nature of these films is one of the main challenges for a successful commercialization. Typically, when exposed to air or moisture, perovskite films degrade within a couple of hours or days. Moreover, the methylammonium lead triiodide (CH₃NH₃PbI₃) perovskite cannot sustain a prolonged annealing at temperatures around 85∘C. In this work, we are investigating stability (upon air and thermal exposure) of a CH₃NH₃PbI₃ perovskite film coated with a thin layer of Al₂O₃ deposited by atomic layer deposition
(ALD). In particular, the chemical and electronic changes occurred at the Al₂O₃/CH₃NH₃PbI₃ interface during the first 50 ALD cycles were monitored ex-situ by high-resolution and surface-sensitive synchrotron-based X-ray photoelectron spectroscopy (SR-XPS). The advantage of the ALD as a deposition method is that it can produce extremely dense layers with a very precise thickness control at room temperature. Detailed SR-XPS data analysis and a stability test of the perovskite film with alumina will be presented.